AU2002338176A1 - Substrate detergent - Google Patents

Substrate detergent

Info

Publication number: AU2002338176A1
Authority: AU; Australia
Prior art keywords: substrate detergent; detergent; substrate
Prior art date: 2002-10-11
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2002338176A

Inventor

Ichiro Hayashida

Masahiko Kakizawa

Mayumi Kimura

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Wako Pure Chemical Corp

Original Assignee

Wako Pure Chemical Industries Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-10-11

Filing date

2002-10-11

Publication date

2004-05-04

2002-10-11 Application filed by Wako Pure Chemical Industries Ltd filed Critical Wako Pure Chemical Industries Ltd

2004-05-04 Publication of AU2002338176A1 publication Critical patent/AU2002338176A1/en

Status Abandoned legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/16—Sulfur-containing compounds
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
- C11D3/349—Organic compounds containing sulfur additionally containing nitrogen atoms, e.g. nitro, nitroso, amino, imino, nitrilo, nitrile groups containing compounds or their derivatives or thio urea
- H10P52/403—
- H10P70/277—
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Organic Chemistry (AREA)
Life Sciences & Earth Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Oil, Petroleum & Natural Gas (AREA)
Wood Science & Technology (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Preventing Corrosion Or Incrustation Of Metals (AREA)
Detergent Compositions (AREA)

AU2002338176A 2002-10-11 2002-10-11 Substrate detergent Abandoned AU2002338176A1 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
PCT/JP2002/010607 WO2004034451A1 (en)	2002-10-11	2002-10-11	Substrate detergent

Publications (1)

Publication Number	Publication Date
AU2002338176A1 true AU2002338176A1 (en)	2004-05-04

Family

ID=32089055

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2002338176A Abandoned AU2002338176A1 (en)	2002-10-11	2002-10-11	Substrate detergent

Country Status (3)

Country	Link
AU (1)	AU2002338176A1 (en)
TW (1)	TW583719B (en)
WO (1)	WO2004034451A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN101169598A (en) *	2006-10-27	2008-04-30	安集微电子（上海）有限公司	Photoresist detergent
CN102338994B (en) *	2010-07-23	2014-12-31	安集微电子（上海）有限公司	Cleaning solution for photoresist
TW201224138A (en) *	2010-12-10	2012-06-16	Anji Microelectronics Co Ltd	Thick-film photoresist stripper solution
WO2012083587A1 (en) *	2010-12-21	2012-06-28	安集微电子（上海）有限公司	Cleaning liquid for thick film photoresists
CN103809393A (en) *	2012-11-12	2014-05-21	安集微电子科技(上海)有限公司	Cleaning liquid for removing photoresist residues
CN103809394B (en) *	2012-11-12	2019-12-31	安集微电子科技（上海）股份有限公司	Cleaning solution for removing photoresist etching residues

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2651643B2 (en) *	1992-08-28	1997-09-10	花王株式会社	Detergent composition
JPH08337563A (en) *	1995-04-11	1996-12-24	Kashima Sekiyu Kk	N-acyl amino acid and its salt
EP1093161A1 (en) *	1999-10-12	2001-04-18	Applied Materials, Inc.	Method and composite arrangement inhibiting corrosion of a metal layer following chemical mechanical polishing
JP2001345303A (en) *	2000-03-30	2001-12-14	Mitsubishi Chemicals Corp	Substrate surface treatment method
JP4689855B2 (en) *	2001-03-23	2011-05-25	イーケーシーテクノロジー，インコーポレイティド	Residue stripper composition and method of use thereof

2002
- 2002-10-11 AU AU2002338176A patent/AU2002338176A1/en not_active Abandoned
- 2002-10-11 WO PCT/JP2002/010607 patent/WO2004034451A1/en not_active Ceased
- 2002-10-17 TW TW091123894A patent/TW583719B/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
TW583719B (en)	2004-04-11
WO2004034451A1 (en)	2004-04-22

Publication	Publication Date	Title
AU2003256071A1 (en)	2004-02-25	Detergent compositions
AU2003299786A1 (en)	2004-07-22	Microelectronic contact structure
AU2003278248A1 (en)	2004-04-30	Diffusing substrate
AU2003278170A1 (en)	2004-06-15	Improved detergent composition
AU2003266611A1 (en)	2004-07-29	Detergent composition
AU2003263591A1 (en)	2004-03-29	Detergent particles
AU2003263737A1 (en)	2003-12-02	Pre-aligner
AU2003270763A1 (en)	2004-04-30	Substrate end effector
AU2002338178A1 (en)	2004-05-04	Substrate cleaner
AU2003258707A1 (en)	2004-04-08	Detergent compositions
AU2003267816A1 (en)	2004-03-19	Detergent particle
AU2003219936A1 (en)	2003-09-16	Marking substrates
AU2003234638A1 (en)	2003-12-12	Luminogenic protease substrates
AU2003290818A1 (en)	2004-06-03	Topoisomerase-targeting agents
AU2003212379A1 (en)	2003-10-08	Coated substrate
AU2003258708A1 (en)	2004-04-08	Detergent compositions
AU2002338176A1 (en)	2004-05-04	Substrate detergent
AU2001292114A1 (en)	2002-04-22	Substrate cleaning
AU2003202606A1 (en)	2003-09-02	Tub arrangement
AU2003246934A1 (en)	2004-02-02	Washer
AU2003265174A1 (en)	2004-03-29	Detergent particles
AU2003257820A1 (en)	2004-02-25	Detergents
AU2003256152A1 (en)	2004-02-23	Substrate conversion
AU2002315481A1 (en)	2004-01-19	Detergent compositions
AU2002362200A1 (en)	2003-07-24	Coater

Legal Events

Date	Code	Title	Description
2005-06-30	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase