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AU2002363479A1 - Electrochemical mechanical processing with advancible sweeper - Google Patents

Electrochemical mechanical processing with advancible sweeper

Info

Publication number
AU2002363479A1
AU2002363479A1 AU2002363479A AU2002363479A AU2002363479A1 AU 2002363479 A1 AU2002363479 A1 AU 2002363479A1 AU 2002363479 A AU2002363479 A AU 2002363479A AU 2002363479 A AU2002363479 A AU 2002363479A AU 2002363479 A1 AU2002363479 A1 AU 2002363479A1
Authority
AU
Australia
Prior art keywords
advancible
sweeper
mechanical processing
electrochemical mechanical
electrochemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002363479A
Inventor
Bulent M. Basol
Homayoun Talieh
Cyprian E. Uzoh
Halit N. Yakupoglu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASM Nutool Inc
Original Assignee
ASM Nutool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASM Nutool Inc filed Critical ASM Nutool Inc
Publication of AU2002363479A1 publication Critical patent/AU2002363479A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/22Electroplating combined with mechanical treatment during the deposition
    • H10P14/47
    • H10P72/0428
    • H10W20/056
    • H10W20/062

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
AU2002363479A 2001-11-02 2002-11-04 Electrochemical mechanical processing with advancible sweeper Abandoned AU2002363479A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US35021401P 2001-11-02 2001-11-02
US60/350,214 2001-11-02
PCT/US2002/035398 WO2003041126A2 (en) 2001-11-02 2002-11-04 Electrochemical mechanical processing with advancible sweeper

Publications (1)

Publication Number Publication Date
AU2002363479A1 true AU2002363479A1 (en) 2003-05-19

Family

ID=23375713

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002363479A Abandoned AU2002363479A1 (en) 2001-11-02 2002-11-04 Electrochemical mechanical processing with advancible sweeper

Country Status (7)

Country Link
EP (1) EP1439935A2 (en)
JP (1) JP2005509092A (en)
KR (1) KR20040064699A (en)
CN (1) CN1646263A (en)
AU (1) AU2002363479A1 (en)
TW (1) TW593787B (en)
WO (1) WO2003041126A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6838149B2 (en) * 2001-12-13 2005-01-04 3M Innovative Properties Company Abrasive article for the deposition and polishing of a conductive material
KR100767047B1 (en) * 2006-05-20 2007-10-17 한국기계연구원 Electrolytic polishing jig and electrolytic polishing method of metal mask using same
CN101987429B (en) * 2009-08-07 2012-09-26 中芯国际集成电路制造(上海)有限公司 Grinding method and device by chemical machinery
CN109277655B (en) * 2018-09-12 2020-02-21 南京航空航天大学 Multi-pattern hollow sheet metal strip electrolytic spray processing device and method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6176992B1 (en) * 1998-11-03 2001-01-23 Nutool, Inc. Method and apparatus for electro-chemical mechanical deposition
US6610190B2 (en) * 2000-11-03 2003-08-26 Nutool, Inc. Method and apparatus for electrodeposition of uniform film with minimal edge exclusion on substrate
US6241583B1 (en) * 1999-02-04 2001-06-05 Applied Materials, Inc. Chemical mechanical polishing with a plurality of polishing sheets
US6464855B1 (en) * 2000-10-04 2002-10-15 Speedfam-Ipec Corporation Method and apparatus for electrochemical planarization of a workpiece

Also Published As

Publication number Publication date
TW593787B (en) 2004-06-21
JP2005509092A (en) 2005-04-07
WO2003041126A2 (en) 2003-05-15
CN1646263A (en) 2005-07-27
KR20040064699A (en) 2004-07-19
TW200300463A (en) 2003-06-01
EP1439935A2 (en) 2004-07-28
WO2003041126A3 (en) 2003-11-06

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase