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BR9610069A - Disposição de vapor quìmico e formação de pó usando-se pulverização térmica com soluções de fluido quase super-crìticas e super-crìticas - Google Patents

Disposição de vapor quìmico e formação de pó usando-se pulverização térmica com soluções de fluido quase super-crìticas e super-crìticas

Info

Publication number
BR9610069A
BR9610069A BR9610069-9A BR9610069A BR9610069A BR 9610069 A BR9610069 A BR 9610069A BR 9610069 A BR9610069 A BR 9610069A BR 9610069 A BR9610069 A BR 9610069A
Authority
BR
Brazil
Prior art keywords
supercritical
flame
chemical vapor
plasma torch
environment
Prior art date
Application number
BR9610069-9A
Other languages
English (en)
Inventor
Andrew T Hunt
Helmut G Hornis
Original Assignee
Microcoating Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microcoating Technologies filed Critical Microcoating Technologies
Publication of BR9610069A publication Critical patent/BR9610069A/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/16Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/28Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from gaseous metal compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/34Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of sprayed or atomised solutions
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/02Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/08Flame spraying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2401/00Form of the coating product, e.g. solution, water dispersion, powders or the like
    • B05D2401/90Form of the coating product, e.g. solution, water dispersion, powders or the like at least one component of the composition being in supercritical state or close to supercritical state
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/54Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00Aeronautics or air transport
    • Y02T50/60Efficient propulsion technologies, e.g. for aircraft
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/256Heavy metal or aluminum or compound thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)

Abstract

Patente de Invenção para ''DEPOSIçãO DE VAPOR QUìMICO E FORMAçãO DE Pó USANDO-SE PULVERIZAçãO TéRMICA COM SOLUçõES DE FLUIDO QUASE SUPER-CRìTICAS E SUPER-CRìTICAS''. Um processo para deposição de vapor químico usando-se uma atomização ou vaporização muito fina de um líquido contendo reagente (T) ou fluido similar à líquido perto de sua temperatura super-crítica, onde a solução atomizada ou vaporizada resultante (N) é admitida em um maçarico de chama ou plasma (170), e um pó é formado, ou um revestimento é depositado em um substrato (190). A chama de combustão (170) pode ser estável de 10 torr à atmosferas múltiplas, e proporciona o ambiente energético em que o reagente contido no interior do fluido (T) pode ser reagido para formar o pó desejado ou material de revestimento sobre um substrato (190). O maçarico de plasma do mesmo modo produz o ambiente de energia requerido, mas diferente da chama, nenhum oxidador é necessário, de modo que material estável em somente pressões parciais de oxigênio muito baixas, pode ser formado. Usando-se ou o maçarico de plasma, ou a chama de combustão (170), os revestimentos podem ser depositados e pós formados na atmosfera aberta, sem a necessidade de uma câmara de reação, mas uma câmara pode ser usada para várias razões, incluindo processo de separação a partir do ambiente, e regulação de pressão.
BR9610069-9A 1995-08-04 1996-08-02 Disposição de vapor quìmico e formação de pó usando-se pulverização térmica com soluções de fluido quase super-crìticas e super-crìticas BR9610069A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US208495P 1995-08-04 1995-08-04
PCT/US1996/012647 WO1997005994A1 (en) 1995-08-04 1996-08-02 Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions

Publications (1)

Publication Number Publication Date
BR9610069A true BR9610069A (pt) 2000-05-09

Family

ID=21699191

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9610069-9A BR9610069A (pt) 1995-08-04 1996-08-02 Disposição de vapor quìmico e formação de pó usando-se pulverização térmica com soluções de fluido quase super-crìticas e super-crìticas

Country Status (9)

Country Link
US (5) US5997956A (pt)
EP (1) EP0848658B1 (pt)
JP (1) JP4047382B2 (pt)
KR (1) KR100479485B1 (pt)
AT (1) ATE342154T1 (pt)
BR (1) BR9610069A (pt)
DE (1) DE69636627T2 (pt)
PT (1) PT848658E (pt)
WO (1) WO1997005994A1 (pt)

Families Citing this family (138)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5783716A (en) * 1996-06-28 1998-07-21 Advanced Technology Materials, Inc. Platinum source compositions for chemical vapor deposition of platinum
KR100479485B1 (ko) * 1995-08-04 2005-09-07 마이크로코팅 테크놀로지, 인크. 근초임계및초임계유동용액의열적분무를이용한화학증착및분말형성
US6919054B2 (en) * 2002-04-10 2005-07-19 Neophotonics Corporation Reactant nozzles within flowing reactors
US6952504B2 (en) * 2001-12-21 2005-10-04 Neophotonics Corporation Three dimensional engineering of planar optical structures
US7384680B2 (en) 1997-07-21 2008-06-10 Nanogram Corporation Nanoparticle-based power coatings and corresponding structures
US7575784B1 (en) 2000-10-17 2009-08-18 Nanogram Corporation Coating formation by reactive deposition
US6788866B2 (en) 2001-08-17 2004-09-07 Nanogram Corporation Layer materials and planar optical devices
US6329899B1 (en) 1998-04-29 2001-12-11 Microcoating Technologies, Inc. Formation of thin film resistors
US6368665B1 (en) * 1998-04-29 2002-04-09 Microcoating Technologies, Inc. Apparatus and process for controlled atmosphere chemical vapor deposition
US6210592B1 (en) * 1998-04-29 2001-04-03 Morton International, Inc. Deposition of resistor materials directly on insulating substrates
US6214473B1 (en) * 1998-05-13 2001-04-10 Andrew Tye Hunt Corrosion-resistant multilayer coatings
US20040197493A1 (en) * 1998-09-30 2004-10-07 Optomec Design Company Apparatus, methods and precision spray processes for direct write and maskless mesoscale material deposition
US7938079B2 (en) 1998-09-30 2011-05-10 Optomec Design Company Annular aerosol jet deposition using an extended nozzle
US7108894B2 (en) 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US7045015B2 (en) 1998-09-30 2006-05-16 Optomec Design Company Apparatuses and method for maskless mesoscale material deposition
US7294366B2 (en) * 1998-09-30 2007-11-13 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition
US20050156991A1 (en) * 1998-09-30 2005-07-21 Optomec Design Company Maskless direct write of copper using an annular aerosol jet
US8110247B2 (en) 1998-09-30 2012-02-07 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
IL132834A (en) * 1998-11-23 2006-06-11 Micro Coating Technologies Production of capacitors with a thin layer
US6235351B1 (en) * 1999-01-22 2001-05-22 Northrop Grumman Corporation Method for producing a self decontaminating surface
US6372364B1 (en) 1999-08-18 2002-04-16 Microcoating Technologies, Inc. Nanostructure coatings
US6472632B1 (en) * 1999-09-15 2002-10-29 Nanoscale Engineering And Technology Corporation Method and apparatus for direct electrothermal-physical conversion of ceramic into nanopowder
BR0014185B1 (pt) 1999-09-22 2009-05-05 processos e dispositivos para atomização de lìquidos.
IL135550A0 (en) * 2000-04-09 2001-05-20 Acktar Ltd Method and apparatus for temperature controlled vapor deposition on a substrate
ES2269428T3 (es) * 2000-06-30 2007-04-01 Ngimat Co. Revestimientos de polimeros.
WO2002007966A1 (en) * 2000-07-14 2002-01-31 Microcoating Technologies, Inc. Reduced grain boundary crystalline thin films
WO2002011980A1 (en) * 2000-08-03 2002-02-14 Microcoating Technologies, Inc. Electronic and optical materials
US6652654B1 (en) * 2000-09-27 2003-11-25 Bechtel Bwxt Idaho, Llc System configured for applying multiple modifying agents to a substrate
US6623686B1 (en) * 2000-09-28 2003-09-23 Bechtel Bwxt Idaho, Llc System configured for applying a modifying agent to a non-equidimensional substrate
EP1333935A4 (en) * 2000-10-17 2008-04-02 Nanogram Corp PREPARATION OF A COAT BY REACTIVE DEPOSITION
EP1335829B1 (en) * 2000-10-26 2011-10-05 NeoPhotonics Corporation Multilayered optical structures
WO2002102903A2 (en) * 2000-11-27 2002-12-27 The Research Foundation Of State University Of New York Direct synthesis and deposition of luminescent films
US6472014B1 (en) 2001-04-17 2002-10-29 Novellus Systems, Inc. Uniform surface texturing for PVD/CVD hardware
US6994837B2 (en) * 2001-04-24 2006-02-07 Tekna Plasma Systems, Inc. Plasma synthesis of metal oxide nanopowder and apparatus therefor
TW586963B (en) * 2001-07-20 2004-05-11 Nektar Therapeutics Uk Ltd Method and apparatus for preparing target substance in particulate form and fluid inlet assembly for said apparatus
US6917511B1 (en) 2001-08-14 2005-07-12 Neophotonics Corporation Reactive deposition for the formation of chip capacitors
US7279137B2 (en) * 2001-08-30 2007-10-09 Tda Research, Inc. Burners and combustion apparatus for carbon nanomaterial production
US7442227B2 (en) * 2001-10-09 2008-10-28 Washington Unniversity Tightly agglomerated non-oxide particles and method for producing the same
US20040101617A1 (en) * 2001-11-27 2004-05-27 Devi P Sujatha Direct synthesis and deposition of luminescent films
JP3926333B2 (ja) * 2001-12-05 2007-06-06 ティーディーエイ リサーチ インコーポレイテッド 液体炭化水素からカーボンナノ材料の合成のための燃焼方法
WO2003074195A1 (en) * 2002-03-01 2003-09-12 Microcoating Technologies, Inc. Fuel cell membranes and catalytic layers
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
TW200308187A (en) * 2002-04-10 2003-12-16 Dow Corning Ireland Ltd An atmospheric pressure plasma assembly
GB0208261D0 (en) * 2002-04-10 2002-05-22 Dow Corning An atmospheric pressure plasma assembly
JP3879990B2 (ja) * 2002-05-17 2007-02-14 独立行政法人放射線医学総合研究所 スラッシュガスターゲットの製造方法とその装置
US8294025B2 (en) * 2002-06-08 2012-10-23 Solarity, Llc Lateral collection photovoltaics
US6884737B1 (en) * 2002-08-30 2005-04-26 Novellus Systems, Inc. Method and apparatus for precursor delivery utilizing the melting point depression of solid deposition precursors in the presence of supercritical fluids
AU2003295469A1 (en) * 2002-11-12 2004-06-03 Microcoating Technologies, Inc. Process for producing carbonaceous materials
WO2004066975A1 (en) * 2002-12-18 2004-08-12 Hough Ear Institute Otologic nanotechnology
WO2004063416A2 (en) 2003-01-10 2004-07-29 Inframat Corporation Apparatus and method for solution plasma spraying
US7563503B2 (en) 2003-01-10 2009-07-21 The University Of Connecticut Coatings, materials, articles, and methods of making thereof
FR2852973B1 (fr) * 2003-03-28 2006-05-26 Atofina Procede de formation d'un revetement d'oxydes metalliques sur un substrat electroconducteur; cathode activee en resultant et son utilisation pour l'electrolyse de solutions acqueuses de chorures de meteaux alcalins.
KR20040098740A (ko) * 2003-05-15 2004-11-26 엘지전자 주식회사 저융점 유리 미분말 제조방법
US7521097B2 (en) * 2003-06-06 2009-04-21 Nanogram Corporation Reactive deposition for electrochemical cell production
US8865271B2 (en) * 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
FR2856079B1 (fr) * 2003-06-11 2006-07-14 Pechiney Rhenalu Procede de traitement de surface pour toles et bandes en alliage d'aluminium
US8651113B2 (en) 2003-06-18 2014-02-18 Swr&D Inc. Magnetically responsive nanoparticle therapeutic constructs and methods of making and using
US7723311B2 (en) * 2003-06-18 2010-05-25 Nanobiomagnetics, Inc. Delivery of bioactive substances to target cells
US7344491B1 (en) 2003-11-26 2008-03-18 Nanobiomagnetics, Inc. Method and apparatus for improving hearing
US20050025695A1 (en) * 2003-07-28 2005-02-03 Bhabendra Pradhan Catalyst and process to produce nanocarbon materials in high yield and at high selectivity at reduced reaction temperatures
GB0323295D0 (en) * 2003-10-04 2003-11-05 Dow Corning Deposition of thin films
US20070137575A1 (en) * 2003-11-05 2007-06-21 Tokyo Electron Limited Plasma processing apparatus
US7187396B2 (en) * 2003-11-07 2007-03-06 Engelhard Corporation Low visibility laser marking additive
US7220456B2 (en) 2004-03-31 2007-05-22 Eastman Kodak Company Process for the selective deposition of particulate material
US20050218076A1 (en) * 2004-03-31 2005-10-06 Eastman Kodak Company Process for the formation of particulate material
US7223445B2 (en) * 2004-03-31 2007-05-29 Eastman Kodak Company Process for the deposition of uniform layer of particulate material
HUE026152T2 (en) 2004-04-23 2016-05-30 Philip Morris Products Sa Aerosol Generator and Method for Aerosol Production
DE102004026636B3 (de) * 2004-06-01 2005-07-21 Daimlerchrysler Ag Vorrichtung und Verfahren zum Umschmelzen von metallischen Oberflächen
WO2005118910A1 (ja) * 2004-06-04 2005-12-15 Yamanashi University 超臨界流体又は亜臨界流体を用いた酸化物薄膜、又は金属積層薄膜の成膜方法、及び成膜装置
US7909263B2 (en) * 2004-07-08 2011-03-22 Cube Technology, Inc. Method of dispersing fine particles in a spray
EP1805347B1 (en) * 2004-09-27 2013-06-26 Technion Research And Development Foundation, Ltd. Spray method for producing semiconductor nanoparticles
US20060280866A1 (en) * 2004-10-13 2006-12-14 Optomec Design Company Method and apparatus for mesoscale deposition of biological materials and biomaterials
EP1808057A1 (en) * 2004-11-05 2007-07-18 Dow Corning Ireland Limited Plasma system
US7597938B2 (en) * 2004-11-29 2009-10-06 Guardian Industries Corp. Method of making coated article with color suppression coating including flame pyrolysis deposited layer(s)
JP4949668B2 (ja) * 2004-12-09 2012-06-13 富士フイルム株式会社 セラミックス膜の製造方法及びセラミックス膜を含む構造物
EP1874978A2 (en) * 2004-12-10 2008-01-09 Koninklijke Philips Electronics N.V. Combustion chemical vapor deposition on temperature-sensitive substrates
WO2006061784A2 (en) * 2004-12-10 2006-06-15 Koninklijke Philips Electronics N.V. Substrate temperature control for combustion chemical vapor deposition
US7938341B2 (en) 2004-12-13 2011-05-10 Optomec Design Company Miniature aerosol jet and aerosol jet array
US7674671B2 (en) 2004-12-13 2010-03-09 Optomec Design Company Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
US7491431B2 (en) * 2004-12-20 2009-02-17 Nanogram Corporation Dense coating formation by reactive deposition
AU2006200043B2 (en) * 2005-01-07 2011-11-17 Inframat Corporation Coated medical devices and methods of making and using
US20060165898A1 (en) * 2005-01-21 2006-07-27 Cabot Corporation Controlling flame temperature in a flame spray reaction process
US20060172065A1 (en) * 2005-02-01 2006-08-03 Carlotto John A Vacuum deposition of coating materials on powders
JP4727355B2 (ja) * 2005-09-13 2011-07-20 株式会社フジクラ 成膜方法
JP4710002B2 (ja) * 2005-03-14 2011-06-29 国立大学法人東京農工大学 膜の製造方法
GB0509648D0 (en) * 2005-05-12 2005-06-15 Dow Corning Ireland Ltd Plasma system to deposit adhesion primer layers
US20060275542A1 (en) * 2005-06-02 2006-12-07 Eastman Kodak Company Deposition of uniform layer of desired material
US8328982B1 (en) * 2005-09-16 2012-12-11 Surfx Technologies Llc Low-temperature, converging, reactive gas source and method of use
RU2008119493A (ru) * 2005-10-17 2009-11-27 Нэшнл Рисерч Каунсл Оф Канада (Ca) Образование покрытий и порошков из реакционноспособного распыляемого материала
CH697933B1 (de) * 2005-11-03 2009-03-31 Tetra Laval Holdings & Finance Verfahren und Vorrichtung zur Beschichtung von Kunststofffolien mit einer Oxidschicht.
US7923281B2 (en) * 2006-04-13 2011-04-12 Solopower, Inc. Roll-to-roll processing method and tools for electroless deposition of thin layers
US7585547B2 (en) 2006-04-13 2009-09-08 Solopower, Inc. Method and apparatus to form thin layers of materials on a base
US7541067B2 (en) * 2006-04-13 2009-06-02 Solopower, Inc. Method and apparatus for continuous processing of buffer layers for group IBIIIAVIA solar cells
US7625482B1 (en) 2006-06-23 2009-12-01 Ngimat Co. Nanoparticulate-catalyzed oxygen transfer processes
US8632651B1 (en) 2006-06-28 2014-01-21 Surfx Technologies Llc Plasma surface treatment of composites for bonding
DE102006033037A1 (de) * 2006-07-14 2008-01-24 Universität Bielefeld Einstufiges Verfahren zur Aufbringung einer Metallschicht auf ein Substrat
WO2008016713A2 (en) * 2006-08-02 2008-02-07 Inframat Corporation Lumen-supporting devices and methods of making and using
WO2008016712A2 (en) * 2006-08-02 2008-02-07 Inframat Corporation Medical devices and methods of making and using
US8609060B1 (en) * 2006-08-15 2013-12-17 U.S. Department Of Energy Method of producing carbon coated nano- and micron-scale particles
FR2915753B1 (fr) * 2007-05-02 2009-09-04 Commissariat Energie Atomique Procede et dispositif de preparation d'un revetement multicouche sur un substrat
EP2167703A4 (en) * 2007-06-15 2011-03-16 Nanogram Corp REACTIVE ELECTRODE AND SYNTHESIS OF INORGANIC FILMS
WO2009007745A1 (en) * 2007-07-06 2009-01-15 Pilkington Group Limited Deposition process
PT2201231E (pt) * 2007-08-30 2012-05-28 Cool Flame Technologies As Sistema de motor e método para combustão substancialmente desprovida de nox de um carburante num motor de ignição por compressão
TWI482662B (zh) 2007-08-30 2015-05-01 阿普托麥克股份有限公司 機械上一體式及緊密式耦合之列印頭以及噴霧源
TWI538737B (zh) 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
EP2191496A4 (en) * 2007-09-01 2015-01-14 Yann Roussillon IMPROVED SOLUTION DESIGN ASSEMBLY
US8887658B2 (en) 2007-10-09 2014-11-18 Optomec, Inc. Multiple sheath multiple capillary aerosol jet
EP2206141A4 (en) * 2007-10-17 2012-10-10 Yann Roussillon ARRANGEMENT FOR IMPROVED DEPOSITION OF A SOLUTION
WO2009074939A1 (en) * 2007-12-11 2009-06-18 Koninklijke Philips Electronics N.V. Magnetic resonance system with cooling system and monitoring of helium pressure
US20110003084A1 (en) * 2008-02-25 2011-01-06 National Research Council Of Canada Process of Making Ceria-Based Electrolyte Coating
GB0808338D0 (en) * 2008-05-08 2008-06-18 Pilkington Group Ltd Production of coated glass
JP5526593B2 (ja) * 2008-05-28 2014-06-18 三菱マテリアル株式会社 強誘電体薄膜形成用組成物、強誘電体薄膜の形成方法並びに該方法により形成された強誘電体薄膜
CN103360066B (zh) 2008-05-28 2015-11-18 三菱综合材料株式会社 强电介质薄膜形成用组合物、强电介质薄膜的形成方法及通过该方法形成的强电介质薄膜
JP4565244B2 (ja) * 2008-08-14 2010-10-20 独立行政法人産業技術総合研究所 マイクロプラズマによる堆積方法及び装置
JP4617480B2 (ja) * 2008-08-14 2011-01-26 独立行政法人産業技術総合研究所 微小なラインを備えた基板
GB2466805B (en) * 2009-01-08 2014-06-11 Cvd Technologies Ltd Method for depositing an antibacterial coating on a substrate
US20100203287A1 (en) * 2009-02-10 2010-08-12 Ngimat Co. Hypertransparent Nanostructured Superhydrophobic and Surface Modification Coatings
US8317894B2 (en) * 2009-04-15 2012-11-27 Korea Institute Of Science And Technology Method of producing metal nanoparticles continuously and metal nanoparticles produced thereby
US20100276827A1 (en) * 2009-04-29 2010-11-04 Kevin Smith Method for Producing Nanoparticles
US8497152B2 (en) 2009-05-12 2013-07-30 Solopower, Inc. Roll-to-roll processing method and tools for electroless deposition of thin layers
US20120282132A1 (en) * 2009-07-14 2012-11-08 Watkins James J Metal and metal oxide structures and preparation thereof
US8118973B2 (en) * 2010-02-17 2012-02-21 Johns Manville Method of applying de-dusting agents to fibrous products and products
JP2012107318A (ja) * 2010-10-25 2012-06-07 Koba Technology:Kk 基材の表面改質方法及びその装置
DE102010055042B4 (de) * 2010-12-17 2013-06-06 Eads Deutschland Gmbh Verfahren und Vorrichtung zur Bildung eines Elektrolytfilmes auf einer Elektrodenoberfläche
US20130034689A1 (en) * 2011-08-05 2013-02-07 Andrew Tye Hunt Inorganic Nanocoating Primed Organic Film
TWI473903B (zh) * 2013-02-23 2015-02-21 Hermes Epitek Corp 應用於半導體設備的噴射器與上蓋板總成
US10032609B1 (en) 2013-12-18 2018-07-24 Surfx Technologies Llc Low temperature atmospheric pressure plasma applications
US10800092B1 (en) 2013-12-18 2020-10-13 Surfx Technologies Llc Low temperature atmospheric pressure plasma for cleaning and activating metals
US9406485B1 (en) 2013-12-18 2016-08-02 Surfx Technologies Llc Argon and helium plasma apparatus and methods
JP6945120B2 (ja) * 2014-08-29 2021-10-06 株式会社Flosfia 金属膜形成方法
CN107548346B (zh) 2015-02-10 2021-01-05 奥普托美克公司 通过气溶胶的飞行中固化制造三维结构
GB201602090D0 (en) * 2016-02-05 2016-03-23 Isis Innovation Powder
US10827601B1 (en) 2016-05-03 2020-11-03 Surfx Technologies Llc Handheld plasma device
KR20200087196A (ko) 2017-11-13 2020-07-20 옵토멕 인코포레이티드 에어로졸 스트림의 셔터링
CN111364101A (zh) * 2020-04-21 2020-07-03 泉州师范学院 大面积准单晶钙钛矿薄膜密闭循环制备装置及其制备方法
TW202247905A (zh) 2021-04-29 2022-12-16 美商阿普托麥克股份有限公司 用於氣溶膠噴射裝置之高可靠性鞘護輸送路徑
KR102866116B1 (ko) 2021-11-26 2025-09-30 삼성전자주식회사 반도체 패키지
KR20230102606A (ko) * 2021-12-30 2023-07-07 이창훈 플라즈마 서스펜션 코팅 시스템 및 방법

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4117179A (en) * 1976-11-04 1978-09-26 General Electric Company Oxidation corrosion resistant superalloys and coatings
US4239827A (en) * 1979-01-15 1980-12-16 Union Carbide Corporation Flame-sprayed thermoplastic substrate is coated with an adhesive layer which bonds particles of an adsorbent like carbon to the substrate
US4734451A (en) * 1983-09-01 1988-03-29 Battelle Memorial Institute Supercritical fluid molecular spray thin films and fine powders
US4582731A (en) * 1983-09-01 1986-04-15 Battelle Memorial Institute Supercritical fluid molecular spray film deposition and powder formation
US4734227A (en) * 1983-09-01 1988-03-29 Battelle Memorial Institute Method of making supercritical fluid molecular spray films, powder and fibers
DE69002564T2 (de) * 1989-03-10 1994-03-10 Idemitsu Petrochemical Co Mit diamanten bedecktes glied und verfahren zur herstellung.
US5032568A (en) * 1989-09-01 1991-07-16 Regents Of The University Of Minnesota Deposition of superconducting thick films by spray inductively coupled plasma method
US5106659A (en) * 1989-10-04 1992-04-21 Nordson Corporation Method and apparatus for spraying a liquid coating containing supercritical fluid or liquified gas
US4970093A (en) * 1990-04-12 1990-11-13 University Of Colorado Foundation Chemical deposition methods using supercritical fluid solutions
US5213851A (en) * 1990-04-17 1993-05-25 Alfred University Process for preparing ferrite films by radio-frequency generated aerosol plasma deposition in atmosphere
US5100868A (en) * 1990-04-17 1992-03-31 Alfred University Inc. Process for preparing superconducting films by radio-frequency-generated aerosol plasma deposition
US5171613A (en) * 1990-09-21 1992-12-15 Union Carbide Chemicals & Plastics Technology Corporation Apparatus and methods for application of coatings with supercritical fluids as diluents by spraying from an orifice
US5109844A (en) * 1990-10-11 1992-05-05 Duke University Retinal microstimulation
US5840774A (en) * 1991-02-28 1998-11-24 Research Foundation Of State University Of New York Low density microporous polymers and process
DE69218152T2 (de) * 1991-12-26 1997-08-28 Canon K.K., Tokio/Tokyo Herstellungsverfahren einer niedergeschlagenen Schicht mittels CVD, unter Verwendung von flüssigem Rohstoff und dazu geeignete Vorrichtung
JP3121102B2 (ja) * 1992-03-26 2000-12-25 キヤノン株式会社 平板ダイヤモンド結晶、及びその形成方法
EP0689618B1 (en) * 1993-03-24 2003-02-26 Georgia Tech Research Corporation Method and apparatus for the combustion chemical vapor deposition of films and coatings
US5318801A (en) * 1993-05-18 1994-06-07 United States Of America As Represented By The Secretary Of The Navy Substrate temperature control apparatus and technique for CVD reactors
US5433977A (en) * 1993-05-21 1995-07-18 Trustees Of Boston University Enhanced adherence of diamond coatings by combustion flame CVD
US5716558A (en) * 1994-11-14 1998-02-10 Union Carbide Chemicals & Plastics Technology Corporation Method for producing coating powders catalysts and drier water-borne coatings by spraying compositions with compressed fluids
KR100479485B1 (ko) * 1995-08-04 2005-09-07 마이크로코팅 테크놀로지, 인크. 근초임계및초임계유동용액의열적분무를이용한화학증착및분말형성
JP3484025B2 (ja) * 1996-01-10 2004-01-06 仲道 山崎 連続水熱合成方法および装置
US5833891A (en) * 1996-10-09 1998-11-10 The University Of Kansas Methods for a particle precipitation and coating using near-critical and supercritical antisolvents
US6505078B1 (en) * 1996-04-04 2003-01-07 Medtronic, Inc. Technique for adjusting the locus of excitation of electrically excitable tissue
DE19707046A1 (de) * 1997-02-21 1998-08-27 Rolf Prof Dr Ing Eckmiller Lernfähiger "Active Vision" Implant Encoder
USH1839H (en) * 1997-04-17 2000-02-01 Xerox Corporation Supercritical fluid processes
US6458157B1 (en) * 1997-08-04 2002-10-01 Suaning Gregg Joergen Retinal stimulator
US5935155A (en) * 1998-03-13 1999-08-10 John Hopkins University, School Of Medicine Visual prosthesis and method of using same
US6368665B1 (en) * 1998-04-29 2002-04-09 Microcoating Technologies, Inc. Apparatus and process for controlled atmosphere chemical vapor deposition
US6421566B1 (en) * 1998-04-30 2002-07-16 Medtronic, Inc. Selective dorsal column stimulation in SCS, using conditioning pulses
US6882881B1 (en) * 1999-10-19 2005-04-19 The Johns Hopkins University Techniques using heat flow management, stimulation, and signal analysis to treat medical disorders
US7571004B2 (en) * 2005-01-26 2009-08-04 Second Sight Medical Products, Inc. Neural stimulation for increased persistence

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US6132653A (en) 2000-10-17
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PT848658E (pt) 2007-01-31
DE69636627D1 (de) 2006-11-23
MX9800986A (es) 1998-09-30
KR100479485B1 (ko) 2005-09-07
US20020015797A1 (en) 2002-02-07
US20010039919A1 (en) 2001-11-15
ATE342154T1 (de) 2006-11-15
EP0848658B1 (en) 2006-10-11
JP4047382B2 (ja) 2008-02-13
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US5997956A (en) 1999-12-07
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US6793975B2 (en) 2004-09-21

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