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BR9005803A - Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao - Google Patents

Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao

Info

Publication number
BR9005803A
BR9005803A BR909005803A BR9005803A BR9005803A BR 9005803 A BR9005803 A BR 9005803A BR 909005803 A BR909005803 A BR 909005803A BR 9005803 A BR9005803 A BR 9005803A BR 9005803 A BR9005803 A BR 9005803A
Authority
BR
Brazil
Prior art keywords
developer
processes
prepared
production
light
Prior art date
Application number
BR909005803A
Other languages
English (en)
Inventor
Klaus Joerg
Rudolf Zertani
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9005803A publication Critical patent/BR9005803A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
BR909005803A 1989-11-16 1990-11-14 Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao BR9005803A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3938107A DE3938107A1 (de) 1989-11-16 1989-11-16 Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen

Publications (1)

Publication Number Publication Date
BR9005803A true BR9005803A (pt) 1991-09-24

Family

ID=6393649

Family Applications (1)

Application Number Title Priority Date Filing Date
BR909005803A BR9005803A (pt) 1989-11-16 1990-11-14 Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao

Country Status (9)

Country Link
US (1) US5155012A (pt)
EP (1) EP0432451B1 (pt)
JP (1) JPH03172850A (pt)
KR (1) KR910010241A (pt)
BR (1) BR9005803A (pt)
CA (1) CA2029968A1 (pt)
DE (2) DE3938107A1 (pt)
FI (1) FI905637A7 (pt)
ZA (1) ZA909159B (pt)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5433885A (en) * 1991-07-17 1995-07-18 Church & Dwight Co., Inc. Stabilization of silicate solutions
US5234506A (en) * 1991-07-17 1993-08-10 Church & Dwight Co., Inc. Aqueous electronic circuit assembly cleaner and method
US5431847A (en) * 1991-07-17 1995-07-11 Charles B. Barris Aqueous cleaning concentrates
US5264047A (en) * 1991-07-17 1993-11-23 Church & Dwight Co., Inc. Low foaming effective hydrotrope
US5234505A (en) * 1991-07-17 1993-08-10 Church & Dwight Co., Inc. Stabilization of silicate solutions
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
DE69416564T2 (de) * 1993-04-28 1999-07-15 Toray Industries, Inc., Tokio/Tokyo Positiv arbeitender elektronenstrahlresist
US5753421A (en) * 1994-03-31 1998-05-19 Tokyo Ohka Kogya Co., Ltd. Stock developer solutions for photoresists and developer solutions prepared by dilution thereof
FR2749315B1 (fr) * 1996-05-31 1998-08-14 Atochem Elf Sa Composition decapante a base d'eau et d'anisole
EP0810272B1 (fr) * 1996-05-31 2001-03-21 Atofina Composition décapante à base d'un solvant aprotique polaire, d'un éther et d'eau
DE19811330A1 (de) * 1998-03-16 1999-09-23 Du Pont Deutschland Entwickler und Verfahren zur Herstellung von flexographischen Druckformen
DE19845605A1 (de) 1998-10-05 2000-04-06 Agfa Gevaert Ag Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien
KR100364291B1 (ko) * 2000-03-06 2002-12-18 주식회사 프리챌홀딩스 기체 필터용 부직포
US6383717B1 (en) 2000-10-11 2002-05-07 Kodak Polychrome Graphics, Llc Aqueous developer for negative working lithographic printing plates
US6756183B2 (en) * 2001-08-24 2004-06-29 Fuji Photo Film Co., Ltd. Method for preparing lithographic printing plate
JP2004252395A (ja) * 2002-05-07 2004-09-09 Shipley Co Llc 残渣削減安定濃縮物
DE10310168B4 (de) * 2003-03-08 2007-07-19 Huber Gmbh Wässrige Entwicklerlösung für Offset-Druckplatten
US7157213B2 (en) * 2004-03-01 2007-01-02 Think Laboratory Co., Ltd. Developer agent for positive type photosensitive compound
EP1574907A1 (en) * 2004-03-08 2005-09-14 Think Laboratory Co., Ltd. Developing agent for positive-type photosensitive composition
JP4900913B2 (ja) * 2006-02-01 2012-03-21 富士フイルム株式会社 平版印刷版の製版方法
JP2008249874A (ja) * 2007-03-29 2008-10-16 Mitsubishi Paper Mills Ltd 平版印刷版の現像処理液および現像処理方法
JP5264427B2 (ja) * 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
US20100216067A1 (en) * 2009-02-20 2010-08-26 Miller Gary R Lithographic printing plate developing compositions
JP5771361B2 (ja) * 2010-04-22 2015-08-26 富士フイルム株式会社 パターン形成方法、化学増幅型レジスト組成物、及び、レジスト膜
EP2677365B1 (en) * 2011-02-16 2019-01-23 Toyobo Co., Ltd. Developer composition for printing plate, developer and method for manufacturing printing plate
EP3542221B1 (en) * 2016-11-16 2021-03-17 Miraclon Corporation Flexographic developers and methods of use
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
JPS5854341A (ja) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd 現像方法および現像液
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
US4588836A (en) * 1982-09-01 1986-05-13 Toyo Jozo Kabushiki Kaisha Novel synthetic substrate and assay method using the same
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4851324A (en) * 1987-07-27 1989-07-25 Hoechst Celanese Corporation Phenoxy propanol containing developer compositions for lithographic plates having neutral pH

Also Published As

Publication number Publication date
EP0432451B1 (de) 1997-01-02
DE59010623D1 (de) 1997-02-13
US5155012A (en) 1992-10-13
JPH03172850A (ja) 1991-07-26
EP0432451A2 (de) 1991-06-19
FI905637L (fi) 1991-05-17
CA2029968A1 (en) 1991-05-17
DE3938107A1 (de) 1991-05-23
EP0432451A3 (en) 1991-09-18
FI905637A7 (fi) 1991-05-17
ZA909159B (en) 1991-08-28
FI905637A0 (fi) 1990-11-14
KR910010241A (ko) 1991-06-29

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Legal Events

Date Code Title Description
FB19 Grant procedure suspended (art. 19)
FB19 Grant procedure suspended (art. 19)
FF Decision: intention to grant
PC Transfer

Free format text: AGFA - GEVAERT - AG (DE)

FG9A Patent or certificate of addition granted
B21A Patent or certificate of addition expired [chapter 21.1 patent gazette]

Free format text: PATENTE EXTINTA EM 14/11/2010

B15K Others concerning applications: alteration of classification

Ipc: G03F 7/32 (2006.01)