AU6103696A - On-site generation of ultra-high-purity buffered hf for semi conductor processing - Google Patents
On-site generation of ultra-high-purity buffered hf for semi conductor processingInfo
- Publication number
- AU6103696A AU6103696A AU61036/96A AU6103696A AU6103696A AU 6103696 A AU6103696 A AU 6103696A AU 61036/96 A AU61036/96 A AU 61036/96A AU 6103696 A AU6103696 A AU 6103696A AU 6103696 A AU6103696 A AU 6103696A
- Authority
- AU
- Australia
- Prior art keywords
- ultra
- semi conductor
- site generation
- conductor processing
- purity buffered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
- B01J39/04—Processes using organic exchangers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/01—Hydrogen peroxide
- C01B15/013—Separation; Purification; Concentration
- C01B15/0135—Purification by solid ion-exchangers or solid chelating agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/191—Hydrogen fluoride
- C01B7/195—Separation; Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/191—Hydrogen fluoride
- C01B7/195—Separation; Purification
- C01B7/197—Separation; Purification by adsorption
- C01B7/198—Separation; Purification by adsorption by solid ion-exchangers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01C—AMMONIA; CYANOGEN; COMPOUNDS THEREOF
- C01C1/00—Ammonia; Compounds thereof
- C01C1/02—Preparation, purification or separation of ammonia
- C01C1/024—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01C—AMMONIA; CYANOGEN; COMPOUNDS THEREOF
- C01C1/00—Ammonia; Compounds thereof
- C01C1/16—Halides of ammonium
- C01C1/162—Ammonium fluoride
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Analytical Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| WOUS9507649 | 1995-06-05 | ||
| PCT/US1995/007649 WO1996039358A1 (en) | 1995-06-05 | 1995-06-05 | Point-of-use ammonia purification for electronic component manufacture |
| US49956295A | 1995-07-07 | 1995-07-07 | |
| US449562 | 1995-07-07 | ||
| PCT/US1996/009556 WO1996039237A1 (en) | 1995-06-05 | 1996-06-05 | On-site generation of ultra-high-purity buffered hf for semiconductor processing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU6103696A true AU6103696A (en) | 1996-12-24 |
Family
ID=26789687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU61036/96A Abandoned AU6103696A (en) | 1995-06-05 | 1996-06-05 | On-site generation of ultra-high-purity buffered hf for semi conductor processing |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JP2002514968A (en) |
| CN (2) | CN1089616C (en) |
| AU (1) | AU6103696A (en) |
| WO (1) | WO1996039237A1 (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10236804A (en) * | 1996-12-05 | 1998-09-08 | Startec Ventures Inc | System and method for producing ultrapure hydrogen peroxide on job site |
| FR2763931B1 (en) * | 1997-05-27 | 1999-07-30 | Chemoxal Sa | PROCESS FOR THE PREPARATION OF AN ULTRAPURE HYDROGEN PEROXIDE SOLUTION BY ION EXCHANGE WITH RECYCLING |
| FR2763930B1 (en) | 1997-05-27 | 1999-07-30 | Chemoxal Sa | PROCESS FOR PREPARING AN ULTRA-PURE HYDROGEN PEROXIDE SOLUTION BY IONIC SEQUENCE EXCHANGE: ANIONIC-CATIONIC-ANIONIC-CATIONIC |
| FR2763929B1 (en) * | 1997-05-27 | 1999-07-30 | Chemoxal Sa | PROCESS FOR PREPARING AN ULTRA-PURE HYDROGEN PEROXIDE SOLUTION BY IONIC EXCHANGE IN THE PRESENCE OF ACETATE IONS |
| FR2763932B1 (en) * | 1997-05-27 | 1999-07-30 | Chemoxal Sa | PROCESS FOR PREPARING AN ULTRA-PURE PEROXIDE SOLUTION BY IONIC EXCHANGE IN BEDS WITH DEFINED H / D RATIO |
| JPH11180704A (en) * | 1997-12-19 | 1999-07-06 | Ube Ind Ltd | Method for producing high-purity aqueous hydrogen peroxide solution |
| DE19817794A1 (en) | 1998-04-21 | 1999-10-28 | Basf Ag | High purity aqueous hydrogen peroxide solution useful for electronic component substrate cleaning |
| US6224252B1 (en) | 1998-07-07 | 2001-05-01 | Air Products And Chemicals, Inc. | Chemical generator with controlled mixing and concentration feedback and adjustment |
| US6416903B1 (en) * | 1998-08-17 | 2002-07-09 | Ovonic Battery Company, Inc. | Nickel hydroxide electrode material and method for making the same |
| DE19926725A1 (en) * | 1999-06-11 | 2000-12-14 | Basf Ag | Process for the implementation of organic compounds with hydrogen peroxide |
| US7091043B2 (en) | 1999-12-10 | 2006-08-15 | Showa Denko K.K. | Method for measuring water concentration in ammonia |
| CN100372586C (en) * | 2004-03-19 | 2008-03-05 | 冯留启 | Method for preparing supper clean, and high pure reagent of acid and rectifier unit |
| CN103112872B (en) * | 2013-02-18 | 2015-04-22 | 苏州晶瑞化学有限公司 | Preparation method of ultrapure fluorine-ammonium etching solution for micro-electronics |
| CN104923518A (en) * | 2015-04-24 | 2015-09-23 | 中建材浚鑫科技股份有限公司 | Cleaning technology of graphite boat |
| CN107848799B (en) | 2015-08-10 | 2020-07-17 | 昭和电工株式会社 | Production method of hydrogen chloride |
| CN114783947B (en) * | 2022-06-20 | 2022-10-11 | 晶芯成(北京)科技有限公司 | Semiconductor device and method of making the same |
| CN116730288B (en) * | 2023-07-03 | 2024-05-10 | 山东飞源东泰高分子材料有限公司 | Hydrogen fluoride production and preparation system |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3870033A (en) * | 1973-11-30 | 1975-03-11 | Aqua Media | Ultra pure water process and apparatus |
| US5164049A (en) * | 1986-10-06 | 1992-11-17 | Athens Corporation | Method for making ultrapure sulfuric acid |
| US4952386A (en) * | 1988-05-20 | 1990-08-28 | Athens Corporation | Method and apparatus for purifying hydrogen fluoride |
| US4980032A (en) * | 1988-08-12 | 1990-12-25 | Alameda Instruments, Inc. | Distillation method and apparatus for reprocessing sulfuric acid |
| US4999179A (en) * | 1988-12-26 | 1991-03-12 | Mitsubishi Gas Chemical Company, Inc. | Method for purifying impure aqueous hydrogen peroxide solution |
| CZ375092A3 (en) * | 1992-01-10 | 1993-10-13 | Rohm & Haas | Column for ion-exchange process application |
| US5364510A (en) * | 1993-02-12 | 1994-11-15 | Sematech, Inc. | Scheme for bath chemistry measurement and control for improved semiconductor wet processing |
-
1996
- 1996-06-05 JP JP50185297A patent/JP2002514968A/en active Pending
- 1996-06-05 CN CN96194534A patent/CN1089616C/en not_active Expired - Fee Related
- 1996-06-05 WO PCT/US1996/009556 patent/WO1996039237A1/en not_active Ceased
- 1996-06-05 JP JP9501851A patent/JPH11509980A/en active Pending
- 1996-06-05 CN CN96194535A patent/CN1082402C/en not_active Expired - Fee Related
- 1996-06-05 AU AU61036/96A patent/AU6103696A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CN1190360A (en) | 1998-08-12 |
| CN1089616C (en) | 2002-08-28 |
| CN1082402C (en) | 2002-04-10 |
| JPH11509980A (en) | 1999-08-31 |
| CN1198102A (en) | 1998-11-04 |
| JP2002514968A (en) | 2002-05-21 |
| WO1996039237A1 (en) | 1996-12-12 |
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