[go: up one dir, main page]

BR8706373A - Mistura liquida de fotoiniciador e composicao fotoendurecivel - Google Patents

Mistura liquida de fotoiniciador e composicao fotoendurecivel

Info

Publication number
BR8706373A
BR8706373A BR8706373A BR8706373A BR8706373A BR 8706373 A BR8706373 A BR 8706373A BR 8706373 A BR8706373 A BR 8706373A BR 8706373 A BR8706373 A BR 8706373A BR 8706373 A BR8706373 A BR 8706373A
Authority
BR
Brazil
Prior art keywords
photoendurecivible
composition
photoinitiator mixture
liquid photoinitiator
liquid
Prior art date
Application number
BR8706373A
Other languages
English (en)
Inventor
Rinaldo Huesler
Werner Rutsch
Manfred Rembold
Franciszek Sitek
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of BR8706373A publication Critical patent/BR8706373A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
BR8706373A 1986-11-26 1987-11-25 Mistura liquida de fotoiniciador e composicao fotoendurecivel BR8706373A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH473486 1986-11-26
CH41687 1987-02-05

Publications (1)

Publication Number Publication Date
BR8706373A true BR8706373A (pt) 1988-07-19

Family

ID=25684516

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8706373A BR8706373A (pt) 1986-11-26 1987-11-25 Mistura liquida de fotoiniciador e composicao fotoendurecivel

Country Status (7)

Country Link
US (1) US4960746A (pt)
EP (1) EP0269573B1 (pt)
JP (1) JP2597860B2 (pt)
KR (1) KR880006568A (pt)
BR (1) BR8706373A (pt)
CA (1) CA1317501C (pt)
DE (1) DE3768919D1 (pt)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5008302A (en) * 1987-12-01 1991-04-16 Ciba-Geigy Corporation Titanocenes, the use thereof, and N-substituted pyrroles
US5026625A (en) * 1987-12-01 1991-06-25 Ciba-Geigy Corporation Titanocenes, the use thereof, and n-substituted fluoroanilines
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE59008501D1 (de) * 1989-06-01 1995-03-30 Ciba Geigy Ag Neue, stickstoffhaltige Titanocene und deren Verwendung.
JP2724624B2 (ja) * 1989-12-26 1998-03-09 日本化薬株式会社 紫外線硬化性樹脂組成物、インキ組成物及びそれらの硬化物
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE4008815A1 (de) * 1990-03-20 1991-09-26 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2551232B2 (ja) * 1990-11-22 1996-11-06 日立化成工業株式会社 新規な光開始剤系及びこれを用いた光重合性組成物
EP0497552B1 (en) * 1991-01-29 1996-05-22 National Starch and Chemical Investment Holding Corporation Photopolymerisable compositions
DE4115950A1 (de) * 1991-05-16 1992-11-19 Herberts Gmbh Fluessige gemische von photoinitiatoren, verfahren zu deren herstellung und deren verwendung
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5496685A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
DE4418645C1 (de) 1994-05-27 1995-12-14 Sun Chemical Corp Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial
DE4435487A1 (de) * 1994-10-04 1996-04-11 Hoechst Ag Mit Silikonen kompatible Photoinitiatoren und diese enthaltende lichtempfindliche Gemische
US5795985A (en) 1996-03-05 1998-08-18 Ciba Specialty Chemicals Corporation Phenyl alkyl ketone substituted by cyclic amine and a process for the preparation thereof
US6664025B2 (en) 2002-02-12 2003-12-16 Kodak Polychrome Graphics Llc Visible radiation sensitive composition
DE10255667B4 (de) 2002-11-28 2006-05-11 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente mit ausgezeichneter Lagerbeständigkeit
US8318830B2 (en) 2007-10-17 2012-11-27 Basf Se Photolatent catalysts based on organometallic compounds
JP5136035B2 (ja) * 2007-12-11 2013-02-06 コニカミノルタホールディングス株式会社 インクジェットインク及びインクジェット記録方法
JP6090707B2 (ja) * 2012-12-28 2017-03-08 川崎化成工業株式会社 ラジカル重合増感剤
JP6299275B2 (ja) 2013-05-15 2018-03-28 株式会社リコー 光重合性インクジェットインク、インクカートリッジ、塗工物
JP6686336B2 (ja) 2015-09-14 2020-04-22 川崎化成工業株式会社 光重合性組成物
CN114308122B (zh) * 2022-01-12 2023-12-29 万华化学集团股份有限公司 季氨碱类相转移催化剂和制备方法及其在制备1,3-二（2-羟基异丙基）苯中的应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722264C2 (de) * 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
EP0003002B1 (de) * 1977-12-22 1984-06-13 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
DE3365773D1 (en) * 1982-02-26 1986-10-09 Ciba Geigy Ag Coloured photo-hardenable composition
US4590287A (en) * 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
EP0117233B1 (de) * 1983-02-18 1987-08-26 Ciba-Geigy Ag Photohärtbare gefärbte Massen
EP0138754B1 (de) * 1983-08-15 1988-05-25 Ciba-Geigy Ag Photohärtbare Gemische
US4713401A (en) * 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
KR910000199B1 (ko) * 1986-04-15 1991-01-23 시바-가이기 코오포레이숀 액체 광개시제 혼합물

Also Published As

Publication number Publication date
CA1317501C (en) 1993-05-11
JP2597860B2 (ja) 1997-04-09
JPS63150303A (ja) 1988-06-23
EP0269573A2 (de) 1988-06-01
EP0269573B1 (de) 1991-03-27
US4960746A (en) 1990-10-02
KR880006568A (ko) 1988-07-23
EP0269573A3 (en) 1989-03-15
DE3768919D1 (en) 1991-05-02

Similar Documents

Publication Publication Date Title
BR8706373A (pt) Mistura liquida de fotoiniciador e composicao fotoendurecivel
DK330087D0 (da) Solfilter-forbindelse og sammensaetning indeholdende samme
DE3789151D1 (de) Fluoralkanderivat und Flüssigkristallmischung.
KR880700844A (ko) 엘라스토머- 플라스틱 혼합물
NO171268C (no) Flytendekrystall-blanding
MX161225A (es) Composicion limpiadora liquida
KR880701771A (ko) 액상 중합체 조성물 및 그의 용도
DE3684967D1 (de) Fluessigkristallzusammensetzung.
IT1198478B (it) Composizione detergente liquida
DE3773446D1 (de) Tolanderivat und dieses enthaltende fluessigkristallmischung.
BR8906843A (pt) Composicao alvejante liquida
BR8701805A (pt) Mistura aplicavel como desespumante e sua aplicacao
KR850010662U (ko) 혼합장치
BR8702683A (pt) Misturadora
BR8506241A (pt) Dispositivo de visualizacao,conjunto,mistura e combinacao
BR8800833A (pt) Composicao liquida amaciante de tecidos
KR890700654A (ko) 액정 혼합물
BR8900970A (pt) Composicao alvejante aquosa liquida
DE3679844D1 (de) Chiral-smektische fluessigkristallzusammensetzung und lichtschalter.
BR8803786A (pt) Composicao detergente liquida e composicao estavel
KR880701524A (ko) 1-옥소히드로카르빌-치환 아자시클로헥산으로 되는 조성물 및 그의 용도
EP0268226A3 (en) Liquid crystal composition
EP0272871A3 (en) Liquid crystal voltmeter
AT386547B (de) Statikmischer
TR23367A (tr) Diflorohalometoksifenil tuerevi ve adi gecen tuerevi etkili terkip maddesi olarak iceren mitisid

Legal Events

Date Code Title Description
B15K Others concerning applications: alteration of classification

Ipc: G03F 7/029 (2006.01)