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AU7438296A - Magnification control and thermal substrate chuck for photolithography - Google Patents

Magnification control and thermal substrate chuck for photolithography

Info

Publication number
AU7438296A
AU7438296A AU74382/96A AU7438296A AU7438296A AU 7438296 A AU7438296 A AU 7438296A AU 74382/96 A AU74382/96 A AU 74382/96A AU 7438296 A AU7438296 A AU 7438296A AU 7438296 A AU7438296 A AU 7438296A
Authority
AU
Australia
Prior art keywords
photolithography
substrate chuck
magnification control
thermal substrate
thermal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU74382/96A
Other languages
English (en)
Inventor
Jeffrey G. Knirck
Paul A. Swanson
James F Tobin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MAGAPANEL Corp
Original Assignee
MAGAPANEL CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MAGAPANEL CORP filed Critical MAGAPANEL CORP
Publication of AU7438296A publication Critical patent/AU7438296A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU74382/96A 1995-10-12 1996-10-11 Magnification control and thermal substrate chuck for photolithography Abandoned AU7438296A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US542290 1990-06-22
US54229095A 1995-10-12 1995-10-12
PCT/US1996/016272 WO1997014077A1 (fr) 1995-10-12 1996-10-11 Ajustement de l'agrandissement et support thermostate pour un substrat pour photolithographie

Publications (1)

Publication Number Publication Date
AU7438296A true AU7438296A (en) 1997-04-30

Family

ID=24163155

Family Applications (1)

Application Number Title Priority Date Filing Date
AU74382/96A Abandoned AU7438296A (en) 1995-10-12 1996-10-11 Magnification control and thermal substrate chuck for photolithography

Country Status (2)

Country Link
AU (1) AU7438296A (fr)
WO (1) WO1997014077A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19827602A1 (de) 1998-06-20 1999-12-23 Zeiss Carl Fa Verfahren zur Korrektur nicht-rotationssymmetrischer Bildfehler
US7561251B2 (en) * 2004-03-29 2009-07-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7830493B2 (en) 2005-10-04 2010-11-09 Asml Netherlands B.V. System and method for compensating for radiation induced thermal distortions in a substrate or projection system
US8760621B2 (en) * 2007-03-12 2014-06-24 Asml Netherlands B.V. Lithographic apparatus and method
CN107300835B (zh) * 2012-05-17 2019-02-15 Asml荷兰有限公司 热调节单元、光刻设备以及器件制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57169244A (en) * 1981-04-13 1982-10-18 Canon Inc Temperature controller for mask and wafer
US4564284A (en) * 1983-09-12 1986-01-14 Canon Kabushiki Kaisha Semiconductor exposure apparatus
JPH01152639A (ja) * 1987-12-10 1989-06-15 Canon Inc 吸着保持装置
US5155652A (en) * 1991-05-02 1992-10-13 International Business Machines Corporation Temperature cycling ceramic electrostatic chuck
JP2864060B2 (ja) * 1991-09-04 1999-03-03 キヤノン株式会社 縮小投影型露光装置及び方法
JPH0851143A (ja) * 1992-07-20 1996-02-20 Nikon Corp 基板保持装置

Also Published As

Publication number Publication date
WO1997014077A1 (fr) 1997-04-17

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