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AU2003252349A1 - Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method - Google Patents

Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method

Info

Publication number
AU2003252349A1
AU2003252349A1 AU2003252349A AU2003252349A AU2003252349A1 AU 2003252349 A1 AU2003252349 A1 AU 2003252349A1 AU 2003252349 A AU2003252349 A AU 2003252349A AU 2003252349 A AU2003252349 A AU 2003252349A AU 2003252349 A1 AU2003252349 A1 AU 2003252349A1
Authority
AU
Australia
Prior art keywords
exposure
device manufacturing
exposure apparatus
position control
position measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003252349A
Inventor
Norihiko Fujimaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003252349A1 publication Critical patent/AU2003252349A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003252349A 2002-07-31 2003-07-30 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method Abandoned AU2003252349A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002223252 2002-07-31
JP2002-223252 2002-07-31
PCT/JP2003/009691 WO2004012245A1 (en) 2002-07-31 2003-07-30 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method

Publications (1)

Publication Number Publication Date
AU2003252349A1 true AU2003252349A1 (en) 2004-02-16

Family

ID=31184956

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003252349A Abandoned AU2003252349A1 (en) 2002-07-31 2003-07-30 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method

Country Status (4)

Country Link
JP (1) JPWO2004012245A1 (en)
KR (1) KR20050025626A (en)
AU (1) AU2003252349A1 (en)
WO (1) WO2004012245A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6934005B2 (en) 2002-09-06 2005-08-23 Asml Holding N.V. Reticle focus measurement method using multiple interferometric beams
EP1396757A3 (en) 2002-09-06 2008-12-17 ASML Holding N.V. Reticle focus measurement system and method using multiple interferometric beams
KR100734648B1 (en) * 2005-12-28 2007-07-02 동부일렉트로닉스 주식회사 Semiconductor exposure apparatus with alignment unit
EP2857902B1 (en) * 2006-01-19 2016-04-20 Nikon Corporation Immersion exposure apparatus, immersion exposure method, and device fabricating method
KR101409011B1 (en) * 2006-08-31 2014-06-18 가부시키가이샤 니콘 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
KR101902723B1 (en) * 2006-08-31 2018-09-28 가부시키가이샤 니콘 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
TWI643035B (en) * 2007-12-28 2018-12-01 日商尼康股份有限公司 Exposure apparatus, exposure method, and component manufacturing method
JP5787483B2 (en) * 2010-01-16 2015-09-30 キヤノン株式会社 Measuring apparatus and exposure apparatus
JP5984459B2 (en) * 2012-03-30 2016-09-06 キヤノン株式会社 Exposure apparatus, exposure apparatus control method, and device manufacturing method
JP6564727B2 (en) * 2016-03-28 2019-08-21 株式会社ブイ・テクノロジー Mask manufacturing apparatus and mask manufacturing apparatus control method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320924A (en) * 1996-05-27 1997-12-12 Nikon Corp Projection exposure device
EP1041357A4 (en) * 1997-12-18 2005-06-15 Nikon Corp Stage device and exposure apparatus
JPH11248419A (en) * 1998-03-06 1999-09-17 Nikon Corp Interferometer and exposure apparatus having the same
JP2001007003A (en) * 1999-06-23 2001-01-12 Kyocera Corp Laser interferometer
JP2003202204A (en) * 2002-01-07 2003-07-18 Nikon Corp Interferometer, exposure apparatus, and exposure method

Also Published As

Publication number Publication date
JPWO2004012245A1 (en) 2005-11-24
WO2004012245A1 (en) 2004-02-05
KR20050025626A (en) 2005-03-14

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase