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AU5771998A - Selective interferometry - Google Patents

Selective interferometry

Info

Publication number
AU5771998A
AU5771998A AU57719/98A AU5771998A AU5771998A AU 5771998 A AU5771998 A AU 5771998A AU 57719/98 A AU57719/98 A AU 57719/98A AU 5771998 A AU5771998 A AU 5771998A AU 5771998 A AU5771998 A AU 5771998A
Authority
AU
Australia
Prior art keywords
interferometry
selective
selective interferometry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU57719/98A
Inventor
Michael John Hammond
Andrew Peter Keens
Nigel Peter Smith
Andrew Michael Christian Smout
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bio Rad Micromeasurements Ltd
Original Assignee
Bio Rad Micromeasurements Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bio Rad Micromeasurements Ltd filed Critical Bio Rad Micromeasurements Ltd
Publication of AU5771998A publication Critical patent/AU5771998A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/12—Condensers affording bright-field illumination
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
AU57719/98A 1997-02-06 1998-01-26 Selective interferometry Abandoned AU5771998A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9702388 1997-02-06
GBGB9702388.1A GB9702388D0 (en) 1997-02-06 1997-02-06 Selective interferometry
PCT/GB1998/000221 WO1998035255A1 (en) 1997-02-06 1998-01-26 Selective interferometry

Publications (1)

Publication Number Publication Date
AU5771998A true AU5771998A (en) 1998-08-26

Family

ID=10807163

Family Applications (1)

Application Number Title Priority Date Filing Date
AU57719/98A Abandoned AU5771998A (en) 1997-02-06 1998-01-26 Selective interferometry

Country Status (3)

Country Link
AU (1) AU5771998A (en)
GB (1) GB9702388D0 (en)
WO (1) WO1998035255A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4231069A1 (en) 1992-09-17 1994-03-24 Leica Mikroskopie & Syst Variable incident light approach according to Mirau
US6540890B1 (en) 2000-11-01 2003-04-01 Roche Diagnostics Corporation Biosensor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4756611A (en) * 1984-08-31 1988-07-12 Olympus Optical Co., Ltd. Multiple-purpose microscope
JP2503388B2 (en) * 1985-04-17 1996-06-05 株式会社ニコン Laser processing optical device
DE3942896A1 (en) * 1989-12-23 1991-06-27 Zeiss Carl Fa INTERFEROMETRIC SENSOR FOR MEASURING DISTANCE CHANGES IN A SMALL AREA
DE4231069A1 (en) * 1992-09-17 1994-03-24 Leica Mikroskopie & Syst Variable incident light approach according to Mirau

Also Published As

Publication number Publication date
GB9702388D0 (en) 1997-03-26
WO1998035255A1 (en) 1998-08-13

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