BR9200680A - Polimero sensivel a radiacao,mistura sensivel a radiacao e material de desenho sensivel a radiacao - Google Patents

Polimero sensivel a radiacao,mistura sensivel a radiacao e material de desenho sensivel a radiacao

Info

Publication number: BR9200680A
Authority: BR; Brazil
Prior art keywords: radiation; sensitive; mixture; design material; polymer
Prior art date: 1991-02-28

Application number

BR929200680A

Other languages

English (en)

Inventor

Horst Roeschert

Hans-Joachim Merrem

Georg Pawlowski

Juergen Fuchs

Ralph Dammel

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-02-28

Filing date

1992-02-27

Publication date

1992-11-10

1992-02-27 Application filed by Hoechst Ag filed Critical Hoechst Ag

1992-11-10 Publication of BR9200680A publication Critical patent/BR9200680A/pt

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Materials For Photolithography (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Thermal Transfer Or Thermal Recording In General (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

BR929200680A 1991-02-28 1992-02-27 Polimero sensivel a radiacao,mistura sensivel a radiacao e material de desenho sensivel a radiacao BR9200680A (pt)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE4106356A DE4106356A1 (de)	1991-02-28	1991-02-28	Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial

Publications (1)

Publication Number	Publication Date
BR9200680A true BR9200680A (pt)	1992-11-10

Family

ID=6426127

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BR929200680A BR9200680A (pt)	1991-02-28	1992-02-27	Polimero sensivel a radiacao,mistura sensivel a radiacao e material de desenho sensivel a radiacao

Country Status (9)

Country	Link
US (1)	US5302488A (pt)
EP (1)	EP0501308B1 (pt)
JP (1)	JPH05155942A (pt)
KR (1)	KR920016900A (pt)
AU (1)	AU1125392A (pt)
BR (1)	BR9200680A (pt)
CA (1)	CA2061847A1 (pt)
DE (2)	DE4106356A1 (pt)
ZA (1)	ZA921455B (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06204162A (ja) *	1992-12-28	1994-07-22	Mitsubishi Electric Corp	半導体装置の製造方法および該方法に用いられるレジスト組成物
JPH07140666A (ja) *	1993-06-04	1995-06-02	Internatl Business Mach Corp <Ibm>	マイクロリトグラフィックレジスト組成物、酸不安定化合物、マイクロリトグラフィックレリーフ画像形成方法及び酸感知性ポリマー組成物
EP1117714B1 (en) *	1998-07-23	2002-11-27	Clariant Finance (BVI) Limited	Water soluble positive-working photoresist composition
KR100363695B1 (ko) *	1998-12-31	2003-04-11	주식회사 하이닉스반도체	유기난반사방지중합체및그의제조방법
US7005227B2 (en) *	2004-01-21	2006-02-28	Intel Corporation	One component EUV photoresist
KR20110059471A (ko) *	2009-11-27	2011-06-02	삼성전자주식회사	포토레지스트 조성물, 이를 이용한 패턴의 형성방법 및 반도체 장치의 제조방법
KR20120066924A (ko) *	2010-12-15	2012-06-25	제일모직주식회사	오르토-니트로벤질 에스테르 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3837860A (en) *	1969-06-16	1974-09-24	L Roos	PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US3779778A (en) *	1972-02-09	1973-12-18	Minnesota Mining & Mfg	Photosolubilizable compositions and elements
JPS5024641B2 (pt) *	1972-10-17	1975-08-18
JPS5236043B2 (pt) *	1974-02-21	1977-09-13
US4139384A (en) *	1974-02-21	1979-02-13	Fuji Photo Film Co., Ltd.	Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
GB1494640A (en) *	1974-12-24	1977-12-07	Fuji Photo Film Co Ltd	Image-forming on light-sensitive element containing a quinone diazide
DE3009873A1 (de) *	1979-03-16	1980-09-25	Daicel Chem	Photoempfindliche masse
JPS6053301B2 (ja) *	1979-08-31	1985-11-25	冨士薬品工業株式会社	ポジ型感光性組成物
DE3028308A1 (de) *	1980-07-25	1982-02-25	Siemens AG, 1000 Berlin und 8000 München	Verfahren zum erzeugen von reliefstrukturen aus strahlungsempfindlichen lacken auf einem substrat, insbesondere fuer die herstellung von integrierten halbleiterschaltungen
DE3246106A1 (de) *	1982-12-13	1984-06-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
CA1321315C (en) *	1986-04-11	1993-08-17	Yoichi Mori	Printing plate
US4910123A (en) *	1986-12-25	1990-03-20	Matsushita Electric Industrial Co., Ltd.	Pattern forming method
JPS6444934A (en) *	1987-08-14	1989-02-17	Japan Synthetic Rubber Co Ltd	Radiation sensitive resin composition
DE3731439A1 (de) *	1987-09-18	1989-03-30	Hoechst Ag	Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial
JPH01106037A (ja) *	1987-10-20	1989-04-24	Matsushita Electric Ind Co Ltd	パターン形成材料
US5178986A (en) *	1988-10-17	1993-01-12	Shipley Company Inc.	Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol
DE3930087A1 (de) *	1989-09-09	1991-03-14	Hoechst Ag	Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2661317B2 (ja) *	1990-03-27	1997-10-08	松下電器産業株式会社	パターン形成方法

1991
- 1991-02-28 DE DE4106356A patent/DE4106356A1/de not_active Withdrawn
1992
- 1992-02-20 DE DE59207077T patent/DE59207077D1/de not_active Expired - Fee Related
- 1992-02-20 EP EP92102838A patent/EP0501308B1/de not_active Expired - Lifetime
- 1992-02-26 US US07/841,545 patent/US5302488A/en not_active Expired - Fee Related
- 1992-02-27 ZA ZA921455A patent/ZA921455B/xx unknown
- 1992-02-27 KR KR1019920003046A patent/KR920016900A/ko not_active Withdrawn
- 1992-02-27 CA CA002061847A patent/CA2061847A1/en not_active Abandoned
- 1992-02-27 AU AU11253/92A patent/AU1125392A/en not_active Abandoned
- 1992-02-27 BR BR929200680A patent/BR9200680A/pt not_active Application Discontinuation
- 1992-02-28 JP JP4078645A patent/JPH05155942A/ja active Pending

Also Published As

Publication number	Publication date
DE59207077D1 (de)	1996-10-17
KR920016900A (ko)	1992-09-25
US5302488A (en)	1994-04-12
AU1125392A (en)	1992-09-03
EP0501308B1 (de)	1996-09-11
JPH05155942A (ja)	1993-06-22
DE4106356A1 (de)	1992-09-03
CA2061847A1 (en)	1992-08-29
EP0501308A1 (de)	1992-09-02
ZA921455B (en)	1992-11-25

Publication	Publication Date	Title
MX9202081A (es)	1992-11-01	Material catalizador mejorado.
FI920434A7 (fi)	1992-08-03	Anordning foer upptaeckt av magnetiskt material i byggnadsdelar.
FI890873L (fi)	1989-08-25	Fiberoptiskt sensororgan foer att detektera kemiska foeraendringar i material.
FI924640L (fi)	1993-04-16	Laongsamt doserande syneresisk polymer laekemedelsdoseringsanordning
FI922971L (fi)	1992-12-28	Ymppolymerer
SK2738U (sk)	2001-01-18	Polymérny materiál a jeho použitie
DE69218393D1 (de)	1997-04-24	Resistmaterial
DE68922460D1 (de)	1995-06-08	Thermoplastische Polymerzusammensetzung.
DE68917114D1 (de)	1994-09-01	Hochorientiertes Polyethylenmaterial.
FI922471A7 (fi)	1992-05-29	Kombineringsmaterial.
DE69013926D1 (de)	1994-12-08	Polymerwerkstoffe.
DE69220096D1 (de)	1997-07-10	Thermoplastische Polymermasse
FI914842A0 (fi)	1991-10-14	Material anvaendbar i human- och veterinaermedicin.
DE69405479D1 (de)	1997-10-16	Resistmaterialien
FI905140A0 (fi)	1990-10-18	Material.
FI882653A7 (fi)	1989-12-07	Foerfarande och extrusionsanordning foer att behandla material avsett att extruderas.
DE68911717D1 (de)	1994-02-10	Thermoplastische Polymerzusammensetzung.
BR9201428A (pt)	1992-12-01	Compostos,mistura sensivel a radiacao e material de desenho sensivel a radiacao
DE69223410D1 (de)	1998-01-15	Polymergemisch
DE68916143D1 (de)	1994-07-21	Siliziumhaltiges Polymer und solches enthaltendes photosensitives Material.
DE69228584D1 (de)	1999-04-15	Positiv-arbeitendes Resistmaterial
BR9200680A (pt)	1992-11-10	Polimero sensivel a radiacao,mistura sensivel a radiacao e material de desenho sensivel a radiacao
DE58907235D1 (de)	1994-04-21	Polymerisatmischung.
FI921962A0 (fi)	1992-04-30	Foerfarande foer blekning av cellulosahaltiga material.
FI921961A0 (fi)	1992-04-30	Foerfarande foer blekning av xylan- och lignocellulosahaltiga material.

Legal Events

Date	Code	Title	Description
1995-09-26	FA1	Application deemed withdrawn (art. 18(2))