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AU7166291A - Programmable masking apparatus - Google Patents

Programmable masking apparatus

Info

Publication number
AU7166291A
AU7166291A AU71662/91A AU7166291A AU7166291A AU 7166291 A AU7166291 A AU 7166291A AU 71662/91 A AU71662/91 A AU 71662/91A AU 7166291 A AU7166291 A AU 7166291A AU 7166291 A AU7166291 A AU 7166291A
Authority
AU
Australia
Prior art keywords
masking apparatus
programmable masking
programmable
masking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU71662/91A
Inventor
Hector Franco
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MANUFACTURING SCIENCES Inc
Original Assignee
MANUFACTURING SCIENCES Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MANUFACTURING SCIENCES Inc filed Critical MANUFACTURING SCIENCES Inc
Publication of AU7166291A publication Critical patent/AU7166291A/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70283Mask effects on the imaging process
    • G03F7/70291Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/316Testing of analog circuits
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2294Addressing the hologram to an active spatial light modulator
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00Active addressable light modulator
    • G03H2225/20Nature, e.g. e-beam addressed
    • G03H2225/22Electrically addressed SLM [EA-SLM]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU71662/91A 1989-12-22 1990-12-12 Programmable masking apparatus Abandoned AU7166291A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45599489A 1989-12-22 1989-12-22
US455994 1995-05-31

Publications (1)

Publication Number Publication Date
AU7166291A true AU7166291A (en) 1991-07-24

Family

ID=23811014

Family Applications (1)

Application Number Title Priority Date Filing Date
AU71662/91A Abandoned AU7166291A (en) 1989-12-22 1990-12-12 Programmable masking apparatus

Country Status (2)

Country Link
AU (1) AU7166291A (en)
WO (1) WO1991010170A1 (en)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3307997B2 (en) * 1992-10-13 2002-07-29 富士通株式会社 Display device
JP2616660B2 (en) * 1993-06-21 1997-06-04 日本電気株式会社 Exposure apparatus for thick film wiring pattern and method for forming thick film
EP0746800B1 (en) 1994-02-21 2001-10-10 Lüllau, Friedrich Process and device for the photomechanical production of structured surfaces, in particular for exposing offset plates
US6035013A (en) * 1994-06-01 2000-03-07 Simage O.Y. Radiographic imaging devices, systems and methods
GB2289983B (en) * 1994-06-01 1996-10-16 Simage Oy Imaging devices,systems and methods
GB2289981A (en) * 1994-06-01 1995-12-06 Simage Oy Imaging devices systems and methods
US6291110B1 (en) 1997-06-27 2001-09-18 Pixelligent Technologies Llc Methods for transferring a two-dimensional programmable exposure pattern for photolithography
US6251550B1 (en) 1998-07-10 2001-06-26 Ball Semiconductor, Inc. Maskless photolithography system that digitally shifts mask data responsive to alignment data
US6529262B1 (en) 1999-04-14 2003-03-04 Ball Semiconductor, Inc. System and method for performing lithography on a substrate
US6379867B1 (en) 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system
US6425669B1 (en) 2000-05-24 2002-07-30 Ball Semiconductor, Inc. Maskless exposure system
US6509955B2 (en) * 2000-05-25 2003-01-21 Ball Semiconductor, Inc. Lens system for maskless photolithography
US6436093B1 (en) 2000-06-21 2002-08-20 Luis Antonio Ruiz Controllable liquid crystal matrix mask particularly suited for performing ophthamological surgery, a laser system with said mask and a method of using the same
US6464692B1 (en) 2000-06-21 2002-10-15 Luis Antonio Ruiz Controllable electro-optical patternable mask, system with said mask and method of using the same
US6537738B1 (en) 2000-08-08 2003-03-25 Ball Semiconductor, Inc. System and method for making smooth diagonal components with a digital photolithography system
US6493867B1 (en) 2000-08-08 2002-12-10 Ball Semiconductor, Inc. Digital photolithography system for making smooth diagonal components
US6512625B2 (en) 2000-11-22 2003-01-28 Ball Semiconductor, Inc. Light modulation device and system
US6473237B2 (en) 2000-11-14 2002-10-29 Ball Semiconductor, Inc. Point array maskless lithography
US6433917B1 (en) 2000-11-22 2002-08-13 Ball Semiconductor, Inc. Light modulation device and system
AU2002229742A1 (en) * 2001-02-21 2002-09-04 International Business Machines Corporation High-resolution photoresist structuring of multi-layer structures deposited onto substrates
US6965387B2 (en) 2001-08-03 2005-11-15 Ball Semiconductor, Inc. Real time data conversion for a digital display
US20040126757A1 (en) * 2002-01-31 2004-07-01 Francesco Cerrina Method and apparatus for synthesis of arrays of DNA probes
US6870604B2 (en) 2002-04-23 2005-03-22 Ball Semiconductor, Inc. High resolution point array
US7164961B2 (en) 2002-06-14 2007-01-16 Disco Corporation Modified photolithography movement system
CN100524026C (en) 2002-10-25 2009-08-05 迈普尔平版印刷Ip有限公司 Lithography system
DE10319154B4 (en) * 2003-04-29 2012-12-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Maskless lithography system
DE10354112B4 (en) * 2003-11-19 2008-07-31 Qimonda Ag Method and arrangement for repairing memory chips by means of micro-lithography method
GB2431732A (en) * 2005-10-31 2007-05-02 Nancy Ellen Johnson Lumpkin Programmable solid state lithography mask
DE102009054024A1 (en) * 2009-11-19 2011-05-26 Amphenol-Tuchel Electronics Gmbh Electronically controllable matrix mask
FR2959025B1 (en) * 2010-04-20 2013-11-15 St Microelectronics Rousset PHOTOLITHOGRAPHY METHOD AND DEVICE
US9730649B1 (en) * 2016-09-13 2017-08-15 Open Water Internet Inc. Optical imaging of diffuse medium
US10778912B2 (en) 2018-03-31 2020-09-15 Open Water Internet Inc. System and device for optical transformation
WO2023004493A1 (en) * 2021-07-26 2023-02-02 Technologies Digitho Inc. Photolithography mask and photolithography system comprising said photolithography mask
US11934091B1 (en) 2021-07-26 2024-03-19 Technologies Digitho Inc. Photolithography mask and photolithography system comprising said photolithography mask
SK9992Y1 (en) 2023-06-07 2024-03-13 Elektrotechnický ústav Slovenskej akadémie vied Stereolithography module for vacuum chambers

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013466A (en) * 1975-06-26 1977-03-22 Western Electric Company, Inc. Method of preparing a circuit utilizing a liquid crystal artwork master
JPS61138285A (en) * 1984-12-10 1986-06-25 ホシデン株式会社 liquid crystal display element
US4653860A (en) * 1985-01-07 1987-03-31 Thomson Components-Mostek Corporation Programable mask or reticle with opaque portions on electrodes
JPH0766253B2 (en) * 1986-06-20 1995-07-19 松下電器産業株式会社 Matrix type image display device
JPH0713715B2 (en) * 1987-01-22 1995-02-15 ホシデン株式会社 Color liquid crystal display device
US4840459A (en) * 1987-11-03 1989-06-20 General Electric Co. Matrix addressed flat panel liquid crystal display device with dual ended auxiliary repair lines for address line repair
US4944578A (en) * 1988-07-21 1990-07-31 Telex Communications Color graphic imager utilizing a liquid crystal display
EP0361074B1 (en) * 1988-08-23 1995-11-15 Citizen Watch Co. Ltd. Liquid crystal display device

Also Published As

Publication number Publication date
WO1991010170A1 (en) 1991-07-11

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