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AU8127498A - Device and method for inspecting surface - Google Patents

Device and method for inspecting surface

Info

Publication number
AU8127498A
AU8127498A AU81274/98A AU8127498A AU8127498A AU 8127498 A AU8127498 A AU 8127498A AU 81274/98 A AU81274/98 A AU 81274/98A AU 8127498 A AU8127498 A AU 8127498A AU 8127498 A AU8127498 A AU 8127498A
Authority
AU
Australia
Prior art keywords
inspecting surface
inspecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU81274/98A
Inventor
Toshiaki Kitamura
Koichiro Komatsu
Takeo Omori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP20075897A external-priority patent/JP3982014B2/en
Priority claimed from JP23450597A external-priority patent/JP3981895B2/en
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU8127498A publication Critical patent/AU8127498A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU81274/98A 1997-07-10 1998-07-09 Device and method for inspecting surface Abandoned AU8127498A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP20075897A JP3982014B2 (en) 1997-07-10 1997-07-10 Surface inspection apparatus and method
JP9-200758 1997-07-10
JP9-234505 1997-08-29
JP23450597A JP3981895B2 (en) 1997-08-29 1997-08-29 Automatic macro inspection device
PCT/JP1998/003076 WO1999002977A1 (en) 1997-07-10 1998-07-09 Device and method for inspecting surface

Publications (1)

Publication Number Publication Date
AU8127498A true AU8127498A (en) 1999-02-08

Family

ID=26512376

Family Applications (1)

Application Number Title Priority Date Filing Date
AU81274/98A Abandoned AU8127498A (en) 1997-07-10 1998-07-09 Device and method for inspecting surface

Country Status (5)

Country Link
US (1) US6512578B1 (en)
KR (1) KR20010015544A (en)
AU (1) AU8127498A (en)
TW (2) TWI226428B (en)
WO (1) WO1999002977A1 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
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JP2002139451A (en) * 2000-08-04 2002-05-17 Nikon Corp Surface inspection equipment
US6844236B2 (en) * 2001-07-23 2005-01-18 Agere Systems Inc. Method and structure for DC and RF shielding of integrated circuits
JP4183492B2 (en) * 2002-11-27 2008-11-19 株式会社日立製作所 Defect inspection apparatus and defect inspection method
WO2004088399A1 (en) * 2003-03-31 2004-10-14 Hits Co., Ltd. Lcd cell edge inspection apparatus and method thereof
US7027145B2 (en) * 2003-06-24 2006-04-11 The Regents Of The University Of Michigan Reconfigurable surface finish inspection apparatus for cylinder bores and other surfaces
DE10330005B4 (en) * 2003-07-03 2006-12-21 Leica Microsystems Semiconductor Gmbh Device for inspecting a wafer
JP4485904B2 (en) * 2004-10-18 2010-06-23 株式会社日立ハイテクノロジーズ Inspection apparatus and inspection method
US8121392B2 (en) * 2004-10-25 2012-02-21 Parata Systems, Llc Embedded imaging and control system
US7372557B2 (en) * 2005-08-26 2008-05-13 Nikon Corporation Surface defect inspection apparatus and surface defect inspection method
US20070146685A1 (en) * 2005-11-30 2007-06-28 Yoo Woo S Dynamic wafer stress management system
US7440094B2 (en) 2005-11-30 2008-10-21 Wafermasters Incorporated Optical sample characterization system
US20080246966A1 (en) * 2005-12-14 2008-10-09 Nikon Corporation Surface-Inspecting Apparatus and Surface-Inspecting Method
US7586607B2 (en) * 2006-04-21 2009-09-08 Rudolph Technologies, Inc. Polarization imaging
JP4251193B2 (en) * 2006-05-23 2009-04-08 コニカミノルタセンシング株式会社 Reflection characteristic measuring device
CN101490538B (en) * 2006-08-02 2013-03-27 株式会社尼康 Defect detecting apparatus and defect detecting method
US20080099675A1 (en) * 2006-10-31 2008-05-01 Hitachi High-Technologies Corporation Inspection apparatus and an inspection method
US7990546B2 (en) * 2007-07-16 2011-08-02 Applied Materials Israel, Ltd. High throughput across-wafer-variation mapping
JP4797005B2 (en) * 2007-09-11 2011-10-19 株式会社日立ハイテクノロジーズ Surface inspection method and surface inspection apparatus
JP5175605B2 (en) * 2008-04-18 2013-04-03 株式会社日立ハイテクノロジーズ Pattern shape inspection method
KR101076603B1 (en) * 2008-07-16 2011-10-26 옵티시스 주식회사 Optical communication module for optical wavelength division multipexing
US8724882B2 (en) * 2008-07-29 2014-05-13 Applied Materials Israel, Ltd. Mapping variations of a surface
JPWO2010050488A1 (en) * 2008-10-31 2012-03-29 株式会社ニコン Defect inspection apparatus and defect inspection method
US10054423B2 (en) * 2012-12-27 2018-08-21 Nova Measuring Instruments Ltd. Optical method and system for critical dimensions and thickness characterization
DE102015100977A1 (en) * 2015-01-23 2016-07-28 Vorwerk & Co. Interholding Gmbh Device for processing a surface
DE102015221773A1 (en) * 2015-11-05 2017-05-11 Carl Zeiss Smt Gmbh Method and device for characterizing a wafer structured by at least one lithography step
KR20170083678A (en) * 2016-01-08 2017-07-19 삼성전자주식회사 Method of Inspecting Substrate
US9816941B2 (en) * 2016-03-28 2017-11-14 Saudi Arabian Oil Company Systems and methods for constructing and testing composite photonic structures
CN107421963A (en) * 2017-09-18 2017-12-01 重庆大学 A kind of nuclear fuel green compact crack detection device and crack detecting method
US10401286B1 (en) * 2018-03-23 2019-09-03 Intel Corporation Reflectivity analysis to determine material on a surface
CN109808024B (en) * 2019-03-27 2023-06-23 南京林业大学 Shaving board surface flatness process adjusting system and method based on two-dimensional detection
JP7191801B2 (en) * 2019-11-06 2022-12-19 株式会社東芝 optical inspection equipment
CN118746267B (en) * 2024-06-11 2025-04-29 浙江驰宇空天技术有限公司 Device for detecting symmetry of hemispherical harmonic oscillator by light beam focusing

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3825351A (en) * 1973-01-19 1974-07-23 Hatachi Electronics Co Ltd Automatic surface inspection device for running object
US3902807A (en) * 1973-10-25 1975-09-02 Du Pont Method for operating an attenuated total reflection infrared system
JPS55164304A (en) 1979-06-11 1980-12-22 Hitachi Ltd Mirror surface check unit
US4630276A (en) * 1984-10-09 1986-12-16 Aeronca Electronics, Inc. Compact laser scanning system
US4902900A (en) * 1987-12-21 1990-02-20 Nikon Corporation Device for detecting the levelling of the surface of an object
US5235400A (en) * 1988-10-12 1993-08-10 Hitachi, Ltd. Method of and apparatus for detecting defect on photomask
US4945220A (en) * 1988-11-16 1990-07-31 Prometrix Corporation Autofocusing system for microscope having contrast detection means
JP3158446B2 (en) * 1990-12-13 2001-04-23 株式会社ニコン Surface position detecting device, surface position detecting method, exposure apparatus, exposure method, and semiconductor manufacturing method
JP3218727B2 (en) * 1992-09-09 2001-10-15 株式会社ニコン Foreign matter inspection device
US5510892A (en) * 1992-11-25 1996-04-23 Nikon Corporation Inclination detecting apparatus and method
US5682244A (en) * 1994-03-25 1997-10-28 Barlow; Clyde H. Automated optical detection of tissue perfusion by microspheres
JP3404134B2 (en) * 1994-06-21 2003-05-06 株式会社ニュークリエイション Inspection device
US5535005A (en) * 1994-08-25 1996-07-09 Texas Instruments Incorporated Method and system for inspecting polished surface texture
JP3483948B2 (en) 1994-09-01 2004-01-06 オリンパス株式会社 Defect detection device
JPH08145645A (en) * 1994-11-28 1996-06-07 Nikon Corp Tilt detection device
JP3668294B2 (en) 1995-08-22 2005-07-06 オリンパス株式会社 Surface defect inspection equipment
JP3311927B2 (en) * 1996-04-18 2002-08-05 トヨタ自動車株式会社 Optical-Magneto-optical effect measuring device
US5777729A (en) * 1996-05-07 1998-07-07 Nikon Corporation Wafer inspection method and apparatus using diffracted light
KR980010412A (en) * 1996-07-09 1998-04-30 고노 시게오 Foreign body inspection device
KR100267665B1 (en) * 1997-08-28 2001-01-15 하나와 요시카즈 Surface Inspection Device

Also Published As

Publication number Publication date
TWI226428B (en) 2005-01-11
US6512578B1 (en) 2003-01-28
WO1999002977A1 (en) 1999-01-21
TW449657B (en) 2001-08-11
KR20010015544A (en) 2001-02-26

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase