CN106119808A - Cutter diamond coatings preparation facilities - Google Patents
Cutter diamond coatings preparation facilities Download PDFInfo
- Publication number
- CN106119808A CN106119808A CN201610716383.1A CN201610716383A CN106119808A CN 106119808 A CN106119808 A CN 106119808A CN 201610716383 A CN201610716383 A CN 201610716383A CN 106119808 A CN106119808 A CN 106119808A
- Authority
- CN
- China
- Prior art keywords
- heated filament
- support platform
- spiral type
- cutter
- preparation facilities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 22
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 20
- 239000010432 diamond Substances 0.000 title claims abstract description 20
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 239000000498 cooling water Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 239000002826 coolant Substances 0.000 claims description 5
- 239000012495 reaction gas Substances 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims 1
- 239000011159 matrix material Substances 0.000 abstract description 7
- 229910052799 carbon Inorganic materials 0.000 abstract description 5
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 abstract description 3
- 230000002708 enhancing effect Effects 0.000 abstract description 3
- 230000006911 nucleation Effects 0.000 abstract description 3
- 238000010899 nucleation Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/271—Diamond only using hot filaments
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
This application discloses a kind of cutter diamond coatings preparation facilities, including cover body, this cover body has a reaction chamber, support platform it is provided with in described reaction chamber, described support platform is provided above spiral type heated filament, this spiral type heated filament be axially located vertical direction, cutter is supported on described support platform and is positioned at the space that described spiral type heated filament surrounds, described support platform can axially rotate, and described spiral type heated filament is connected with heater supply and DC bias power respectively.The present invention uses spiral type heated filament, it is possible to ensure that cutter is heated evenly so that the distance between tool matrix surface and heated filament is equal so that the most even compactness rolled into a ball by the carbon ion pattern being distributed in around matrix and hydrion, is conducive to increasing Enhancing Nucleation Density.
Description
Technical field
The application relates to a kind of cutter diamond coatings preparation facilities.
Background technology
Traditional cutter coat preparation facilities, it is uneven that its shortcoming essentially consists in coating.The carbon ion group that heated filament ionizes out
Be deposited on substrate surface with ionic hydrocarbon group major part, thus more uniform diamond thin can be deposited, and carbon from
Son group is consistent with the direction of air-flow with the trend of ionic hydrocarbon group, if used and flat knife when complex shaped cutter is prepared in use
Having identical device, the coating on the tool matrix surface inevitably resulting in parallel weaving is thicker, and lower surface chance does not has coating
Generate.
Summary of the invention
It is an object of the invention to provide a kind of cutter diamond coatings preparation facilities, with overcome of the prior art not
Foot.
For achieving the above object, the present invention provides following technical scheme:
The open a kind of cutter diamond coatings preparation facilities of the embodiment of the present application, including cover body, this cover body has a reaction
Chamber, is provided with support platform in described reaction chamber, described support platform is provided above spiral type heated filament, this spiral type heated filament axial
Being positioned at vertical direction, cutter is supported on described support platform and is positioned at the space that described spiral type heated filament surrounds, described support
Platform can axially rotate, and described spiral type heated filament is connected with heater supply and DC bias power respectively.
Preferably, in above-mentioned cutter diamond coatings preparation facilities, described reaction chamber is the cavity sealed, this cavity
It is connected to vacuum and Pneumatic controller.
Preferably, in above-mentioned cutter diamond coatings preparation facilities, described cover body is provided with reaction gas inlet,
In this reaction gas inlet extends described reaction chamber and towards described spiral type heated filament.
Preferably, in above-mentioned cutter diamond coatings preparation facilities, described support platform is provided with chiller.
Preferably, in above-mentioned cutter diamond coatings preparation facilities, described chiller includes being set around described
The circulating water pipe of support platform, this circulating water pipe has cooling water inlet and coolant outlet, described cooling water inlet and cooling water and goes out
Connect between Kou and have cooling water source and water circulating pump.
Preferably, in above-mentioned cutter diamond coatings preparation facilities, described cover body is additionally provided with observation panel.
Compared with prior art, it is an advantage of the current invention that: the present invention uses spiral type heated filament, it is possible to ensure that cutter is heated
Uniformly so that the distance between tool matrix surface and heated filament is equal so that the carbon ion pattern that is distributed in around matrix and
The most even compactness of hydrion group, is conducive to increasing Enhancing Nucleation Density.
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present application or technical scheme of the prior art, below will be to embodiment or existing
In having technology to describe, the required accompanying drawing used is briefly described, it should be apparent that, the accompanying drawing in describing below is only this
Some embodiments described in application, for those of ordinary skill in the art, on the premise of not paying creative work,
Other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 show the structural representation of cutter diamond coatings preparation facilities in the specific embodiment of the invention.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out detailed retouching
State, it is clear that described embodiment is only a part of embodiment of the present invention rather than whole embodiments.Based on the present invention
In embodiment, the every other enforcement that those of ordinary skill in the art are obtained on the premise of not making creative work
Example, broadly falls into the scope of protection of the invention.
Shown in Fig. 1, cutter diamond coatings preparation facilities, including cover body 1, this cover body has a reaction chamber 2, reaction
Be provided with in chamber 2 support platform 3, support platform 3 be provided above spiral type heated filament 4, this spiral type heated filament 4 be axially located vertical side
To, cutter 5 is supported on support platform 3 and is positioned at the space that spiral type heated filament 4 surrounds, and supporting platform 3 can axially rotate, spiral
Shape heated filament 4 is connected with heater supply 5 and DC bias power 6 respectively.
Further, reaction chamber 2 is the cavity sealed, and this cavity is connected to vacuum and Pneumatic controller 7.
Further, cover body 1 is provided with reaction gas inlet 8, in this reaction gas inlet 8 extends reaction chamber and face
To spiral type heated filament 4.
Further, support on platform 3 and be provided with chiller.
Further, chiller includes being set around the circulating water pipe supporting platform, and this circulating water pipe has cooling water inlet 9
With coolant outlet 10, connect between cooling water inlet 9 and coolant outlet 10 and have cooling water source and water circulating pump.
Further, described cover body 1 is additionally provided with observation panel 11.
The present invention uses spiral type heated filament, it is possible to ensure that cutter is heated evenly so that between tool matrix surface and heated filament
Distance equal so that the most even compactness rolled into a ball by the carbon ion pattern being distributed in around matrix and hydrion, is conducive to
Increase Enhancing Nucleation Density.
It should be noted that in this article, term " includes ", " comprising " or its any other variant are intended to non-row
Comprising of his property, so that include that the process of a series of key element, method, article or equipment not only include those key elements, and
And also include other key elements being not expressly set out, or also include intrinsic for this process, method, article or equipment
Key element.In the case of there is no more restriction, statement " including ... " key element limited, it is not excluded that including
State and the process of key element, method, article or equipment there is also other identical element.
The above is only the detailed description of the invention of the application, it is noted that for the ordinary skill people of the art
For Yuan, on the premise of without departing from the application principle, it is also possible to make some improvements and modifications, these improvements and modifications also should
It is considered as the protection domain of the application.
Claims (6)
1. a cutter diamond coatings preparation facilities, it is characterised in that include cover body, this cover body has a reaction chamber, described
Being provided with support platform in reaction chamber, described support platform is provided above spiral type heated filament, and being axially located of this spiral type heated filament is perpendicular
Nogata to, cutter is supported on described support platform and is positioned at the space that described spiral type heated filament surrounds, and described support platform can edge
Axial rotation, described spiral type heated filament is connected with heater supply and DC bias power respectively.
Cutter diamond coatings preparation facilities the most according to claim 1, it is characterised in that: described reaction chamber is seal
Cavity, this cavity is connected to vacuum and Pneumatic controller.
Cutter diamond coatings preparation facilities the most according to claim 1, it is characterised in that: it is provided with anti-on described cover body
Answer gas access, in this reaction gas inlet extends described reaction chamber and towards described spiral type heated filament.
Cutter diamond coatings preparation facilities the most according to claim 1, it is characterised in that: it is provided with on described support platform
Chiller.
Cutter diamond coatings preparation facilities the most according to claim 4, it is characterised in that: described chiller include around
Being located at the circulating water pipe of described support platform, this circulating water pipe has cooling water inlet and coolant outlet, described cooling water inlet
With connection has cooling water source and water circulating pump between coolant outlet.
Cutter diamond coatings preparation facilities the most according to claim 1, it is characterised in that: it is additionally provided with on described cover body
Observation panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610716383.1A CN106119808A (en) | 2016-08-24 | 2016-08-24 | Cutter diamond coatings preparation facilities |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610716383.1A CN106119808A (en) | 2016-08-24 | 2016-08-24 | Cutter diamond coatings preparation facilities |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106119808A true CN106119808A (en) | 2016-11-16 |
Family
ID=57275001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610716383.1A Pending CN106119808A (en) | 2016-08-24 | 2016-08-24 | Cutter diamond coatings preparation facilities |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106119808A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1818131A (en) * | 2006-03-09 | 2006-08-16 | 上海交通大学 | Chemical gas-phase deposition for producing diamond thin filmon cutter with complex-formation |
| US20080047489A1 (en) * | 2006-08-23 | 2008-02-28 | Kinik Company | Chemical vapor deposition reactor that pre-heats applied gas and substrate before reaction |
| CN101736323A (en) * | 2009-12-21 | 2010-06-16 | 上海交通大学 | Device for preparing boron-doped diamond composite coating on surface of cutter |
| CN105039927A (en) * | 2015-03-11 | 2015-11-11 | 北京交通大学长三角研究院 | Preparation device and preparation method of macroporous diamond drawing die coating |
| CN205398722U (en) * | 2016-03-02 | 2016-07-27 | 上海科弦精密工具有限公司 | Apparatus for preparing diamond coating |
-
2016
- 2016-08-24 CN CN201610716383.1A patent/CN106119808A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1818131A (en) * | 2006-03-09 | 2006-08-16 | 上海交通大学 | Chemical gas-phase deposition for producing diamond thin filmon cutter with complex-formation |
| US20080047489A1 (en) * | 2006-08-23 | 2008-02-28 | Kinik Company | Chemical vapor deposition reactor that pre-heats applied gas and substrate before reaction |
| CN101736323A (en) * | 2009-12-21 | 2010-06-16 | 上海交通大学 | Device for preparing boron-doped diamond composite coating on surface of cutter |
| CN105039927A (en) * | 2015-03-11 | 2015-11-11 | 北京交通大学长三角研究院 | Preparation device and preparation method of macroporous diamond drawing die coating |
| CN205398722U (en) * | 2016-03-02 | 2016-07-27 | 上海科弦精密工具有限公司 | Apparatus for preparing diamond coating |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Kim et al. | Wafer‐scale and low‐temperature growth of 1T‐WS2 film for efficient and stable hydrogen evolution reaction | |
| Meng et al. | Simultaneous manipulation of O‐doping and metal vacancy in atomically thin Zn10In16S34 nanosheet arrays toward improved photoelectrochemical performance | |
| TWI875695B (en) | Multi-layer plasma chemical vapor deposition coating on electrical device, reaction chamber for applying the same, and method for applying the same in reaction chamber | |
| CN102877109A (en) | Method for preparing grapheme transparent conducting films by electrophoretic deposition | |
| CN102618846B (en) | Method and device for depositing super-hard film through multi-torch plasma spray CVD (Chemical Vapor Deposition) method | |
| CN104005073B (en) | Preparation method of low-solar-absorptance high-emissivity coating on surface of titanium alloy TC4 | |
| CN101931060B (en) | Metal laminate plate, preparation method thereof and battery using metal laminate plate | |
| Briois et al. | A comparison of electrical properties of sputter-deposited electrolyte coatings dedicated to intermediate temperature solid oxide fuel cells | |
| WO2020119680A1 (en) | Superhydrophobic diamond-like composite layer structure and preparation method therefor | |
| CN106119808A (en) | Cutter diamond coatings preparation facilities | |
| CN109457223A (en) | A kind of protective device and method for turborotor variable-angle applying coating | |
| Sun et al. | Topographic scanning electronic microscopy reveals the 3d surface structure of materials | |
| CN111021085B (en) | Cu/TiO based on magnetron sputtering2Heat insulation fabric and preparation method thereof | |
| CN202193845U (en) | A kind of silicon wafer support plate applied to thin film deposition process | |
| CN205070236U (en) | Electrical cabinet | |
| CN105887153B (en) | Precision size and Part Surface Roughness for the part of Ra≤0.8 local electrochemical enamelizing method | |
| Yin et al. | Effects of the grain boundary on phase structure and surface morphology of TiO2 films prepared by MAO technology | |
| CN113058826A (en) | Carbon material surface high temperature resistant densification nano deposition graphene coating technology | |
| Metcalfe et al. | Influence of Microstructure on Electrochemical Performance of Plasma Sprayed Ni‐YSZ Anodes for SOFCs | |
| CN207845774U (en) | A kind of diamond-like-carbon film deposition apparatus of low hydrogen content | |
| CN109912231A (en) | A kind of the high transmittance coating apparatus and film plating process of photovoltaic glass | |
| CN206052149U (en) | Solar silicon wafers plated film graphite boat piece and graphite boat | |
| CN205628394U (en) | Sample anchor clamps for hot spraying experiments | |
| CN102367571B (en) | Preparation method for improving surface hydrophilicity of nano PET film | |
| Milella et al. | Single Step Plasma Deposition of Platinum‐Fluorocarbon Nanocomposite Films as Electrocatalysts of Interest for Micro Fuel Cells Technology |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20161116 |