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AU2010999A - Method of etching and cleaning using interhalogen compounds - Google Patents

Method of etching and cleaning using interhalogen compounds

Info

Publication number
AU2010999A
AU2010999A AU20109/99A AU2010999A AU2010999A AU 2010999 A AU2010999 A AU 2010999A AU 20109/99 A AU20109/99 A AU 20109/99A AU 2010999 A AU2010999 A AU 2010999A AU 2010999 A AU2010999 A AU 2010999A
Authority
AU
Australia
Prior art keywords
etching
cleaning
interhalogen compounds
interhalogen
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU20109/99A
Inventor
Timothy R. Demmin
Mohammed A. Fathimulla
Matthew H. Luly
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
AlliedSignal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AlliedSignal Inc filed Critical AlliedSignal Inc
Publication of AU2010999A publication Critical patent/AU2010999A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H10P70/12—
    • H10P50/267—
    • H10P50/268—
    • H10P50/283—
    • H10P50/642—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
AU20109/99A 1997-12-31 1998-12-23 Method of etching and cleaning using interhalogen compounds Abandoned AU2010999A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US7020797P 1997-12-31 1997-12-31
US60070207 1997-12-31
US12803498A 1998-08-03 1998-08-03
US09128034 1998-08-03
PCT/US1998/027427 WO1999034428A1 (en) 1997-12-31 1998-12-23 Method of etching and cleaning using interhalogen compounds

Publications (1)

Publication Number Publication Date
AU2010999A true AU2010999A (en) 1999-07-19

Family

ID=26750902

Family Applications (1)

Application Number Title Priority Date Filing Date
AU20109/99A Abandoned AU2010999A (en) 1997-12-31 1998-12-23 Method of etching and cleaning using interhalogen compounds

Country Status (2)

Country Link
AU (1) AU2010999A (en)
WO (1) WO1999034428A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4060526B2 (en) * 2000-12-13 2008-03-12 株式会社日立国際電気 Manufacturing method of semiconductor device
US20220254607A1 (en) * 2019-06-18 2022-08-11 Showa Denko K.K. Plasma etching method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012779B2 (en) * 1976-04-28 1985-04-03 株式会社日立製作所 Manufacturing method of semiconductor device
US4310380A (en) * 1980-04-07 1982-01-12 Bell Telephone Laboratories, Incorporated Plasma etching of silicon
JPH05343363A (en) * 1992-06-08 1993-12-24 Matsushita Electric Ind Co Ltd Dry etching method
JP3381076B2 (en) * 1992-11-24 2003-02-24 ソニー株式会社 Dry etching method

Also Published As

Publication number Publication date
WO1999034428A1 (en) 1999-07-08

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase