CA979711A - Light-sensitive copying composition and etch-resistant reproduction material employing the same - Google Patents

Light-sensitive copying composition and etch-resistant reproduction material employing the same

Info

Publication number: CA979711A
Authority: CA; Canada
Prior art keywords: etch; light; same; sensitive copying; material employing
Prior art date: 1970-04-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA110,659A

Other languages

English (en)

Other versions

CA110659S (en

Inventor

Hans Ruckert

Hartmut Steppan

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hoechst AG

Original Assignee

Hoechst AG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1970-04-22

Filing date

1971-04-19

Publication date

1975-12-16

1971-04-19 Application filed by Hoechst AG filed Critical Hoechst AG

1975-12-16 Application granted granted Critical

1975-12-16 Publication of CA979711A publication Critical patent/CA979711A/en

Status Expired legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

CA110,659A 1970-04-22 1971-04-19 Light-sensitive copying composition and etch-resistant reproduction material employing the same Expired CA979711A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE2019426A DE2019426C3 (de)	1970-04-22	1970-04-22	Lichtempfindliches Gemisch und lichtempfindliches Kopiermaterial

Publications (1)

Publication Number	Publication Date
CA979711A true CA979711A (en)	1975-12-16

Family

ID=5768839

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA110,659A Expired CA979711A (en)	1970-04-22	1971-04-19	Light-sensitive copying composition and etch-resistant reproduction material employing the same

Country Status (9)

Country	Link
AU (1)	AU2797371A (de)
BE (1)	BE765966A (de)
BR (1)	BR7102385D0 (de)
CA (1)	CA979711A (de)
DE (1)	DE2019426C3 (de)
FR (1)	FR2090544A5 (de)
GB (1)	GB1352411A (de)
NL (1)	NL7104769A (de)
ZA (1)	ZA712565B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2655553A1 (de) *	1976-12-08	1978-06-15	Licentia Gmbh	Mittels einer diazoniumverbindung sensibilisierte waesserige loesung eines polymerisates sowie verwendung einer solchen loesung zur herstellung von leuchtschirmen fuer farbbildkathodenstrahlroehren
EP0058981B1 (de) *	1981-02-25	1986-01-22	Hitachi, Ltd.	Farblose Flüssigkristallinverbindungen
DE3130987A1 (de) *	1981-08-05	1983-02-24	Hoechst Ag, 6000 Frankfurt	Verfahren zur herstellung von flachdruckformen aus einem lichtempfindlichen material auf basis von diazoniumsalz-polykondensationsprodukten
US4511640A (en) *	1983-08-25	1985-04-16	American Hoechst Corporation	Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
DE3404366A1 (de) *	1984-02-08	1985-08-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US4707437A (en) *	1985-08-02	1987-11-17	Hoechst Celanese Corporation	Radiation-polymerizable composition and element containing a photopolymer composition
US4652604A (en) *	1985-08-02	1987-03-24	American Hoechst Corporation	Radiation-polymerizable composition and element containing a photopolymer composition
US4772538A (en) *	1985-08-02	1988-09-20	American Hoechst Corporation	Water developable lithographic composition
US4780392A (en) *	1985-08-02	1988-10-25	Hoechst Celanese Corporation	Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4822720A (en) *	1985-08-02	1989-04-18	Hoechst Celanese Corporation	Water developable screen printing composition

1970
- 1970-04-22 DE DE2019426A patent/DE2019426C3/de not_active Expired
1971
- 1971-04-08 NL NL7104769A patent/NL7104769A/xx unknown
- 1971-04-19 CA CA110,659A patent/CA979711A/en not_active Expired
- 1971-04-19 BE BE765966A patent/BE765966A/xx unknown
- 1971-04-20 GB GB1016071*[A patent/GB1352411A/en not_active Expired
- 1971-04-21 ZA ZA712565A patent/ZA712565B/xx unknown
- 1971-04-21 AU AU27973/71A patent/AU2797371A/en not_active Expired
- 1971-04-22 FR FR7114302A patent/FR2090544A5/fr not_active Expired
- 1971-04-22 BR BR2385/71A patent/BR7102385D0/pt unknown

Also Published As

Publication number	Publication date
DE2019426C3 (de)	1981-01-29
ZA712565B (en)	1972-01-26
BR7102385D0 (pt)	1973-04-05
BE765966A (fr)	1971-10-19
FR2090544A5 (de)	1972-01-14
NL7104769A (de)	1971-10-26
GB1352411A (en)	1974-05-08
DE2019426A1 (de)	1971-11-11
DE2019426B2 (de)	1980-05-14
AU2797371A (en)	1972-10-26

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