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AU3381799A - Energy emission system for photolithography - Google Patents

Energy emission system for photolithography

Info

Publication number
AU3381799A
AU3381799A AU33817/99A AU3381799A AU3381799A AU 3381799 A AU3381799 A AU 3381799A AU 33817/99 A AU33817/99 A AU 33817/99A AU 3381799 A AU3381799 A AU 3381799A AU 3381799 A AU3381799 A AU 3381799A
Authority
AU
Australia
Prior art keywords
photolithography
emission system
energy emission
energy
emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU33817/99A
Inventor
Bruce D. Abel
Vincent S. Calia
Vincent A. Christina
Robert M. Gutowski
Edwin G. Haas
Richard A. Hartley Jr.
Richard A. Oman
Michael A. Peacock
Alan M. Todd
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Systems Inc
Original Assignee
Advanced Energy Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/054,977 external-priority patent/US6194733B1/en
Application filed by Advanced Energy Systems Inc filed Critical Advanced Energy Systems Inc
Publication of AU3381799A publication Critical patent/AU3381799A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0025—Systems for collecting the plasma generating material after the plasma generation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Nozzles (AREA)
AU33817/99A 1998-04-03 1999-04-02 Energy emission system for photolithography Abandoned AU3381799A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US5502498A 1998-04-03 1998-04-03
US09054977 1998-04-03
US09/054,977 US6194733B1 (en) 1998-04-03 1998-04-03 Method and apparatus for adjustably supporting a light source for use in photolithography
US09055024 1998-04-03
PCT/US1999/007429 WO1999051357A1 (en) 1998-04-03 1999-04-02 Energy emission system for photolithography

Publications (1)

Publication Number Publication Date
AU3381799A true AU3381799A (en) 1999-10-25

Family

ID=26733704

Family Applications (1)

Application Number Title Priority Date Filing Date
AU33817/99A Abandoned AU3381799A (en) 1998-04-03 1999-04-02 Energy emission system for photolithography

Country Status (4)

Country Link
EP (1) EP1068019A1 (en)
JP (1) JP2002510548A (en)
AU (1) AU3381799A (en)
WO (1) WO1999051357A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2799667B1 (en) 1999-10-18 2002-03-08 Commissariat Energie Atomique METHOD AND DEVICE FOR GENERATING A DENSE FOG OF MICROMETRIC AND SUBMICROMETRIC DROPLETS, APPLICATION TO THE GENERATION OF LIGHT IN EXTREME ULTRAVIOLET IN PARTICULAR FOR LITHOGRAPHY
WO2001046962A1 (en) * 1999-12-20 2001-06-28 Philips Electron Optics B.V. 'x-ray microscope having an x-ray source for soft x-rays
TW502559B (en) * 1999-12-24 2002-09-11 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6324256B1 (en) * 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
WO2002019781A1 (en) * 2000-08-31 2002-03-07 Powerlase Limited Electromagnetic radiation generation using a laser produced plasma
GB0111204D0 (en) 2001-05-08 2001-06-27 Mertek Ltd High flux,high energy photon source
JP4298336B2 (en) * 2002-04-26 2009-07-15 キヤノン株式会社 Exposure apparatus, light source apparatus, and device manufacturing method
KR100802329B1 (en) * 2005-04-15 2008-02-13 주식회사 솔믹스 Metal base composite formation method and the coating layer and bulk prepared using the same
JP5717165B2 (en) * 2010-05-10 2015-05-13 株式会社Ihi Electron accelerator
US9136794B2 (en) 2011-06-22 2015-09-15 Research Triangle Institute, International Bipolar microelectronic device
KR101349898B1 (en) * 2012-08-30 2014-01-16 한국과학기술연구원 Module for extreme ultra-violet beam generation
EP3726940A3 (en) 2019-04-16 2020-11-11 Okinawa Institute of Science and Technology School Corporation Laser-driven microplasma xuv source

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography
GB2195070B (en) * 1986-09-11 1991-04-03 Hoya Corp Laser plasma x-ray generator capable of continuously generating x-rays
US5487078A (en) * 1994-03-14 1996-01-23 Board Of Trustees Of The University Of Illinois Apparatus and method for generating prompt x-radiation from gas clusters
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
US5637962A (en) * 1995-06-09 1997-06-10 The Regents Of The University Of California Office Of Technology Transfer Plasma wake field XUV radiation source
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
JPH10221499A (en) * 1997-02-07 1998-08-21 Hitachi Ltd Laser plasma X-ray source, semiconductor exposure apparatus and semiconductor exposure method using the same

Also Published As

Publication number Publication date
WO1999051357A1 (en) 1999-10-14
EP1068019A1 (en) 2001-01-17
JP2002510548A (en) 2002-04-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase