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AU3261199A - Curable compositions - Google Patents

Curable compositions

Info

Publication number
AU3261199A
AU3261199A AU32611/99A AU3261199A AU3261199A AU 3261199 A AU3261199 A AU 3261199A AU 32611/99 A AU32611/99 A AU 32611/99A AU 3261199 A AU3261199 A AU 3261199A AU 3261199 A AU3261199 A AU 3261199A
Authority
AU
Australia
Prior art keywords
curable compositions
curable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU32611/99A
Inventor
Stephen Anthony Hall
Julian Mark Steer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coates Brothers and Co Ltd
Original Assignee
Coates Brothers and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coates Brothers and Co Ltd filed Critical Coates Brothers and Co Ltd
Publication of AU3261199A publication Critical patent/AU3261199A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AU32611/99A 1998-02-27 1999-02-26 Curable compositions Abandoned AU3261199A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9804267 1998-02-27
GB9804267A GB2334719A (en) 1998-02-27 1998-02-27 Curable compositions
PCT/GB1999/000598 WO1999044100A1 (en) 1998-02-27 1999-02-26 Curable compositions

Publications (1)

Publication Number Publication Date
AU3261199A true AU3261199A (en) 1999-09-15

Family

ID=10827758

Family Applications (1)

Application Number Title Priority Date Filing Date
AU32611/99A Abandoned AU3261199A (en) 1998-02-27 1999-02-26 Curable compositions

Country Status (3)

Country Link
AU (1) AU3261199A (en)
GB (1) GB2334719A (en)
WO (1) WO1999044100A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7078457B2 (en) 2002-07-30 2006-07-18 Rohm And Haas Company Polymer composition and process for the preparation thereof
CN110036342A (en) * 2016-12-05 2019-07-19 阿科玛股份有限公司 Initiator blend and the Photocurable composition containing such initiator blend that can be used for 3D printing

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4777230A (en) * 1985-05-30 1988-10-11 Pennwalt Corporation Solution polymerization of acrylic acid derived monomers using tertiary alkyl(ηC5)hydroperoxides
US4939198A (en) * 1989-04-07 1990-07-03 Gaf Chemicals Corporation Solution feed, solution polymerization process for production of copolymers of maleic anhydride and an alkylvinyl ether having low viscosities and high solids content
US5082910A (en) * 1989-09-01 1992-01-21 Isp Investments Inc. Polymerization process using tertiary-amylperoxy pivalate as the free radical initiator
EP0499271A1 (en) * 1991-02-15 1992-08-19 Kawasaki Steel Corporation Photosensitive resin

Also Published As

Publication number Publication date
WO1999044100B1 (en) 1999-10-21
WO1999044100A1 (en) 1999-09-02
GB9804267D0 (en) 1998-04-22
GB2334719A (en) 1999-09-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase