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BR9710719A - Dispositivo gerador de plasma e m-todo para prover um revestimento resistente - abrasÆo - Google Patents

Dispositivo gerador de plasma e m-todo para prover um revestimento resistente - abrasÆo

Info

Publication number
BR9710719A
BR9710719A BR9710719A BR9710719A BR9710719A BR 9710719 A BR9710719 A BR 9710719A BR 9710719 A BR9710719 A BR 9710719A BR 9710719 A BR9710719 A BR 9710719A BR 9710719 A BR9710719 A BR 9710719A
Authority
BR
Brazil
Prior art keywords
abrasion
generating device
resistant coating
plasma generating
plasma
Prior art date
Application number
BR9710719A
Other languages
English (en)
Inventor
Feng Ing Hu
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of BR9710719A publication Critical patent/BR9710719A/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
BR9710719A 1996-07-30 1997-07-28 Dispositivo gerador de plasma e m-todo para prover um revestimento resistente - abrasÆo BR9710719A (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US68845496A 1996-07-30 1996-07-30
US08/898,158 US5993598A (en) 1996-07-30 1997-07-22 Magnetron
PCT/US1997/013473 WO1998005057A1 (en) 1996-07-30 1997-07-28 Magnetron

Publications (1)

Publication Number Publication Date
BR9710719A true BR9710719A (pt) 1999-08-17

Family

ID=27104231

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9710719A BR9710719A (pt) 1996-07-30 1997-07-28 Dispositivo gerador de plasma e m-todo para prover um revestimento resistente - abrasÆo

Country Status (9)

Country Link
US (1) US5993598A (pt)
EP (1) EP0919066B1 (pt)
JP (1) JP2002505792A (pt)
KR (1) KR100454318B1 (pt)
CN (1) CN1106670C (pt)
AU (1) AU3902397A (pt)
BR (1) BR9710719A (pt)
DE (1) DE69718328T2 (pt)
WO (1) WO1998005057A1 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1142577C (zh) 1997-10-01 2004-03-17 陶氏化学公司 用于磁控管等离子体产生装置的双面簇射头电极
GB2332087A (en) * 1997-12-02 1999-06-09 Superion Ltd Apparatus and method relating to ion beams and gaseous plasma
JP2003535939A (ja) * 2000-06-06 2003-12-02 ザ ダウ ケミカル カンパニー ポリマー及び容器用の透過バリヤー層
JP2006507197A (ja) * 2002-11-12 2006-03-02 ダウ グローバル テクノロジーズ インコーポレイティド 容器にプラズマ被覆を付着させる方法及び装置
US7513953B1 (en) 2003-11-25 2009-04-07 Nano Scale Surface Systems, Inc. Continuous system for depositing films onto plastic bottles and method
CN103108482B (zh) * 2013-01-11 2015-08-05 哈尔滨工业大学 一种等离子体射流密度大范围调节器
JP2018028109A (ja) * 2014-12-22 2018-02-22 旭硝子株式会社 プラズマｃｖｄ装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL50072C (pt) * 1935-12-28
US4013532A (en) * 1975-03-03 1977-03-22 Airco, Inc. Method for coating a substrate
HU179482B (en) * 1979-02-19 1982-10-28 Mikroelektronikai Valalat Penning pulverizel source
US4260647A (en) * 1979-06-13 1981-04-07 Rca Corporation Method of depositing an abrasive layer
JPS59179152A (ja) * 1983-03-31 1984-10-11 Agency Of Ind Science & Technol アモルファスシリコン半導体薄膜の製造方法
JPS60156547A (ja) * 1984-01-27 1985-08-16 Tokuyama Soda Co Ltd プラズマ処理方法
DE3521318A1 (de) * 1985-06-14 1986-12-18 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum behandeln, insbesondere zum beschichten, von substraten mittels einer plasmaentladung
DE3774098D1 (de) * 1986-12-29 1991-11-28 Sumitomo Metal Ind Plasmageraet.
DE3721373A1 (de) * 1987-06-29 1989-01-12 Leybold Ag Beschichtungsvorrichtung
JPH01302726A (ja) * 1988-02-10 1989-12-06 Japan Synthetic Rubber Co Ltd 反応性イオンエッチング装置
US5178743A (en) * 1989-06-15 1993-01-12 Microelectronics And Computer Technology Corporation Cylindrical magnetron sputtering system
JP3033104B2 (ja) * 1989-11-17 2000-04-17 ソニー株式会社 エッチング方法
US5298587A (en) * 1992-12-21 1994-03-29 The Dow Chemical Company Protective film for articles and method
EP0634778A1 (en) * 1993-07-12 1995-01-18 The Boc Group, Inc. Hollow cathode array
US5433786A (en) * 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
US5364666A (en) * 1993-09-23 1994-11-15 Becton, Dickinson And Company Process for barrier coating of plastic objects

Also Published As

Publication number Publication date
JP2002505792A (ja) 2002-02-19
CN1226339A (zh) 1999-08-18
US5993598A (en) 1999-11-30
DE69718328T2 (de) 2004-01-15
AU3902397A (en) 1998-02-20
EP0919066A1 (en) 1999-06-02
KR20000029621A (ko) 2000-05-25
DE69718328D1 (de) 2003-02-13
WO1998005057A1 (en) 1998-02-05
EP0919066B1 (en) 2003-01-08
CN1106670C (zh) 2003-04-23
KR100454318B1 (ko) 2004-10-26

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Legal Events

Date Code Title Description
FA10 Dismissal: dismissal - article 33 of industrial property law
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]