CN105803423A - Titanium nitride deposition system - Google Patents
Titanium nitride deposition system Download PDFInfo
- Publication number
- CN105803423A CN105803423A CN201610250431.2A CN201610250431A CN105803423A CN 105803423 A CN105803423 A CN 105803423A CN 201610250431 A CN201610250431 A CN 201610250431A CN 105803423 A CN105803423 A CN 105803423A
- Authority
- CN
- China
- Prior art keywords
- titanium nitride
- cavity components
- carrying arm
- depositing system
- arm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 title claims abstract description 17
- 230000008021 deposition Effects 0.000 title abstract description 4
- 238000000151 deposition Methods 0.000 claims description 14
- 238000012423 maintenance Methods 0.000 abstract description 16
- 230000003449 preventive effect Effects 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 8
- 238000004140 cleaning Methods 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C23C16/303—Nitrides
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invntion provides a titanium nitride deposition system. The titanium nitride deposition system comprises a cavity module and a bearing arm; and the cavity module is detachably mounted on the bearing arm. As the bearing arm and the cavity module are detachably mounted, the whole cavity module (Chamber Lid) can be dismounted during maintaining, the assembly time and the cleaning time of a gas box (Gas Box) and the like are excluded by the preventive maintenance process, the needed preventive maintenance time is shortened, and the stand utilization rate is improved.
Description
Technical field
The present invention relates to semi-conductor processing equipment, particularly relate to a kind of titanium nitride depositing system.
Background technology
In existing situation, in the preventive maintenance process of this titanium nitride deposition chamber of AMATEnduraIITxZChamber, because cavity components (ChamberLid assembly) can not overall pulling down, it is necessary to whole cavity components (ChamberLid assembly) is split into minimum assembly and could remove cavity components (ChamberLid assembly) completely.
Refer to Fig. 1, cavity components (ChamberLid assembly) includes air chamber (GasBox), isolator (LidIsolator), spray head (ShowerHead), obstruct dish (BlockerPlate) and sealing ring (O-Ring), so just can carry out next step action.And air chamber (GasBox) needs just can be continuing with after hydrogen peroxide dipping wiping.So, whole preventive maintenance process schedule is just postponed to be delayed, and causes the overlong time required for whole preventive maintenance, wastes board production capacity.
Summary of the invention
The technical problem to be solved in the present invention is how to reduce the time of titanium nitride depositing system preventive maintenance.
In order to solve this technical problem, the invention provides a kind of titanium nitride depositing system, including cavity components and carrying arm, described cavity components is removably installed in described carrying arm.
Optionally, described carrying arm connects described cavity components by T-shaped fixed block.
Optionally, the quantity of described carrying arm is two, is respectively arranged on the both sides of described cavity components.
Optionally, two described carrying arms are connected by head rod, and described head rod is connected with described cavity components by screw element.
Optionally, described carrying arm includes arm body and round plate, is connected by the second connecting rod between two described round plates, and described second connecting rod is arranged in described cavity components.
Optionally, described round plate is provided with hole, location, and described round plate is located by connecting with described cavity components by keeper and hole, described location.
Optionally, described carrying arm also includes location bar, and described location bar is rotatably connected in described arm body, and described keeper is detachably arranged at described location bar.
The invention enables and detachably install between carrying arm and chamber combination, so, when safeguarding, can by whole chamber combination (ChamberLid) overall pulling down, outside the cleaning time of built-up time and air chamber (GasBox) etc. is put into preventive maintenance process, thus reducing preventive maintenance required time, improve board utilization rate.
Accompanying drawing explanation
Fig. 1 is the decomposing schematic representation of prior art middle chamber assembly (ChamberLid)；
Fig. 2 is the connection diagram of one embodiment of the invention middle chamber assembly and carrying arm；
Fig. 3 is the schematic diagram of T-shaped fixed block in one embodiment of the invention；
Fig. 4 is the schematic diagram positioning hole in one embodiment of the invention；
In figure, 1-chamber combination；2-carries arm；21-arm body；22-round plate；23-positions bar；3-head rod；4-screw element；5-T type fixed block；6-positions hole；7-keeper；8-the second connecting rod.
Detailed description of the invention
Below with reference to Fig. 2 to Fig. 4, titanium nitride depositing system provided by the invention is described in detail, it is in optional embodiment of the present invention, it is believed that those skilled in the art do not change the present invention spirit and content scope in, it is possible to it is modified and polishes.
Refer to Fig. 2, the invention provides a kind of titanium nitride depositing system, including cavity components 1 and carrying arm 2, described cavity components 1 is removably installed in described carrying arm 2.
The invention enables and detachably install between carrying arm 2 and chamber combination 1, so, when safeguarding, can by whole chamber combination (ChamberLid) overall pulling down, outside the cleaning time of built-up time and air chamber (GasBox) etc. is put into preventive maintenance process, thus reducing preventive maintenance required time, improve board utilization rate.
In optional embodiment of the present invention, described carrying arm 2 connects described cavity components by T-shaped fixed block 5.Specifically, the structure of T-shaped fixed block 5 is as shown in Figure 3, in further alternative embodiment, T-shaped fixed block 5 can pass through threaded portion etc. and be removably mounted to arm main body 21 or the chamber combination 1 of carrying arm 2, and on chamber combination 1 or arm main body 21, it is provided with the screwed hole of correspondence, T-shaped fixed block 5 is accessed screwed hole, it may be achieved the connection between carrying arm 2 and chamber combination 1.
In the embodiment of Fig. 2 signal, the quantity of described carrying arm 2 is two, is respectively arranged on the both sides of described cavity components 1.Furthermore, it is understood that two described carrying arms 2 are connected by head rod 3, described head rod 3 is connected with described cavity components 1 by screw element 4.Can realize removing and installing by screw element 4.
In optional embodiment of the present invention, described carrying arm includes arm body 21 and round plate 22, is connected by the second connecting rod 8 between two described round plates 22, and described second connecting rod 8 is arranged in described cavity components 1.By extracting described second connecting rod 8 out, it is possible to achieve remove and install.
In further alternative embodiment, described round plate 22 is provided with hole 6, location, and described round plate 22 is located by connecting with described cavity components 1 by keeper 7 and hole, described location 6.In optional scheme, keeper 7 is realized relative location through hole 6, location with the respective bore section on cavity components 1.
Further in alternative embodiment, described carrying arm 2 also includes location bar 23, and described location bar 23 is rotatably connected in described arm body 21, and described keeper 7 is detachably arranged at described location bar 23.By the dismounting of keeper 7 and installation, it is possible to achieve carrying arm 2 and chamber combination 1 between combination with separate.
The time of the preventive maintenance after adopting the present invention has been carried out concrete comparison and has set forth by above table, it is seen then that the present invention is effectively shortened maintenance time, improves the maintenance efficiency of cavity.
In sum, the invention enables and detachably install between carrying arm and chamber combination, so, when safeguarding, can by whole chamber combination (ChamberLid) overall pulling down, outside the cleaning time of built-up time and air chamber (GasBox) etc. is put into preventive maintenance process, thus reducing preventive maintenance required time, improve board utilization rate.
Simultaneously, in installation process, use the chamber combination (ChamberLid) being already prepared to, it is also possible to by chamber combination (ChamberLid) integral installation to carrying arm, avoid the method that traditional method assembly piecemeal is installed, time saving and energy saving.By overall pulling down and installation, also make the scene of safeguarding in good order, improve overall maintenance efficiency and safeguard success rate.
Claims (7)
1. a titanium nitride depositing system, it is characterised in that: including cavity components and carrying arm, described cavity components is removably installed in described carrying arm.
2. titanium nitride depositing system as claimed in claim 1, it is characterised in that: described carrying arm connects described cavity components by T-shaped fixed block.
3. titanium nitride depositing system as claimed in claim 1, it is characterised in that: the quantity of described carrying arm is two, is respectively arranged on the both sides of described cavity components.
4. titanium nitride depositing system as claimed in claim 3, it is characterised in that: two described carrying arms are connected by head rod, and described head rod is connected with described cavity components by screw element.
5. titanium nitride depositing system as claimed in claim 3, it is characterised in that: described carrying arm includes arm body and round plate, is connected by the second connecting rod between two described round plates, and described second connecting rod is arranged in described cavity components.
6. titanium nitride depositing system as claimed in claim 5, it is characterised in that: described round plate is provided with hole, location, and described round plate is located by connecting with described cavity components by keeper and hole, described location.
7. titanium nitride depositing system as claimed in claim 6, it is characterised in that: described carrying arm also includes location bar, and described location bar is rotatably connected in described arm body, and described keeper is detachably arranged at described location bar.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610250431.2A CN105803423A (en) | 2016-04-21 | 2016-04-21 | Titanium nitride deposition system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610250431.2A CN105803423A (en) | 2016-04-21 | 2016-04-21 | Titanium nitride deposition system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105803423A true CN105803423A (en) | 2016-07-27 |
Family
ID=56458375
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610250431.2A Pending CN105803423A (en) | 2016-04-21 | 2016-04-21 | Titanium nitride deposition system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105803423A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109837530A (en) * | 2019-03-18 | 2019-06-04 | 上海离原环境科技有限公司 | Hollow cathode plasma titanium nitride film plating process system and device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0714998A2 (en) * | 1994-11-30 | 1996-06-05 | Applied Materials, Inc. | CVD processing chamber |
| WO1999028945A1 (en) * | 1997-12-02 | 1999-06-10 | Applied Materials, Inc. | A processing chamber and method for confining plasma |
| CN102414794A (en) * | 2009-04-21 | 2012-04-11 | 应用材料公司 | Cvd apparatus for improved film thickness non-uniformity and particle performance |
-
2016
- 2016-04-21 CN CN201610250431.2A patent/CN105803423A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0714998A2 (en) * | 1994-11-30 | 1996-06-05 | Applied Materials, Inc. | CVD processing chamber |
| WO1999028945A1 (en) * | 1997-12-02 | 1999-06-10 | Applied Materials, Inc. | A processing chamber and method for confining plasma |
| CN102414794A (en) * | 2009-04-21 | 2012-04-11 | 应用材料公司 | Cvd apparatus for improved film thickness non-uniformity and particle performance |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109837530A (en) * | 2019-03-18 | 2019-06-04 | 上海离原环境科技有限公司 | Hollow cathode plasma titanium nitride film plating process system and device |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160727 |