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BR9814578A - Aparelho para realizar deposição quìmica de vapor do plasma, e, processos para fabricar uma fibra ótica, para fabricar uma haste de preforma de fibra ótica e para fabricar um tubo de revestimento para uma preforma de fibra ótica - Google Patents

Aparelho para realizar deposição quìmica de vapor do plasma, e, processos para fabricar uma fibra ótica, para fabricar uma haste de preforma de fibra ótica e para fabricar um tubo de revestimento para uma preforma de fibra ótica

Info

Publication number
BR9814578A
BR9814578A BR9814578-9A BR9814578A BR9814578A BR 9814578 A BR9814578 A BR 9814578A BR 9814578 A BR9814578 A BR 9814578A BR 9814578 A BR9814578 A BR 9814578A
Authority
BR
Brazil
Prior art keywords
optical fiber
making
fiber preform
vapor deposition
manufacturing
Prior art date
Application number
BR9814578-9A
Other languages
English (en)
Inventor
Antonius Henricus Elisa Breuls
Mattheus Jacobus Nicol Stralen
Andries Heero Van Bergen
Original Assignee
Plasma Optical Fibre Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Optical Fibre Bv filed Critical Plasma Optical Fibre Bv
Publication of BR9814578A publication Critical patent/BR9814578A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)

Abstract

"APARELHO PARA REALIZAR DEPOSIçãO QUìMICA DE VAPOR DO PLASMA, E, PROCESSOS PARA FABRICAR UMA FIBRA óTICA, PARA FABRICAR UMA HASTE DE PREFORMA DE FIBRA óTICA E PARA FABRICAR UM TUBO DE REVESTIMENTO PARA UMA PREFORMA DE FIBRA óTICA". A invenção é relativa a um aparelho para realizar deposição química de vapor do plasma (PCVD), pelo que uma ou mais camadas de sílica podem ser depositadas sobre um substrato vítreo alongado, o aparelho compreendendo uma guia de microonda alongada que emerge no interior de uma cavidade ressonante, a qual é substancialmente simétrica cilindricamente ao redor de um eixo cilíndrico, ao longo de cujo eixo o substrato pode ser posicionado, em cujo aparelho: a cavidade é substancialmente anular em forma, com uma parede cilíndrica interna e uma parede cilíndrica externa; a parede cilíndrica interna compreende uma fenda que se estende em um circulo completo ao redor do eixo cilíndrico; a guia tem um eixo longitudinal que é substancialmente perpendicular ao eixo cilíndrico e que não intercepta a fenda. A invenção também é relativa a um processo para fabricar uma fibra ótica, uma haste de preforma, e um tubo de revestimento que utiliza dito aparelho, bem como a fibra ótica assim obtida.
BR9814578-9A 1997-12-31 1998-12-02 Aparelho para realizar deposição quìmica de vapor do plasma, e, processos para fabricar uma fibra ótica, para fabricar uma haste de preforma de fibra ótica e para fabricar um tubo de revestimento para uma preforma de fibra ótica BR9814578A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP97204152 1997-12-31
PCT/EP1998/007798 WO1999035304A1 (en) 1997-12-31 1998-12-02 Pcvd apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith

Publications (1)

Publication Number Publication Date
BR9814578A true BR9814578A (pt) 2000-10-10

Family

ID=8229151

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9814578-9A BR9814578A (pt) 1997-12-31 1998-12-02 Aparelho para realizar deposição quìmica de vapor do plasma, e, processos para fabricar uma fibra ótica, para fabricar uma haste de preforma de fibra ótica e para fabricar um tubo de revestimento para uma preforma de fibra ótica

Country Status (9)

Country Link
US (2) US6260510B1 (pt)
EP (1) EP1060288B1 (pt)
JP (1) JP4326146B2 (pt)
CN (1) CN1117176C (pt)
AT (1) ATE234947T1 (pt)
AU (1) AU1563699A (pt)
BR (1) BR9814578A (pt)
DE (1) DE69812434T2 (pt)
WO (1) WO1999035304A1 (pt)

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US6715441B2 (en) * 1997-12-31 2004-04-06 Plasma Optical Fibre B.V. PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith
JP4610126B2 (ja) 2001-06-14 2011-01-12 株式会社神戸製鋼所 プラズマｃｖｄ装置
NL1019371C2 (nl) * 2001-11-15 2003-05-16 Draka Fibre Technology Bv Werkwijze voor het bereiden van zeer zuiver siliciumchloride en/of germaniumchloride.
US7650853B2 (en) 2001-12-04 2010-01-26 Draka Fibre Technology B.V. Device for applying electromagnetic microwave radiation in a plasma cavity
NL1020358C2 (nl) * 2002-04-10 2003-10-13 Draka Fibre Technology Bv Werkwijze en inrichting ter vervaardiging van optische voorvormen, alsmede de daarmee verkregen optische vezels.
NL1022140C2 (nl) * 2002-12-11 2004-06-15 Draka Fibre Technology Bv Werkwijze voor de depositie van een of meer glaslagen met laag hydroxylgehalte op het inwendige van een substraatbuis.
NL1024015C2 (nl) * 2003-07-28 2005-02-01 Draka Fibre Technology Bv Multimode optische vezel voorzien van een brekingsindexprofiel, optisch communicatiesysteem onder toepassing daarvan en werkwijze ter vervaardiging van een dergelijke vezel.
NL1024480C2 (nl) 2003-10-08 2005-04-11 Draka Fibre Technology Bv Werkwijze ter vervaardiging van een voorvorm voor optische vezels, alsmede werkwijze ter vervaardiging van optische vezels.
NL1025155C2 (nl) * 2003-12-30 2005-07-04 Draka Fibre Technology Bv Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm.
CN1333489C (zh) * 2005-03-23 2007-08-22 长飞光纤光缆有限公司 等离子体谐振腔可调谐波导装置
NL1032015C2 (nl) * 2006-06-16 2008-01-08 Draka Comteq Bv Inrichting voor het uitvoeren van een plasma chemische dampdepositie (PCVD) en werkwijze ter vervaardiging van een optische vezel.
NL1032867C2 (nl) * 2006-11-14 2008-05-15 Draka Comteq Bv Inrichting en een werkwijze voor het uitvoeren van een depositieproces van het type PCVD.
NL1033783C2 (nl) 2007-05-01 2008-11-06 Draka Comteq Bv Inrichting voor het uitvoeren van een plasma chemische dampdepositie alsmede werkwijze ter vervaardiging van een optische voorvorm.
CN101182113B (zh) * 2007-11-20 2011-02-09 长飞光纤光缆有限公司 大直径光纤芯棒的pcvd制作方法
NL2004874C2 (nl) 2010-06-11 2011-12-19 Draka Comteq Bv Werkwijze voor het vervaardigen van een primaire voorvorm.
CN102263000B (zh) * 2011-06-24 2013-05-15 长飞光纤光缆有限公司 一种等离子体微波谐振腔
JP5828232B2 (ja) * 2011-06-29 2015-12-02 住友電気工業株式会社 ガラス母材用加熱炉
NL2007809C2 (en) * 2011-11-17 2013-05-21 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
NL2007831C2 (en) 2011-11-21 2013-05-23 Draka Comteq Bv Apparatus and method for carrying out a pcvd deposition process.
NL2007968C2 (en) * 2011-12-14 2013-06-17 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
US9002162B2 (en) 2013-03-15 2015-04-07 Ofs Fitel, Llc Large core multimode optical fibers
NL2010724C2 (en) 2013-04-26 2014-10-29 Draka Comteq Bv A pcvd method for manufacturing a primary preform for optical fibers.
NL2011077C2 (en) * 2013-07-01 2015-01-05 Draka Comteq Bv A method for manufacturing a precursor for a primary preform for optical fibres by means of an internal plasma chemical vapour deposition (pcvd) process.
NL2011075C2 (en) * 2013-07-01 2015-01-05 Draka Comteq Bv Pcvd process with removal of substrate tube.
NL2012857B1 (en) 2014-05-22 2016-03-07 Draka Comteq Bv Apparatus and method for carrying out a plasma deposition process.
NL2014519B1 (en) 2015-03-25 2017-01-25 Draka Comteq Bv A rotary feed-through for mounting a rotating substrate tube in a lathe, a CVD lathe and a corresponding method using the CVD lathe.
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CN111056740B (zh) * 2020-01-13 2023-09-12 成都翱翔拓创光电科技合伙企业(有限合伙) 一种pcvd法制备有源光纤预制棒的装置和方法

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Also Published As

Publication number Publication date
EP1060288A1 (en) 2000-12-20
JP2002500280A (ja) 2002-01-08
US20020002949A1 (en) 2002-01-10
EP1060288B1 (en) 2003-03-19
WO1999035304A1 (en) 1999-07-15
DE69812434D1 (de) 2003-04-24
CN1117176C (zh) 2003-08-06
US6260510B1 (en) 2001-07-17
AU1563699A (en) 1999-07-26
ATE234947T1 (de) 2003-04-15
CN1285008A (zh) 2001-02-21
JP4326146B2 (ja) 2009-09-02
DE69812434T2 (de) 2004-01-15
US6372305B2 (en) 2002-04-16

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Legal Events

Date Code Title Description
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]
B25A Requested transfer of rights approved

Owner name: DRAKA COMTEQ, B.V. (NL)

B21A Patent or certificate of addition expired [chapter 21.1 patent gazette]

Free format text: PATENTE EXTINTA EM 02.12.2018