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AU8201698A - Method for electrochemical deposition and/or etching and an electrochemical cel lof this nature - Google Patents

Method for electrochemical deposition and/or etching and an electrochemical cel lof this nature

Info

Publication number
AU8201698A
AU8201698A AU82016/98A AU8201698A AU8201698A AU 8201698 A AU8201698 A AU 8201698A AU 82016/98 A AU82016/98 A AU 82016/98A AU 8201698 A AU8201698 A AU 8201698A AU 8201698 A AU8201698 A AU 8201698A
Authority
AU
Australia
Prior art keywords
electrochemical
lof
etching
nature
cel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU82016/98A
Inventor
Bert Raf Celis
Jean-Pierre Paul Julien Clement Frans Celis
Jan Leo Dominique Fransaer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Katholieke Universiteit Leuven
Interuniversitair Microelektronica Centrum vzw IMEC
Original Assignee
Katholieke Universiteit Leuven
Interuniversitair Microelektronica Centrum vzw IMEC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Katholieke Universiteit Leuven, Interuniversitair Microelektronica Centrum vzw IMEC filed Critical Katholieke Universiteit Leuven
Publication of AU8201698A publication Critical patent/AU8201698A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
AU82016/98A 1997-07-03 1998-07-03 Method for electrochemical deposition and/or etching and an electrochemical cel lof this nature Abandoned AU8201698A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL1006463 1997-07-03
NL1006463A NL1006463C2 (en) 1997-07-03 1997-07-03 Method for electrochemical deposition and / or etching and such an electrochemical cell.
PCT/BE1998/000102 WO1999001592A1 (en) 1997-07-03 1998-07-03 Method for electrochemical deposition and/or etching and an electrochemical cell of this nature

Publications (1)

Publication Number Publication Date
AU8201698A true AU8201698A (en) 1999-01-25

Family

ID=19765267

Family Applications (1)

Application Number Title Priority Date Filing Date
AU82016/98A Abandoned AU8201698A (en) 1997-07-03 1998-07-03 Method for electrochemical deposition and/or etching and an electrochemical cel lof this nature

Country Status (3)

Country Link
AU (1) AU8201698A (en)
NL (1) NL1006463C2 (en)
WO (1) WO1999001592A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201021326D0 (en) 2010-12-16 2011-01-26 Picofluidics Ltd Electro chemical deposition apparatus
US9136794B2 (en) 2011-06-22 2015-09-15 Research Triangle Institute, International Bipolar microelectronic device
TWI671435B (en) * 2018-06-08 2019-09-11 台灣創智成功科技有限公司 Plating device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU489616A2 (en) * 1973-07-12 1975-10-30 Московский Ордена Ленина Энергетический Институт The method of dimensional electrochemical processing
JP2547886B2 (en) * 1990-05-09 1996-10-23 隆久 増沢 Electrochemical machining method by pulse current and its equipment

Also Published As

Publication number Publication date
NL1006463C2 (en) 1999-01-05
WO1999001592A1 (en) 1999-01-14

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