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BR8400428A - Artigo fotossensivel suscetivel de formacao de imagem - Google Patents

Artigo fotossensivel suscetivel de formacao de imagem

Info

Publication number
BR8400428A
BR8400428A BR8400428A BR8400428A BR8400428A BR 8400428 A BR8400428 A BR 8400428A BR 8400428 A BR8400428 A BR 8400428A BR 8400428 A BR8400428 A BR 8400428A BR 8400428 A BR8400428 A BR 8400428A
Authority
BR
Brazil
Prior art keywords
sustainable
photosensitive
image formation
formation article
article
Prior art date
Application number
BR8400428A
Other languages
English (en)
Inventor
Stanley C Busman
John C Chang
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of BR8400428A publication Critical patent/BR8400428A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BR8400428A 1983-02-02 1984-02-01 Artigo fotossensivel suscetivel de formacao de imagem BR8400428A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/463,295 US4511641A (en) 1983-02-02 1983-02-02 Metal film imaging structure

Publications (1)

Publication Number Publication Date
BR8400428A true BR8400428A (pt) 1984-09-04

Family

ID=23839609

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8400428A BR8400428A (pt) 1983-02-02 1984-02-01 Artigo fotossensivel suscetivel de formacao de imagem

Country Status (7)

Country Link
US (1) US4511641A (pt)
EP (1) EP0115446B1 (pt)
JP (1) JPS59172642A (pt)
AU (1) AU564258B2 (pt)
BR (1) BR8400428A (pt)
CA (1) CA1217669A (pt)
DE (1) DE3477614D1 (pt)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4740600A (en) * 1984-05-10 1988-04-26 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
US4737463A (en) * 1985-10-09 1988-04-12 Lifelines Technology, Inc. Photoactivatable time-temperature indicator
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
US5156941A (en) * 1986-06-17 1992-10-20 Kyodo Printing Co., Ltd. Method of producing an optical or magneto-optical recording card and transfer type optical or magneto-optical recording medium
JPH0614414B2 (ja) * 1986-06-17 1994-02-23 共同印刷株式会社 転写型光記録媒体
JPH0688148B2 (ja) * 1986-08-08 1994-11-09 マツダ株式会社 物品へのレ−ザ刻印方法
US4963462A (en) * 1990-01-08 1990-10-16 Hoechst Celanese Corporation Positive working, peel developable, color proofing system having two photosensitive layers
US5246812A (en) * 1990-03-22 1993-09-21 Hoechst Celanese Corporation Partially translucent white film having a metallized surface
DE4216359A1 (de) * 1992-05-18 1993-12-02 Hoechst Ag Verfahren zur Herstellung eines Mehrfarbenbilds und lichtempfindliches Material zur Durchführung dieses Verfahrens
EP0701173B1 (en) * 1994-09-08 1997-11-12 Agfa-Gevaert N.V. Method for producing lithographic plates with imaging elements comprising a photosensitive acid precusor
US6013409A (en) * 1996-09-10 2000-01-11 3M Innovative Properties Company Dry peel-apart imaging process
US5856064A (en) * 1996-09-10 1999-01-05 Minnesota Mining And Manufacturing Company Dry peel-apart imaging or proofing system
US6066830A (en) * 1998-06-04 2000-05-23 Astronics Corporation Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby
WO2001051276A2 (en) * 2000-01-07 2001-07-19 President And Fellows Of Harvard College Fabrication of metallic microstructures via exposure of photosensitive composition
CA2408323C (en) * 2000-05-08 2012-06-12 The University Of British Columbia Drug delivery systems for photodynamic therapy
JP3802732B2 (ja) * 2000-05-12 2006-07-26 信越化学工業株式会社 レジスト材料及びパターン形成方法
US6632872B1 (en) 2000-09-19 2003-10-14 3M Innovative Properties Company Adhesive compositions including self-assembling molecules, adhesives, articles, and methods
US6767688B2 (en) * 2001-12-31 2004-07-27 Shipley Company, L.L.C. Photoresist compositions
GB0518613D0 (en) * 2005-09-13 2005-10-19 Eastman Kodak Co Method of forming conductive tracks
JP4784760B2 (ja) * 2006-10-20 2011-10-05 信越化学工業株式会社 レジスト材料及びパターン形成方法
US7772047B2 (en) * 2007-06-28 2010-08-10 Sandisk Corporation Method of fabricating a semiconductor die having a redistribution layer
US7763980B2 (en) * 2007-06-28 2010-07-27 Sandisk Corporation Semiconductor die having a distribution layer
US20090004419A1 (en) * 2007-06-29 2009-01-01 Cok Ronald S Multi-layer masking film

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE626525A (pt) * 1959-08-05
US3445229A (en) * 1965-05-17 1969-05-20 Du Pont Photopolymerizable compositions,elements,and processes
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US4123309A (en) * 1973-11-29 1978-10-31 Minnesota Mining And Manufacturing Company Transfer letter system
US3997349A (en) * 1974-06-17 1976-12-14 Minnesota Mining And Manufacturing Company Light-sensitive development-free driographic printing plate
US4247619A (en) * 1979-12-20 1981-01-27 E. I. Du Pont De Nemours And Company Negative-working multilayer photosensitive tonable element
US4205989A (en) * 1976-04-14 1980-06-03 Kimoto & Co., Ltd. Dry system image producing element
JPS6020735B2 (ja) * 1976-06-28 1985-05-23 富士写真フイルム株式会社 剥離現像可能な感光材料を用いる画像形成方法
JPS5446034A (en) * 1977-09-19 1979-04-11 Fuji Photo Film Co Ltd Image rorming method
JPS5479032A (en) * 1977-12-06 1979-06-23 Fuji Photo Film Co Ltd Image formation emthod
GB2020837A (en) * 1978-05-11 1979-11-21 Polychrome Corp Multi-layered Image Forming Construction Having a Release Layer
JPS54153631A (en) * 1978-05-24 1979-12-04 Fuji Photo Film Co Ltd Relief image formation method
US4291114A (en) * 1978-10-18 1981-09-22 Minnesota Mining And Manufacturing Co. Imageable, composite-dry transfer sheet and process of using same
US4369244A (en) * 1980-08-11 1983-01-18 Minnesota Mining And Manufacturing Company Imaging process and article employing photolabile, blocked surfactant

Also Published As

Publication number Publication date
AU564258B2 (en) 1987-08-06
EP0115446B1 (en) 1989-04-05
JPH0352854B2 (pt) 1991-08-13
US4511641A (en) 1985-04-16
DE3477614D1 (en) 1989-05-11
EP0115446A2 (en) 1984-08-08
CA1217669A (en) 1987-02-10
AU2398584A (en) 1984-08-09
EP0115446A3 (en) 1986-06-11
JPS59172642A (ja) 1984-09-29

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Legal Events

Date Code Title Description
MM Lapse due to non-payment of fees (art. 50)
B15K Others concerning applications: alteration of classification

Free format text: PROCEDIMENTO AUTOMATICO DE RECLASSIFICACAO. AS CLASSIFICACOES IPC ANTERIORES ERAM: G03G 5/08; G03C 1/68.

Ipc: G03F 1/54 (2012.01), G03F 7/34 (2006.01)

Ipc: G03F 1/54 (2012.01), G03F 7/34 (2006.01)