CN104503203A - Mask plate and production method thereof and display panel frame sealing adhesive curing method - Google Patents
Mask plate and production method thereof and display panel frame sealing adhesive curing method Download PDFInfo
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- CN104503203A CN104503203A CN201510020570.1A CN201510020570A CN104503203A CN 104503203 A CN104503203 A CN 104503203A CN 201510020570 A CN201510020570 A CN 201510020570A CN 104503203 A CN104503203 A CN 104503203A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
本发明公开了一种掩膜板及其制备方法和显示面板中封框胶的固化方法，其中该掩膜板包括：透明基板和位于透明基板上的对位标识，对位标识用于将掩膜板与待紫外固化处理的显示面板进行对位，对位标识的材料为感光树脂。本发明的技术方案通过将掩膜板中对位标识的材料设置为感光树脂，从而在制备该由感光树脂构成的对位标识时，仅需经过感光树脂薄膜涂覆工序、曝光工序和显影工序即可完成对位标识的制备。与现有技术相比，本发明的技术方案可省去金属材料沉积工序、刻蚀工序和光刻胶剥离工序，即本发明技术方案可使得制备对位标识过程中所需要的工序数量减少，简化制作掩膜板的工艺流程，节省成本。
The invention discloses a mask plate, a preparation method thereof and a curing method for a frame sealant in a display panel, wherein the mask plate comprises: a transparent substrate and an alignment mark on the transparent substrate, and the alignment mark is used to align the mask The film plate is aligned with the display panel to be cured by UV, and the material of the alignment mark is photosensitive resin. The technical scheme of the present invention sets the material of the alignment mark in the mask plate as a photosensitive resin, so that when preparing the alignment mark made of photosensitive resin, it only needs to go through the photosensitive resin film coating process, exposure process and development process The preparation of the alignment mark can be completed. Compared with the prior art, the technical solution of the present invention can save the metal material deposition process, etching process and photoresist stripping process, that is, the technical solution of the present invention can reduce the number of processes required in the process of preparing the alignment mark, Simplify the technological process of making mask plates and save costs.
Description
技术领域technical field
本发明涉及显示技术领域，特别涉及掩膜板及其制备方法和显示面板中封框胶的固化方法。The invention relates to the field of display technology, in particular to a mask plate, a preparation method thereof, and a curing method for a frame sealant in a display panel.
背景技术Background technique
液晶显示面板的生产过程大致如下。首先在阵列基板或者彩膜基板上滴注液晶和封框胶，然后将两基板进行对盒，再将封框胶进行固化。其中，封框胶的作用是粘接阵列基板和彩膜基板，并且保护中间的液晶不受外界空气和水的影响。The production process of the liquid crystal display panel is roughly as follows. First, the liquid crystal and the sealant are dripped on the array substrate or the color film substrate, and then the two substrates are boxed, and then the sealant is cured. Among them, the role of the sealant is to bond the array substrate and the color filter substrate, and protect the liquid crystal in the middle from the influence of external air and water.
目前，往往采用紫外固化的方式对封框胶进行固化，在进行紫外固化处理的过程中需要用到相应的掩膜板，其中该掩膜板包括形成于透明基板上的至少一个对位标识，该对位标识用于与显示面板中相应的对位图形进行匹配实现掩膜板与显示面板的对位。在现有技术中，该对位标识的材料为金属材料，因此在制备该对位标识时需要至少经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光(掩膜)工序、显影工序、刻蚀工序以及光刻胶剥离工序。At present, ultraviolet curing is often used to cure the frame sealant, and a corresponding mask plate is required in the process of ultraviolet curing treatment, wherein the mask plate includes at least one alignment mark formed on the transparent substrate, The alignment mark is used to match the corresponding alignment pattern in the display panel to achieve alignment between the mask plate and the display panel. In the prior art, the material of the alignment mark is a metal material, so it is necessary to go through at least a metal material film deposition process, a photoresist coating process, an exposure (mask) process, a development process, Etching process and photoresist stripping process.
由上述内容可见，现有技术在制备该紫外固化用的掩膜板中的对位标识时需要进行繁多的工序。It can be seen from the above that in the prior art, numerous procedures are required to prepare the alignment mark in the mask plate for ultraviolet curing.
发明内容Contents of the invention
本发明提供一种掩膜板及其制备方法和显示面板中封框胶的固化方法，可有效的简化在制备掩膜板中的对位标识时所需要的工序数量。The invention provides a mask plate, a preparation method thereof, and a curing method for a frame sealant in a display panel, which can effectively simplify the number of processes required for preparing alignment marks in the mask plate.
为实现上述目的，本发明提供一种掩膜板，包括：透明基板和位于所述透明基板上的对位标识，所述对位标识用于将所述掩膜板与待紫外固化处理的显示面板进行对位，其特征在于，所述对位标识的材料为感光树脂。In order to achieve the above object, the present invention provides a mask plate, including: a transparent substrate and an alignment mark located on the transparent substrate, the alignment mark is used to connect the mask plate with the display to be treated by ultraviolet curing The panel is aligned, and the feature is that the material of the alignment mark is photosensitive resin.
可选地，所述感光树脂的光透过率小于或等于80％。Optionally, the light transmittance of the photosensitive resin is less than or equal to 80%.
可选地，所述对位标识位于所述透明基板的周边区域。Optionally, the alignment mark is located in the peripheral area of the transparent substrate.
可选地，还包括：设置于所述透明基板上且与所述显示面板上的显示区域对应的多个矩形遮光图形，所述矩形遮光图形的材料为遮光材料。Optionally, it further includes: a plurality of rectangular light-shielding patterns arranged on the transparent substrate and corresponding to the display area on the display panel, where the material of the rectangular light-shielding patterns is light-shielding material.
可选地，所述遮光材料为金属材料。Optionally, the light-shielding material is a metal material.
可选地，所述矩形遮光图形位于所述透明基板的中间区域。Optionally, the rectangular light-shielding pattern is located in the middle area of the transparent substrate.
为实现上述目的，本发明还提供一种掩膜板的制备方法，所述制备方法包括：In order to achieve the above object, the present invention also provides a method for preparing a mask plate, the preparation method comprising:
在透明基板上形成对位标识，所述对位标识用于将所述掩膜板与待紫外固化处理的所述显示面板进行对位，所述对位标识的材料为感光树脂。An alignment mark is formed on the transparent substrate, and the alignment mark is used for aligning the mask plate with the display panel to be treated by ultraviolet curing, and the material of the alignment mark is photosensitive resin.
可选地，所述在透明基板上形成对位标识的步骤包括：Optionally, the step of forming an alignment mark on the transparent substrate includes:
在所述透明基板的上方形成感光树脂薄膜；forming a photosensitive resin film on the transparent substrate;
利用相应的掩膜基板对所述感光树脂薄膜进行曝光处理；Exposing the photosensitive resin film by using a corresponding mask substrate;
对曝光处理后的所述感光树脂薄膜进行显影处理得到所述对位标识的图形。Developing the photosensitive resin film after the exposure treatment to obtain the pattern of the alignment mark.
可选地，所述感光树脂薄膜可以为光交联型感光树脂薄膜或光分解型感光树脂薄膜或光聚合型感光树脂薄膜。Optionally, the photosensitive resin film may be a photocrosslinkable photosensitive resin film, a photodecomposable photosensitive resin film, or a photopolymerizable photosensitive resin film.
可选地，所述制备方法还包括：Optionally, the preparation method also includes:
在所述透明基板上形成与所述显示面板上的显示区域对应的多个矩形遮光图形，所述遮光图形的材料为遮光材料。A plurality of rectangular light-shielding patterns corresponding to the display areas on the display panel are formed on the transparent substrate, and the material of the light-shielding patterns is light-shielding material.
可选地，所述遮光材料为金属材料。Optionally, the light-shielding material is a metal material.
为实现上述目的，本发明还提供一种显示面板中封框胶的固化方法，其特征在于，在对所述封框胶进行紫外固化处理时采用上述的掩膜板进行掩膜。To achieve the above object, the present invention also provides a method for curing a frame sealant in a display panel, which is characterized in that the above-mentioned mask plate is used for masking when the frame sealant is subjected to ultraviolet curing treatment.
本发明具有以下有益效果：The present invention has the following beneficial effects:
本发明提供了一种掩膜板及其制备方法和显示面板中封框胶的固化方法，其中该掩膜板用于在对显示面板中的封框胶进行紫外固化处理时进行掩膜，该掩膜板包括：透明基板和位于透明基板上的对位标识，对位标识用于将掩膜板与待紫外固化处理的显示面板进行对位，对位标识的材料为感光树脂。本发明的技术方案通过将掩膜板中对位标识的材料设置为感光树脂，从而在制备该由感光树脂构成的对位标识时，仅需经过感光树脂薄膜涂覆工序(可等效于光刻胶涂覆工序)、曝光工序和显影工序即可完成对位标识的制备。与现有技术中制备对位标识时至少需要经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光工序、显影工序、刻蚀工序以及光刻胶剥离工序相比，本发明的技术方案可省去金属材料沉积工序、刻蚀工序和光刻胶剥离工序，即本发明技术方案可使得制备对位标识过程中所需要的工序数量减少，简化制作掩膜板的工艺流程，节省成本。The invention provides a mask plate and its preparation method and a method for curing the frame sealant in the display panel, wherein the mask plate is used to perform masking when the frame sealant in the display panel is subjected to ultraviolet curing treatment. The mask plate includes: a transparent substrate and an alignment mark located on the transparent substrate. The alignment mark is used for aligning the mask plate with the display panel to be cured by ultraviolet light. The material of the alignment mark is photosensitive resin. The technical scheme of the present invention sets the material of the alignment mark in the mask plate as a photosensitive resin, so that when preparing the alignment mark made of photosensitive resin, it only needs to go through the photosensitive resin film coating process (which can be equivalent to the photosensitive resin film coating process). Resist coating process), exposure process and development process can complete the preparation of the alignment mark. Compared with the process of preparing alignment marks in the prior art, at least metal material film deposition process, photoresist coating process, exposure process, development process, etching process and photoresist stripping process, the technical solution of the present invention can The metal material deposition process, etching process and photoresist stripping process are omitted, that is, the technical solution of the present invention can reduce the number of processes required in the process of preparing the alignment mark, simplify the process flow of making the mask plate, and save costs.
附图说明Description of drawings
图1为本发明实施例一提供的掩膜板的俯视图；FIG. 1 is a top view of a mask plate provided by Embodiment 1 of the present invention;
图2为图1所示的掩膜板与显示面板进行对位时的示意图；FIG. 2 is a schematic diagram of alignment between the mask plate shown in FIG. 1 and the display panel;
图3为掩膜板中的对位标识与显示面板中的对位图像进行匹配的示意图；Fig. 3 is a schematic diagram of matching the alignment mark in the mask plate with the alignment image in the display panel;
图4为本发明实施例二提供的一种掩膜板的制备方法的流程图；FIG. 4 is a flow chart of a method for preparing a mask provided in Embodiment 2 of the present invention;
图5为本发明实施例二提供的又一种掩膜板的制备方法的流程图。FIG. 5 is a flow chart of another method for preparing a mask plate provided by Embodiment 2 of the present invention.
具体实施方式detailed description
为使本领域的技术人员更好地理解本发明的技术方案，下面结合附图对本发明提供的掩膜板及其制备方法和显示面板中封框胶的固化方法进行详细描述。In order for those skilled in the art to better understand the technical solution of the present invention, the mask plate provided by the present invention, its preparation method and the curing method of the sealant in the display panel will be described in detail below with reference to the accompanying drawings.
为实现上述目的，图1为本发明实施例一提供的掩膜板的俯视图，图2为图1所示的掩膜板与显示面板进行对位时的示意图，图3为掩膜板中的对位标识与显示面板中的对位图像进行匹配的示意图，如图1至图3所示，该掩膜板4用于在对显示面板8中的封框胶5进行紫外固化处理时进行掩膜，该掩膜板4包括：透明基板1和位于透明基板1上的对位标识2，对位标识2用于将掩膜板4与待紫外固化处理的显示面板8进行对位，对位标识2的材料为感光树脂。To achieve the above purpose, FIG. 1 is a top view of the mask provided by Embodiment 1 of the present invention, FIG. 2 is a schematic diagram of the alignment between the mask shown in FIG. 1 and the display panel, and FIG. 3 is the mask in the mask. A schematic diagram of matching the alignment mark with the alignment image in the display panel, as shown in FIGS. film, the mask plate 4 includes: a transparent substrate 1 and an alignment mark 2 located on the transparent substrate 1, and the alignment mark 2 is used to align the mask plate 4 with the display panel 8 to be treated by ultraviolet curing. The material marked 2 is photosensitive resin.
需要说明的是，由于感光树脂可直接与光进行光交联反应或光分解反应或光聚合反应，因此感光树脂可用于制备光刻胶。在本实施例中，在制备该由感光树脂构成的对位标识2时，仅需经过感光树脂薄膜涂覆工序(可等效于光刻胶涂覆工序)、曝光工序和显影工序即可完成对位标识2的制备。因此，与现有技术中制备掩膜板4中的对位标识2时至少需要经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光工序、显影工序、刻蚀工序以及光刻胶剥离工序相比，在制备本实施例提供的掩膜板4中的对位标识2时，可省去金属材料薄膜沉积工序、刻蚀工序和光刻胶剥离工序，即本实施例提供的技术方案可使得制备对位标识2过程中所需要的工序数量减少，简化制作掩膜板的工艺流程，节省成本。It should be noted that since the photosensitive resin can directly undergo photocrosslinking reaction, photolysis reaction or photopolymerization reaction with light, the photosensitive resin can be used to prepare photoresist. In this embodiment, when preparing the alignment mark 2 made of photosensitive resin, it only needs to go through the photosensitive resin film coating process (which can be equivalent to the photoresist coating process), exposure process and development process. Preparation of para-identification 2. Therefore, when preparing the alignment mark 2 in the mask plate 4 in the prior art, at least a metal material film deposition process, a photoresist coating process, an exposure process, a development process, an etching process and a photoresist stripping process are required. In comparison, when preparing the alignment mark 2 in the mask plate 4 provided by this embodiment, the metal material film deposition process, etching process and photoresist stripping process can be omitted, that is, the technical solution provided by this embodiment can This reduces the number of processes required in the process of preparing the alignment mark 2 , simplifies the process flow for manufacturing the mask plate, and saves costs.
可选地，本实施例中感光树脂的光透过率小于或等于80％，此时可保证生产人员能容易且清楚地观察到掩膜板4中对位标识2，从而可确保掩膜板4与显示面板8能快速且准确的进行对位。Optionally, the light transmittance of the photosensitive resin in this embodiment is less than or equal to 80%. At this time, it can be ensured that the production personnel can easily and clearly observe the alignment mark 2 in the mask plate 4, thereby ensuring that the mask plate 4 and the display panel 8 can be aligned quickly and accurately.
可选地，该对位标识2设置于透明基板1的周边区域。由于显示面板8上的对位图案6往往是设置于显示面板8的周边区域，为便于掩膜板4中的对位标识2与显示面板8中的对位图案6进行匹配，可将掩膜板4中的对位标识2对应设置在透明基板1的周边区域。参见图3，掩膜板4中的对位标识2为框形，显示面板8中的对位图案6为圆形的情况为例进行说明，当呈现框形的对位标识2的中心点与呈现圆形的对位图案6的中心点重合时，即说明对位标识2与对位图案6匹配完成，相应地，掩膜板4与显示面板8对位完成。Optionally, the alignment mark 2 is disposed on the peripheral area of the transparent substrate 1 . Since the alignment pattern 6 on the display panel 8 is often arranged in the peripheral area of the display panel 8, in order to match the alignment mark 2 in the mask plate 4 with the alignment pattern 6 in the display panel 8, the mask can be The alignment mark 2 in the plate 4 is correspondingly arranged on the peripheral area of the transparent substrate 1 . Referring to FIG. 3 , the case where the alignment mark 2 in the mask plate 4 is frame-shaped and the alignment pattern 6 in the display panel 8 is a circle is described as an example. When the center point of the frame-shaped alignment mark 2 and When the center points of the circular alignment pattern 6 coincide, it means that the alignment mark 2 is matched with the alignment pattern 6 , and correspondingly, the alignment between the mask plate 4 and the display panel 8 is completed.
需要说明的是，掩膜板4中的对位标识2为框形，显示面板8中的对位图案6为圆形的情况仅起到示例性作用，这并不会对本申请的技术方案产生限制，本实施例中的对位标识2以及对位图案6还可以为其他形状，此处不再一一列举。It should be noted that the alignment mark 2 in the mask plate 4 is frame-shaped, and the alignment pattern 6 in the display panel 8 is a circle. As a limitation, the alignment mark 2 and the alignment pattern 6 in this embodiment may also have other shapes, which will not be listed here.
可选地，还包括：设置于透明基板1上且与显示面板8上的显示区域7对应的多个矩形遮光图形3，该矩形遮光图形3位于透明基板1的中间区域，该矩形遮光图形3的材料为遮光材料。在本实施例中，该矩形遮光图形3用于在紫外固化处理过程中遮挡射向显示面板8的显示区域7的紫外光，从而避免紫外光线对显示区域7内部件造成损坏，为此该矩形遮光图形3必须严格的确保不透光。本实施例中，该遮光材料具体为金属材料，从而可有效的保证矩形遮光图形3不透光。Optionally, it also includes: a plurality of rectangular light-shielding patterns 3 arranged on the transparent substrate 1 and corresponding to the display area 7 on the display panel 8, the rectangular light-shielding patterns 3 are located in the middle area of the transparent substrate 1, and the rectangular light-shielding patterns 3 The material is shading material. In this embodiment, the rectangular light-shielding pattern 3 is used to block the ultraviolet light directed to the display area 7 of the display panel 8 during the ultraviolet curing process, so as to prevent the ultraviolet light from damaging the internal components of the display area 7. For this reason, the rectangular The light-shielding pattern 3 must strictly ensure light-tightness. In this embodiment, the light-shielding material is specifically a metal material, so as to effectively ensure that the rectangular light-shielding pattern 3 does not transmit light.
本发明实施例还提供一种掩膜板的制备方法，用以制备上述实施例一中的掩膜板。图4为本发明实施例二提供的一种掩膜板的制备方法的流程图，如图4所示，该掩膜板的制备方法包括：An embodiment of the present invention also provides a method for preparing a mask, which is used to prepare the mask in the first embodiment above. FIG. 4 is a flow chart of a method for preparing a mask provided in Embodiment 2 of the present invention. As shown in FIG. 4 , the method for preparing the mask includes:
步骤S1：在透明基板上形成对位标识，对位标识用于将掩膜板与待紫外固化处理的显示面板进行对位，对位标识的材料为感光树脂。Step S1: forming an alignment mark on the transparent substrate, the alignment mark is used to align the mask plate with the display panel to be treated by ultraviolet curing, and the material of the alignment mark is photosensitive resin.
在步骤S1中，具体包括：In step S1, specifically include:
步骤S11：在透明基板的上方形成感光树脂薄膜；Step S11: forming a photosensitive resin film on the transparent substrate;
步骤S12:利用相应的掩膜基板对感光树脂薄膜进行曝光处理；Step S12: using a corresponding mask substrate to expose the photosensitive resin film;
步骤S13:对曝光处理后的感光树脂薄膜进行显影处理得到对位标识的图形。Step S13: Developing the photosensitive resin film after the exposure treatment to obtain the pattern of the alignment mark.
需要说明的是，本实施例中该感光树脂薄膜可以为光交联型感光树脂薄膜或光分解型感光树脂薄膜或光聚合型感光树脂薄膜。It should be noted that, in this embodiment, the photosensitive resin film may be a photocrosslinkable photosensitive resin film, a photodecomposable photosensitive resin film, or a photopolymerizable photosensitive resin film.
当该感光树脂为光交联型感光树脂时，上述步骤S11～步骤13可具体对应为下述步骤101～步骤103。When the photosensitive resin is a photo-crosslinkable photosensitive resin, the above steps S11 to 13 may specifically correspond to the following steps 101 to 103 .
步骤101：在透明基板的上方形成光交联型感光树脂薄膜。Step 101: forming a photo-crosslinkable photosensitive resin film on the transparent substrate.
在步骤101中，可采用涂覆方式以在透明基板的上方形成光交联型感光树脂薄膜。In step 101, a coating method may be used to form a photo-crosslinkable photosensitive resin film on the transparent substrate.
步骤102：利用第一掩膜基板对光交联型感光树脂薄膜进行曝光处理，第一掩膜基板包括：第一遮光区域和第一透光区域，第一透光区域与光交联型感光树脂薄膜上待形成对位标识的区域对应。Step 102: Use the first mask substrate to expose the photo-crosslinkable photosensitive resin film. The first mask substrate includes: a first light-shielding region and a first light-transmitting region, the first light-transmitting region and the photo-crosslinking photosensitive resin film Corresponds to the area on the resin film where the alignment mark is to be formed.
在步骤102中，利用曝光装置和第一掩膜基板对光交联型感光树脂薄膜进行曝光处理，此时光交联型感光树脂薄膜上待形成对位标识的区域被光线照射，并发生光交联反应，从而使得光交联型感光树脂薄膜上对应待形成对位标识的区域具有抗腐蚀性。In step 102, the photocrosslinkable photosensitive resin film is exposed to light by using the exposure device and the first mask substrate. Linkage reaction, so that the area on the photo-crosslinking photosensitive resin film corresponding to the alignment mark is corrosion-resistant.
步骤103：对曝光处理后的光交联型感光树脂薄膜进行显影处理得到对位标识的图形。Step 103: Developing the photo-crosslinked photosensitive resin film after the exposure treatment to obtain the pattern of the alignment mark.
在步骤103中，通过相应的显影液对曝光处理后的光交联型感光树脂薄膜进行显影处理，此时该光交联型感光树脂薄膜上对应待形成对位标识的区域得到保留，即形成对位标识。In step 103, the photo-crosslinked photosensitive resin film after the exposure treatment is developed with a corresponding developing solution. At this time, the area corresponding to the alignment mark to be formed on the photo-crosslinked photosensitive resin film is retained, that is, a Counterpoint identification.
当感光数字为光聚合型感光树脂时，形成由光聚合型感光树脂构成的对位标识的过程，与上述形成由光交联型感光树脂构成的对位标识的过程类似，具体过程可参见上述步骤101～步骤103的描述，此处不再赘述。When the photosensitive numerals are photopolymerizable photosensitive resin, the process of forming the alignment mark composed of photopolymerizable photosensitive resin is similar to the above-mentioned process of forming the alignment mark composed of photocrosslinkable photosensitive resin. For the specific process, please refer to the above The description of steps 101 to 103 will not be repeated here.
当感光树脂为光分解型感光树脂，上述步骤S11～步骤13可具体对应为下述步骤201～步骤203。When the photosensitive resin is a photodecomposable photosensitive resin, the above steps S11 to 13 may specifically correspond to the following steps 201 to 203 .
步骤201：在透明基板的上方形成光分解型感光树脂薄膜。Step 201: forming a photodecomposable photosensitive resin film on the transparent substrate.
在步骤201中，可采用涂覆的方式以在透明基板的上方形成光分解型感光树脂薄膜。In step 201, a coating method may be used to form a photodecomposable photosensitive resin film on the transparent substrate.
步骤202：利用第二掩膜基板对光分解型感光树脂薄膜进行曝光处理，第二掩膜基板包括：第二遮光区域和第二透光区域，第二遮光区域与光分解型感光树脂薄膜上待形成对位标识的区域对应。Step 202: Exposing the photodecomposable photosensitive resin film by using the second mask substrate. The second mask substrate includes: a second light-shielding area and a second light-transmitting area. The area corresponding to the alignment mark to be formed.
在步骤202中，利用曝光装置和第二掩膜基板对光分解型感光树脂薄膜进行曝光处理，此时光分解型感光树脂薄膜上待形成对位标识的区域未被光线照射，光分解型感光树脂薄膜上的其他区域被光线照射并发生光分解反应，从而使得光分解型感光树脂薄膜上的其他区域具有可溶性。In step 202, the photodecomposable photosensitive resin film is subjected to exposure treatment by using the exposure device and the second mask substrate. Other areas on the film are irradiated by light and undergo a photodecomposition reaction, thereby making other areas on the photodecomposable photosensitive resin film soluble.
步骤203：对曝光处理后的光分解型感光树脂薄膜进行显影处理得到对位标识的图形。Step 203: Developing the photodegradable photosensitive resin film after the exposure treatment to obtain the pattern of the alignment mark.
在步骤203中，通过相应的显影液对曝光处理后的光分解型感光树脂薄膜进行显影处理，此时该光分解型感光树脂薄膜上对应待形成对位标识的区域得到保留，而其他区域被去除，即形成对位标识。In step 203, the photodegradable photosensitive resin film after the exposure treatment is developed with a corresponding developing solution. At this time, the area corresponding to the alignment mark to be formed on the photodegradable photosensitive resin film is retained, while other areas are removed. Removed, that is to form the alignment mark.
通过上述步骤101～步骤103或步骤201～步骤203可见，在制备该由感光树脂构成的对位标识时，仅需经过感光树脂薄膜沉积工序(可等效于光刻胶涂覆工序)、曝光工序和显影工序即可完成对位标识的制备。与现有技术相比，本实施例的技术方案可省去金属材料沉积工序、刻蚀工序和光刻胶剥离工序，即本实施例提供的技术方案可使得制备对位标识过程中所需要的工序数量减少，简化制作掩膜板的工艺流程，节省成本。It can be seen from the above steps 101 to 103 or steps 201 to 203 that when preparing the alignment mark made of photosensitive resin, it is only necessary to go through the photosensitive resin film deposition process (which can be equivalent to the photoresist coating process), exposure process and developing process to complete the preparation of the alignment mark. Compared with the prior art, the technical solution of this embodiment can save the metal material deposition process, etching process and photoresist stripping process, that is, the technical solution provided by this embodiment can make the process of preparing the alignment mark The number of processes is reduced, the process flow of making the mask plate is simplified, and the cost is saved.
作为本实施例提供的又一种可选方案，图5为本发明实施例二提供的又一种掩膜板的制备方法的流程图，如图5所示，在步骤S1之后还包括：As another optional solution provided in this embodiment, FIG. 5 is a flow chart of another method for preparing a mask plate provided in Embodiment 2 of the present invention. As shown in FIG. 5 , after step S1, it also includes:
步骤S2：在透明基板上形成与显示面板上的显示区域对应的多个矩形遮光图形，矩形遮光图形的材料为金属材料。Step S2: forming a plurality of rectangular light-shielding patterns corresponding to the display areas on the display panel on the transparent substrate, and the material of the rectangular light-shielding patterns is metal material.
具体地，在步骤S2中，经过金属材料薄膜沉积工序、光刻胶涂覆工序、曝光(掩膜)工序、显影工序、刻蚀工序以及光刻胶剥离工序可得到对应的矩形遮光图形3。Specifically, in step S2, the corresponding rectangular light-shielding pattern 3 can be obtained through metal material film deposition process, photoresist coating process, exposure (mask) process, development process, etching process and photoresist stripping process.
需要说明的是，上述步骤S2也可在步骤S1之前执行，具体情况此处不再描述。It should be noted that the above step S2 may also be performed before step S1, and the specific situation will not be described here.
本发明实施例三还提供一种显示面板中封框胶的固化方法，具体地，在对封框胶进行紫外固化处理时采用上述实施例一提供的掩膜板进行掩膜。Embodiment 3 of the present invention also provides a method for curing a frame sealant in a display panel. Specifically, the mask plate provided in Embodiment 1 above is used for masking when the frame sealant is subjected to ultraviolet curing treatment.
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。It can be understood that, the above embodiments are only exemplary embodiments adopted for illustrating the principle of the present invention, but the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also regarded as the protection scope of the present invention.
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| CN112873355B (en) * | 2020-12-24 | 2023-09-08 | 烟台正海科技股份有限公司 | Touch screen OCA laminating alignment target design method |
| CN112992662A (en) * | 2021-02-26 | 2021-06-18 | 武汉京东方光电科技有限公司 | Display substrate, manufacturing method thereof and display device |
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| WO2016112636A1 (en) | 2016-07-21 |
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