CN105426006A - Embedded touch screen with high-resistance film and preparation method thereof - Google Patents

Abstract

The invention relates to an embedded touch screen with a high-resistance film and a preparation method thereof. The touch screen comprises a first substrate, a thin-film transistor substrate, a liquid crystal layer, a colour optical filter, a touch induction layer, a second substrate and a high-resistance film polarizing plate laminated in sequence; a plurality of mutually insulated induction circuits are arranged on the surface of the thin-film transistor substrate towards the liquid crystal layer; the high-resistance film is arranged on the surface of the second substrate away from the touch induction layer; the high-resistance film is electrically connected with the thin-film transistor substrate; the material of the high-resistance film comprises the mixture of graphite oxide, tin oxide, a surface active agent and a cross-linking agent; therefore, the high-resistance film has good adsorption performance and electrical performance; static electricity generated by the thin-film transistor substrate is instantly released through the high-resistance film; therefore, the electrostatic interaction is eliminated; mutual interference between touch sensors can be reduced; and thus, the touch sensitivity of the embedded touch screen can be improved. The preparation method of the touch screen is simple in preparation process and low in fragment risk and is applied to large-scale production.

Description

Embedded touch screen with high resistance film and preparation method thereof

technical field

The invention relates to the field of display devices, in particular to an embedded touch screen with a high resistance film and a preparation method thereof.

Background technique

Touch screens are an important part of electronic devices such as mobile phones, tablet computers, and e-books. Currently, touch screens can generally be classified into: On-Cell type and In-Cell type according to the composition structure. Embedded (On-Cell) refers to the method of embedding the touch panel between the color filter substrate and the polarizer of the display screen, that is, a touch sensor is equipped on the LCD panel. Due to the addition of a touch layer, the thickness It is thicker, and it is easy to produce color unevenness and other problems when touching. Embedded refers to the method of embedding the touch panel function into the LCD pixels, that is, embedding the touch sensor function inside the display screen, which can reduce the overall thickness of the module and greatly reduce the production cost of the touch screen. favor.

However, the in-cell touch screen generally needs to embed touch sensors inside the pixels on the thin film transistor array substrate, and the touch sensors are likely to interfere with each other, resulting in low touch sensitivity.

Contents of the invention

Based on this, it is necessary to provide an in-cell touch screen with high sensitivity and a preparation method thereof.

An embedded touch screen with a high resistance film, comprising a first substrate, a thin film transistor substrate, a liquid crystal layer, a color filter, a touch sensing layer, a second substrate, a high resistance film and a polarizer stacked in sequence, the thin film The surface of the transistor substrate facing the liquid crystal layer is provided with a plurality of mutually insulated sensing lines, the high-resistance film is formed on the surface of the second substrate away from the touch-sensing layer, the high-resistance film and the thin film The transistor substrate is electrically connected, and the material of the high-resistance film includes a mixture of graphite oxide, tin oxide, surfactant and cross-linking agent.

In one embodiment, the material of the high resistance film includes 4 to 7 parts of graphite oxide, 10 to 13 parts of tin oxide, 25 to 30 parts of surfactant and 10 parts by weight. ~26 parts of crosslinker.

In one embodiment, a protective cover is further included, and the protective cover is laminated on the surface of the polarizer away from the high-resistance film.

In one embodiment, the thickness of the high resistance film is 30nm-50nm.

The preparation method of the above-mentioned in-cell touch screen with high resistance film comprises the following steps:

providing a first substrate on which a thin film transistor substrate is stacked;

forming a plurality of mutually insulated induction lines on the surface of the thin film transistor substrate;

forming a liquid crystal layer on the surface of the thin film transistor substrate on which the sensing lines are formed;

providing a color filter, and laminating the color filter on the liquid crystal layer;

providing a second substrate, forming a touch sensitive layer on the surface of the second substrate;

bonding the color filter to the touch-sensing layer to obtain a first substrate, a thin-film transistor substrate, a liquid crystal layer, a color filter, a touch-sensing layer and a second substrate that are sequentially stacked;

forming a high-resistance film on the surface of the second substrate away from the touch-sensitive layer, the material of the high-resistance film includes a mixture of graphite oxide, tin oxide, a surfactant, and a crosslinking agent;

laminating a polarizing plate on the high resistance film; and

The high-resistance film is electrically connected with the thin film transistor layer to obtain an in-cell touch screen with a high-resistance film.

In one embodiment, the operation of forming the high-resistance film on the surface of the second substrate away from the touch-sensing layer is: spraying the slurry on the surface of the second substrate away from the touch-sensing layer by spraying. On the surface, the slurry includes a mixture of graphite oxide, tin oxide, surfactant, crosslinking agent and solvent, the spraying pressure is 0.5MPa-1.5MPa, the temperature is 20°C-30°C, and the humidity is 50%-60%.

In one embodiment, the slurry includes 4-7 parts by weight of graphite oxide, 10-13 parts of tin oxide, 25-30 parts of surfactant, 10-26 parts cross-linking agent and 35 to 45 parts of solvent.

In one embodiment, the viscosity of the slurry is 30cP˜40cP.

In one embodiment, the operation of attaching the color filter to the touch-sensing layer is: attaching the color filter to the touch-sensing layer under vacuum conditions.

In one of the implementation manners, after forming the high-resistance film on the surface of the second substrate away from the touch-sensitive layer, it includes baking treatment, cleaning treatment and air-drying treatment, and the conditions of the baking treatment are 110° C. to 120° C. Bake for 10 min to 20 min at ℃, and the air drying condition is 10 min to 50 min at 55 ℃ to 65 ℃.

The above-mentioned in-cell touch screen with a high-resistance film includes a first substrate, a thin-film transistor substrate, a liquid crystal layer, a color filter, a touch-sensing layer, a second substrate, and a high-resistance film polarizer stacked in sequence. The surface of the thin film transistor substrate facing the liquid crystal layer is provided with a plurality of mutually insulated sensing lines, and the thin film transistor substrate cooperates with the touch sensing layer to embed the touch panel function into the liquid crystal pixels, reducing the thickness of the touch screen. A high-resistance film is provided on the surface of the second substrate away from the touch-sensitive layer, and the high-resistance film is electrically connected to the thin-film transistor substrate. The material of the high-resistance film includes a mixture of graphite oxide, tin oxide, surfactant and cross-linking agent, which has excellent adsorption performance and electrical characteristics. The mutual interference between touch sensors improves the touch sensitivity of the embedded touch screen.

Description of drawings

FIG. 1 is a schematic structural view of an in-cell touch screen with a high-resistance film according to an embodiment;

FIG. 2 is a flow chart of a method for manufacturing an in-cell touch screen with a high-resistance film according to an embodiment.

detailed description

The in-cell touch screen with high resistance film and its preparation method will be further described in detail below mainly in conjunction with specific drawings and specific embodiments.

Please refer to FIG. 1 , an in-cell touch screen 100 with a high-resistance film in one embodiment includes a first substrate 10, a thin film transistor substrate (ThinFilmTransistor, TFT substrate) 20, a liquid crystal layer 30, a color filter 40, The touch sensing layer 50 , the second substrate 60 , the high resistance film 70 , the polarizer 80 and the protective cover 90 .

The surface of the thin film transistor substrate 20 facing the liquid crystal layer 30 is provided with a plurality of mutually insulated sensing lines, the high resistance film 70 is formed on the surface of the second substrate 60 away from the touch sensing layer 50, and the high resistance film 70 is electrically connected to the thin film transistor substrate 20 . Specifically, the high resistance film 70 and the TFT substrate 20 can be electrically connected through wires.

The surface of the TFT substrate 20 facing the liquid crystal layer 30 is provided with a plurality of mutually insulated sensing lines, and the plurality of mutually insulated sensing lines can be embedded in the liquid crystal layer 30 . The thin film transistor substrate 20 cooperates with the touch sensing layer 50, so that the touch panel function is embedded in the liquid crystal pixels, and the touch sensor function is embedded in the display screen to form an In-Cell type touch screen, which reduces the thickness of the touch screen and makes the screen thinner. The high resistance film 70 is provided on the surface of the second substrate 60 away from the touch sensing layer 50 , and the high resistance film 70 is electrically connected to the TFT substrate 20 . The high-resistance film 70 can immediately release the static electricity generated by the TFT substrate 20 to eliminate static electricity and reduce mutual interference between touch sensors, thereby improving the touch sensitivity of the in-cell touch screen 100 with the high-resistance film.

In this embodiment, the thickness of the in-cell touch screen 100 with the high resistance film is 0.6mm˜0.8mm. By embedding the touch panel function into the LCD pixels, the thickness of the touch screen is greatly reduced.

Specifically, the first substrate 10 and the second substrate 60 may be made of light-transmitting materials such as glass.

Specifically, the material of the high resistance film 70 includes a mixture of graphite oxide, tin oxide, surfactant and crosslinking agent.

Graphite oxide (GO) is a new type of carbon material with excellent adsorption properties. Tin oxide (SnO ₂ ) is an active oxide with semiconductor properties. After mixing graphite oxide, tin oxide, surfactant and crosslinking agent, a composite material with excellent performance can be obtained. Tin oxide can change the surface properties of graphite oxide, and the high porosity and large surface area of graphite oxide can improve the dispersion of tin oxide. The synergistic effect of various components leads to the high resistance film 70 having excellent adsorption performance and electrical characteristics.

The high-resistance film 70 composed of a mixture of graphite oxide, tin oxide, surfactant and cross-linking agent can immediately release the static electricity generated by the thin film transistor substrate 20 to eliminate static electricity and improve touch sensitivity. At the same time, due to its excellent adsorption performance, it can be formed on the surface of the second substrate 60 without using adhesives and the like, and hardly increases the thickness of the in-cell touch screen 100 with the high resistance film.

Preferably, the material of the high resistance film 70 includes 4-7 parts by weight of graphite oxide, 10-13 parts of tin oxide, 25-30 parts of surfactant and 10-26 parts of cross-linked agent.

In this embodiment, the mixture of graphite oxide, tin oxide, surfactant and crosslinking agent includes 5.5 parts of graphite oxide, 11.5 parts of tin oxide, 27.5 parts of surfactant and 18 parts of crosslinking agent in parts by weight. agent.

Specifically, the surfactant may be stearic acid, sodium dodecylbenzenesulfonate, quaternary ammonium compound, lecithin, fatty acid glyceride, fatty acid sorbitan (Span), polysorbate (Tween) and the like.

In this embodiment, the surfactant is a DOWFAX2A1 surfactant produced by Dow Corporation of the United States.

Specifically, the crosslinking agent can be polyethylene, polyvinyl chloride, polyacrylate, polyalkylacrylate, styrene, acrylonitrile, acrylic acid, methacrylic acid, glyoxal, aziridine, etc.

In this embodiment, the crosslinking agent is an aziridine crosslinking agent. Specifically, it is the production of SaC-100 aziridine cross-linking agent for Shanghai Youen Chemical Co., Ltd.

Traditional touch screens generally need to use a substrate as a carrier to reduce touch interference, but because of the addition of a carrier, the thickness of the product increases. After stacking, the thickness will increase by about 0.4mm, which greatly increases the thickness of electronic devices (such as mobile phones), and the light transmission is poor, and the reflectivity is high in sunlight, which directly affects the experience effect. At the same time, problems are prone to occur during the bonding process, which reduces the yield rate. This will directly lead to increased costs and long processing cycles, which are not suitable for the stimulating market competition environment.

Using semiconductor materials can also improve the sensitivity of the touch screen. However, semiconductor materials are expensive and have complicated preparation processes, which are not suitable for large-scale production.

The mixture composed of graphite oxide, tin oxide, aziridine and anionic surfactant of the present invention has strong adhesion, good electrical conductivity, good light transmission, and is stable and difficult to be oxidized. The preparation process is simple and is suitable for large-scale production .

Preferably, the thickness of the high resistance film 70 is 30nm-50nm.

Preferably, the surface resistance of the high resistance film 70 is 5×10 ⁸ Ω/cm ² to 5×10 ⁹ Ω/cm ² .

In this embodiment, the light transmittance of the high resistance film 70 is greater than or equal to 92%, where the light transmittance refers to the transmittance of the in-cell touch screen 100 with the high resistance film after the high resistance film 70 is formed and before the high resistance film 70 is formed. Ratio of light rate.

Generally, the lower the surface resistance of the high resistance film 70 is, the better the antistatic effect is. However, the smaller the resistance value of the surface resistance, the more likely it will interfere with the in-cell touch screen and affect the touch effect. The larger the resistance value is, the less obvious the anti-static effect is, and the ITO conductivity is very strong. When a higher resistance value is required, the film thickness is too thin to achieve the anti-static effect.

Experiments in the present invention show that when the surface resistance of the high-resistance film 70 is 5×10 ⁸ Ω/cm ² to 5×10 ⁹ Ω/cm ² , it can prevent static electricity without affecting the touch effect. Light transmittance and conductivity, anti-static effect is good.

The preparation method of the above-mentioned embedded touch screen with high resistance film as shown in Figure 2 comprises the following steps:

S10, providing a first substrate, and stacking thin film transistor substrates on the first substrate.

The first substrate may be glass, and glass has good light transmittance.

A thin film transistor substrate is stacked on the surface of the first substrate.

S20, forming a plurality of sensing lines insulated from each other on the surface of the thin film transistor substrate.

The material of the sensing line is ITO. Of course, the material of the sensing line is not limited to ITO, and can also be other conductive materials such as AZO.

Specifically, a film can be coated on the surface of the thin film transistor substrate by means of silk screen printing or vacuum magnetron sputtering, and a pattern is prepared by chemical etching to obtain a plurality of mutually insulated induction lines.

S30, forming a liquid crystal layer on the surface of the thin film transistor substrate on which the sensing lines are formed.

The material of the liquid crystal layer can be aliphatic, aromatic, stearic acid and other organic substances. A drop-type liquid crystal injection method can be used, and the liquid crystal is directly dropped on the thin film transistor substrate first, and then the thin film transistor substrate and the color filter are combined. Alternatively, the liquid crystal layer can be formed between the thin film transistor substrate and the color filter by using the method of pouring liquid crystal, that is, after the thin film transistor substrate and the color filter are combined, the liquid crystal is sucked into the liquid crystal layer by capillary principle.

S40, providing a color filter, and laminating the color filter on the liquid crystal layer.

In this embodiment, the liquid crystal is directly dropped on the thin film transistor substrate, and then the thin film transistor substrate and the color filter are combined so that the color filter is stacked on the liquid crystal layer.

S50, providing a second substrate, and forming a touch sensing layer on a surface of the second substrate.

The material of the touch sensing layer is ITO, of course, the material of the touch sensing layer is not limited to ITO, and may also be other conductive materials such as AZO.

Specifically, a film can be coated on the surface of the second substrate by means of silk screen printing or vacuum magnetron sputtering, and a chemical etching method is used for pattern preparation to obtain a touch sensing layer.

S60 , bonding the color filter to the touch-sensing layer to obtain a first substrate, a thin film transistor substrate, a liquid crystal layer, a color filter, a touch-sensing layer, and a second substrate that are sequentially stacked.

A thin film transistor substrate, a liquid crystal layer, and a color filter are stacked sequentially on the first substrate, which is a plate. A touch sensing layer is stacked on the second substrate, which is the b-board. Bonding board a and board b, wherein the color filter is relatively bonded to the touch-sensing layer to obtain the first substrate, the thin-film transistor substrate, the liquid crystal layer, the color filter, the touch-sensing layer and the second substrate stacked in sequence .

Preferably, plate a and plate b are bonded together under vacuum conditions. Vacuum bonding is beneficial to improve the strength of the close bonding between the touch sensing layer and the color filter, making the prepared touch screen thinner.

The thin film transistor substrate cooperates with the touch sensing layer, so that the function of the touch panel is embedded in the liquid crystal pixels, and the function of the touch sensor is embedded in the display screen. Driven by IC (integrated circuit, integrated circuit), the touch function is achieved.

S70, forming a high-resistance film on the surface of the second substrate away from the touch-sensing layer, where the material of the high-resistance film includes a mixture of graphite oxide, tin oxide, a surfactant, and a cross-linking agent.

Specifically, the slurry may be sprayed onto the surface of the second substrate away from the touch-sensitive layer by spraying. Of course, other methods, such as vacuum magnetron sputtering, screen printing, etc., can also be used to form a high resistance film on the surface of the second substrate.

In this embodiment, automatic spraying equipment is used to spray the slurry onto the surface of the second substrate. Preferably, the distance between the spraying gun and the surface of the second substrate is 20cm-40cm, the spraying pressure is 0.5MPa-1.5MPa, the temperature is 20°C-30°C, and the humidity is 50%-60%.

Specifically, the slurry includes a mixture of graphite oxide, tin oxide, surfactant, crosslinking agent and solvent.

Preferably, the slurry includes 4-7 parts by weight of graphite oxide, 10-13 parts of tin oxide, 25-30 parts of surfactant, 10-26 parts of cross-linking agent and 35 parts Parts to 45 parts of solvent.

Among them, graphite oxide (Graphiteoxide, GO) is a new type of carbon material with excellent adsorption properties. Tin oxide (SnO ₂ ) is an active oxide with semiconductor properties. After graphite oxide, tin oxide, surfactant, crosslinking agent and solvent are mixed, a composite material with excellent performance can be obtained. Tin oxide can change the surface properties of graphite oxide, and the high porosity and large surface area of graphite oxide can improve the dispersion of tin oxide. The synergistic effect of various components leads to the slurry with excellent adsorption performance and electrical properties.

Due to the excellent adsorption performance of the above-mentioned slurry, it can be sprayed onto the surface of the second substrate without using adhesives and the like, and hardly increases the thickness of the in-cell touch screen with the high-resistance film. The high-resistance film obtained after the slurry is dried can immediately release the static electricity generated by the thin film transistor substrate, thereby eliminating static electricity and improving touch sensitivity.

Specifically, the solvent may be water or an organic solvent. Preferably, the viscosity of the slurry is 30cP-40cP.

Specifically, the surfactant may be stearic acid, sodium dodecylbenzenesulfonate, quaternary ammonium compound, lecithin, fatty acid glyceride, fatty acid sorbitan (Span), polysorbate (Tween) and the like.

The crosslinking agent can be polyethylene, polyvinyl chloride, polyacrylate, polyalkylacrylate, styrene, acrylonitrile, acrylic acid, methacrylic acid, glyoxal, aziridine, etc.

Specifically, in this embodiment, the surfactant is a DOWFAX2A1 surfactant produced by Dow Corporation of the United States. The crosslinking agent is specifically the SaC-100 type aziridine crosslinking agent produced by Shanghai Union Chemical Co., Ltd.

Preferably, before the high-resistance film is formed on the surface of the second substrate away from the touch-sensitive layer, the second substrate can be sequentially subjected to cleaning treatment, drying treatment, and static electricity dissipation treatment. The operations of the cleaning treatment include sequentially performing pure water cleaning, alkaline solution cleaning, Two-fluid spray cleaning (BJ spray cleaning), ultrapure water spray cleaning (DI spray cleaning) and high-pressure spray cleaning. The lye can be a cleaning agent, such as a glass cleaner containing potassium hydroxide or sodium hydroxide. Two-fluid spray refers to mixing high-pressure gaseous fluid such as air with liquid fluid such as water, and then spraying high-pressure gas and cleaning liquid into droplets at high speed through nozzles to clean the surface of objects. Ultrapure water spray, pure water refers to water with a resistivity ≥ 10 megohms. The drying treatment includes sequentially performing cold air drying and hot air drying. It should be noted that this step can be omitted if the color filter substrate itself is clean and free from dirt and dust. After cleaning and drying, carry out electrostatic dissipation treatment, and test the surface quality, and enter the spraying slurry process after passing the test.

Preferably, after the high-resistance film is formed on the surface of the second substrate away from the touch-sensing layer, the second substrate on which the high-resistance film is formed is subjected to baking treatment, cleaning treatment and air-drying treatment. The conditions for baking treatment are baking at 110°C-120°C for 10min-20min, the cleaning treatment is preferably to use pure water with a resistivity ≥ 10 megohms, and the conditions for air-drying treatment are air-drying at 55°C-65°C for 10min-50min. The baking treatment can accelerate the drying of the slurry, so that the components of the formed high-resistance film are more evenly distributed.

S80, laminating polarizing plates on the high resistance film.

Preferably, the material of the polarizing plate is selected from ethylene-vinyl acetate copolymer (EVA), polyethylene terephthalate (PET), polyvinyl alcohol (PVA) and polyhydroxyl amino polyether (AP). at least one.

Preferably, specifically, after the high resistance film is formed, the touch panel can be divided into small pieces. The size of the small pieces is generally about 4.5 inches to 6 inches, which is suitable for the size of the mobile phone screen. After the small piece is cleaned, a polarizing plate is formed on the high resistance film, and then a protective cover is laminated on the polarizing plate. Preferably, the protective cover is bonded to the polarizing layer through optical glue, and the protective cover can protect the high-resistance film. The material of the protective cover 90 is selected from at least one of soda-lime glass, high-alumina white glass, and Xuhong high-alumina glass.

S90, electrically connecting the high-resistance film to the thin film transistor layer to obtain an in-cell touch screen with the high-resistance film.

Specifically, the high resistance film may be electrically connected to the thin film transistor layer through wires. The high resistance film is electrically connected to the thin film transistor substrate. The high-resistance film immediately releases the static electricity generated by the thin film transistor substrate to eliminate static electricity and reduce mutual interference between touch sensors, thereby improving the touch sensitivity of the embedded touch screen with the high-resistance film.

It should be noted that the steps of the above-mentioned method for manufacturing an in-cell touch screen with a high-resistance film are not limited to the above-mentioned sequence, and can also be adjusted as required. For example, S50 may precede S10.

The above-mentioned in-cell touch screen with a high-resistance film includes a first substrate, a thin-film transistor substrate, a liquid crystal layer, a color filter, a touch-sensing layer, a second substrate, and a high-resistance film polarizer stacked in sequence. The surface of the thin film transistor substrate facing the liquid crystal layer is provided with a plurality of mutually insulated sensing lines, and the thin film transistor substrate cooperates with the touch sensing layer to embed the touch panel function into the liquid crystal pixels, reducing the thickness of the touch screen. A high-resistance film is provided on the surface of the second substrate away from the touch-sensitive layer, and the high-resistance film is electrically connected to the thin-film transistor substrate. The material of the high-resistance film includes a mixture of graphite oxide, tin oxide, surfactant and cross-linking agent, which has excellent adsorption performance and electrical characteristics. Mutual interference between touch sensors to improve touch sensitivity of in-cell touch screen with high resistance film. At the same time, the in-cell touch screen with high resistance film has a thinner thickness, good light transmission, strong stability, not easy to be oxidized, low storage environment, and long shelf life.

The above-mentioned method for preparing an embedded touch screen with a high-resistance film has a simple preparation process and a small risk of fragmentation, and is suitable for large-scale production.

The following will be described in detail in conjunction with specific embodiments.

In the following examples, unless otherwise specified, the experimental methods for which specific conditions are not indicated are generally in accordance with conventional conditions.

Instruments: automatic spraying equipment, drying oven, washing machine, high resistance meter, film thickness meter, spectrometer, etc.

Reagent: Surfactant is DOWFAX2A1 type surfactant produced by Dow Company of the United States, and cross-linking agent is SaC-100 type aziridine cross-linking agent produced by Shanghai Union Chemical Co., Ltd.

Example 1

A method for preparing an embedded touch screen with a high-resistance film, comprising the steps of:

(1) Laminate a thin film transistor substrate (TFT substrate) on the surface of the glass substrate (the first substrate), and form a layer of induction circuit layer on the surface of the thin film transistor substrate. The material of the induction circuit is ITO, after exposure, development, etching and other steps Finally, mutually insulated sensing lines are formed on the surface of the thin film transistor substrate, and a liquid crystal layer is formed on the thin film transistor substrate, and color filters are laminated to form an a-plate.

(2) Form a touch-sensitive layer on the surface of another glass substrate (the second substrate), the material of the touch-sensitive layer is a b-plate made of ITO.

(3) Bonding plate a and plate b in a vacuum environment, wherein the color filter and the touch-sensitive layer are bonded to each other to obtain a first substrate, a thin film transistor substrate, a liquid crystal layer, and a color filter stacked in sequence , a touch sensing layer and a second substrate.

(4) Using automatic spraying equipment to form a high resistance film on the surface of the second substrate away from the touch sensing layer. The substrate is sent to the working table of the spraying equipment, and automatically positioned, and then the slurry is sprayed on the second substrate. The slurry includes a mixture of graphite oxide, tin oxide, surfactant and crosslinking agent. The slurry is in parts by weight The count includes 5.5 parts of graphite oxide, 11.5 parts of tin oxide, 27.5 parts of surfactant, 18 parts of crosslinking agent and 37.5 parts of water. The viscosity of the slurry was 35 cP. The distance between the spraying gun and the surface of the second substrate is 30 cm, and the spraying pressure is 1.0 MPa. The working environment is a dust-free space (class 100), with a temperature of 25°C and a humidity of 55%. After the spray coating is completed, the second substrate on which the high-resistance film is formed is subjected to baking treatment, cleaning treatment and air-drying treatment. The baking treatment is to bake in a drying oven, the condition is to bake at 115°C for 15 minutes, the cleaning treatment is preferably to use pure water with a resistivity ≥ 10 megohm, and the air-drying treatment condition is to air-dry at 60°C for 30 minutes, and after cooling to obtain High resistance film.

The thickness of the high-resistance film was measured by a film thickness meter to be 40 nm.

The light transmittance of the high resistance film was tested by a spectrometer to be 99.8%.

The film hardness was 6H.

Of course, the touch screen also includes the preparation of the cover plate, the polarizing plate, and the lead wires, and the common methods in the industry can be used, which is not limited here.

The resistance of the high resistance film is 5×10 ⁸ Ω/cm ² measured by a resistance meter, which shows that it has good electrical properties and good antistatic effect. Using a constant temperature and humidity box at 90°C and 60% humidity for 240 hours in a baking test, the resistance change rate of the high-resistance film is 5%, indicating that it has good moisture resistance. After soaking in alcohol for 5 minutes, the resistance change rate of the high-resistance film is 5%. Baking in an oven with pads at 60°C for 240 hours, the resistivity change of the high-resistance film is 5%, indicating that it has good heat resistance.

ITO square resistance of touch sensing layer: 90Ω, film thickness

The above-mentioned in-cell touch screen with a high resistance film has strong stability and is not easy to be oxidized, and has good conductivity and light transmission, and has a good antistatic effect.

Example 2

A method for preparing an embedded touch screen with a high-resistance film, comprising the steps of:

(1) Laminate a thin film transistor substrate (TFT substrate) on the surface of the glass substrate (the first substrate), and form a layer of induction circuit layer on the surface of the thin film transistor substrate. The material of the induction circuit is ITO, after exposure, development, etching and other steps Finally, an induction line is formed on the surface of the thin-film transistor substrate, and a liquid crystal layer is formed on the thin-film transistor substrate, and a color filter is laminated to form an a-plate.

(2) Form a touch-sensitive layer on the surface of another glass substrate (the second substrate), the material of the touch-sensitive layer is a b-plate made of ITO.

(3) Bonding plate a and plate b in a vacuum environment, wherein the color filter and the touch-sensitive layer are bonded to each other to obtain a first substrate, a thin film transistor substrate, a liquid crystal layer, and a color filter stacked in sequence , a touch sensing layer and a second substrate.

(4) Using automatic spraying equipment to form a high resistance film on the surface of the second substrate away from the touch sensing layer. The substrate is sent to the working table of the spraying equipment, and automatically positioned, and then the slurry is sprayed on the second substrate. The slurry includes a mixture of graphite oxide, tin oxide, surfactant, crosslinking agent and solvent, in parts by weight The count includes 4 parts of graphite oxide, 10 parts of tin oxide, 25 parts of surfactant, 10 parts of crosslinking agent and 30 parts of water. The slurry viscosity was 30 cP. The distance between the spraying gun and the surface of the second substrate is 20cm, the spraying pressure is 0.5MPa, the working environment is a dust-free space (class 100), the temperature is 20°C, and the humidity is 50%. After the spray coating is completed, the second substrate on which the high-resistance film is formed is subjected to baking treatment, cleaning treatment and air-drying treatment. The baking treatment is to bake in a drying oven, the condition is to bake at 110°C for 10 minutes, the cleaning treatment is preferably to use pure water with a resistivity ≥ 10 megohm, and the air-drying treatment condition is to dry at 55°C for 10 minutes, and after cooling to obtain High resistance film.

The thickness of the high-resistance film was tested by a film thickness meter to be 30 nm.

The light transmittance of the high-resistance film was tested by a spectrometer to be 98%.

The film hardness was 6H.

Of course, the touch screen also includes the preparation of the protective cover, the polarizing plate, and the lead wires, which can be prepared by common methods in the industry, and are not limited here.

The resistance of the high-resistance film was measured by a resistance meter to be 5×10 ⁹ Ω/cm ² , which indicated that the high-resistance film had good electrical properties. Using a constant temperature and humidity box at 90°C and 60% humidity for 240 hours in a baking test, the resistance change rate of the high-resistance film is 10%, indicating that it has good moisture resistance. After soaking in alcohol for 5 minutes, the resistance change rate of the high-resistance film is 10%. Baking in an oven with pads at 60°C for 240 hours, the change in resistivity is 5%, indicating good heat resistance.

ITO square resistance of touch sensing layer: 60Ω, film thickness

The above-mentioned in-cell touch screen with a high resistance film has strong stability and is not easy to be oxidized, and has good conductivity and light transmission, and has a good antistatic effect.

Example 3

A built-in touch screen with a high-resistance film is prepared by the following steps:

(1) Laminate a thin film transistor substrate (TFT substrate) on the surface of the glass substrate (the first substrate), and form a layer of induction circuit layer on the surface of the thin film transistor substrate. The material of the induction circuit is ITO, after exposure, development, etching and other steps Finally, an induction line is formed on the surface of the thin-film transistor substrate, and a liquid crystal layer is formed on the thin-film transistor substrate, and a color filter is laminated to form an a-plate.

(2) Form a touch-sensitive layer on the surface of another glass substrate (the second substrate), the material of the touch-sensitive layer is a b-plate made of ITO.

(3) Bonding plate a and plate b in a vacuum environment, wherein the color filter and the touch-sensitive layer are bonded to each other to obtain a first substrate, a thin film transistor substrate, a liquid crystal layer, and a color filter stacked in sequence , a touch sensing layer and a second substrate.

(4) Using automatic spraying equipment to form a high resistance film on the surface of the second substrate away from the touch sensing layer. The substrate is sent to the working table of the spraying equipment, and automatically positioned, and then the slurry is sprayed on the second substrate. The slurry includes a mixture of graphite oxide, tin oxide, surfactant, crosslinking agent and solvent, in parts by weight The count includes 7 parts of graphite oxide, 13 parts of tin oxide, 30 parts of surfactant, 26 parts of crosslinking agent and 40 parts of water. The slurry viscosity was 40 cP. The distance between the spraying gun and the surface of the second substrate is 40cm, the spraying pressure is 1.5MPa, the working environment is a dust-free space (class 100), the temperature is 30°C, and the humidity is 60%. After the spray coating is completed, the second substrate on which the high-resistance film is formed is subjected to baking treatment, cleaning treatment and air-drying treatment. The baking treatment is to bake in a drying oven, the condition is to bake at 120°C for 20 minutes, the cleaning treatment is preferably to use pure water with a resistivity ≥ 10 megohms, and the air-drying treatment condition is to dry at 65°C for 50 minutes, and after cooling to obtain High resistance film.

The thickness of the high-resistance film was tested by a film thickness meter to be 50 nm.

The light transmittance of the high resistance film was tested by a spectrometer to be 96%.

The film hardness was 6H.

Of course, the touch screen also includes the preparation of the protective cover, the polarizing plate, and the lead wires, which can be prepared by common methods in the industry, and are not limited here.

The resistance of the high-resistance film was measured by a resistance meter to be 5×10 ⁹ Ω/cm ² , which indicated that the high-resistance film had good electrical properties. Using a constant temperature and humidity box at 90°C and 60% humidity for 240 hours in a baking test, the resistance change rate of the high-resistance film is 10%, indicating that it has good moisture resistance. After soaking in alcohol for 5 minutes, the resistance change rate of the high-resistance film is 10%. Baking in an oven with pads at 60°C for 240 hours, the change in resistivity is 15%, indicating good heat resistance.

ITO square resistance of touch sensing layer: 150Ω, film thickness

The above-mentioned in-cell touch screen with a high resistance film has strong stability and is not easy to be oxidized, and has good conductivity and light transmission, and has a good antistatic effect.

Example 4

A built-in touch screen with a high-resistance film is prepared by the following steps:

(1) Laminate a thin film transistor substrate (TFT substrate) on the surface of the glass substrate (the first substrate), and form a layer of induction circuit layer on the surface of the thin film transistor substrate. The material of the induction circuit is ITO, after exposure, development, etching and other steps Finally, an induction line is formed on the surface of the thin-film transistor substrate, and a liquid crystal layer is formed on the thin-film transistor substrate, and a color filter is laminated to form an a-plate.

(2) Form a touch-sensitive layer on the surface of another glass substrate (the second substrate), the material of the touch-sensitive layer is a b-plate made of ITO.

(3) Bonding plate a and plate b in a vacuum environment, wherein the color filter and the touch-sensitive layer are bonded to each other to obtain a first substrate, a thin film transistor substrate, a liquid crystal layer, and a color filter stacked in sequence , a touch sensing layer and a second substrate.

(4) Using automatic spraying equipment to form a high resistance film on the surface of the second substrate away from the touch sensing layer. The substrate is sent to the working table of the spraying equipment, and automatically positioned, and then the slurry is sprayed on the second substrate. The slurry includes a mixture of graphite oxide, tin oxide, surfactant, crosslinking agent and solvent, in parts by weight The count includes 5 parts of graphite oxide, 12 parts of tin oxide, 28 parts of surfactant, 15 parts of crosslinking agent and 36 parts of water. The slurry viscosity was 38 cP. The distance between the spraying gun and the surface of the second substrate is 40 cm, the spraying pressure is 1.0 MPa, the working environment is a dust-free space (class 100), the temperature is 25° C., and the humidity is 55%. After the spray coating is completed, the second substrate on which the high-resistance film is formed is subjected to baking treatment, cleaning treatment and air-drying treatment. The baking treatment is to bake in a drying oven, the condition is to bake at 115°C for 15 minutes, the cleaning treatment is preferably to use pure water with a resistivity ≥ 10 megohm, and the air-drying treatment condition is to air-dry at 60°C for 30 minutes, and after cooling to obtain High resistance film.

The thickness of the high-resistance film was tested by a film thickness meter to be 50 nm.

The light transmittance of the high resistance film was tested by a spectrometer to be 97%.

The film hardness was 6H.

Of course, the touch screen also includes the preparation of the protective cover, the polarizing plate, and the lead wires, which can be prepared by common methods in the industry, and are not limited here.

The resistance of the high-resistance film was measured by a resistance meter to be 5×10 ⁹ Ω/cm ² , which indicated that the high-resistance film had good electrical properties. Using a constant temperature and humidity box at 90°C and 60% humidity for 240 hours in a baking test, the resistance change rate of the high-resistance film is 5%, indicating that it has good moisture resistance. After soaking in alcohol for 5 minutes, the resistance change rate of the high-resistance film is 10%. Baking in an oven with pads at 60°C for 240 hours, the change in resistivity is 10%, indicating good heat resistance.

ITO square resistance of touch sensing layer: 150Ω, film thickness

The above-mentioned in-cell touch screen with a high resistance film has strong stability and is not easy to be oxidized, and has good conductivity and light transmission, and has a good antistatic effect.

The above-mentioned embodiments only express several implementation modes of the present invention, and the descriptions thereof are relatively specific and detailed, but should not be construed as limiting the patent scope of the invention. It should be pointed out that those skilled in the art can make several modifications and improvements without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent for the present invention should be based on the appended claims.

Claims (10)

1. one kind has the In-cell touch panel of high resistance film, it is characterized in that, comprise the first substrate stacked gradually, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer, second substrate, high resistance film and Polarizer, described thin film transistor base plate is provided with the induction line of many mutually insulateds towards the surface of described liquid crystal layer, described high resistance film is formed at the surface of described second substrate away from described touch sensitive layer, described high resistance film is electrically connected with described thin film transistor base plate, the material of described high resistance film comprises graphite oxide, tin oxide, the potpourri of surfactant and crosslinking chemical.

2. the In-cell touch panel with high resistance film according to claim 1, it is characterized in that, the material of described high resistance film comprises the crosslinking chemical of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts and 10 parts ~ 26 parts according to weight parts.

3. the In-cell touch panel with high resistance film according to claim 1, is characterized in that, also comprise cover sheet, and described cover sheet is laminated on the surface of described Polarizer away from described high resistance film.

4. the In-cell touch panel with high resistance film according to claim 1, is characterized in that, the thickness of described high resistance film is 30nm ~ 50nm.

5. the preparation method with the In-cell touch panel of high resistance film according to any one of Claims 1 to 4, is characterized in that, comprise the steps:

There is provided first substrate, laminate film transistor base on described first substrate;

The induction line of many mutually insulateds is formed on the surface of described thin film transistor base plate;

The surface being formed with described induction line at described thin film transistor base plate forms liquid crystal layer;

There is provided colored filter, by stacked for described colored filter on described liquid crystal layer;

Second substrate is provided, forms touch sensitive layer on the surface of described second substrate;

Described colored filter and described touch sensitive layer are fitted, obtains the first substrate, thin film transistor base plate, liquid crystal layer, colored filter, touch sensitive layer and the second substrate that stack gradually;

At the surface formation high resistance film of described second substrate away from described touch sensitive layer, the material of described high resistance film comprises the potpourri of graphite oxide, tin oxide, surfactant and crosslinking chemical;

Stacked Polarizer on described high resistance film; And

Described high resistance film is electrically connected with described tft layer, obtains the In-cell touch panel with high resistance film.

6. the preparation method with the In-cell touch panel of high resistance film according to claim 5, it is characterized in that, being operating as of high resistance film is formed away from the surface of described touch sensitive layer: by the mode of spraying, pulp spraying is applied to the surface of described second substrate away from described touch sensitive layer at described second substrate, described slurry comprises the potpourri of graphite oxide, tin oxide, surfactant, crosslinking chemical and solvent, spray pressure is 0.5MPa ~ 1.5MPa, temperature is 20 DEG C ~ 30 DEG C, and humidity is 50% ~ 60%.

7. the preparation method with the In-cell touch panel of high resistance film according to claim 6, it is characterized in that, described slurry comprises the solvent of the graphite oxide of 4 parts ~ 7 parts, the tin oxide of 10 parts ~ 13 parts, the surfactant of 25 parts ~ 30 parts, the crosslinking chemical of 10 parts ~ 26 parts and 35 parts ~ 45 parts according to weight parts.

8. the preparation method with the In-cell touch panel of high resistance film according to claim 6, is characterized in that, the viscosity of described slurry is 30cP ~ 40cP.

9. the preparation method with the In-cell touch panel of high resistance film according to claim 5, it is characterized in that, described described colored filter and described touch sensitive layer are fitted be operating as: under vacuum, described colored filter and described touch sensitive layer are fitted.

10. the preparation method with the In-cell touch panel of high resistance film according to claim 5, it is characterized in that, formed after high resistance film on the surface of described second substrate away from described touch sensitive layer, comprise baking process, cleaning treatment and air-dry process, the condition of described baking process is toast 10min ~ 20min at 110 DEG C ~ 120 DEG C, and the condition of described air-dry process is air-dry 10min ~ 50min at 55 DEG C ~ 65 DEG C.