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CA870006A - Energy-sensitive systems - Google Patents

Energy-sensitive systems

Info

Publication number
CA870006A
CA870006A CA870006A CA870006DA CA870006A CA 870006 A CA870006 A CA 870006A CA 870006 A CA870006 A CA 870006A CA 870006D A CA870006D A CA 870006DA CA 870006 A CA870006 A CA 870006A
Authority
CA
Canada
Prior art keywords
energy
sensitive systems
sensitive
systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA870006A
Inventor
W. Heseltine Donald
D. Mee John
W. Jenkins Philip
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Publication date
Application granted granted Critical
Publication of CA870006A publication Critical patent/CA870006A/en
Expired legal-status Critical Current

Links

CA870006A Energy-sensitive systems Expired CA870006A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA870006T

Publications (1)

Publication Number Publication Date
CA870006A true CA870006A (en) 1971-05-04

Family

ID=36356051

Family Applications (1)

Application Number Title Priority Date Filing Date
CA870006A Expired CA870006A (en) Energy-sensitive systems

Country Status (1)

Country Link
CA (1) CA870006A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4886735A (en) * 1987-05-21 1989-12-12 Basf Aktiengesellschaft Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4886735A (en) * 1987-05-21 1989-12-12 Basf Aktiengesellschaft Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon

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