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AU9000998A - Substrate-holding device, substrate-holding method and exposure device - Google Patents

Substrate-holding device, substrate-holding method and exposure device

Info

Publication number
AU9000998A
AU9000998A AU90009/98A AU9000998A AU9000998A AU 9000998 A AU9000998 A AU 9000998A AU 90009/98 A AU90009/98 A AU 90009/98A AU 9000998 A AU9000998 A AU 9000998A AU 9000998 A AU9000998 A AU 9000998A
Authority
AU
Australia
Prior art keywords
substrate
holding
exposure device
exposure
holding method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU90009/98A
Inventor
Takahiro Michimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU9000998A publication Critical patent/AU9000998A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H10P72/175—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • H10P72/18—
    • H10P72/74—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
AU90009/98A 1997-12-01 1998-09-09 Substrate-holding device, substrate-holding method and exposure device Abandoned AU9000998A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-345804 1997-12-01
JP34580497 1997-12-01
PCT/JP1998/004053 WO1999028219A1 (en) 1997-12-01 1998-09-09 Substrate-holding device, substrate-holding method and exposure device

Publications (1)

Publication Number Publication Date
AU9000998A true AU9000998A (en) 1999-06-16

Family

ID=18379104

Family Applications (1)

Application Number Title Priority Date Filing Date
AU90009/98A Abandoned AU9000998A (en) 1997-12-01 1998-09-09 Substrate-holding device, substrate-holding method and exposure device

Country Status (3)

Country Link
AU (1) AU9000998A (en)
TW (1) TW434463B (en)
WO (1) WO1999028219A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220397704A1 (en) * 2019-12-02 2022-12-15 Nippon Light Metal Company, Ltd. Optical member and production method therefor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3077117B2 (en) * 1993-07-20 2000-08-14 東京応化工業株式会社 Substrate transfer and transport device

Also Published As

Publication number Publication date
TW434463B (en) 2001-05-16
WO1999028219A1 (en) 1999-06-10

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase