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CN105801127A - Method for preparing high-thermal-conductivity aluminum nitride ceramic substrate for integrated circuit package - Google Patents

Method for preparing high-thermal-conductivity aluminum nitride ceramic substrate for integrated circuit package Download PDF

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CN105801127A
CN105801127A CN201610120001.9A CN201610120001A CN105801127A CN 105801127 A CN105801127 A CN 105801127A CN 201610120001 A CN201610120001 A CN 201610120001A CN 105801127 A CN105801127 A CN 105801127A
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ceramic substrate
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thermal conductivity
aln
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沈悦
李伟
刘春雪
徐宇豪
吴中瑞
顾峰
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University of Shanghai for Science and Technology
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    • C04B35/581Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on aluminium nitride
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Abstract

本发明公开了一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法,其步骤:(1)先取无水碳酸锂、无水氧化钇放于马弗炉,合成锂酸钇,再经湿法球磨,制成浆料;(2)将球磨后浆料放入烘干机干燥,将烘干的干料经筛选,获得锂酸钇粉末;(3)按质量百分比,取锂酸钇、氟化钙和AlN粉体放于无水乙醇介质中,球磨24h,制成浆料;(4)将球磨后浆料放入烘干机干燥,将烘干的干料筛选,得到混合粉末;(5)将所得的粉末再干压、静压成型,得到素胚;(6)将素胚放在高温氮气炉,在氮气和氢气气氛中,升温至1450℃,烧结保温1小时,再升温至1735℃,烧结保温8h,然后降温冷却至室温,获得高热导率AlN陶瓷基板。该方法制备的AlN陶瓷基板热导率高、结构致密,晶粒细小,且分布均匀。The invention discloses a method for preparing an aluminum nitride ceramic substrate with high thermal conductivity for integrated circuit packaging. The steps are: (1) firstly take anhydrous lithium carbonate and anhydrous yttrium oxide and put them in a muffle furnace to synthesize yttrium lithium oxide, and then Through wet ball milling, slurry is made; (2) after ball milling, the slurry is put into a dryer for drying, and the dried material is screened to obtain yttrium lithium oxide powder; (3) according to mass percentage, lithium acid Put the yttrium, calcium fluoride and AlN powders in an anhydrous ethanol medium, and ball mill for 24 hours to make a slurry; (4) put the ball milled slurry into a dryer for drying, and screen the dried dry material to obtain a mixed powder; (5) dry-press and static-press the obtained powder to obtain a plain embryo; (6) place the plain embryo in a high-temperature nitrogen furnace, in a nitrogen and hydrogen atmosphere, heat up to 1450 ° C, sinter and keep it warm for 1 hour, Then the temperature was raised to 1735° C., sintered and kept for 8 hours, and then cooled to room temperature to obtain an AlN ceramic substrate with high thermal conductivity. The AlN ceramic substrate prepared by the method has high thermal conductivity, compact structure, fine grains and uniform distribution.

Description

一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法Preparation method of high thermal conductivity aluminum nitride ceramic substrate for integrated circuit packaging

技术领域 technical field

本发明技术涉及氮化物陶瓷领域,具体的说是一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法。 The technology of the invention relates to the field of nitride ceramics, in particular to a method for preparing an aluminum nitride ceramic substrate with high thermal conductivity for integrated circuit packaging.

背景技术 Background technique

现有的集成电路的基板大多数采用AlN氮化铝基板和AlN陶瓷基板,它们不能满足现有的电子功率器件发展的需要,因此,提高AlN氮化铝基板和AlN陶瓷基板的散热性能,使芯片能够在正常温度工作,已经成为一个亟待解决的问题。 Most of the substrates of existing integrated circuits use AlN aluminum nitride substrates and AlN ceramic substrates, which cannot meet the needs of the development of existing electronic power devices. Therefore, improving the heat dissipation performance of AlN aluminum nitride substrates and AlN ceramic substrates makes The ability of chips to work at normal temperatures has become an urgent problem to be solved.

AlN氮化铝基板和AlN陶瓷基板是共价键化合物,自扩散系数小,自身难以烧结。为了提高AlN基板的致密性,一般采用添加烧结助剂来协同烧结,烧结助剂与氧化铝在较低温度下形成适宜的液相分布,大大促进颗粒重排和传质过程,完成了AlN陶瓷的致密化。在具有代表性的集成电路封装用AlN陶瓷通常采用该烧结助剂时,该AlN陶瓷的烧结温度较高,耗能高,合格率低,生产设备损耗严重;另外,该烧结助剂所含的氧在高温下会加大晶格氧的含量,阻碍了热导率的提升,因此降低AlN陶瓷的烧结温度是集成电路封装用AlN陶瓷制备的重要研究方向之一。 AlN aluminum nitride substrates and AlN ceramic substrates are covalently bonded compounds with small self-diffusion coefficients and are difficult to sinter by themselves. In order to improve the compactness of the AlN substrate, it is generally used to add sintering aids for synergistic sintering. The sintering aids and alumina form a suitable liquid phase distribution at a lower temperature, which greatly promotes the particle rearrangement and mass transfer process, and the AlN ceramics are completed. densification. When the sintering aid is usually used in representative AlN ceramics for integrated circuit packaging, the sintering temperature of the AlN ceramic is high, the energy consumption is high, the pass rate is low, and the loss of production equipment is serious; in addition, the sintering aid contained in Oxygen will increase the content of lattice oxygen at high temperature and hinder the improvement of thermal conductivity. Therefore, reducing the sintering temperature of AlN ceramics is one of the important research directions for the preparation of AlN ceramics for integrated circuit packaging.

在AlN陶瓷基板烧结过程中,不同比例的混合还原气氛不仅影响着陶瓷基板本身的烧结,也影响着烧结陶瓷基板时的各种添加物的烧结效果。在陶瓷基板烧结后期,其胚体中孤立的气孔逐渐减少,压力增大,逐步抵消了作为烧结推动力的表面张力作用,烧结致密过程趋于缓慢。AlN陶瓷基板在氢气氛中烧结时,由于氢原子的半径很小,易于扩散,有利AlN陶瓷的气孔的消除,提高热导率。但是,在AlN陶瓷基板氢气氛中烧结时,若氢气与氮气的比例过大,不仅增加烧结成本,还会由于氧化铝和烧结助剂被还原后,不能促进无压烧结氮化铝陶瓷的致密化,也不利于提高氮化铝陶瓷热导率。同时,氧化铝和烧结助剂的还原反应是由外向内的逐步进行,若氮化铝陶瓷的烧结体内部、外部收缩不一致,氮化铝陶瓷表面会大面积开裂。 During the sintering process of AlN ceramic substrates, different proportions of mixed reducing atmosphere not only affect the sintering of the ceramic substrate itself, but also affect the sintering effect of various additives when sintering the ceramic substrate. In the late sintering stage of the ceramic substrate, the isolated pores in the green body gradually decrease, and the pressure increases, which gradually offsets the surface tension as the driving force of sintering, and the sintering densification process tends to be slow. When the AlN ceramic substrate is sintered in a hydrogen atmosphere, because the hydrogen atom has a small radius, it is easy to diffuse, which is beneficial to the elimination of the pores of the AlN ceramic and improves the thermal conductivity. However, when the AlN ceramic substrate is sintered in a hydrogen atmosphere, if the ratio of hydrogen to nitrogen is too large, it will not only increase the sintering cost, but also fail to promote the densification of pressureless sintered aluminum nitride ceramics due to the reduction of alumina and sintering aids. It is also not conducive to improving the thermal conductivity of aluminum nitride ceramics. At the same time, the reduction reaction of alumina and sintering aids is carried out gradually from the outside to the inside. If the internal and external shrinkage of the sintered body of aluminum nitride ceramics is inconsistent, the surface of aluminum nitride ceramics will be cracked in a large area.

发明内容 Contents of the invention

针对上述现有技术存在的中所要解决的技术问题,本发明提供一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法,该方法制备的AlN陶瓷基板具有热导率高、结构致密,晶粒细小且分布均匀的AlN陶瓷基板。 Aiming at the technical problems to be solved in the above-mentioned prior art, the present invention provides a method for preparing an aluminum nitride ceramic substrate with high thermal conductivity for integrated circuit packaging. The AlN ceramic substrate prepared by the method has high thermal conductivity and a compact structure. , AlN ceramic substrate with fine grains and uniform distribution.

为达到上述目的,本发明采用如下技术方案 In order to achieve the above object, the present invention adopts the following technical solutions

一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法,其特征在于,该方法具有以下具体步骤: A method for preparing a high thermal conductivity aluminum nitride ceramic substrate for integrated circuit packaging, characterized in that the method has the following specific steps:

(1).先按质量百分比,取24.67%的无水碳酸锂、75.33%的无水氧化钇混合后放于马弗炉中,升温到1400℃,保温3~4h,冷却取出合成锂酸钇,放于无水乙醇作介质中湿法球磨6h,制成混合浆料; (1). According to the mass percentage, take 24.67% of anhydrous lithium carbonate and 75.33% of anhydrous yttrium oxide and mix them in a muffle furnace, raise the temperature to 1400°C, keep it warm for 3 to 4 hours, and take out the synthetic yttrium lithium oxide after cooling , placed in absolute ethanol as a medium for wet ball milling for 6 hours to make a mixed slurry;

(2).将球磨后的混合浆料放入烘干机中,设置80℃的温度进行干燥处理,干燥时间为4h,将烘干后的干料经过100目筛筛选,获得锂酸钇粉末; (2). Put the mixed slurry after ball milling into a dryer, set the temperature at 80°C for drying treatment, and the drying time is 4 hours. The dried material after drying is screened through a 100-mesh sieve to obtain yttrium lithium oxide powder ;

(3).按质量百分比,取4%的锂酸钇、0.5%的氟化钙和95.5%的AlN粉体放于无水乙醇介质中球磨24h,制成混合浆料; (3). According to the mass percentage, take 4% of yttrium lithium oxide, 0.5% of calcium fluoride and 95.5% of AlN powder and put them into an anhydrous ethanol medium for ball milling for 24 hours to make a mixed slurry;

(4).将球磨后的混合浆料放入烘干机中,设置80℃的温度进行干燥处理,干燥时间为4h,将烘干后的干料经过100目筛筛选,得到混合粉末,其粒径为2-10μm; (4). Put the mixed slurry after ball milling into a dryer, set a temperature of 80°C for drying treatment, and the drying time is 4 hours. The dried material after drying is screened through a 100-mesh sieve to obtain a mixed powder. The particle size is 2-10μm;

(5).将所得的粉末再干压、静压成型,得到所需形状的素胚,其中, (5). The obtained powder is then dry-pressed and static-pressed to obtain a plain embryo of the desired shape, wherein,

所述的干压、静压成型为:将所得的混合粉末放入模具,施加90~100Mpa之间的压力,保压20~30s,再施加180~200Mpa之间的压力,静压70~90s,脱模,制成所需形状的素胚; The dry pressing and static pressing molding are as follows: put the obtained mixed powder into the mold, apply a pressure between 90-100Mpa, keep the pressure for 20-30s, and then apply a pressure between 180-200Mpa, and press the static pressure for 70-90s , demolded, and made into a plain embryo of the desired shape;

(6).将所需形状的素胚放置在高温氮气炉,在氮气和氢气的混合气氛保护中,其中氢气流量占混合气体总流量的10~20%,以3~5℃/min的升温速率升温至1420~1450℃,烧结保温0.5~1小时,再以同样的升温速率升温至1720~1735℃,烧结保温2-8h,然后以同样的降温速率冷却至室温,获得高热导率的AlN陶瓷基板。 (6). Place the plain blank of the desired shape in a high-temperature nitrogen furnace, and protect it in a mixed atmosphere of nitrogen and hydrogen, where the flow rate of hydrogen accounts for 10-20% of the total flow rate of the mixed gas, and the temperature rises at a rate of 3-5°C/min. Raise the temperature to 1420-1450°C, sinter and hold for 0.5-1 hour, then raise the temperature to 1720-1735°C at the same heating rate, sinter and hold for 2-8 hours, and then cool to room temperature at the same cooling rate to obtain AlN with high thermal conductivity Ceramic substrate.

上述步骤(2)中所述的AlN粉体选用的粒径为2-10μm。 The selected particle size of the AlN powder in the above step (2) is 2-10 μm.

本发明同现有技术相比,有如下显著优点: Compared with the prior art, the present invention has the following significant advantages:

本发明是以适量锂酸钇和氟化钙为烧结助剂,改变烧结气氛中氢气比例,充分烧结制备获得;烧结助剂先与氧化铝反应生成液相促进烧结,并在一定温度下挥发减少了液相均,促进AlN陶瓷的致密化;该方法烧结过程中控制氢气比例,既满足在还原气氛中降低晶格的氧含量,又能保证AlN陶瓷烧结体的表面不开裂,还能降低生产成本;该方法既适合实验室内小面积AlN陶瓷烧结制备,也适合大面积AlN陶瓷烧结制备。 The present invention is obtained by using appropriate amount of yttrium lithium and calcium fluoride as sintering aids, changing the proportion of hydrogen in the sintering atmosphere, and fully sintering the preparation; the sintering aids first react with alumina to form a liquid phase to promote sintering, and volatilize at a certain temperature to reduce The homogenization of the liquid phase can promote the densification of AlN ceramics; the method controls the proportion of hydrogen in the sintering process, which not only satisfies the need to reduce the oxygen content of the lattice in the reducing atmosphere, but also ensures that the surface of the AlN ceramic sintered body does not crack, and can also reduce production. Cost; this method is not only suitable for small-area AlN ceramic sintering preparation in the laboratory, but also suitable for large-area AlN ceramic sintering preparation.

具体实施方式 detailed description

现将本发明的具体实施例叙述于后。 Specific embodiments of the present invention are described below.

实施例1 Example 1

一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法具体制备过程和步骤如下所述: A method for preparing a high thermal conductivity aluminum nitride ceramic substrate for integrated circuit packaging The specific preparation process and steps are as follows:

(1).首先将按质量百分比,取24.67%的无水碳酸锂、75.33%的无水氧化钇混合后在马弗炉中,升温到1400℃,保温4h,冷却取出合成锂酸钇,放于无水乙醇作介质中湿法球磨6h; (1). First, mix 24.67% anhydrous lithium carbonate and 75.33% anhydrous yttrium oxide in a muffle furnace according to the mass percentage, heat up to 1400°C, keep warm for 4 hours, cool and take out the synthetic yttrium lithium oxide, put Wet ball milling in absolute ethanol as medium for 6h;

(2).将球磨后的混合浆料放入烘干机中,设置80℃的温度进行干燥处理,干燥时间为4h,.将烘干后的干料经过100目筛筛选,获得锂酸钇粉末; (2). Put the mixed slurry after ball milling into a dryer, set the temperature at 80°C for drying treatment, and the drying time is 4 hours. Screen the dried material through a 100-mesh sieve to obtain yttrium lithium oxide powder;

(3).按质量百分比,取4%的锂酸钇、0.5%的氟化钙和95.5%的AlN粉体放于无水乙醇介质中湿法球磨共24h,制成混合浆料; (3). According to the mass percentage, take 4% of yttrium lithium oxide, 0.5% of calcium fluoride and 95.5% of AlN powder and put them into anhydrous ethanol medium for wet ball milling for 24 hours to make a mixed slurry;

(4).将球磨后的混合浆料放入烘干机中,设置80℃的温度进行干燥处理,干燥时间为4h,将烘干后的干料经过100目筛筛选,制成混合粉料,其粒径为10μm (4). Put the mixed slurry after ball milling into the dryer, set the temperature at 80°C for drying treatment, and the drying time is 4 hours. The dried material after drying is screened through a 100-mesh sieve to make a mixed powder , whose particle size is 10 μm ;

(5).将步骤(4)所得混合粉末干压成型、静压成型,制得所需形状的素胚,其中,所述的干压、静压成型为:将所得的混合粉末放入模具,施加100Mpa之间的压力,保压30s,再施加200Mpa之间的压力,静压90s,脱模,制成所需形状的素胚; (5). The mixed powder obtained in step (4) is dry-pressed and static-pressed to obtain a blank of the desired shape, wherein the dry-pressed and static-pressed molding is as follows: the resulting mixed powder is put into a mold , apply a pressure between 100Mpa, keep the pressure for 30s, then apply a pressure between 200Mpa, static pressure for 90s, demould, and make the blank of the desired shape;

(6).将所需形状的素胚放置高温氮气炉,在氮气和氢气的混合气氛保护中,其中氢气流量占混合气体总流量的20%,以3~5℃/min的升温速率升温至1450℃,烧结保温1小时,再以同样的升温速率升温至1735℃,烧结保温6h,然后以同样的降温速率冷却至室温,获得高热导率的AlN陶瓷基板。 (6). Place the plain blank of the desired shape in a high-temperature nitrogen furnace, and in a mixed atmosphere of nitrogen and hydrogen, where the hydrogen flow accounts for 20% of the total flow of the mixed gas, heat up to 1450°C, sintering and holding for 1 hour, then raising the temperature to 1735°C at the same heating rate, sintering and holding for 6 hours, and then cooling to room temperature at the same cooling rate to obtain an AlN ceramic substrate with high thermal conductivity.

将烧结制备的AlN陶瓷基板性能检测: Performance testing of the AlN ceramic substrate prepared by sintering:

在扫描电子显微镜下观察AlN陶瓷基板,其微观结构致密,气孔率低,晶粒细小且分布均匀。使用导热系数仪对AlN陶瓷基板进行检测,测得其热导率为103W·m-1·k-1Observing the AlN ceramic substrate under a scanning electron microscope, its microstructure is dense, its porosity is low, and its grains are fine and evenly distributed. The AlN ceramic substrate was tested with a thermal conductivity meter, and its thermal conductivity was measured to be 103W·m -1 ·k -1 .

Claims (2)

1.一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法,其特征在于,该方法具体步骤如下: 1. A method for preparing a high thermal conductivity aluminum nitride ceramic substrate for integrated circuit packaging, characterized in that, the specific steps of the method are as follows: 先按质量百分比,取24.67%的无水碳酸锂、75.33%的无水氧化钇混合后放于马弗炉中,升温到1400℃,保温3~4h,冷却取出合成锂酸钇,放于无水乙醇作介质中湿法球磨6h,制成混合浆料; According to the mass percentage, mix 24.67% anhydrous lithium carbonate and 75.33% anhydrous yttrium oxide, put them in a muffle furnace, raise the temperature to 1400°C, keep it warm for 3-4 hours, cool down and take out the synthetic yttrium lithium oxide, put it in a dry Wet ball milling in water and ethanol for 6 hours to make a mixed slurry; 将球磨后的混合浆料放入烘干机中,设置80℃的温度进行干燥处理,干燥时间为4h,将烘干后的干料经过100目筛筛选,获得锂酸钇粉末; Put the mixed slurry after ball milling into a dryer, set the temperature at 80°C for drying treatment, and the drying time is 4 hours. The dried material after drying is screened through a 100-mesh sieve to obtain yttrium lithium oxide powder; 按质量百分比,取4%的锂酸钇、0.5%的氟化钙和95.5%的AlN粉体放于无水乙醇介质中球磨24h,制成混合浆料; According to the mass percentage, take 4% of yttrium lithium oxide, 0.5% of calcium fluoride and 95.5% of AlN powder and put them into an anhydrous ethanol medium for ball milling for 24 hours to make a mixed slurry; 将球磨后的混合浆料放入烘干机中,设置80℃的温度进行干燥处理,干燥时间为4h,将烘干后的干料经过100目筛筛选,得到混合粉末,其粒径为2-10μm; Put the mixed slurry after ball milling into a dryer, set the temperature at 80°C for drying treatment, and the drying time is 4 hours. The dried material after drying is screened through a 100-mesh sieve to obtain a mixed powder with a particle size of 2 -10μm; 将所得的粉末再干压、静压成型,得到所需形状的素胚,其中, The obtained powder is then dry-pressed and static-pressed to obtain a plain embryo of the desired shape, wherein, 所述的干压、静压成型为:将所得的混合粉末放入模具,施加90~100Mpa之间的压力,保压20~30s,再施加180~200Mpa之间的压力,静压70~90s,脱模,制成所需形状的素胚; The dry pressing and static pressing molding are as follows: put the obtained mixed powder into the mold, apply a pressure between 90-100Mpa, keep the pressure for 20-30s, and then apply a pressure between 180-200Mpa, and press the static pressure for 70-90s , demolded, and made into a plain embryo of the desired shape; 将所需形状的素胚放置在高温氮气炉,在氮气和氢气的混合气氛保护中,其中氢气流量占混合气体总流量的10~20%,以3~5℃/min的升温速率升温至1420~1450℃,烧结保温0.5~1小时,再以同样的升温速率升温至1720~1735℃,烧结保温2-8h,然后以同样的降温速率冷却至室温,获得高热导率的AlN陶瓷基板。 Place the plain embryo of the desired shape in a high-temperature nitrogen furnace, and in a mixed atmosphere of nitrogen and hydrogen, where the hydrogen flow accounts for 10-20% of the total flow of the mixed gas, the temperature is raised to 1420 at a heating rate of 3-5°C/min. ~1450°C, sintering and holding for 0.5~1 hour, then heating up to 1720~1735°C at the same heating rate, sintering and holding for 2-8h, and then cooling to room temperature at the same cooling rate to obtain AlN ceramic substrate with high thermal conductivity. 2.根据权利要求1所述的一种集成电路封装用的高热导率氮化铝陶瓷基板制备方法,其特征在于,上述步骤(2)中所述的AlN粉体选用的粒径为2-10μm。 2. the preparation method of a kind of high thermal conductivity aluminum nitride ceramic substrate for integrated circuit packaging according to claim 1, is characterized in that, the selected particle size of the AlN powder described in the above-mentioned step (2) is 2- 10 μm.
CN201610120001.9A 2016-03-03 2016-03-03 Method for preparing high-thermal-conductivity aluminum nitride ceramic substrate for integrated circuit package Pending CN105801127A (en)

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