CN106000086A - Condensation treatment equipment for organic gaseous pollutants - Google Patents

Abstract

The invention relates to a condensation treatment equipment for organic gaseous pollutants. The treatment equipment is provided with a gas inlet and a gas outlet respectively on both sides of the internal channel of the base, so that external gas containing pollutants can enter through the gas inlet and pass through the inside of the channel. The clean gas processed by the treatment system is output from the gas outlet, and the gas inlet on one side of the channel of the base is directed toward the gas outlet on the other side. The oxidation unit, humidification unit, first condensation unit, water washing unit and third unit of the treatment system are arranged in sequence. The second condensation unit uses a photocatalyst light source to crack the pollutants in the gas through the oxidation unit, then increases the humidity of the gas and then cools it down. After flushing the gas, it cools down again. Then the purified gas is discharged from the gas outlet to achieve the purpose of reducing the content of the gas. The purpose of gas treatment of pollutants is to form clean air.

Description

Condensation treatment equipment for organic gaseous pollutants

technical field

The invention provides a condensation treatment device for organic gaseous pollutants, especially the equipment that can purify the gas containing pollutants, and use the internal treatment system of the base to carry out photocatalyst cracking, humidification, condensation, water washing and re-condensation of the polluted gas, etc. Treatment steps to achieve the purpose of purifying air with high efficiency.

Background technique

By the way, with the progress of the high-tech era, all kinds of electronic and electrical products are prevalent, and portable electronic devices such as smart phones, tablet computers and notebook computers are widely used by the public, which has also led to the establishment of related manufacturing industries, among which The growth rate of the semiconductor industry is increasing, and the production process of semiconductor manufacturing, whether in silicon wafers, integrated circuit manufacturing or IC chip assembly, is quite complicated, and there are quite a lot of chemical substances used in the process. The use of these chemical substances or solvents has become the main source of air pollution in the production process of the semiconductor industry, and thus makes the air pollution of semiconductor manufacturing present a small amount but a wide variety of characteristics.

Furthermore, almost every step in the manufacturing process of wafers and integrated circuits uses a variety of acid and alkali substances, organic solvents, and toxic gases, etc., and various substances form complex products after reaction The chemical substances used in different processes are also different, so all processes may also be a source of air pollution, and the waste gas generated by the production process is continuously discharged and classified according to the characteristics of the pollutants. Wafers and The air pollution caused by the integrated circuit process is divided into: toxic and flammable gases used in the oxidation diffusion and chemical vapor deposition process and the gas generated after the reaction, acid-base gas generated in the etching and cleaning process, Organic solvent gas generated during the yellow light chamber process; as for wafers cut into wafers and then undergoing a series of assembly operations, possible air pollution sources include acid and alkali waste gas generated in the electroplating area and tin soot generated in the tin leaching area , as well as the acid gas and organic solvent vapors generated during the cleaning process. In these processes, waste gas containing a large amount of toxic Total Organic Compounds (Total Organic Compounds, TOCs) will be generated. In order to avoid pollution of the waste gas to the environment and Public nuisance, the harmful substances in the waste gas must be purified and removed before being discharged into the outside atmosphere.

The currently known technologies for treating waste gas containing TOCs from semiconductors are mainly divided into high-temperature incineration technology, activated carbon adsorption technology, and wet scrubbing technology. Among them, high-temperature incineration technology needs to consume a large amount of fuel to generate high-temperature flames, and the exhaust gas The flammable and harmful substances are burned into ashes, but there is a strong corrosive fluorinated gas in the exhaust gas, and it needs a high temperature above 1,000 degrees (°C) to be decomposed into harmless gases. The area is only located at the outlet end of the gas, so that the density of the high-temperature flame combustion is relatively loose, so that the exhaust gas can easily pass through the gap of the flame combustion, and the exhaust gas cannot be purified one by one. After turning into ashes, there will still be the problem of secondary spill pollution, so this high-temperature incineration technology still needs to be improved; moreover, the activated carbon absorption technology needs to use a large amount of activated carbon to remove harmful substances in the exhaust gas, but activated carbon After a short period of use, its adsorption capacity will gradually decrease, and the activated carbon must be replaced frequently to remove harmful substances in the exhaust gas, and the relative cost will also increase, which is not in line with the benefits of the agent.

In addition, the wet scrubbing technology uses the characteristics that harmful substances in the exhaust gas are almost soluble in water, transfers the harmful substances in the gas phase to the liquid phase, and then removes them by oxidation. Generally speaking, most of them use spray scrubbing technology to wash them The liquid is atomized into droplets with a particle size of 1 to 500 microns, and the water mist is used to capture the powder, soluble or hydrophilic harmful substances in the exhaust gas, and then the water mist with a high liquid-to-gas ratio is used to form the water mist In the supersaturated state, to avoid the re-evaporation of water mist and affect the efficiency, and then use such as plastic water curtains to filter out water drops, and to achieve the purpose of removing harmful substances through the removal of water. However, this wet washing technology must be completely It is difficult to avoid 100% re-evaporation of water mist (especially TOCs exhaust gas), and it is impossible to maintain high removal efficiency continuously. It is also easy to cause the harmful substances in the supplied water and exhaust gas to react to form insoluble compound ions, such as water The mist contains calcium ions, and when the air contains fluorine gas (F ₂ ) or ammonia (NH ₃ ), it is easy to generate insoluble calcium fluoride or alkaline compounds, and it is also easy to generate solid corrosive products and With alkaline substances, the dirt deposition produced by these insoluble and corrosive products can easily cause the washing equipment to be blocked, which in turn will cause damage to the washing equipment and reduce the service life. Therefore, the quality of the washing equipment used must be very high. Due to the need to maintain Only high-quality water can maintain a certain purification and air humidification effect, so the rate of water exchange and replenishment is quite high, and the operating cost of water consumption is relatively high. In addition, it is necessary to introduce more expensive circulating water filtration equipment, which also increases the cost of waste gas treatment. .

Therefore, how to solve the problems and troubles of serious air pollution caused by industrial waste gas, the inability of waste gas treatment equipment to effectively purify polluted waste gas, and the ineffectiveness and high cost of various waste gas treatment equipment. Relevant manufacturers in the industry are eager to study the direction of improvement.

Contents of the invention

Therefore, in view of the above-mentioned problems and deficiencies, the inventor collected relevant information, evaluated and considered in many ways, and based on years of experience accumulated in this industry, through continuous trial and modification, he designed this kind of exhaust gas Harmful pollutants are purified through the internal treatment system of the base, and the invention patent of the condensation treatment equipment for organic gaseous pollutants that can effectively reduce the degree of air pollution caused by exhaust gas is born.

The main purpose of the present invention is that the processing equipment is provided with a gas inlet and a gas outlet on both sides of the channel inside the base, so that the gas containing pollutants from the outside can enter through the gas inlet, and the gas after being processed by the processing system can be supplied to the inside of the channel. The clean gas is output from the gas outlet, and from the gas inlet on one side of the channel of the base to the gas outlet on the other side, the oxidation unit, humidification unit, first condensation unit, water washing unit and second condensation unit of the treatment system are arranged in sequence, The pollutants in the gas are cracked by the photocatalyst light source through the oxidation unit, and then the humidity of the gas is increased to cool down, and the gas is washed and cooled again, and the purified gas is discharged from the gas outlet to achieve the treatment of the gas containing pollutants. The purpose of forming clean air.

The secondary purpose of the present invention is that the oxidation unit of the treatment system includes a photocatalyst light source that can emit ultraviolet light (UV), so that the pollutants in the gas can be cracked, and the pollutants can be decomposed into inorganic particles depending on the molecular size of the pollutants. Harmful carbon dioxide (CO ₂ ) or hydrophilic substances are removed by water washing; as for the humidification unit and water washing unit, there are respectively a first water processor and a second water processor, which are respectively treated by the first water The first water supply pipe for water supply from the device, the second water supply pipe for water supply by the second water liquid processor, a plurality of first water mist nozzles located on the first water supply pipe, and a plurality of second water mist located on the second water supply pipe The nozzle increases the relative humidity in the exhaust gas through the humidification unit, so that the humidity of the exhaust gas reaches the saturation line, so as to improve the efficiency of subsequent condensation treatment, while the water washing unit uses the water mist to collide with the pollutants in the gas, so that the pollutants are absorbed by the water mist adsorption and grabbing, and can be excluded; and the first condensing unit and the second condensing unit respectively include a first condensing coil and a second condensing coil, and the first condensing coil has a first water inlet, a first outlet The second condensing coil has a second water inlet and a second water outlet, so as to condense the gas containing moisture, so that the pollutants in the gas are condensed and removed.

Another object of the present invention is that the photocatalyst light source of the oxidation unit can emit light excitation of 184.9nm or 185nm ultraviolet light (UV) to directly form ozone (O ₃ ) with strong reaction activity, and the ozone is further activated by the photocatalyst It is decomposed into oxygen (O) or water (H ₂ O) and reacts into oxyhydrogen organic compound (OH·). Through this chain reaction, more free radicals are generated, which can oxidize pollutants more intensely, so The ability of hydrogen to oxidize organic compounds (OH·) is higher than that of ozone by 10 ⁹ -10 ¹⁰ , which can decompose organic gaseous pollutants into small fragments of pollutant molecules that are cracked, and will eventually be decomposed into harmless carbon dioxide ( CO ₂ ) is discharged into the air. If the pollutants are larger molecules, they can also be oxidized to hydrophilic substances first, and then removed by washing with water.

Description of drawings

Fig. 1 is a side view sectional view of the present invention;

Fig. 2 is a side sectional view of another direction of the present invention.

Explanation of reference numerals: 1. base; 10. channel; 11. gas inlet; 12. gas outlet; 2. treatment system; 21. oxidation unit; 22. humidification unit; 221. first water-liquid processor; 2211, Clean water injection pipe; 2212, waste water discharge pipe; 222, the first water supply pipe; 223, the first water mist nozzle; 23, the first condensing unit; 231, the first condensing coil; 2311, the first water inlet; 2312, the first 1 water outlet; 24, water washing unit; 241, second water liquid processor; 2411, clean water injection pipe; 2412, waste water discharge pipe; 242, second water supply pipe; 243, second water mist nozzle; 25, second condensation Unit; 251, the second condensing coil; 2511, the second water inlet; 2512, the second water outlet.

detailed description

In order to achieve the above-mentioned purpose and effect, the technical means adopted in the present invention, its structure, and the method of implementation, etc., are hereby described in detail with respect to the preferred embodiments of the present invention. Its features and functions are as follows, in order to fully understand.

Please refer to Fig. 1 and shown in Fig. 2, which are respectively a side view sectional view of the present invention and a side view sectional view in another direction, as shown in the figure, it can be clearly seen that the condensation treatment equipment of organic gaseous pollutants of the present invention, Including base 1, processing system 2, wherein:

The base 1 has a hollow channel 10 inside, and a gas inlet 11 and a gas outlet 12 are respectively provided on two sides of the channel 10 for passing through to the outside.

The treatment system 2 includes an oxidation unit 21, a humidification unit 22, a first condensation unit 23, a water washing unit 24 and a second condensation unit 25, and the oxidation unit 21 is provided with a photocatalyst light source that can emit ultraviolet light (UV); and the humidification unit 22 A first water-liquid processor 221 is provided, and the first water-liquid processor 221 is connected with a first water supply pipe 222, and a plurality of first water mist nozzles 223 are arranged on the surface of the first water supply pipe 222; The unit 23 is provided with a first condensing coil 231, and a first water inlet 2311 and a first water outlet 2312 are respectively provided on both sides of the first condensing coil 231; and the washing unit 24 is provided with a second water-liquid processor 241 , and the second water-liquid processor 241 is to connect the second water supply pipe 242, and the second water supply pipe 242 is provided with a plurality of second water mist nozzles 243; moreover, the second condensing unit 25 is provided with the first The second condensing coil 251 is provided with a second water inlet 2511 and a second water outlet 2512 on two sides of the second condensing coil 251 respectively.

When the above-mentioned components are actually assembled, the oxidation unit 21, the humidification unit 22, and the first condensation unit of the treatment system 2 are assembled sequentially from the gas inlet 11 to the gas outlet 12 in the channel 10 of the base 1. 23. The water washing unit 24 and the second condensing unit 25 are used to process the external air introduced at the gas inlet 11 through the treatment system 2 for sterilization, deodorization, and filtering of pollutants, and then produce harmless gas that is produced by another The gas outlet 12 on one side is discharged outwards, and the processing equipment of the present invention is formed by using the base 1 and the processing system 2, and can achieve the purpose of purifying the air and reducing air pollution.

And the oxidation unit 21 of above-mentioned processing system 2, be provided with and can emit section and be the photocatalyst light source of 184.9nm or 185nm ultraviolet light (UV, excite by ultraviolet light (UV) and directly form the ozone (O ₃ ) with strong reactivity, and Ozone is further decomposed into oxygen (O) by photocatalyst, or ozone (O ₃ ) reacts with water (H ₂ O) to form hydrogen-oxygen organic compound (OH·), which can generate more free radicals through this chain reaction , which can carry out a more intense oxidation of pollutants, because the oxidation reaction capacity of organic compounds (OH·) is 10 ⁹ to 10 ¹⁰ times that of ozone (O ₃ ), which can crack organic gaseous pollutants Mineralization and decomposition of small fragments of pollutant molecules will eventually be decomposed into harmless carbon dioxide (CO ₂ ) and then discharged into the air. If the pollutants are larger molecules, they can also be oxidized to hydrophilic substances first, Then remove by washing; and [the wavelength of ultraviolet light (UV) light is 1～380nm after photocatalyst light source irradiation, and the ultraviolet light section applied in the preferred embodiment of the present invention can be 184.9nm or 185nm, but not Therefore, the embodiment of the ultraviolet light section of the present invention is not limited], the properties of the titanium dioxide (TiO 2 ) particles produced by the photocatalyst light source can be changed and become more active when the titanium dioxide (TiO ₂ ) particles produced by the photocatalyst light source reach the nanoscale, providing titanium dioxide (TiO ₂ ) The electrons on the surface of the particle jump out, which makes the surface of the titanium dioxide (TiO ₂ ) particle form an electric hole, so that as soon as the oxygen in the air contacts the electric hole on the surface of the titanium dioxide (TiO ₂ ), it will form a superoxide ion (O ₂ ) and water molecules (relative humidity) in the air to generate hydroxyl radicals (OH), which will generate carbon atoms (C) in the tiny organic substances in the air and form a redox effect, making the tiny organic substances in the air Organic substances (such as bacteria, odors, viruses, molds or dust mites, etc.) are subjected to ultraviolet light wavelengths in the light projected by multiple photocatalyst light sources, resulting in a photocatalyst conversion reaction, even if the air is converted into carbon dioxide (CO ₂ ) and water Gas (H ₂ O), reducing the degree of air pollution.

Moreover, the humidifying unit 22 and the water washing unit 24 of the treatment system 2 supply water to the first water supply pipe 222 through the first water liquid processor 221, and supply water to the second water supply pipe 242 through the second water liquid processor 241, and then through the first water liquid processor 221 to supply water to the second water supply pipe 242. A plurality of first water mist nozzles 223 on a water supply pipe 222 and a plurality of second water mist nozzles 243 on a second water supply pipe 242 spray water mist into the channel 10 of the base 1 respectively, and can increase the gas concentration of the exhaust gas. The relative humidity in the air, so that the humidity of the pollutants in the gas reaches the saturation line, and the gas enters the subsequent first condensing unit 23 and the second condensing unit 25 to improve the efficiency of the gas being condensed, and most of the gas can be condensed. The nucleation effect of the pollutants being condensed increases the first removal stroke of the pollutants in the gas; and the first water-liquid processor 221 and the second water-liquid processor 241 can be provided with clean water injection pipes 2211 and 2411 respectively, Clean water is injected from the outside and supplied to the first water supply pipe 222 and the second water supply pipe 242 respectively, and the water mist sprayed by the first water mist nozzle 223 and the second water mist nozzle 243 falls into the first water liquid processor 221, After the second water liquid processor 241, the water liquid in the first water liquid processor 221 and the second water liquid processor 241 can be purified by filtering equipment (not shown in the figure), so that the first water liquid The water liquid in the processor 221 and the second water liquid processor 241 is kept in a clean state; and after a predetermined time, the pollutants caught by the water mist will form water droplets and then drop into the first water liquid processor 221 and the second water liquid processor 221. The non-polluting waste water formed in the second water-liquid processor 241 passes through the waste water discharge pipes 2212 and 2412 of the first water-liquid processor 221 and the second water-liquid processor 241 to discharge the non-polluting waste water to the outside.

As for the first condensing unit 23 and the second condensing unit 25 of the processing system 2, the first condensing coil 231 and the second condensing coil 251 respectively form a continuous circular spiral extension, filling the base 1 In the space of channel 10, low-temperature cold water or ice water can be injected through the first water inlet 2311 of the first condensing coil 231 and the second water inlet 2511 of the second condensing coil 251 (the water inlet temperature can be about 7 °C), the cold water can be cooled and condensed through the circulation flow of the first condensing coil 231 and the second condensing coil 251, and the gas entering the channel 10 of the base 1 can be cooled and condensed, and the gas can be condensed through the first condensing unit 23 The temperature drops to 9.8°C, and the second condensing unit 25 lowers the gas temperature to 8.5°C, which can effectively improve the condensation nucleation effect on the condensation of most pollutants contained in the gas, and the pollutants in the gas can be condensed by The condensed nucleation method is removed, and the cold water in the first condensing coil 231 is injected through the first water inlet 2311, and then discharged from the first water outlet 2312 (the outlet water temperature is about 9°C); as for the second condensing coil After the cold water in the pipe 251 is injected from the second water inlet 2511, it is discharged from the second water outlet 2512 (the temperature of the outlet water is about 8.5°C) to supply the low temperature in the first condensing coil 23 and the second condensing coil 251. Cold water or ice water, etc. (can be selected according to actual application, does not limit the application mode of low-temperature cold water or ice water, etc. of the present invention) can circulate.

And when the gas inlet 11 of the base 1 introduces external air, the gas contains organic pollutants [such as DMSO-chemical formula (C ₂ H ₆ OS), MEA-chemical formula (C ₂ H ₇ NO), NMP-chemical formula (C ₅ H ₉ NO) or Ethylene Glycol-chemical formula (C ₂ H ₆ O ₂ ), etc.], make the gas first pass through the oxidation unit 21 near the gas inlet 11 and irradiate it with the ultraviolet light source of the photocatalyst to crack the pollutants in the gas Mineralization and decomposition of small fragments of pollutant molecules will eventually be decomposed into harmless carbon dioxide (CO ₂ ) and then emitted into the air. If the pollutants are larger molecules, they can also be oxidized to hydrophilic substances first Finally, when the gas enters the subsequent humidifying unit 22, water mist is sprayed on the gas through a plurality of first water mist nozzles 223 on the first water supply pipe 222, so that the relative humidity of the gas is increased, and the relative humidity of the gas and pollutants is supplied. When the saturation line is reached, when the gas and pollutants enter the first condensing unit 23, the low-temperature cold water or ice water circulated in the first condensing coil 231 is used to condense the gas and pollutants. And when the pollutants enter the water washing unit 24, a plurality of second water mist nozzles 243 on the second water supply pipe 242 are used to spray water mist on the pollutants of the gas, and after the water mist hits the pollutants, the pollutants in the gas can be captured. Pollutants, the relative humidity in the gas is saturated by water washing and the pollutants that have been condensed and treated are washed away by impacting and grabbing, which can effectively remove most of the pollutants in the gas, and can remove most of the pollutants in the gas After the substances are washed away, the gas enters the second condensing unit 25 again, and the gas is condensed again, which can prevent the organic pollutants from volatilizing again, and after the pollutants are condensed again, the pollutants in the gas can be effectively removed , the clean gas processed by the processing system 2 can be discharged through the gas outlet 12, so that the purified air discharged from the gas outlet 12 will not pollute the external air or the environment, and the quality of the air can also be maintained. The gas is subjected to strong and powerful purification treatment.

Moreover, the treatment system 2 installed in the inner channel 10 of the base 1 undergoes the purification treatment operation of the oxidation unit 21, the humidification unit 22, the first condensation unit 23, the water washing unit 24 and the second condensation unit 25 arranged in sequence, and There is no need to install expensive machinery and equipment, the cost will not increase, and the service life of the base 1 and the treatment system 2 is long, which can reduce the cost of waste gas treatment and is more in line with economic benefits.

Therefore, the above description is only a preferred embodiment of the present invention, and does not limit the patent scope of the present invention. The condensation treatment equipment for organic gaseous pollutants of the present invention is located at the gas inlet 11 of the internal channel 10 of the base 1 To the gas outlet 12, the oxidation unit 21, the humidification unit 22, the first condensation unit 23, the water washing unit 24 and the second condensation unit 25 of the treatment system 2 are assembled in sequence, and the external gas enters the channel 10 from the gas inlet 11 After using the oxidation unit 21 of the treatment system 2 to irradiate with the photocatalyst light source, the relative humidity of the gas is increased through the humidification unit 22, the condensation nucleation is performed through the first condensation unit 23, and the water mist hits the gas through the water washing unit 24. After removing the pollutants, grab the pollutants, and then carry out the second condensation treatment through the second condensation unit 25, so as to achieve the purpose of removing the pollutants in the gas and purifying the air, and can effectively remove most of the pollutants in the gas. Pollutants are converted into effects that do not affect the air, reduce the degree of damage to the air or the environment, effectively filter the air and avoid pollution to the environment, so all structures and devices that can achieve the aforementioned effects should be covered by the present invention. Such simple modifications and equivalent structural changes should be included in the scope of the patent of the present invention in the same way, and are hereby stated.

Therefore, the present invention is mainly designed for the condensation treatment equipment of organic gaseous pollutants, and uses the inner channel of the base to assemble the oxidation unit, humidification unit, first condensation unit, water washing unit and second condensation unit of the treatment system for external After the gas enters the channel from the gas inlet on the side of the base, after being irradiated by the photocatalyst light source of the oxidation unit, the relative humidity of the gas is increased to the saturation line through the humidification unit, and after the condensation treatment is carried out by the first condensation unit, the water washing unit is used to Water mist hits the gas to grab the pollutants contained in the gas, and after being processed by the second condensation unit, the pollutants in the gas can be treated by the treatment system and become purified air, which is discharged from the gas outlet as the main protection focus , and the base and the processing system can process the pollutants in the gas and become harmless to the air, which is only an advantage of avoiding air pollution or environmental pollution for maintaining air quality. However, the above is only the present invention It is only a preferred embodiment of the present invention, which does not limit the patent scope of the present invention. Therefore, all simple modifications and equivalent structural changes made by using the description and drawings of the present invention should be included in the patent scope of the present invention in the same way. , together with Chen Ming.

In summary, the above-mentioned condensation treatment equipment for organic gaseous pollutants of the present invention can indeed achieve its efficacy and purpose during actual application and implementation, so the present invention is a research and development with excellent practicability, and is in line with the requirements of the invention patent The application requirements are to submit an application in accordance with the law. I hope that the review committee will approve the case as soon as possible to protect the inventor's hard work in research and development and creation. If the review committee has any doubts, please feel free to send a letter to instruct. The inventor will do his best to cooperate. I really appreciate it .

Claims (5)

1. a condensation process equipment for organic gas pollutant, including pedestal and the process system that is positioned at this base interior System, it is characterised in that:

This base interior has the passage of hollow form, and is respectively equipped with in passage two side of this pedestal for extraneous gas entrance Gas access, for process after gas output gas outlet, and this passage in for assemble processing system；And

This processing system is from this gas access, passage side of this pedestal toward sequential between this gas outlet of opposite side, then Including the oxidation unit that gas pollutant is decomposed, make humidifying unit that gas humidity increases, gas is cooled First condensing unit, gas bleed is washed unit and the second condensing unit again cooled gas.

2. the condensation process equipment of organic gas pollutant as claimed in claim 1, the wherein oxidation of this processing system The photocatalyst light source of unit include carrying out pollutant in gas cracking more than one group, and this photocatalyst light source is for launching The light source of 184.9nm or 185nm ultraviolet.

3. the condensation process equipment of organic gas pollutant as claimed in claim 1, the wherein humidification of this processing system Unit include the first water liquid processor, by this first water liquid processor provide water source the first feed pipe and by this first Multiple first waterfog heads that the internal water source of feed pipe sprays in water smoke mode.

4. the condensation process equipment of organic gas pollutant as claimed in claim 1, wherein the first of this processing system Condensing unit includes the first condenser coil, and this second condensing unit then includes the second condenser coil, and this first condensate pans Pipe and this second condenser coil are respectively equipped with the first water inlet, the second water inlet entered for condensed water, and this is first cold Solidifying coil pipe and this second condenser coil are respectively equipped with the first outlet for condensed water discharge, the second outlet again.

5. the condensation process equipment of organic gas pollutant as claimed in claim 1, the wherein washing of this processing system Unit include the second water liquid processor, by this second water liquid processor provide water source the second feed pipe and by this second Multiple second waterfog heads that the internal water source of feed pipe sprays in water smoke mode.