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CA868514A - Cosputtered film and process - Google Patents

Cosputtered film and process

Info

Publication number
CA868514A
CA868514A CA868514A CA868514DA CA868514A CA 868514 A CA868514 A CA 868514A CA 868514 A CA868514 A CA 868514A CA 868514D A CA868514D A CA 868514DA CA 868514 A CA868514 A CA 868514A
Authority
CA
Canada
Prior art keywords
cosputtered
film
cosputtered film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA868514A
Inventor
C. Miller Norman
A. Shirn George
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sprague Electric Co
Original Assignee
Sprague Electric Co
Publication date
Application granted granted Critical
Publication of CA868514A publication Critical patent/CA868514A/en
Expired legal-status Critical Current

Links

CA868514A Cosputtered film and process Expired CA868514A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA868514T

Publications (1)

Publication Number Publication Date
CA868514A true CA868514A (en) 1971-04-13

Family

ID=36354610

Family Applications (1)

Application Number Title Priority Date Filing Date
CA868514A Expired CA868514A (en) Cosputtered film and process

Country Status (1)

Country Link
CA (1) CA868514A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4170662A (en) 1974-11-05 1979-10-09 Eastman Kodak Company Plasma plating
US4424101A (en) 1980-11-06 1984-01-03 The Perkin-Elmer Corp. Method of depositing doped refractory metal silicides using DC magnetron/RF diode mode co-sputtering techniques
US4735698A (en) * 1986-04-11 1988-04-05 Fuji Photo Film Co., Ltd. Method of making magneto-optical recording medium
EP0801144A1 (en) * 1996-04-12 1997-10-15 Hauzer Holding B.V. Element with a wear resistant layer, and process for the manufacture of such an element

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4170662A (en) 1974-11-05 1979-10-09 Eastman Kodak Company Plasma plating
US4424101A (en) 1980-11-06 1984-01-03 The Perkin-Elmer Corp. Method of depositing doped refractory metal silicides using DC magnetron/RF diode mode co-sputtering techniques
US4735698A (en) * 1986-04-11 1988-04-05 Fuji Photo Film Co., Ltd. Method of making magneto-optical recording medium
EP0801144A1 (en) * 1996-04-12 1997-10-15 Hauzer Holding B.V. Element with a wear resistant layer, and process for the manufacture of such an element

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