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AU2003295517A1 - Anti-reflective coatings for photolithography and methods of preparation thereof - Google Patents

Anti-reflective coatings for photolithography and methods of preparation thereof

Info

Publication number
AU2003295517A1
AU2003295517A1 AU2003295517A AU2003295517A AU2003295517A1 AU 2003295517 A1 AU2003295517 A1 AU 2003295517A1 AU 2003295517 A AU2003295517 A AU 2003295517A AU 2003295517 A AU2003295517 A AU 2003295517A AU 2003295517 A1 AU2003295517 A1 AU 2003295517A1
Authority
AU
Australia
Prior art keywords
photolithography
preparation
methods
reflective coatings
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003295517A
Other languages
English (en)
Other versions
AU2003295517A8 (en
Inventor
Teresa Baldwin
William Bedwell
Mello Hebert
Nancy Iwamoto
Joseph Kennedy
Bo Li
Tadashi Nakano
Jason Stuck
Arlene Suedemeyer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2002/036327 external-priority patent/WO2003044078A1/fr
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of AU2003295517A8 publication Critical patent/AU2003295517A8/xx
Publication of AU2003295517A1 publication Critical patent/AU2003295517A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
AU2003295517A 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof Abandoned AU2003295517A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US44469702P 2002-11-12 2002-11-12
AU2002359387 2002-11-12
PCT/US2002/036327 WO2003044078A1 (fr) 2001-11-15 2002-11-12 Couches antireflets pour photolithographie et procedes de preparation associes
US60/444,697 2002-11-12
US50919903P 2003-10-07 2003-10-07
US60/509,199 2003-10-07
PCT/US2003/036354 WO2004044025A2 (fr) 2002-11-12 2003-11-12 Revetements antireflechissant utilises en photolithographie et leurs procedes de preparation

Publications (2)

Publication Number Publication Date
AU2003295517A8 AU2003295517A8 (en) 2004-06-03
AU2003295517A1 true AU2003295517A1 (en) 2004-06-03

Family

ID=32685877

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003295517A Abandoned AU2003295517A1 (en) 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Country Status (2)

Country Link
AU (1) AU2003295517A1 (fr)
WO (1) WO2004044025A2 (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2374944A1 (fr) 1999-06-10 2000-12-21 Nigel Hacker Enduit antireflet spin-on-glass pour photolithographie
CN100355813C (zh) 2003-05-23 2007-12-19 陶氏康宁公司 具有高的湿蚀刻速率的硅氧烷树脂型抗反射涂料组合物
ATE400672T1 (de) 2004-12-17 2008-07-15 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
EP1846479B1 (fr) 2004-12-17 2010-10-27 Dow Corning Corporation Revetement en resine de siloxane
NO325797B1 (no) * 2005-10-14 2008-07-21 Nor X Ind As Lysbeskyttelsesmiddel basert på organisk/uorganisk hybridpolymer, fremgangsmåte til fremstilling og anvendelse av samme
JP4881396B2 (ja) 2006-02-13 2012-02-22 ダウ・コーニング・コーポレイション 反射防止膜材料
US7550249B2 (en) 2006-03-10 2009-06-23 Az Electronic Materials Usa Corp. Base soluble polymers for photoresist compositions
JP2009540084A (ja) * 2006-06-13 2009-11-19 ブラゴーン オサケ ユキチュア 反射防止被膜用の無機−有機混成重合体組成物
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US7759046B2 (en) 2006-12-20 2010-07-20 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
CN101622296B (zh) 2007-02-27 2013-10-16 Az电子材料美国公司 硅基抗反射涂料组合物
TWI439494B (zh) * 2007-02-27 2014-06-01 Braggone Oy 產生有機矽氧烷聚合物的方法
US8987039B2 (en) 2007-10-12 2015-03-24 Air Products And Chemicals, Inc. Antireflective coatings for photovoltaic applications
KR20100126295A (ko) 2008-01-08 2010-12-01 다우 코닝 도레이 캄파니 리미티드 실세스퀴옥산 수지
EP2238198A4 (fr) 2008-01-15 2011-11-16 Dow Corning Résines à base de silsesquioxane
JP5581225B2 (ja) 2008-03-04 2014-08-27 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
EP2250215B1 (fr) 2008-03-05 2020-03-25 Dow Silicones Corporation Résines silsesquioxane
EP2373722A4 (fr) 2008-12-10 2013-01-23 Dow Corning Résines silsesquioxanes
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP2015534652A (ja) * 2012-08-31 2015-12-03 ハネウェル・インターナショナル・インコーポレーテッド 高耐久性反射防止被覆
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

Also Published As

Publication number Publication date
AU2003295517A8 (en) 2004-06-03
WO2004044025A8 (fr) 2004-10-07
WO2004044025A2 (fr) 2004-05-27
WO2004044025A3 (fr) 2004-07-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase