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BR9200681A - Polimero sensivel a radiacao,mistura sensivel a radiacao,processo para a preparacao mistura sensivel a radiacao,processo para a preparacao do dito polimiero e material de desenho sensivel a radiacao - Google Patents

Polimero sensivel a radiacao,mistura sensivel a radiacao,processo para a preparacao mistura sensivel a radiacao,processo para a preparacao do dito polimiero e material de desenho sensivel a radiacao

Info

Publication number
BR9200681A
BR9200681A BR929200681A BR9200681A BR9200681A BR 9200681 A BR9200681 A BR 9200681A BR 929200681 A BR929200681 A BR 929200681A BR 9200681 A BR9200681 A BR 9200681A BR 9200681 A BR9200681 A BR 9200681A
Authority
BR
Brazil
Prior art keywords
radiation
sensitive
preparation
polymer
mixture
Prior art date
Application number
BR929200681A
Other languages
English (en)
Inventor
Horst Roeschert
Hans-Joachim Merrem
Georg Pawlowski
Juergen Fuchs
Ralph Dammel
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9200681A publication Critical patent/BR9200681A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BR929200681A 1991-02-28 1992-02-27 Polimero sensivel a radiacao,mistura sensivel a radiacao,processo para a preparacao mistura sensivel a radiacao,processo para a preparacao do dito polimiero e material de desenho sensivel a radiacao BR9200681A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4106357A DE4106357A1 (de) 1991-02-28 1991-02-28 Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
BR9200681A true BR9200681A (pt) 1992-11-10

Family

ID=6426128

Family Applications (1)

Application Number Title Priority Date Filing Date
BR929200681A BR9200681A (pt) 1991-02-28 1992-02-27 Polimero sensivel a radiacao,mistura sensivel a radiacao,processo para a preparacao mistura sensivel a radiacao,processo para a preparacao do dito polimiero e material de desenho sensivel a radiacao

Country Status (10)

Country Link
US (1) US5326826A (pt)
EP (1) EP0501294B1 (pt)
JP (1) JP3152986B2 (pt)
KR (1) KR920016901A (pt)
AU (1) AU1125492A (pt)
BR (1) BR9200681A (pt)
CA (1) CA2061991A1 (pt)
DE (2) DE4106357A1 (pt)
MX (1) MX9200826A (pt)
ZA (1) ZA921456B (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0174316B1 (ko) * 1994-07-05 1999-04-01 모리시다 요이치 미세패턴 형성방법
US5691098A (en) * 1996-04-03 1997-11-25 Minnesota Mining And Manufacturing Company Laser-Induced mass transfer imaging materials utilizing diazo compounds
US5747217A (en) * 1996-04-03 1998-05-05 Minnesota Mining And Manufacturing Company Laser-induced mass transfer imaging materials and methods utilizing colorless sublimable compounds
KR100252062B1 (ko) * 1998-04-20 2000-06-01 윤종용 포토레지스트용 중합체 혼합물, 이를 포함하는포토레지스트 조성물 및 이의 제조방법
JP3832099B2 (ja) * 1998-07-24 2006-10-11 Ｊｓｒ株式会社 バンプ形成用材料および配線形成用材料
US7005227B2 (en) * 2004-01-21 2006-02-28 Intel Corporation One component EUV photoresist
DE102004004214A1 (de) * 2004-01-27 2005-08-25 Basf Ag Polymerdispersionen oder -lösungen mit 3,4 Dihydroxyphenylgruppen
US7951525B2 (en) * 2008-09-08 2011-05-31 International Business Machines Corporation Low outgassing photoresist compositions
KR20110059471A (ko) * 2009-11-27 2011-06-02 삼성전자주식회사 포토레지스트 조성물, 이를 이용한 패턴의 형성방법 및 반도체 장치의 제조방법
KR20120066924A (ko) * 2010-12-15 2012-06-25 제일모직주식회사 오르토-니트로벤질 에스테르 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물
EP2792725A4 (en) * 2011-12-14 2015-07-29 Mitsui Chemicals Tohcello Co Ltd ADHESIVE COMPOSITION, LAYER BODY AND SELF-REMOVAL PROCESS
WO2020066342A1 (ja) * 2018-09-28 2020-04-02 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
JPS5024641B2 (pt) * 1972-10-17 1975-08-18
GB1494640A (en) * 1974-12-24 1977-12-07 Fuji Photo Film Co Ltd Image-forming on light-sensitive element containing a quinone diazide
DE3009873A1 (de) * 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
JPS6053301B2 (ja) * 1979-08-31 1985-11-25 冨士薬品工業株式会社 ポジ型感光性組成物
DE3028308A1 (de) * 1980-07-25 1982-02-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen von reliefstrukturen aus strahlungsempfindlichen lacken auf einem substrat, insbesondere fuer die herstellung von integrierten halbleiterschaltungen
CA1321315C (en) * 1986-04-11 1993-08-17 Yoichi Mori Printing plate
US4910123A (en) * 1986-12-25 1990-03-20 Matsushita Electric Industrial Co., Ltd. Pattern forming method
DE3731439A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial
JPH01106037A (ja) * 1987-10-20 1989-04-24 Matsushita Electric Ind Co Ltd パターン形成材料
DE3900735A1 (de) * 1989-01-12 1990-07-26 Hoechst Ag Neue mehrfunktionelle (alpha)-diazo-(beta)-ketoester, verfahren zu ihrer herstellung und deren verwendung
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5087547A (en) * 1990-03-02 1992-02-11 Union Carbide Chemicals & Plastics Technology Corporation Dual-tone photoresist utilizing diazonaphthoquinone resin and carbodiimide stabilizer

Also Published As

Publication number Publication date
DE59200671D1 (de) 1994-12-01
JP3152986B2 (ja) 2001-04-03
DE4106357A1 (de) 1992-09-03
US5326826A (en) 1994-07-05
EP0501294A1 (de) 1992-09-02
JPH05105715A (ja) 1993-04-27
CA2061991A1 (en) 1992-08-29
MX9200826A (es) 1992-08-01
AU1125492A (en) 1992-09-03
KR920016901A (ko) 1992-09-25
EP0501294B1 (de) 1994-10-26
ZA921456B (en) 1992-11-25

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Legal Events

Date Code Title Description
FA1 Application deemed withdrawn (art. 18(2))