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AU7923500A - Method for the production of nanometer range surface decorated substrates - Google Patents

Method for the production of nanometer range surface decorated substrates

Info

Publication number
AU7923500A
AU7923500A AU79235/00A AU7923500A AU7923500A AU 7923500 A AU7923500 A AU 7923500A AU 79235/00 A AU79235/00 A AU 79235/00A AU 7923500 A AU7923500 A AU 7923500A AU 7923500 A AU7923500 A AU 7923500A
Authority
AU
Australia
Prior art keywords
nanometer range
production
range surface
surface decorated
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU79235/00A
Inventor
Martin Moller
Joachim Spatz
Paul Ziemann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universitaet Ulm
Original Assignee
Universitaet Ulm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universitaet Ulm filed Critical Universitaet Ulm
Publication of AU7923500A publication Critical patent/AU7923500A/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Chemically Coating (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The invention relates to a method for the production of nanometer range surface decorated substrates and in particular those which have lines consisting of 1-30 nm sized dots or 1-30 n wide lines deposited thereon made from inorganic clusters. The inventive method is based on the positioning of polymeric core-shell-systems, the cores of which are loaded with suitable inorganic raw material compounds in recesses having structured photolacquer layers produced by lithographic techniques. Subsequent removal of the polymeric core-shell-systems by dry etching, pyrolysis, oxidation or reduction is performed. The invention also relates to the aforementioned substrates which have nanometer range surface decorated surface structures.
AU79235/00A 1999-10-28 2000-10-27 Method for the production of nanometer range surface decorated substrates Abandoned AU7923500A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19952018A DE19952018C1 (en) 1999-10-28 1999-10-28 Process for the production of substrates decorated in the nanometer range
DE19952018 1999-10-28
PCT/EP2000/010607 WO2001031402A1 (en) 1999-10-28 2000-10-27 Method for the production of nanometer range surface decorated substrates

Publications (1)

Publication Number Publication Date
AU7923500A true AU7923500A (en) 2001-05-08

Family

ID=7927219

Family Applications (1)

Application Number Title Priority Date Filing Date
AU79235/00A Abandoned AU7923500A (en) 1999-10-28 2000-10-27 Method for the production of nanometer range surface decorated substrates

Country Status (5)

Country Link
EP (1) EP1244938B1 (en)
AT (1) ATE292293T1 (en)
AU (1) AU7923500A (en)
DE (2) DE19952018C1 (en)
WO (1) WO2001031402A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004032451B4 (en) * 2004-07-05 2015-11-19 Bernd Burchard Device and method for the spatially resolved placement of nanoclusters
DE102004043908A1 (en) 2004-09-10 2006-03-30 GRÄTER, Stefan Surface-structured polymeric substrates and their preparation
DE102008060991A1 (en) 2008-12-08 2010-06-10 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Subtrate for selection and specific influence on the function of cells
DE102008060992A1 (en) 2008-12-08 2010-06-17 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Sorting of biological samples at nanostructured interfaces
IT1399258B1 (en) * 2009-01-07 2013-04-11 Calmed S R L PROCESS OF MANUFACTURE OF AN OPTICAL DETECTION DEVICE.
EP2260995A1 (en) 2009-06-12 2010-12-15 Max-Planck-Gesellschaft zur Förderung der Wissenschaften E.V. Surface-structured polyurethane substrates and methods for producing the same
WO2011068960A2 (en) * 2009-12-02 2011-06-09 Northwestern University Block copolymer-assisted nanolithography
WO2011139344A2 (en) 2010-04-28 2011-11-10 Pacific Biosciences Of California, Inc Nanoscale apertures having islands of functionality
JP5876059B2 (en) * 2010-10-13 2016-03-02 マツクス−プランク−ゲゼルシャフト ツール フエルデルング デル ヴイツセンシャフテン エー フアウ Method for fabricating highly ordered nanopillars or nanohole structures on large areas
WO2013007354A1 (en) 2011-07-08 2013-01-17 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. A method for preventing or reducing the production of biofilms formed by microorganisms using nanostructured surfaces
US9352278B2 (en) 2011-07-27 2016-05-31 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. Substrate surface structured with thermally stable metal alloy nanoparticles, a method for preparing the same and uses thereof, in particular as a catalyst
EP3130559A1 (en) 2015-08-14 2017-02-15 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Fabrication of nanostructured substrated comprising a plurality of nanostructure gradients on a single substrate

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519872A (en) * 1984-06-11 1985-05-28 International Business Machines Corporation Use of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processes
DE19747815A1 (en) * 1997-10-29 1999-05-06 Univ Ulm Production of surface-structured substrates used in the manufacture of electronic components
DE59809228D1 (en) * 1997-10-29 2003-09-11 Univ Ulm NANO STRUCTURES
US6051149A (en) * 1998-03-12 2000-04-18 Micron Technology, Inc. Coated beads and process utilizing such beads for forming an etch mask having a discontinuous regular pattern

Also Published As

Publication number Publication date
DE50009945D1 (en) 2005-05-04
ATE292293T1 (en) 2005-04-15
EP1244938A1 (en) 2002-10-02
WO2001031402A1 (en) 2001-05-03
DE19952018C1 (en) 2001-08-23
EP1244938B1 (en) 2005-03-30
WO2001031402A8 (en) 2002-01-03

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase