AU7166291A - Programmable masking apparatus - Google Patents
Programmable masking apparatusInfo
- Publication number
- AU7166291A AU7166291A AU71662/91A AU7166291A AU7166291A AU 7166291 A AU7166291 A AU 7166291A AU 71662/91 A AU71662/91 A AU 71662/91A AU 7166291 A AU7166291 A AU 7166291A AU 7166291 A AU7166291 A AU 7166291A
- Authority
- AU
- Australia
- Prior art keywords
- masking apparatus
- programmable masking
- programmable
- masking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000000873 masking effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/316—Testing of analog circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2294—Addressing the hologram to an active spatial light modulator
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2225/00—Active addressable light modulator
- G03H2225/20—Nature, e.g. e-beam addressed
- G03H2225/22—Electrically addressed SLM [EA-SLM]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US45599489A | 1989-12-22 | 1989-12-22 | |
| US455994 | 1995-05-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU7166291A true AU7166291A (en) | 1991-07-24 |
Family
ID=23811014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU71662/91A Abandoned AU7166291A (en) | 1989-12-22 | 1990-12-12 | Programmable masking apparatus |
Country Status (2)
| Country | Link |
|---|---|
| AU (1) | AU7166291A (en) |
| WO (1) | WO1991010170A1 (en) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3307997B2 (en) * | 1992-10-13 | 2002-07-29 | 富士通株式会社 | Display device |
| JP2616660B2 (en) * | 1993-06-21 | 1997-06-04 | 日本電気株式会社 | Exposure apparatus for thick film wiring pattern and method for forming thick film |
| EP0746800B1 (en) | 1994-02-21 | 2001-10-10 | Lüllau, Friedrich | Process and device for the photomechanical production of structured surfaces, in particular for exposing offset plates |
| US6035013A (en) * | 1994-06-01 | 2000-03-07 | Simage O.Y. | Radiographic imaging devices, systems and methods |
| GB2289983B (en) * | 1994-06-01 | 1996-10-16 | Simage Oy | Imaging devices,systems and methods |
| GB2289981A (en) * | 1994-06-01 | 1995-12-06 | Simage Oy | Imaging devices systems and methods |
| US6291110B1 (en) | 1997-06-27 | 2001-09-18 | Pixelligent Technologies Llc | Methods for transferring a two-dimensional programmable exposure pattern for photolithography |
| US6251550B1 (en) | 1998-07-10 | 2001-06-26 | Ball Semiconductor, Inc. | Maskless photolithography system that digitally shifts mask data responsive to alignment data |
| US6529262B1 (en) | 1999-04-14 | 2003-03-04 | Ball Semiconductor, Inc. | System and method for performing lithography on a substrate |
| US6379867B1 (en) | 2000-01-10 | 2002-04-30 | Ball Semiconductor, Inc. | Moving exposure system and method for maskless lithography system |
| US6425669B1 (en) | 2000-05-24 | 2002-07-30 | Ball Semiconductor, Inc. | Maskless exposure system |
| US6509955B2 (en) * | 2000-05-25 | 2003-01-21 | Ball Semiconductor, Inc. | Lens system for maskless photolithography |
| US6436093B1 (en) | 2000-06-21 | 2002-08-20 | Luis Antonio Ruiz | Controllable liquid crystal matrix mask particularly suited for performing ophthamological surgery, a laser system with said mask and a method of using the same |
| US6464692B1 (en) | 2000-06-21 | 2002-10-15 | Luis Antonio Ruiz | Controllable electro-optical patternable mask, system with said mask and method of using the same |
| US6537738B1 (en) | 2000-08-08 | 2003-03-25 | Ball Semiconductor, Inc. | System and method for making smooth diagonal components with a digital photolithography system |
| US6493867B1 (en) | 2000-08-08 | 2002-12-10 | Ball Semiconductor, Inc. | Digital photolithography system for making smooth diagonal components |
| US6512625B2 (en) | 2000-11-22 | 2003-01-28 | Ball Semiconductor, Inc. | Light modulation device and system |
| US6473237B2 (en) | 2000-11-14 | 2002-10-29 | Ball Semiconductor, Inc. | Point array maskless lithography |
| US6433917B1 (en) | 2000-11-22 | 2002-08-13 | Ball Semiconductor, Inc. | Light modulation device and system |
| AU2002229742A1 (en) * | 2001-02-21 | 2002-09-04 | International Business Machines Corporation | High-resolution photoresist structuring of multi-layer structures deposited onto substrates |
| US6965387B2 (en) | 2001-08-03 | 2005-11-15 | Ball Semiconductor, Inc. | Real time data conversion for a digital display |
| US20040126757A1 (en) * | 2002-01-31 | 2004-07-01 | Francesco Cerrina | Method and apparatus for synthesis of arrays of DNA probes |
| US6870604B2 (en) | 2002-04-23 | 2005-03-22 | Ball Semiconductor, Inc. | High resolution point array |
| US7164961B2 (en) | 2002-06-14 | 2007-01-16 | Disco Corporation | Modified photolithography movement system |
| CN100524026C (en) | 2002-10-25 | 2009-08-05 | 迈普尔平版印刷Ip有限公司 | Lithography system |
| DE10319154B4 (en) * | 2003-04-29 | 2012-12-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Maskless lithography system |
| DE10354112B4 (en) * | 2003-11-19 | 2008-07-31 | Qimonda Ag | Method and arrangement for repairing memory chips by means of micro-lithography method |
| GB2431732A (en) * | 2005-10-31 | 2007-05-02 | Nancy Ellen Johnson Lumpkin | Programmable solid state lithography mask |
| DE102009054024A1 (en) * | 2009-11-19 | 2011-05-26 | Amphenol-Tuchel Electronics Gmbh | Electronically controllable matrix mask |
| FR2959025B1 (en) * | 2010-04-20 | 2013-11-15 | St Microelectronics Rousset | PHOTOLITHOGRAPHY METHOD AND DEVICE |
| US9730649B1 (en) * | 2016-09-13 | 2017-08-15 | Open Water Internet Inc. | Optical imaging of diffuse medium |
| US10778912B2 (en) | 2018-03-31 | 2020-09-15 | Open Water Internet Inc. | System and device for optical transformation |
| WO2023004493A1 (en) * | 2021-07-26 | 2023-02-02 | Technologies Digitho Inc. | Photolithography mask and photolithography system comprising said photolithography mask |
| US11934091B1 (en) | 2021-07-26 | 2024-03-19 | Technologies Digitho Inc. | Photolithography mask and photolithography system comprising said photolithography mask |
| SK9992Y1 (en) | 2023-06-07 | 2024-03-13 | Elektrotechnický ústav Slovenskej akadémie vied | Stereolithography module for vacuum chambers |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4013466A (en) * | 1975-06-26 | 1977-03-22 | Western Electric Company, Inc. | Method of preparing a circuit utilizing a liquid crystal artwork master |
| JPS61138285A (en) * | 1984-12-10 | 1986-06-25 | ホシデン株式会社 | liquid crystal display element |
| US4653860A (en) * | 1985-01-07 | 1987-03-31 | Thomson Components-Mostek Corporation | Programable mask or reticle with opaque portions on electrodes |
| JPH0766253B2 (en) * | 1986-06-20 | 1995-07-19 | 松下電器産業株式会社 | Matrix type image display device |
| JPH0713715B2 (en) * | 1987-01-22 | 1995-02-15 | ホシデン株式会社 | Color liquid crystal display device |
| US4840459A (en) * | 1987-11-03 | 1989-06-20 | General Electric Co. | Matrix addressed flat panel liquid crystal display device with dual ended auxiliary repair lines for address line repair |
| US4944578A (en) * | 1988-07-21 | 1990-07-31 | Telex Communications | Color graphic imager utilizing a liquid crystal display |
| EP0361074B1 (en) * | 1988-08-23 | 1995-11-15 | Citizen Watch Co. Ltd. | Liquid crystal display device |
-
1990
- 1990-12-12 WO PCT/US1990/007331 patent/WO1991010170A1/en not_active Ceased
- 1990-12-12 AU AU71662/91A patent/AU7166291A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO1991010170A1 (en) | 1991-07-11 |
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