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AU7371898A - Low density film for low dielectric constant applications - Google Patents

Low density film for low dielectric constant applications

Info

Publication number
AU7371898A
AU7371898A AU73718/98A AU7371898A AU7371898A AU 7371898 A AU7371898 A AU 7371898A AU 73718/98 A AU73718/98 A AU 73718/98A AU 7371898 A AU7371898 A AU 7371898A AU 7371898 A AU7371898 A AU 7371898A
Authority
AU
Australia
Prior art keywords
dielectric constant
low
density film
low density
constant applications
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU73718/98A
Inventor
Mark J. Hampden-Smith
Toivo T. Kodas
Daniel J. Skamser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DANIEL J SKAMSER
MARK J HAMPDEN SMITH
TOIVO T KODAS
Original Assignee
DANIEL J SKAMSER
MARK J HAMPDEN SMITH
TOIVO T KODAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DANIEL J SKAMSER, MARK J HAMPDEN SMITH, TOIVO T KODAS filed Critical DANIEL J SKAMSER
Publication of AU7371898A publication Critical patent/AU7371898A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3694—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer having a composition gradient through its thickness
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C08K7/26—Silicon- containing compounds
    • H10P14/6334—
    • H10P14/6342—
    • H10P14/662—
    • H10P14/665—
    • H10P14/6922—
    • H10P14/69394—
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Health & Medical Sciences (AREA)
  • Composite Materials (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
AU73718/98A 1997-05-07 1998-05-06 Low density film for low dielectric constant applications Abandoned AU7371898A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US85236297A 1997-05-07 1997-05-07
US08852362 1997-05-07
PCT/US1998/009295 WO1998050945A2 (en) 1997-05-07 1998-05-06 Low density film for low dielectric constant applications

Publications (1)

Publication Number Publication Date
AU7371898A true AU7371898A (en) 1998-11-27

Family

ID=25313123

Family Applications (1)

Application Number Title Priority Date Filing Date
AU73718/98A Abandoned AU7371898A (en) 1997-05-07 1998-05-06 Low density film for low dielectric constant applications

Country Status (2)

Country Link
AU (1) AU7371898A (en)
WO (1) WO1998050945A2 (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6469390B2 (en) * 1999-01-26 2002-10-22 Agere Systems Guardian Corp. Device comprising thermally stable, low dielectric constant material
JP3827056B2 (en) * 1999-03-17 2006-09-27 キヤノンマーケティングジャパン株式会社 Method for forming interlayer insulating film and semiconductor device
JP3600507B2 (en) 2000-05-18 2004-12-15 キヤノン販売株式会社 Semiconductor device and manufacturing method thereof
JP3532830B2 (en) 2000-05-24 2004-05-31 キヤノン販売株式会社 Semiconductor device and manufacturing method thereof
JP2002009069A (en) 2000-06-22 2002-01-11 Canon Sales Co Inc Method for forming film
JP3934343B2 (en) 2000-07-12 2007-06-20 キヤノンマーケティングジャパン株式会社 Semiconductor device and manufacturing method thereof
KR100486333B1 (en) 2000-07-21 2005-04-29 가부시끼가이샤 한도따이 프로세스 켄큐쇼 Semiconductor apparatus and method of manufacturing the same
US6500752B2 (en) 2000-07-21 2002-12-31 Canon Sales Co., Inc. Semiconductor device and semiconductor device manufacturing method
US6835669B2 (en) 2000-07-21 2004-12-28 Canon Sales Co., Inc. Film forming method, semiconductor device and semiconductor device manufacturing method
JP3545364B2 (en) 2000-12-19 2004-07-21 キヤノン販売株式会社 Semiconductor device and manufacturing method thereof
JP2005504433A (en) 2001-07-18 2005-02-10 トリコン ホールディングス リミティド Low dielectric constant layer
JP3701626B2 (en) 2001-12-06 2005-10-05 キヤノン販売株式会社 Manufacturing method of semiconductor device
US9061317B2 (en) 2002-04-17 2015-06-23 Air Products And Chemicals, Inc. Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
ATE499458T1 (en) * 2002-04-17 2011-03-15 Air Prod & Chem METHOD FOR PRODUCING A POROUS SIZE LAYER
JP3859540B2 (en) 2002-05-14 2006-12-20 松下電器産業株式会社 Low dielectric constant insulating film forming material
US6825130B2 (en) 2002-12-12 2004-11-30 Asm Japan K.K. CVD of porous dielectric materials
DE102012108704A1 (en) * 2012-09-17 2014-03-20 Osram Opto Semiconductors Gmbh Method for fixing a matrix-free electrophoretically deposited layer on a semiconductor chip and radiation-emitting semiconductor component
EP3655494B1 (en) 2017-07-20 2021-04-14 Saudi Arabian Oil Company Mitigation of condensate banking using surface modification
EP3914667A1 (en) 2019-01-23 2021-12-01 Saudi Arabian Oil Company Mitigation of condensate and water banking using functionalized nanoparticles
JP7618439B2 (en) * 2020-12-17 2025-01-21 積水化成品工業株式会社 Hollow resin particles for use in resin composition for semiconductor members
CN119419064A (en) * 2024-09-29 2025-02-11 黄山申格电子科技股份有限公司 Composite dielectric film, metallized film and capacitor

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4865875A (en) * 1986-02-28 1989-09-12 Digital Equipment Corporation Micro-electronics devices and methods of manufacturing same
US4849284A (en) * 1987-02-17 1989-07-18 Rogers Corporation Electrical substrate material
US5055342A (en) * 1990-02-16 1991-10-08 International Business Machines Corporation Fluorinated polymeric composition, fabrication thereof and use thereof
US5354611A (en) * 1990-02-21 1994-10-11 Rogers Corporation Dielectric composite
JPH0697298A (en) * 1992-09-14 1994-04-08 Fujitsu Ltd Method for forming insulating film of semiconductor device
EP0604799A1 (en) * 1992-12-29 1994-07-06 International Business Machines Corporation Coated filler and use thereof
JP3567494B2 (en) * 1993-08-27 2004-09-22 旭硝子株式会社 Coating agent consisting of organosol dispersed in fluorinated solvent
US5835987A (en) * 1995-10-31 1998-11-10 Micron Technology, Inc. Reduced RC delay between adjacent substrate wiring lines
US5801092A (en) * 1997-09-04 1998-09-01 Ayers; Michael R. Method of making two-component nanospheres and their use as a low dielectric constant material for semiconductor devices

Also Published As

Publication number Publication date
WO1998050945A2 (en) 1998-11-12
WO1998050945A3 (en) 1999-03-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase