AU2003272478A1 - Electrostatic chuck having a low level of particle generation and method of fabricating same - Google Patents

Electrostatic chuck having a low level of particle generation and method of fabricating same

Info

Publication number: AU2003272478A1
Authority: AU; Australia
Prior art keywords: low level; electrostatic chuck; particle generation; fabricating same; fabricating
Prior art date: 2002-09-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2003272478A

Inventor

Wendell G. Boyd Jr.

Ho T. Fang

Jose-Antonio Marin

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Applied Materials Inc

Original Assignee

Applied Materials Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-09-19

Filing date

2003-09-18

Publication date

2004-04-08

2002-09-19 Priority claimed from US10/247,599 external-priority patent/US6894211B2/en

2003-09-18 Application filed by Applied Materials Inc filed Critical Applied Materials Inc

2004-04-08 Publication of AU2003272478A1 publication Critical patent/AU2003272478A1/en

Status Abandoned legal-status Critical Current

Classifications

- H10P72/72—
- H10P95/00—

AU2003272478A 2002-09-19 2003-09-18 Electrostatic chuck having a low level of particle generation and method of fabricating same Abandoned AU2003272478A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US10/247,599 US6894211B2 (en)	2001-09-21	2002-09-19	Keyboard apparatus
US10/247,599		2002-09-19
PCT/US2003/029212 WO2004027839A2 (en)	2002-09-19	2003-09-18	Electrostatic chuck having a low level of particle generation and method of fabricating same

Publications (1)

Publication Number	Publication Date
AU2003272478A1 true AU2003272478A1 (en)	2004-04-08

Family

ID=32028974

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2003272478A Abandoned AU2003272478A1 (en)	2002-09-19	2003-09-18	Electrostatic chuck having a low level of particle generation and method of fabricating same

Country Status (4)

Country	Link
KR (1)	KR20050054950A (en)
CN (1)	CN1685473A (en)
AU (1)	AU2003272478A1 (en)
WO (1)	WO2004027839A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN100368591C (en) *	2004-11-19	2008-02-13	上海华虹Nec电子有限公司	Electronic absorbing disk for chemical gas-phase depositor
TWI327761B (en) *	2005-10-07	2010-07-21	Rohm & Haas Elect Mat	Method for making semiconductor wafer and wafer holding article
JP5295515B2 (en)	2007-03-30	2013-09-18	東京エレクトロン株式会社	Surface treatment method for mounting table
TWI475594B (en)	2008-05-19	2015-03-01	恩特格林斯公司	Electrostatic chuck
US7884925B2 (en) *	2008-05-23	2011-02-08	Lam Research Corporation	Electrical and optical system and methods for monitoring erosion of electrostatic chuck edge bead materials
US8861170B2 (en)	2009-05-15	2014-10-14	Entegris, Inc.	Electrostatic chuck with photo-patternable soft protrusion contact surface
JP5731485B2 (en)	2009-05-15	2015-06-10	インテグリス・インコーポレーテッド	Electrostatic chuck with polymer protrusions
CN105196094B (en)	2010-05-28	2018-01-26	恩特格林斯公司	high surface resistivity electrostatic chuck
CN108359957A (en) *	2010-10-29	2018-08-03	应用材料公司	Deposition ring and electrostatic chuck for physical vapor deposition chamber
JP6238996B2 (en) *	2012-11-02	2017-11-29	インテグリス・インコーポレーテッド	Electrostatic chuck with photopatternable soft protrusion contact surface
WO2014126896A1 (en) *	2013-02-13	2014-08-21	Entegris, Inc.	Vacuum chuck with polymeric embossments

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6117246A (en) *	1997-01-31	2000-09-12	Applied Materials, Inc.	Conductive polymer pad for supporting a workpiece upon a workpiece support surface of an electrostatic chuck
TW517265B (en) *	2000-06-23	2003-01-11	Applied Materials Inc	Apparatus for supporting a substrate and method of fabricating same

2003
- 2003-09-18 AU AU2003272478A patent/AU2003272478A1/en not_active Abandoned
- 2003-09-18 WO PCT/US2003/029212 patent/WO2004027839A2/en not_active Ceased
- 2003-09-18 CN CNA03823372XA patent/CN1685473A/en active Pending
- 2003-09-18 KR KR1020057004679A patent/KR20050054950A/en not_active Withdrawn

Also Published As

Publication number	Publication date
WO2004027839A2 (en)	2004-04-01
CN1685473A (en)	2005-10-19
WO2004027839A3 (en)	2004-05-21
KR20050054950A (en)	2005-06-10

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Legal Events

Date	Code	Title	Description
2005-07-07	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase