BR8502114A - Processo de gravacao a seco - Google Patents

Processo de gravacao a seco

Info

Publication number: BR8502114A
Authority: BR; Brazil
Prior art keywords: recording process; dry recording; dry; recording
Prior art date: 1984-05-04

Application number

BR8502114A

Other languages

English (en)

Inventor

Jens Dr Gobrecht

Marco Dr Rossinelli

Original Assignee

Bbc Brown Boveri & Cie

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-05-04

Filing date

1985-05-03

Publication date

1985-12-31

1985-05-03 Application filed by Bbc Brown Boveri & Cie filed Critical Bbc Brown Boveri & Cie

1985-12-31 Publication of BR8502114A publication Critical patent/BR8502114A/pt

Classifications

- H10P14/6342—
- H10P14/6939—
- H10P14/69391—
- H10P14/69394—
- H10P14/69395—
- H10P50/242—
- H10P50/692—
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/945—Special, e.g. metal

BR8502114A 1984-05-04 1985-05-03 Processo de gravacao a seco BR8502114A (pt)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CH217484		1984-05-04

Publications (1)

Publication Number	Publication Date
BR8502114A true BR8502114A (pt)	1985-12-31

Family

ID=4227619

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BR8502114A BR8502114A (pt)	1984-05-04	1985-05-03	Processo de gravacao a seco

Country Status (7)

Country	Link
US (1)	US4634495A (pt)
EP (1)	EP0166893B1 (pt)
JP (1)	JPS60243284A (pt)
BR (1)	BR8502114A (pt)
DE (1)	DE3567768D1 (pt)
IN (1)	IN164376B (pt)
ZA (1)	ZA853209B (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5182234A (en) *	1986-03-21	1993-01-26	Advanced Power Technology, Inc.	Profile tailored trench etch using a SF6 -O2 etching composition wherein both isotropic and anisotropic etching is achieved by varying the amount of oxygen
US4767724A (en) *	1986-03-27	1988-08-30	General Electric Company	Unframed via interconnection with dielectric etch stop
US5015381A (en) *	1987-03-09	1991-05-14	Hughes Aircraft Company	Solid element fluid filter for removing small particles from fluids
US4824768A (en) *	1987-12-03	1989-04-25	General Motors Corporation	Method for forming patterned alumina film element
EP0394741B1 (de) *	1989-04-24	1997-06-25	Siemens Aktiengesellschaft	Verfahren zur Erzeugung ätzresistenter Strukturen
FR2669466B1 (fr) *	1990-11-16	1997-11-07	Michel Haond	Procede de gravure de couches de circuit integre a profondeur fixee et circuit integre correspondant.
US5867266A (en)	1996-04-17	1999-02-02	Cornell Research Foundation, Inc.	Multiple optical channels for chemical analysis
AU6533598A (en) *	1997-01-24	1998-08-18	California Institute Of Technology	Flexible skin incorporating mems technology
US7196016B2 (en) *	2003-09-29	2007-03-27	Hitachi Global Storage Technologies Netherlands, B.V.	Fabrication process for preparing recording head sliders made from silicon substrates with SiO2 overcoats
US8206768B2 (en) *	2006-09-28	2012-06-26	Pioneer Corporation	Oxide material, patterning substrate, method of forming a pattern, method of producing an imprint transfer mold, method of producing a recording medium, imprint transfer mold, and recording medium
EP2444826B1 (en) *	2009-06-18	2019-05-22	Toppan Printing Co., Ltd.	Optical device and method of manufacturing the same
FR2965110B1 (fr) *	2010-09-20	2012-09-28	Commissariat Energie Atomique	Procede de structuration d'une couche polymere et procede d'encapsulation d'une microbatterie

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE1621525A1 (de) *	1967-08-01	1971-06-03	Telefunken Patent	Verfahren zum Herstellen einer Bortrioxydschicht
DE2012080A1 (de) *	1970-03-13	1971-09-23	Siemens Ag	Verfahren zum Herstellen von dichten Metalloxidbelegungen auf Halbleiteroberflächen
US3674580A (en) *	1970-05-08	1972-07-04	Bell Telephone Labor Inc	Zirconium mask for semiconductor fabricated using alkaline etchants
DE2449731A1 (de) *	1973-12-03	1975-06-05	Hewlett Packard Co	Aetzverfahren
US4132586A (en) *	1977-12-20	1979-01-02	International Business Machines Corporation	Selective dry etching of substrates
JPS5593225A (en) *	1979-01-10	1980-07-15	Hitachi Ltd	Forming method of minute pattern
DE2929682A1 (de) *	1979-07-04	1981-01-15	Bbc Brown Boveri & Cie	Verfahren zum aetzen von silizium- substraten und substrat zur durchfuehrung des verfahrens
JPS59202636A (ja) *	1983-05-04	1984-11-16	Hitachi Ltd	微細パタ−ン形成方法

1985
- 1985-04-23 EP EP85104927A patent/EP0166893B1/de not_active Expired
- 1985-04-23 DE DE8585104927T patent/DE3567768D1/de not_active Expired
- 1985-04-26 US US06/727,429 patent/US4634495A/en not_active Expired - Fee Related
- 1985-04-27 IN IN316/MAS/85A patent/IN164376B/en unknown
- 1985-04-30 ZA ZA853209A patent/ZA853209B/xx unknown
- 1985-05-02 JP JP60093988A patent/JPS60243284A/ja active Pending
- 1985-05-03 BR BR8502114A patent/BR8502114A/pt unknown

Also Published As

Publication number	Publication date
JPS60243284A (ja)	1985-12-03
DE3567768D1 (en)	1989-02-23
US4634495A (en)	1987-01-06
EP0166893A1 (de)	1986-01-08
ZA853209B (en)	1985-12-24
IN164376B (pt)	1989-03-04
EP0166893B1 (de)	1989-01-18

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