AU2002306892A1 - Method and device for vibration control - Google Patents
Method and device for vibration controlInfo
- Publication number
- AU2002306892A1 AU2002306892A1 AU2002306892A AU2002306892A AU2002306892A1 AU 2002306892 A1 AU2002306892 A1 AU 2002306892A1 AU 2002306892 A AU2002306892 A AU 2002306892A AU 2002306892 A AU2002306892 A AU 2002306892A AU 2002306892 A1 AU2002306892 A1 AU 2002306892A1
- Authority
- AU
- Australia
- Prior art keywords
- vibration control
- vibration
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45028—Lithography
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Atmospheric Sciences (AREA)
- Automation & Control Theory (AREA)
- Human Computer Interaction (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US27881001P | 2001-03-26 | 2001-03-26 | |
| US60/278,810 | 2001-03-26 | ||
| US09/968,180 | 2001-10-01 | ||
| US09/968,180 US20020099475A1 (en) | 2000-12-01 | 2001-10-01 | Method and device for vibration control |
| US10/104,502 | 2002-03-22 | ||
| US10/104,502 US6690706B2 (en) | 2000-06-09 | 2002-03-22 | High rep-rate laser with improved electrodes |
| PCT/US2002/009394 WO2002077484A2 (en) | 2001-03-26 | 2002-03-25 | Method and device for vibration control |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2002306892A1 true AU2002306892A1 (en) | 2002-10-08 |
Family
ID=29255186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2002306892A Abandoned AU2002306892A1 (en) | 2001-03-26 | 2002-03-25 | Method and device for vibration control |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1380000A2 (en) |
| JP (1) | JP2004532517A (en) |
| AU (1) | AU2002306892A1 (en) |
| WO (1) | WO2002077484A2 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10301765A1 (en) * | 2003-01-18 | 2004-07-29 | Dr. Johannes Heidenhain Gmbh | Controller structure for active damping of low-frequency vibrations on numerically controlled machine tools |
| US7576832B2 (en) * | 2006-05-04 | 2009-08-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7630059B2 (en) * | 2006-07-24 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| ES2333194B1 (en) * | 2008-04-21 | 2011-01-31 | Arquimea Ingenieria, S.L. | MATERIAL ACTUATOR WITH FORM MEMORY. |
| US20110094546A1 (en) * | 2009-10-23 | 2011-04-28 | John Valcore | System and method for wafer carrier vibration reduction |
| US9665012B2 (en) | 2012-11-06 | 2017-05-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN106227149B (en) * | 2016-07-11 | 2018-10-19 | 广东工业大学 | A kind of galvanometer motor motion planning method shortening idle stroke positioning time |
| RU187662U1 (en) * | 2018-07-23 | 2019-03-14 | Сергей Иванович Чижиков | Piezoelectric Acoustic Damper |
| CN116021555B (en) * | 2023-03-29 | 2023-07-07 | 之江实验室 | Vibration absorption control method and device for a flexible joint manipulator |
| CN119714517B (en) * | 2025-02-25 | 2025-06-27 | 青岛智腾微电子有限公司 | Downhole drilling tool vibration monitoring and restraining system based on multi-chip assembly |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3065489B2 (en) * | 1994-10-12 | 2000-07-17 | 捷夫 本田 | Vibration resistant interferometer |
| US5847960A (en) * | 1995-03-20 | 1998-12-08 | Electro Scientific Industries, Inc. | Multi-tool positioning system |
| JP3653827B2 (en) * | 1995-10-20 | 2005-06-02 | 株式会社ニコン | Interferometer |
| US6144118A (en) * | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
-
2002
- 2002-03-25 JP JP2002575502A patent/JP2004532517A/en active Pending
- 2002-03-25 AU AU2002306892A patent/AU2002306892A1/en not_active Abandoned
- 2002-03-25 EP EP02753853A patent/EP1380000A2/en not_active Withdrawn
- 2002-03-25 WO PCT/US2002/009394 patent/WO2002077484A2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004532517A (en) | 2004-10-21 |
| WO2002077484A3 (en) | 2003-11-06 |
| WO2002077484A2 (en) | 2002-10-03 |
| EP1380000A2 (en) | 2004-01-14 |
| WO2002077484A9 (en) | 2004-06-03 |
| WO2002077484A8 (en) | 2003-02-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |