AU2003226114A8 - Method and apparatus for electrochemical processing - Google Patents
Method and apparatus for electrochemical processingInfo
- Publication number
- AU2003226114A8 AU2003226114A8 AU2003226114A AU2003226114A AU2003226114A8 AU 2003226114 A8 AU2003226114 A8 AU 2003226114A8 AU 2003226114 A AU2003226114 A AU 2003226114A AU 2003226114 A AU2003226114 A AU 2003226114A AU 2003226114 A8 AU2003226114 A8 AU 2003226114A8
- Authority
- AU
- Australia
- Prior art keywords
- electrochemical processing
- electrochemical
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
- H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- H10D64/01358—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/127—The active layers comprising only Group III-V materials, e.g. GaAs or InP
- H10F71/1272—The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising at least three elements, e.g. GaAlAs or InGaAsP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/129—Passivating
-
- H10P14/6306—
-
- H10P14/6309—
-
- H10P14/6312—
-
- H10P14/6324—
-
- H10P14/69391—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US36854302P | 2002-03-29 | 2002-03-29 | |
| US36871702P | 2002-03-29 | 2002-03-29 | |
| US60/368,543 | 2002-03-29 | ||
| US60/368,717 | 2002-03-29 | ||
| PCT/US2003/009596 WO2003083175A2 (en) | 2002-03-29 | 2003-03-28 | Method and apparatus for electrochemical processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU2003226114A1 AU2003226114A1 (en) | 2003-10-13 |
| AU2003226114A8 true AU2003226114A8 (en) | 2003-10-13 |
Family
ID=28678244
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2003226114A Abandoned AU2003226114A1 (en) | 2002-03-29 | 2003-03-28 | Method and apparatus for electrochemical processing |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20050126920A1 (en) |
| AU (1) | AU2003226114A1 (en) |
| WO (1) | WO2003083175A2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110241185A1 (en) * | 2010-04-05 | 2011-10-06 | International Business Machines Corporation | Signal shielding through-substrate vias for 3d integration |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5262360A (en) * | 1990-12-31 | 1993-11-16 | The Board Of Trustees Of The University Of Illinois | AlGaAs native oxide |
| US5550081A (en) * | 1994-04-08 | 1996-08-27 | Board Of Trustees Of The University Of Illinois | Method of fabricating a semiconductor device by oxidizing aluminum-bearing 1H-V semiconductor in water vapor environment |
| US5739067A (en) * | 1995-12-07 | 1998-04-14 | Advanced Micro Devices, Inc. | Method for forming active devices on and in exposed surfaces of both sides of a silicon wafer |
| DE19612555C2 (en) * | 1996-03-29 | 1998-03-19 | Atotech Deutschland Gmbh | Process for the selective electrochemical treatment of printed circuit boards and device for carrying out the process |
| US6168691B1 (en) * | 1996-08-09 | 2001-01-02 | Atotech Deutschland Gmbh | Device for electrochemical treatment of elongate articles |
| DE19837973C1 (en) * | 1998-08-21 | 2000-01-20 | Atotech Deutschland Gmbh | Apparatus for electrochemical treatment of parts of bar-shaped workpieces in immersion bath installations |
| US6508826B2 (en) * | 2001-04-30 | 2003-01-21 | Embol-X, Inc. | Cannula with flow diversion mechanism and methods of use |
-
2003
- 2003-03-28 AU AU2003226114A patent/AU2003226114A1/en not_active Abandoned
- 2003-03-28 WO PCT/US2003/009596 patent/WO2003083175A2/en not_active Ceased
-
2004
- 2004-09-29 US US10/953,888 patent/US20050126920A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003083175A3 (en) | 2003-12-04 |
| AU2003226114A1 (en) | 2003-10-13 |
| WO2003083175A2 (en) | 2003-10-09 |
| US20050126920A1 (en) | 2005-06-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |