CN104833686B - X-ray magnification imaging system - Google Patents
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Abstract
本发明公开一种X射线放大成像系统,该X射线放大成像系统包括:X射线光源;X射线光源透镜,其入口端设置有X射线光源,用于会聚X射线光源发射的X射线并得到用于照射样品的微焦斑相干光源;相位放大光栅,设置于样品之后,用于收集并调制照射样品后的X射线并产生衍射自成像效应;分析吸收放大光栅,设置于相位放大光栅之后,位于衍射自成像效应对应的自成像平面位置处,分析吸收放大光栅用于收集并处理来自相位放大光栅的X射线,将其中的相位信息转换为可识别的光强信息;X射线探测器,设置在分析吸收放大光栅之后,靠近分析吸收放大光栅的出口端,用于探测并收集样品的信息。本发明能大幅提高该X射线放大成像系统的分辨率和使用范围。
The invention discloses an X-ray magnified imaging system. The X-ray magnified imaging system includes: an X-ray light source; an X-ray light source lens. The micro-focus spot coherent light source for irradiating the sample; the phase magnification grating, set behind the sample, is used to collect and modulate the X-rays irradiated on the sample and generate diffraction self-imaging effect; the analysis absorption magnification grating, set behind the phase magnification grating, is located At the position of the self-imaging plane corresponding to the diffraction self-imaging effect, the analysis absorption amplification grating is used to collect and process the X-rays from the phase amplification grating, and convert the phase information into identifiable light intensity information; the X-ray detector is set at After the analysis absorption amplification grating, it is close to the exit end of the analysis absorption amplification grating, which is used to detect and collect the information of the sample. The invention can greatly improve the resolution and application range of the X-ray magnified imaging system.
Description
技术领域technical field
本发明涉及光学成像技术领域,特别涉及一种X射线放大成像系统。The invention relates to the technical field of optical imaging, in particular to an X-ray magnified imaging system.
背景技术Background technique
目前,X射线光栅在生命、能源、环境、食品等领域中具有重要应用,由于X射线光栅是非常精密的光学器件,对制作工艺的要求很高,尤其是制作高质量的二维X射线光栅的难度更大,因此,如何制作高质量的二维X射线光栅备受相关科研人员的重视。现有的制作光栅的方法主要是采用机械刻划、全息光刻、电子束光刻、X射线光刻和微电镀技术等,但通过这些方法制作得到的X射线光栅的“高宽比”不大,而且这些方法在制作较大“高宽比”的二维高能X射线光栅时存在困难,这主要是因为相对于低能X射线,高能X射线具有更强的穿透能力。因此,现有的X射线光栅不满足各界对较大“高宽比”X射线光栅的要求。At present, X-ray gratings have important applications in the fields of life, energy, environment, food, etc. Since X-ray gratings are very precise optical devices, they have high requirements for manufacturing technology, especially the production of high-quality two-dimensional X-ray gratings Therefore, how to make high-quality two-dimensional X-ray gratings has attracted the attention of relevant researchers. Existing methods for fabricating gratings mainly use mechanical scribing, holographic lithography, electron beam lithography, X-ray lithography and micro-plating techniques, etc., but the "aspect ratio" of the X-ray gratings produced by these methods is not Large, and these methods have difficulties in fabricating two-dimensional high-energy X-ray gratings with a large "aspect ratio", mainly because high-energy X-rays have stronger penetrating ability than low-energy X-rays. Therefore, the existing X-ray gratings do not meet the requirements of all walks of life for larger "aspect ratio" X-ray gratings.
另外,利用常规的X射线吸收衬度成像技术对碳、氢、氧等元素组成的物质进行X射线成像分析时,由于分辨率不高,满足不了实际需要。此外,发展X射线相衬成像技术的另一个关键因素在于如何得到理想且成本相对低廉的微焦斑X射线相干光源,而比较理想的相干光是同步辐射光源,但同步辐射造价昂贵,不便于推广。In addition, when using conventional X-ray absorption contrast imaging technology to perform X-ray imaging analysis on substances composed of carbon, hydrogen, oxygen and other elements, due to the low resolution, it cannot meet the actual needs. In addition, another key factor in the development of X-ray phase-contrast imaging technology is how to obtain an ideal and relatively low-cost micro-focus spot X-ray coherent light source, and the ideal coherent light is a synchrotron radiation source, but synchrotron radiation is expensive and inconvenient promote.
发明内容Contents of the invention
有鉴于此,本发明实施例的目的在于提出一种X射线放大成像系统,采用具有较大高宽比的X射线放大光栅,能够大幅提高该X射线放大成像系统的分辨率和使用范围。In view of this, the purpose of the embodiments of the present invention is to provide an X-ray magnifying imaging system, which can greatly improve the resolution and application range of the X-ray magnifying imaging system by using an X-ray magnifying grating with a large aspect ratio.
进一步来讲,该X射线放大成像系统包括:X射线光源;X射线光源透镜,其入口端设置有所述X射线光源,用于会聚所述X射线光源发射的X射线并得到用于照射样品的微焦斑相干光源;相位放大光栅,设置于所述样品之后,用于收集并调制照射所述样品后的X射线并产生衍射自成像效应;分析吸收放大光栅,设置于所述相位放大光栅之后,位于所述衍射自成像效应对应的自成像平面位置处,所述分析吸收放大光栅用于收集并处理来自所述相位放大光栅的X射线,将其中的相位信息转换为可识别的光强信息;X射线探测器,设置在所述分析吸收放大光栅之后,靠近所述分析吸收放大光栅的出口端,用于探测并收集所述样品的信息。Further speaking, the X-ray magnified imaging system includes: an X-ray light source; an X-ray light source lens, the entrance end of which is provided with the X-ray light source for converging the X-rays emitted by the X-ray light source and obtaining A micro-focus spot coherent light source; a phase amplification grating, arranged behind the sample, used to collect and modulate the X-rays irradiated on the sample and generate a diffraction self-imaging effect; an analysis absorption amplification grating, arranged on the phase amplification grating Afterwards, at the position of the self-imaging plane corresponding to the diffractive self-imaging effect, the analytical absorption amplification grating is used to collect and process the X-rays from the phase amplification grating, and convert the phase information therein into identifiable light intensity Information; the X-ray detector is arranged behind the analytical absorption amplification grating, close to the exit end of the analytical absorption amplification grating, and is used to detect and collect the information of the sample.
可选地,在一些实施例中,所述相位放大光栅和分析吸收放大光栅为锥形多毛细管X射线光栅,分别由多根硅酸盐玻璃或铅玻璃单毛细管拉制而成;其中,所述相位放大光栅和分析吸收放大光栅沿各自长度方向上的外形为锥形面段、抛物线型面段或者其它二次曲面段。Optionally, in some embodiments, the phase amplification grating and the analysis absorption amplification grating are tapered polycapillary X-ray gratings, which are respectively drawn from a plurality of silicate glass or lead glass single capillaries; wherein, the The shapes of the phase amplification grating and the analysis absorption amplification grating along the respective length directions are conical surface segments, parabolic surface segments or other quadric surface segments.
可选地,在一些实施例中,所述样品放置于所述微焦斑相干光源和相位放大光栅之间,靠近所述相位放大光栅的入口端;所述X射线探测器设置在所述分析吸收放大光栅之后靠近其出口端。Optionally, in some embodiments, the sample is placed between the micro-focus spot coherent light source and the phase amplification grating, close to the entrance end of the phase amplification grating; the X-ray detector is arranged at the analysis The absorption magnifying grating is close to its exit end.
可选地,在一些实施例中,X射线放大成像系统还包括:信息处理装置,与所述X射线探测器连接,用于提取并分析处理所述样品的信息。Optionally, in some embodiments, the X-ray magnified imaging system further includes: an information processing device, connected to the X-ray detector, for extracting, analyzing and processing the information of the sample.
可选地,在一些实施例中,所述相位放大光栅和分析吸收放大光栅的光栅周期范围为0.01-20微米,高宽比的范围为10-100000;其中,所述光栅周期为相邻单毛细管的中空通道的中心连线的长度;所述高宽比为光栅的长度与相应光栅周期的一半的比值。Optionally, in some embodiments, the phase amplification grating and the analysis absorption amplification grating have a grating period in the range of 0.01-20 microns, and an aspect ratio in the range of 10-100000; wherein, the grating period is adjacent single The length of the central line of the hollow channel of the capillary; the aspect ratio is the ratio of the length of the grating to half of the corresponding grating period.
可选地,在一些实施例中,所述相位放大光栅沿其水平中心周线方向上的长度H1的取值范围为0.1-20厘米,入口端直径D1的取值范围为1-200毫米,出口端直径D2的取值范围为4-400毫米;所述分析吸收放大光栅沿其水平中心周线方向上的长度H2的取值范围为0.1-15厘米,入口端直径D3的取值范围为8-500毫米,出口端直径D4的取值范围为:12-600毫米。Optionally, in some embodiments, the value range of the length H1 of the phase amplification grating along its horizontal central circumference is 0.1-20 cm, and the value range of the entrance diameter D1 is 1-200 mm, The value range of the outlet diameter D2 is 4-400 millimeters; the value range of the length H2 of the analytical absorption amplification grating along its horizontal center circumference is 0.1-15 cm, and the value range of the inlet diameter D3 is 8-500 mm, the value range of the outlet diameter D4 is: 12-600 mm.
可选地,在一些实施例中,所述X射线光源透镜为单/多毛细管硅酸盐玻璃或铅玻璃透镜,其入口焦距F1的范围为1-30厘米,出口焦距F2的范围为1-40毫米,出口焦斑的直径范围为0.05-20微米,长度L1的范围为5-200毫米,入口端直径Din1范围为3-40毫米,出口端直径Dout1范围为1-20毫米。Optionally, in some embodiments, the X-ray source lens is a single/polycapillary silicate glass or lead glass lens, the range of the entrance focal length F1 is 1-30 cm, and the range of the exit focal length F2 is 1-30 cm. 40 mm, the diameter of the exit focal spot is in the range of 0.05-20 microns, the length L1 is in the range of 5-200 mm, the diameter of the inlet end D in1 is in the range of 3-40 mm, and the diameter of the outlet end D out1 is in the range of 1-20 mm.
可选地,在一些实施例中,所述X射线光源透镜的出口焦斑的直径范围为1微米,长度L1为50毫米,入口端直径Din1为10毫米,出口端直径Dout1为1毫米;所述相位放大光栅的光栅周期为2微米,高宽比为1300,入口端直径D1和出口端直径D2分别为8毫米和12毫米;所述分析吸收放大光栅的光栅周期为2微米,高宽比为900,入口端直径D3和出口端直径D4分别为15毫米和18毫米。Optionally, in some embodiments, the diameter of the exit focal spot of the X-ray source lens is 1 micron, the length L1 is 50 mm, the diameter D in1 of the entrance end is 10 mm, and the diameter D out1 of the exit end is 1 mm The grating period of the phase amplification grating is 2 microns, the aspect ratio is 1300, and the diameter D1 of the entrance end and the diameter D2 of the exit end are 8 millimeters and 12 millimeters respectively; The grating period of the analysis absorption amplification grating is 2 microns, and the height The width ratio is 900, and the diameter D3 of the inlet end and the diameter D4 of the outlet end are 15 mm and 18 mm, respectively.
可选地,在一些实施例中,所述相位放大光栅和分析吸收放大光栅沿垂直于其水平中心线方向的横截面的外形为四边形;其中,构成所述多毛细管X射线光栅的中空单毛细管的轮廓外形为六角形或圆形。Optionally, in some embodiments, the cross-sections of the phase amplification grating and the analysis absorption amplification grating along the direction perpendicular to their horizontal centerlines have quadrilateral shapes; wherein, the hollow single capillary constituting the polycapillary X-ray grating The outline shape is hexagonal or circular.
可选地,在一些实施例中,构成所述X射线光源透镜、相位放大光栅和分析吸收放大光栅的多个单毛细管紧密排列,位于中心位置的单毛细管为一根,其所在的层数定义为1,则从内向外各层上的单毛细管的数目为6(n-1),其中n为层数,n>1,各单毛细管的内径大小相同。Optionally, in some embodiments, a plurality of single capillaries constituting the X-ray source lens, phase magnification grating, and analysis absorption magnification grating are closely arranged, and the single capillary at the central position is one, and the number of layers where it is located defines is 1, then the number of single capillaries on each layer from inside to outside is 6(n-1), where n is the number of layers, n>1, and the inner diameters of each single capillary are the same.
相对于现有技术,本发明各实施例具有以下优点:Compared with the prior art, each embodiment of the present invention has the following advantages:
采用本发明实施例的技术方案后,由于本发明的X射线放大成像系统采用具有较大“高宽比”的相位放大光栅和分析吸收放大光栅,不仅制作工艺简单,原材料价格较低廉,便于推广,而且其适用的X射线能量范围广,尤其可以适用于高能X射线,并可通过低空间分辨的探测器获取高空间分辨的成像效果,因而可大幅提高该X射线放大成像系统的分辨率和使用范围。After adopting the technical solution of the embodiment of the present invention, since the X-ray magnified imaging system of the present invention adopts the phase magnification grating and the analysis absorption magnification grating with a relatively large "aspect ratio", not only the manufacturing process is simple, but the raw material price is relatively cheap, which is convenient for popularization , and it is suitable for a wide range of X-ray energy, especially for high-energy X-rays, and can obtain high-spatial-resolution imaging effects through low-spatial-resolution detectors, thus greatly improving the resolution and scope of use.
另外,X射线放大成像系统采用实验室X射线光管与X射线光源透镜相结合的方式获取微焦斑相干光源,在提高性能的同时还能降低造价成本,便于推广,具有潜在重要应用和广泛使用范围。In addition, the X-ray magnification imaging system adopts the combination of the laboratory X-ray light tube and the X-ray light source lens to obtain the micro-focus spot coherent light source, which can reduce the cost while improving performance, and is easy to promote. It has potential important applications and wide scope of use.
本发明实施例的更多特点和优势将在之后的具体实施方式予以说明。More features and advantages of the embodiments of the present invention will be described in the following specific implementation manners.
附图说明Description of drawings
构成本发明实施例一部分的附图用来提供对本发明实施例的进一步理解,本发明的示意性实施例及其说明用于解释本发明,并不构成对本发明的不当限定。在附图中:The drawings constituting a part of the embodiments of the present invention are used to provide a further understanding of the embodiments of the present invention, and the schematic embodiments of the present invention and their descriptions are used to explain the present invention, and do not constitute improper limitations to the present invention. In the attached picture:
图1为本发明实施例提供的X射线放大成像系统的组成示意图;FIG. 1 is a schematic diagram of the composition of an X-ray magnified imaging system provided by an embodiment of the present invention;
图2为本发明实施例中X射线光源透镜的结构示意图;Fig. 2 is a schematic structural view of an X-ray light source lens in an embodiment of the present invention;
图3为本发明实施例中X射线光源透镜沿垂直于其中心对称轴线的剖面示意图;3 is a schematic cross-sectional view of the X-ray source lens along the axis of symmetry perpendicular to its center in the embodiment of the present invention;
图4为本发明实施例中相位放大光栅的主体结构示意图;Fig. 4 is a schematic diagram of the main structure of the phase amplification grating in the embodiment of the present invention;
图5为本发明实施例中分析吸收放大光栅的主体结构示意图;Fig. 5 is a schematic diagram of the main structure of the analysis absorption amplification grating in the embodiment of the present invention;
图6为本发明实施例中相位放大光栅或分析吸收放大光栅沿垂直于其中心对称轴线的剖面示意图。Fig. 6 is a schematic cross-sectional view of a phase amplification grating or an analysis absorption amplification grating along the axis of symmetry perpendicular to its center in an embodiment of the present invention.
附图标记说明Explanation of reference signs
1 X射线光源1 X-ray light source
2 毛细管X射线光源透镜2 capillary X-ray source lens
3 微焦斑光源3 micro-focus spot light source
4 样品4 samples
5 相位放大光栅5 Phase Amplified Gratings
6 分析吸收放大光栅6 Analyzing Absorption Amplified Gratings
7 X射线探测器7 X-ray detectors
具体实施方式Detailed ways
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
需要说明的是,在不冲突的情况下,本发明实施例及实施例中的特征可以相互组合。It should be noted that, in the case of no conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other.
下面结合附图,对本发明的各优选实施例作进一步说明:Below in conjunction with accompanying drawing, each preferred embodiment of the present invention is described further:
基于对现有X射线光栅的性能及其制作方法的分析,本发明的发明人进行了大量的毛细管X射线光学器件研制和应用研究,制作出一种X射线光源透镜和具有较大“高宽比”的多毛细管X射线放大光栅,进而提出一种采用该X射线光源透镜和多毛细管X射线光栅的X射线放大成像系统。Based on the analysis of the performance of the existing X-ray grating and its manufacturing method, the inventors of the present invention have carried out a large amount of capillary X-ray optical device development and application research, and produced a kind of X-ray source lens and a lens with a larger "height and width". Ratio" polycapillary X-ray magnifying grating, and then proposes an X-ray magnifying imaging system using the X-ray source lens and polycapillary X-ray grating.
参照图1,其为本发明实施例的X射线放大成像系统的组成示意图,X射线放大成像系统包括:X射线光源1、X射线光源透镜2、相位放大光栅5、分析吸收放大光栅6、及X射线探测器7。其中:With reference to Fig. 1, it is the composition schematic diagram of the X-ray magnifying imaging system of the embodiment of the present invention, and X-ray magnifying imaging system comprises: X-ray light source 1, X-ray light source lens 2, phase amplifying grating 5, analysis absorbing amplifying grating 6, and X-ray detector7. in:
X射线光源透镜2的入口端设置有X射线光源1,X射线光源透镜2用于会聚X射线光源1发射的X射线,得到微焦斑相干光源3,微焦斑相干光源3用于照射样品4。相位放大光栅5设置于样品4之后,用于收集并调制照射样品4后的X射线并产生衍射自成像效应,得到干涉条纹。The entrance end of the X-ray source lens 2 is provided with an X-ray source 1, and the X-ray source lens 2 is used to converge the X-rays emitted by the X-ray source 1 to obtain a micro-focus spot coherent light source 3, which is used to irradiate the sample 4. The phase amplifying grating 5 is arranged behind the sample 4, and is used for collecting and modulating the X-rays irradiated on the sample 4 and generating a diffraction self-imaging effect to obtain interference fringes.
分析吸收放大光栅6设置于相位放大光栅5之后,位于衍射自成像效应对应的自成像平面位置处,使分析吸收放大光栅6和相位放大光栅5之间的距离满足光栅相位衬度成像条件,分析吸收放大光栅6用于收集并处理来自相位放大光栅5的X射线,将其中的相位信息转换为X射线探测器7可识别的光强信息。X射线探测器7设置在分析吸收放大光栅6之后,靠近分析吸收放大光栅6的出口端,X射线探测器7用于探测并收集样品4的信息。The analysis absorption amplification grating 6 is arranged behind the phase amplification grating 5, and is located at the position of the self-imaging plane corresponding to the diffractive self-imaging effect, so that the distance between the analysis absorption amplification grating 6 and the phase amplification grating 5 meets the grating phase contrast imaging condition, and the analysis The absorption amplifying grating 6 is used to collect and process the X-rays from the phase amplifying grating 5 , and convert the phase information therein into light intensity information recognizable by the X-ray detector 7 . The X-ray detector 7 is arranged behind the analysis absorption amplification grating 6 and close to the exit end of the analysis absorption amplification grating 6 , and the X-ray detector 7 is used for detecting and collecting information of the sample 4 .
进一步来讲,X射线光源透镜2、相位放大光栅5和分析吸收放大光栅6可由硅酸盐玻璃或铅玻璃毛细管拉制而成,其中,毛细管的中空部分是X射线穿过光栅的空间部分,单毛细管壁是吸收阻止X射线穿过的部分。上述实施例中,X射线光源1发出的X射线束,X射线光源透镜2收集和会聚这些X射线束,进而得到高功率微焦斑相干光源3,该微焦斑相干光源3用于照射到样品4上,照射到样品4之后的射线传射至相位放大光栅5,该相位放大光栅5对这些相干光的波阵面进行调制,产生Talbot(泰伯)自成像效应(又称衍射自成像效应),经相位放大光栅5调制的X射线照射到分析吸收放大光栅6,该分析吸收放大光栅6放置在上述自成像效应对应的自成像平面位置,从而得到莫尔干涉条纹,将其中的相位信息转换为可识别的光强信息,进而被X射线探测器7探测收集。这样,可从X射线探测器7探测到的信号中提出样品4的信息。Further speaking, the X-ray source lens 2, the phase amplification grating 5 and the analysis absorption amplification grating 6 can be drawn from silicate glass or lead glass capillary, wherein the hollow part of the capillary is the space part where X-rays pass through the grating, The single capillary wall is the part that absorbs and prevents X-rays from passing through. In the above embodiment, the X-ray beams emitted by the X-ray source 1 are collected and converged by the X-ray source lens 2 to obtain a high-power micro-focus spot coherent light source 3, which is used to irradiate to On the sample 4, the rays irradiated on the sample 4 are transmitted to the phase amplification grating 5, and the phase amplification grating 5 modulates the wavefronts of these coherent lights to generate the Talbot (Tabot) self-imaging effect (also known as diffractive self-imaging effect), the X-rays modulated by the phase amplification grating 5 irradiate the analysis absorption amplification grating 6, and the analysis absorption amplification grating 6 is placed at the position of the self-imaging plane corresponding to the above-mentioned self-imaging effect, thereby obtaining Moire interference fringes, and the phase The information is converted into identifiable light intensity information, which is then detected and collected by the X-ray detector 7 . In this way, information about the sample 4 can be extracted from the signal detected by the X-ray detector 7 .
进一步来讲,上述实施例中,样品4放置于微焦斑相干光源3和相位放大光栅5之间,靠近相位放大光栅5的入口端。X射线探测器7设置在分析吸收放大光栅6之后靠近其出口端。Further speaking, in the above embodiment, the sample 4 is placed between the micro-focus spot coherent light source 3 and the phase amplification grating 5 , close to the entrance of the phase amplification grating 5 . The X-ray detector 7 is arranged after analyzing the absorption amplification grating 6 close to its exit end.
以上对上述实施例中的X射线放大成像系统进行了说明,下面对上述中的主要光学器件作进一步说明:The X-ray magnified imaging system in the above-mentioned embodiment has been described above, and the main optical devices in the above-mentioned are further described below:
1、X射线光源透镜1. X-ray light source lens
这里,对上述各实施例中的X射线光源透镜2进行举例说明,上述各实施例可选用以下所述的任意一种X射线光源透镜2:Here, the X-ray source lens 2 in the above-mentioned embodiments is illustrated, and any of the following X-ray source lenses 2 can be selected for each of the above-mentioned embodiments:
1)性能1) Performance
上述实施例中采用X射线光源透镜2,这样可通过高功率大焦斑X射线光源结合毛细管X射线光源透镜技术得到微焦斑相干光源3,而该微焦斑相干光源3能够克服现有微焦斑相干光源造价高、功率低等问题,因此,上述X射线放大成像系统可以采用实验室大焦斑X射线光管作为光源,例如,X射线光源1可以为实验室X射线光管,功率范围为3-9000瓦。这样,不仅便于该X射线放大成像系统的推广,还能使其具有广泛的使用范围。The X-ray light source lens 2 is adopted in the above-mentioned embodiment, so that a micro-focus spot coherent light source 3 can be obtained by combining a high-power large-focus spot X-ray light source with a capillary X-ray light source lens technology, and the micro-focus spot coherent light source 3 can overcome existing micro The focal spot coherent light source has problems such as high cost and low power. Therefore, the above-mentioned X-ray magnification imaging system can use a laboratory large focal spot X-ray light tube as a light source. For example, the X-ray light source 1 can be a laboratory X-ray light tube, and the power The range is 3-9000 watts. In this way, it is not only convenient to popularize the X-ray magnified imaging system, but also has a wide application range.
2)外形2) shape
参照图2,其为X射线光源透镜2的主体结构示意图。Referring to FIG. 2 , it is a schematic diagram of the main structure of the X-ray source lens 2 .
如图2所示,上述各实施例中,X射线光源透镜2沿其长度方向上的外形根据实际需要可以是锥形面段、抛物线型面段或者其它二次曲面段。As shown in FIG. 2 , in the above-mentioned embodiments, the shape of the X-ray source lens 2 along its length direction can be a conical surface segment, a parabolic surface segment or other quadric surface segments according to actual needs.
3)构成3) Composition
X射线光源透镜2可以是单毛细管硅酸盐玻璃或铅玻璃透镜,也可以多毛细管硅酸盐玻璃或铅玻璃透镜,即是没有支撑的单孔或者多孔固体。其中,毛细管是中空的,X射线在毛细管的中空管内壁上发生全反射而改变传播方向。例如,上述实施例中,X射线光源透镜2可以是多通道光学器件,可以会聚发散的X射线得到微焦斑相干光源,以用于X射线光栅相衬成像。The X-ray light source lens 2 can be a single capillary silicate glass or lead glass lens, and can also be a polycapillary silicate glass or lead glass lens, that is, a single hole or porous solid without support. Wherein, the capillary is hollow, and the X-ray is totally reflected on the inner wall of the hollow tube of the capillary to change the propagation direction. For example, in the above embodiments, the X-ray light source lens 2 can be a multi-channel optical device, which can converge and diverge X-rays to obtain a micro-focus spot coherent light source for X-ray grating phase-contrast imaging.
如图3所示,X射线光源透镜2沿垂直于其中心线方向的横截面的外形是正六边形,它是由多根单毛细管(图中标记为B)构成,单毛细管的横截面的轮廓为圆形。多根单毛细管紧密排列组成X射线光源透镜2,如果把中间一根单毛细管所在的层数定义为1,则从内向外各层上的单毛细管的数目为6(n-1),其中n>1为层数,单毛细管的内径大小相同也可以不同。As shown in Figure 3, the profile of X-ray light source lens 2 along the cross section perpendicular to its centerline direction is regular hexagon, and it is made of many single capillaries (marked as B among the figure), the cross section of single capillary The outline is round. A plurality of single capillaries are closely arranged to form the X-ray light source lens 2. If the number of layers where a single capillary in the middle is located is defined as 1, then the number of single capillaries on each layer from the inside to the outside is 6(n-1), where n >1 is the number of layers, and the inner diameter of the single capillary can be the same or different.
4)几何参量4) Geometric parameters
如图2-3所示,X射线光源透镜2几何参量包括:入口焦距F1(X射线光源透镜2的入口端到X射线源的距离),出口焦距F2(X射线光源透镜2的出口端到其出口焦斑处的距离),毛细管X射线光源透镜2长度L1,透镜入口端直径尺寸Din1、出口端直径尺寸Dout1、最大尺寸Dmax1(对圆形细管X射线会聚透镜为其直径,对多边形细管X射线会聚透镜为其对边距离)。As shown in Figure 2-3, X-ray light source lens 2 geometric parameters include: entrance focal length F1 (the entrance end of X-ray light source lens 2 to the distance of X-ray source), exit focal length F2 (exit end of X-ray light source lens 2 to The distance at the focal spot of its exit), the length L1 of the capillary X-ray light source lens 2, the diameter of the lens entrance D in1 , the diameter of the exit D out1 , and the maximum size D max1 (the diameter of the circular capillary X-ray converging lens , for the polygonal capillary X-ray converging lens, its opposite side distance).
其中,可选的是,X射线光源透镜2的长度L1范围可为5-200毫米,透镜的入口端直径Din1范围可为3-40毫米,透镜的出口端直径Dout1范围可为1-20毫米,入口焦距F1的范围为1-30厘米,出口焦距F2的范围为1-40毫米,最大尺寸Dmax1的范围为3-20毫米。X射线光源透镜2适用X射线的能量范围可为1-150keV。Wherein, optionally, the length L1 range of the X-ray light source lens 2 can be 5-200 millimeters, the range of the entrance diameter D in1 of the lens can be 3-40 millimeters, and the range of the outlet diameter D out1 of the lens can be 1-200 millimeters. 20 mm, the range of the entrance focal length F1 is 1-30 cm, the range of the exit focal length F2 is 1-40 mm, and the range of the maximum dimension D max1 is 3-20 mm. The X-ray light source lens 2 is applicable to the X-ray energy range of 1-150keV.
例如,X射线光源透镜2的长度L1可为50毫米,入口端直径Din1可为10毫米,出口端直径Dout1可为1毫米,适用X射线的能量范围可为80keV。For example, the length L1 of the X-ray light source lens 2 may be 50 mm, the diameter D in1 of the entrance end may be 10 mm, the diameter D out1 of the exit end may be 1 mm, and the applicable X-ray energy range may be 80 keV.
5)物理参量5) Physical parameters
i)出口焦斑直径,即微焦斑相干光源3的直径,取值范围可为0.05-50微米,例如可根据实际需要选用可形成0.1um、1um或20um焦斑的透镜。i) The diameter of the focal spot at the exit, that is, the diameter of the micro-focus spot coherent light source 3, can range from 0.05 to 50 microns. For example, a lens that can form a focal spot of 0.1 um, 1 um or 20 um can be selected according to actual needs.
ii)功率密度增益,即为:光路中放置X射线会聚透镜2时和没有放置该透镜时,该透镜焦斑处等单位面积上的X射线强度比值,取值范围可为100-10000。ii) Power density gain, that is: when the X-ray converging lens 2 is placed in the optical path and when the lens is not placed, the X-ray intensity ratio at the focal spot of the lens on an equal unit area, and the value range can be 100-10000.
2、X射线放大光栅2. X-ray magnifying grating
这里所提及的X射线放大光栅包括相位放大光栅5和分析吸收放大光栅6,以下是对二者进行的举例说明,上述各实施例可选用以下任意一种相位放大光栅5和分析吸收放大光栅6:The X-ray amplifying grating mentioned here includes a phase amplifying grating 5 and an analysis absorption amplifying grating 6, and the following is an illustration of the two. The above-mentioned embodiments can choose any of the following phase amplifying gratings 5 and analysis absorption amplifying gratings 6:
1)性能1) Performance
上述X射线放大成像系统中,采用多毛细管X射线放大光栅,即相位放大光栅5和分析吸收放大光栅6实现放大成像,不仅具有较大的高宽比,分辨率高,而且适用的能量范围广,尤其可以适用于高能X射线,从而克服现有X射线光栅的缺点,使该X射线放大成像系统具有重要且更为广泛的科研和应用价值。因此,基于该X射线光栅的相衬放大成像系统特别适合微小样品的相位衬度放大成像研究,可以说上述实施例进一步发展了X射线相衬成像技术。In the above-mentioned X-ray magnification imaging system, the polycapillary X-ray magnification grating, that is, the phase magnification grating 5 and the analysis absorption magnification grating 6 is used to realize magnification imaging, which not only has a large aspect ratio, high resolution, but also has a wide range of applicable energy , especially suitable for high-energy X-rays, thereby overcoming the shortcomings of existing X-ray gratings, making the X-ray magnification imaging system have important and wider scientific research and application values. Therefore, the phase contrast magnification imaging system based on the X-ray grating is particularly suitable for the phase contrast magnification imaging research of tiny samples, and it can be said that the above embodiments further develop the X-ray phase contrast imaging technology.
2)构成2) Composition
上述实施例中,相位放大光栅5和分析吸收放大光栅6为没有支撑的多孔固体,分别由多根硅酸盐玻璃或铅玻璃单毛细管拉制而成。In the above-mentioned embodiments, the phase amplification grating 5 and the analysis absorption amplification grating 6 are porous solids without support, which are respectively drawn from a plurality of silicate glass or lead glass single capillaries.
需要说明的是,上述实施例中,X射线光源透镜2、相位放大光栅5和分析吸收放大光栅6可采用拉制机对玻璃母管进行复合拉制等工艺来制作得到。例如:通过拉丝炉对玻璃母管进行拉制产生单毛细管,然后利用这些单毛细管通过复合拉制,得到符合要求的多毛细管X射线光栅。其中,拉丝炉为具有加热器以及手动或者自动拉丝器。玻璃母管为厚壁玻璃管,材料可以是硅酸盐玻璃和铅玻璃等,对应地,单毛细管的材料为硅酸盐玻璃或者是铅玻璃。这里,通过选择合适的玻璃材料和控制工艺等方法,满足各界对较大“高宽比”高能量X射线光栅的要求,同时也能满足各界对较大“高宽比”低能量X射线光栅的要求,可以说,该多毛细管X射线光栅制作方法在光栅制作领域尤其是高能光栅制作领域将带来革命性的创新。特别是,上述实施例通过拉丝机拉制硅酸盐或铅玻璃多毛细管X射线光栅,不仅能简化光栅的制作工艺,而且因其原材料价格低廉,也便于推广,使得多毛细管X射线光栅具有重要的科研和应用价值,在生命、能源、环境、食品等科学中具有重要应用。It should be noted that, in the above embodiments, the X-ray light source lens 2, the phase amplification grating 5 and the analysis absorption amplification grating 6 can be manufactured by composite drawing of a glass mother tube by a drawing machine. For example: the glass mother tube is drawn through a wire drawing furnace to produce single capillaries, and then these single capillaries are used for compound drawing to obtain a multi-capillary X-ray grating that meets the requirements. Wherein, the wire drawing furnace has a heater and a manual or automatic wire drawing device. The glass mother tube is a thick-walled glass tube, and the material can be silicate glass or lead glass. Correspondingly, the material of the single capillary is silicate glass or lead glass. Here, through the selection of appropriate glass materials and control techniques, the requirements of all walks of life for high-energy X-ray gratings with a large "aspect ratio" can be met, and at the same time, the requirements for low-energy X-ray gratings with a large "aspect ratio" can also be met. It can be said that the multi-capillary X-ray grating manufacturing method will bring revolutionary innovations in the field of grating manufacturing, especially in the field of high-energy grating manufacturing. In particular, the above-mentioned embodiment uses a wire drawing machine to draw silicate or lead glass polycapillary X-ray gratings, which not only simplifies the grating manufacturing process, but also facilitates popularization because of the low price of raw materials, making the polycapillary X-ray gratings important. Its scientific research and application value have important applications in life, energy, environment, food and other sciences.
3)外形3) shape
参照图4-5,其分别为相位放大光栅5和分析吸收放大光栅6的主体结构示意图。上述实施例中,相位放大光栅5和分析吸收放大光栅6为锥形多毛细管X射线光栅,沿各自长度方向上的外形为锥形面段、抛物线型面段或者其它二次曲面段。Referring to FIGS. 4-5 , they are schematic diagrams of the main structures of the phase amplification grating 5 and the analysis absorption amplification grating 6 respectively. In the above embodiments, the phase amplification grating 5 and the analysis absorption amplification grating 6 are tapered polycapillary X-ray gratings, and the shapes along their length directions are conical surface segments, parabolic surface segments or other quadric surface segments.
由于上述实施例采用锥形的X射线光栅,所以具有放大功能,这可降低成像系统对高空间分辨探测器的要求,例如,上述X射线探测可采用空间分辨探测器,其空间分辨范围可为0.01-200微米。换言之,上述实施例可以利用低空间分辨的探测得到高空间分辨的成像效果。基于该多毛细管X射线放大光栅的X射线放大成像系统可以进行相位衬度成像,例如,医学和生物学领域的样品成像分析。Since the above-mentioned embodiment adopts the tapered X-ray grating, it has a zoom function, which can reduce the requirement of the imaging system for the high spatial resolution detector. For example, the above-mentioned X-ray detection can adopt the spatial resolution detector, and its spatial resolution range can be 0.01-200 microns. In other words, the above-mentioned embodiments can utilize detection with low spatial resolution to obtain imaging effects with high spatial resolution. The X-ray magnification imaging system based on the polycapillary X-ray magnification grating can perform phase contrast imaging, for example, sample imaging analysis in the fields of medicine and biology.
4)几何参量4) Geometric parameters
如图4所示,相位放大光栅5的几何参量包括长度H1、入口端直径D2及出口端直径D3等,其中:As shown in Figure 4, the geometric parameters of the phase amplification grating 5 include the length H1, the diameter of the entrance end D2 and the diameter of the exit end D3, etc., wherein:
i)相位放大光栅5沿其水平中心周线方向上的长度H1,取值范围可为0.1-20厘米;i) The length H1 of the phase amplification grating 5 along the direction of its horizontal central circumference, which can range from 0.1 to 20 centimeters;
ii)入口端直径D1,取值范围可为:1-200毫米;ii) The diameter of the inlet end D1, the value range can be: 1-200 mm;
iii)出口端直径D2,取值范围可为:4-400毫米。iii) The diameter D2 of the outlet end may range from 4 mm to 400 mm.
如图5所示,分析吸收放大光栅6的几何参量包括长度H2、入口端直径D3及出口端直径D4等,其中:As shown in Figure 5, the geometric parameters of the analysis absorption amplification grating 6 include length H2, diameter D3 of the entrance end and diameter D4 of the exit end, etc., wherein:
i)分析吸收放大光栅6沿其水平中心周线方向上的长度H2,取值范围可为:0.1-15厘米;i) Analyzing the length H2 of the absorption amplification grating 6 along the direction of its horizontal central perimeter, the value range may be: 0.1-15 cm;
ii)入口端直径D3,取值范围可为:8-500毫米;ii) The diameter of the inlet end D3, the value range can be: 8-500 mm;
iii)出口端直径D4,取值范围可为:12-600毫米。iii) The outlet diameter D4 may range from 12 mm to 600 mm.
5)物理参量5) Physical parameters
i)光栅周期i) grating period
如图6所示,相位放大光栅5和分析吸收放大光栅6沿垂直于各自水平中心线方向的横截面的外形为四边形,构成这些光栅的中空单毛细管的轮廓是四边形的,横截面中的黑色部分是单毛细管的壁,用来吸收和阻挡X射线,白色部分是单毛细管的中空部分,为X射线穿过光栅的通道。这里,将相邻通道的中心连线的长度定义为光栅周期p1。As shown in Figure 6, the phase amplifying grating 5 and the analysis absorption amplifying grating 6 are quadrilateral in cross section along the direction perpendicular to their respective horizontal centerlines. The part is the wall of the single capillary, which is used to absorb and block X-rays, and the white part is the hollow part of the single capillary, which is the channel for X-rays to pass through the grating. Here, the length of the line connecting the centers of adjacent channels is defined as the grating period p1.
其中,可选的是,相位放大光栅5和分析吸收放大光栅6的光栅周期范围可为0.01-20微米,高宽比范围可为10-100000。另外,相位放大光栅5和分析吸收放大光栅6沿垂直于各自中心对称轴线的界面的直径范围可为1-800毫米,适用X射线的能量范围可为1-150keV。Wherein, optionally, the grating period of the phase amplification grating 5 and the analysis absorption amplification grating 6 may range from 0.01 to 20 microns, and the aspect ratio may range from 10 to 100,000. In addition, the diameter range of the phase amplification grating 5 and the analysis absorption amplification grating 6 along the interface perpendicular to their respective central symmetry axes can be 1-800 mm, and the applicable X-ray energy range can be 1-150 keV.
ii)高宽比ii) aspect ratio
如图4-6中所示,光栅的长度H1和H2分别与相应光栅的周期的一半的比值定义为相应光栅对应的“高宽比”。As shown in FIGS. 4-6 , the ratios of the lengths H1 and H2 of the grating to half the period of the corresponding grating are defined as the "aspect ratio" corresponding to the corresponding grating.
此处,以相位放大光栅5为例,相位放大光栅5的高宽比为其长度H1与光栅周期的一半的比值。可选的是,相位放大光栅5的光栅周期可为2-8微米,高宽比可为1300-1500,入口端直径D1可为8-10毫米,出口端直径D2为12-14毫米,使用X射线的能量可为80-100keV,光栅的材料可为铅玻璃。Here, taking the phase amplification grating 5 as an example, the aspect ratio of the phase amplification grating 5 is the ratio of its length H1 to half of the grating period. Optionally, the grating period of the phase amplification grating 5 can be 2-8 microns, the aspect ratio can be 1300-1500, the diameter D1 of the entrance end can be 8-10 mm, and the diameter D2 of the exit end can be 12-14 mm. The energy of X-rays can be 80-100keV, and the material of the grating can be lead glass.
又如,分析吸收放大光栅6的光栅周期范围可为2-6微米,高宽比可为900-1200,入口端直径D3可为15-18毫米,出口端直径D4可为18-20毫米,使用X射线的能量可为80-100keV,光栅的材料可为铅玻璃。As another example, the grating period range of the analytical absorption amplification grating 6 can be 2-6 microns, the aspect ratio can be 900-1200, the diameter D3 of the entrance end can be 15-18 mm, and the diameter D4 of the exit end can be 18-20 mm. The energy of the X-rays used can be 80-100keV, and the material of the grating can be lead glass.
作为一种可选的实施方式,上述各实施例中,X射线放大成像系统还可包括信息处理装置,信息处理装置与X射线探测器7连接,用于提取所述样品4的信息,并对该信息进行分析处理。这里,信息处理装置可根据实际应用的需要进行配置。这样,采用上述实施例的X射线放大成像系统,可以从X射线探测器7的探测到的信号中提出样品4的信息,并通过信息处理装置根据具体需求进行分析处理。As an optional implementation, in the above embodiments, the X-ray magnified imaging system may also include an information processing device connected to the X-ray detector 7 for extracting the information of the sample 4, and This information is analyzed and processed. Here, the information processing device may be configured according to actual application requirements. In this way, by using the X-ray magnified imaging system of the above embodiment, the information of the sample 4 can be extracted from the detected signal of the X-ray detector 7, and analyzed and processed by the information processing device according to specific requirements.
综上,与现有技术相比,本发明各实施例提出的X射线放大成像系统具有以下优点:To sum up, compared with the prior art, the X-ray magnified imaging system proposed by each embodiment of the present invention has the following advantages:
本发明各实施例提出的X射线放大成像系统采用具有较大“高宽比”的X射线放大光栅,即相位放大光栅和分析吸收放大光栅,不仅制作工艺简单,原材料价格较低廉,便于推广,而且其适用的X射线能量范围广,尤其可以适用于高能X射线,并可通过低空间分辨的探测器获取高空间分辨的成像效果,进而可大幅提高该X射线放大成像系统的分辨率和使用范围。The X-ray magnifying imaging system proposed by each embodiment of the present invention adopts an X-ray magnifying grating with a relatively large "aspect ratio", that is, a phase magnifying grating and an analytical absorption magnifying grating. Moreover, it is suitable for a wide range of X-ray energy, especially for high-energy X-rays, and can obtain high-spatial-resolution imaging effects through low-spatial-resolution detectors, which can greatly improve the resolution and use of the X-ray magnification imaging system. scope.
另外,本发明各实施例的X射线放大成像系统采用实验室X射线光管与X射线光源透镜相结合的方式获取微焦斑相干光源,在提高性能的同时还能降低造价成本,便于推广,具有潜在重要应用和广泛使用范围。In addition, the X-ray magnification imaging system of each embodiment of the present invention adopts the combination of the laboratory X-ray light tube and the X-ray light source lens to obtain the micro-focus spot coherent light source, which can reduce the cost while improving the performance, and is easy to promote. It has potentially important applications and a wide range of applications.
此外,本领域技术人员应当理解的是,上述各实施例的成像系统中还可包括其他有助于成像的辅助器件,如试验台、各光学元件的支架配件、调整装置配件等,这属于本领域常用的器件,因此不再作进一步说明。In addition, those skilled in the art should understand that the imaging systems of the above embodiments may also include other auxiliary devices that facilitate imaging, such as test benches, bracket accessories for optical elements, adjustment device accessories, etc., which belong to this devices commonly used in the field, so no further description is given.
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included in the scope of the present invention. within the scope of protection.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6389101B1 (en) * | 1999-05-24 | 2002-05-14 | Jmar Research, Inc. | Parallel x-ray nanotomography |
| CN101833233A (en) * | 2010-05-18 | 2010-09-15 | 北京师范大学 | X-ray phase imaging device |
| CN102890060A (en) * | 2012-08-26 | 2013-01-23 | 贵州大学 | Imaging method based on reflection Talbot effect, application of imaging method and device |
| CN103876766A (en) * | 2012-12-21 | 2014-06-25 | 西门子公司 | X-ray image acquisition system for differential phase contrast imaging |
| CN204536232U (en) * | 2015-04-21 | 2015-08-05 | 北京师范大学 | X ray amplification imaging system |
-
2015
- 2015-04-21 CN CN201510191710.1A patent/CN104833686B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6389101B1 (en) * | 1999-05-24 | 2002-05-14 | Jmar Research, Inc. | Parallel x-ray nanotomography |
| CN101833233A (en) * | 2010-05-18 | 2010-09-15 | 北京师范大学 | X-ray phase imaging device |
| CN102890060A (en) * | 2012-08-26 | 2013-01-23 | 贵州大学 | Imaging method based on reflection Talbot effect, application of imaging method and device |
| CN103876766A (en) * | 2012-12-21 | 2014-06-25 | 西门子公司 | X-ray image acquisition system for differential phase contrast imaging |
| CN204536232U (en) * | 2015-04-21 | 2015-08-05 | 北京师范大学 | X ray amplification imaging system |
Non-Patent Citations (3)
| Title |
|---|
| Radiation dose efficiency comparison between differential phase contrast CT and conventional absorption CT;Joseph J. Zambelli et al.;《Med. Phys.》;20101231;第37卷;第2473-2479页 * |
| Talbot效应的平面波干涉理论;梁铨廷;《广州大学学报(自然科学版)》;20020331;第1卷(第2期);第13-15页 * |
| 光学系统中的光栅衍射自成像现象:广义的Talbot效应;廖江红等;《光学学报》;19850430;第5卷(第4期);第331-335页 * |
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