AU2003266662A1 - Aligning method and aligning device in proximity exposure - Google Patents

Aligning method and aligning device in proximity exposure

Info

Publication number: AU2003266662A1
Authority: AU; Australia
Prior art keywords: aligning; proximity exposure; aligning device; aligning method; proximity
Prior art date: 2002-11-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2003266662A

Inventor

Tsutomu Miyatake

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Sumitomo Heavy Industries Ltd

Original Assignee

Sumitomo Heavy Industries Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-11-13

Filing date

2003-09-26

Publication date

2004-06-03

2003-09-26 Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd

2004-06-03 Publication of AU2003266662A1 publication Critical patent/AU2003266662A1/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7038—Alignment for proximity or contact printer

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Length Measuring Devices By Optical Means (AREA)
Electron Beam Exposure (AREA)

AU2003266662A 2002-11-13 2003-09-26 Aligning method and aligning device in proximity exposure Abandoned AU2003266662A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2002329849		2002-11-13
JP2002-329849		2002-11-13
PCT/JP2003/012377 WO2004044966A1 (en)	2002-11-13	2003-09-26	Aligning method and aligning device in proximity exposure

Publications (1)

Publication Number	Publication Date
AU2003266662A1 true AU2003266662A1 (en)	2004-06-03

Family

ID=32310583

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2003266662A Abandoned AU2003266662A1 (en)	2002-11-13	2003-09-26	Aligning method and aligning device in proximity exposure

Country Status (4)

Country	Link
JP (1)	JP4497364B2 (en)
AU (1)	AU2003266662A1 (en)
TW (1)	TWI227918B (en)
WO (1)	WO2004044966A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4431479B2 (en)	2004-10-15	2010-03-17	株式会社ソキア・トプコン	2D coordinate measuring machine
KR101261606B1 (en)	2006-05-09	2013-05-09	삼성디스플레이 주식회사	Apparatus for manufacturing a display panel and method for manufacturing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2676412B2 (en) *	1989-10-20	1997-11-17	住友重機械工業株式会社	Wide detection field High-precision alignment system
JPH08288201A (en) *	1995-04-20	1996-11-01	Sumitomo Heavy Ind Ltd	Method and apparatus for alignment applied to proximity exposure
JP2998673B2 (en) *	1997-01-20	2000-01-11	日本電気株式会社	Wafer, method and apparatus for aligning the wafer
JP3299144B2 (en) *	1997-07-10	2002-07-08	住友重機械工業株式会社	Position detecting apparatus and position detecting method applied to proximity exposure
JPH11121325A (en) *	1997-09-03	1999-04-30	Canon Inc	Projection exposure equipment
JP4208277B2 (en) *	1997-11-26	2009-01-14	キヤノン株式会社	Exposure method and exposure apparatus
JP3336955B2 (en) *	1998-05-26	2002-10-21	ウシオ電機株式会社	Exposure equipment with backside alignment function
JP2000012455A (en) *	1998-06-25	2000-01-14	Nikon Corp	Charged particle beam transfer exposure apparatus and method for aligning mask and sensitive substrate in charged particle beam transfer exposure apparatus

2003
- 2003-09-26 AU AU2003266662A patent/AU2003266662A1/en not_active Abandoned
- 2003-09-26 JP JP2004551188A patent/JP4497364B2/en not_active Expired - Fee Related
- 2003-09-26 WO PCT/JP2003/012377 patent/WO2004044966A1/en not_active Ceased
- 2003-10-15 TW TW92128608A patent/TWI227918B/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
TWI227918B (en)	2005-02-11
WO2004044966A1 (en)	2004-05-27
TW200416849A (en)	2004-09-01
JP4497364B2 (en)	2010-07-07
JPWO2004044966A1 (en)	2006-03-16

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Legal Events

Date	Code	Title	Description
2005-07-28	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase