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AU2002232395A1 - Hall effect ion source at high current density - Google Patents

Hall effect ion source at high current density

Info

Publication number
AU2002232395A1
AU2002232395A1 AU2002232395A AU3239502A AU2002232395A1 AU 2002232395 A1 AU2002232395 A1 AU 2002232395A1 AU 2002232395 A AU2002232395 A AU 2002232395A AU 3239502 A AU3239502 A AU 3239502A AU 2002232395 A1 AU2002232395 A1 AU 2002232395A1
Authority
AU
Australia
Prior art keywords
current density
ion source
high current
hall effect
effect ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002232395A
Inventor
Wayne L. Johnson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2002232395A1 publication Critical patent/AU2002232395A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/146—End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
AU2002232395A 2000-11-03 2001-10-30 Hall effect ion source at high current density Abandoned AU2002232395A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US24521200P 2000-11-03 2000-11-03
US60/245,212 2000-11-03
PCT/US2001/042846 WO2002037521A2 (en) 2000-11-03 2001-10-30 Hall effect ion source at high current density

Publications (1)

Publication Number Publication Date
AU2002232395A1 true AU2002232395A1 (en) 2002-05-15

Family

ID=22925751

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002232395A Abandoned AU2002232395A1 (en) 2000-11-03 2001-10-30 Hall effect ion source at high current density

Country Status (3)

Country Link
US (1) US6819053B2 (en)
AU (1) AU2002232395A1 (en)
WO (1) WO2002037521A2 (en)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7695690B2 (en) 1998-11-05 2010-04-13 Tessera, Inc. Air treatment apparatus having multiple downstream electrodes
US7318856B2 (en) 1998-11-05 2008-01-15 Sharper Image Corporation Air treatment apparatus having an electrode extending along an axis which is substantially perpendicular to an air flow path
US20050210902A1 (en) 2004-02-18 2005-09-29 Sharper Image Corporation Electro-kinetic air transporter and/or conditioner devices with features for cleaning emitter electrodes
US6544485B1 (en) 2001-01-29 2003-04-08 Sharper Image Corporation Electro-kinetic device with enhanced anti-microorganism capability
US20030206837A1 (en) 1998-11-05 2003-11-06 Taylor Charles E. Electro-kinetic air transporter and conditioner device with enhanced maintenance features and enhanced anti-microorganism capability
US7220295B2 (en) 2003-05-14 2007-05-22 Sharper Image Corporation Electrode self-cleaning mechanisms with anti-arc guard for electro-kinetic air transporter-conditioner devices
US6176977B1 (en) 1998-11-05 2001-01-23 Sharper Image Corporation Electro-kinetic air transporter-conditioner
EP1390964B1 (en) * 2001-04-20 2011-12-07 General Plasma, Inc. Dipole ion source
KR101153978B1 (en) * 2002-03-26 2012-06-14 카부시키카이샤 시.브이.리서어치 Method of manufacturing amorphous metal oxide film and methods of manufacturing capacitance element having amorphous metal oxide film and semiconductor device
US7405672B2 (en) 2003-04-09 2008-07-29 Sharper Image Corp. Air treatment device having a sensor
US7077890B2 (en) 2003-09-05 2006-07-18 Sharper Image Corporation Electrostatic precipitators with insulated driver electrodes
US20050051420A1 (en) 2003-09-05 2005-03-10 Sharper Image Corporation Electro-kinetic air transporter and conditioner devices with insulated driver electrodes
US7724492B2 (en) 2003-09-05 2010-05-25 Tessera, Inc. Emitter electrode having a strip shape
US7517503B2 (en) 2004-03-02 2009-04-14 Sharper Image Acquisition Llc Electro-kinetic air transporter and conditioner devices including pin-ring electrode configurations with driver electrode
US7906080B1 (en) 2003-09-05 2011-03-15 Sharper Image Acquisition Llc Air treatment apparatus having a liquid holder and a bipolar ionization device
WO2005028697A1 (en) 2003-09-12 2005-03-31 Applied Process Technologies, Inc. Magnetic mirror plasma source and method using same
USH2212H1 (en) * 2003-09-26 2008-04-01 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for producing an ion-ion plasma continuous in time
CN100533642C (en) * 2003-10-15 2009-08-26 塞恩技术有限公司 Ion source with improved gas transport
US7767169B2 (en) 2003-12-11 2010-08-03 Sharper Image Acquisition Llc Electro-kinetic air transporter-conditioner system and method to oxidize volatile organic compounds
US7638104B2 (en) 2004-03-02 2009-12-29 Sharper Image Acquisition Llc Air conditioner device including pin-ring electrode configurations with driver electrode
US7285155B2 (en) 2004-07-23 2007-10-23 Taylor Charles E Air conditioner device with enhanced ion output production features
US7311762B2 (en) 2004-07-23 2007-12-25 Sharper Image Corporation Air conditioner device with a removable driver electrode
US20060016333A1 (en) 2004-07-23 2006-01-26 Sharper Image Corporation Air conditioner device with removable driver electrodes
US7420182B2 (en) * 2005-04-27 2008-09-02 Busek Company Combined radio frequency and hall effect ion source and plasma accelerator system
KR100741401B1 (en) * 2005-08-10 2007-07-20 한국기계연구원 Separation and purification method of nanotubes using microwaves and apparatus for separation and purification of nanotubes used therein
CN100419944C (en) * 2005-12-08 2008-09-17 北京北方微电子基地设备工艺研究中心有限责任公司 A plasma processing coil
US7833322B2 (en) 2006-02-28 2010-11-16 Sharper Image Acquisition Llc Air treatment apparatus having a voltage control device responsive to current sensing
US7850828B2 (en) * 2006-09-15 2010-12-14 Cardinal Cg Company Enhanced virtual anode
EP2385542B1 (en) * 2010-05-07 2013-01-02 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Electron beam device with dispersion compensation, and method of operating same
US8508134B2 (en) * 2010-07-29 2013-08-13 Evgeny Vitalievich Klyuev Hall-current ion source with improved ion beam energy distribution
CN107208249B (en) 2015-02-03 2019-08-20 卡迪奈尔镀膜玻璃公司 Spraying and splashing facility including gas distributing system
WO2016205857A1 (en) * 2015-06-23 2016-12-29 Aurora Labs Pty Ltd Plasma driven particle propagation apparatus and pumping method
CN111140448A (en) * 2019-12-23 2020-05-12 北京航空航天大学 Vector Magnetic Nozzle for Electric Propulsion Constructed of Interwoven Electromagnetic Coils
CN112859547A (en) * 2021-03-22 2021-05-28 芶富均 Strong pulse extreme ultraviolet light source system
CN113436951A (en) * 2021-05-21 2021-09-24 武汉理工大学 Ion beam and radio frequency hybrid driven capacitively coupled plasma source
CN114899067B (en) * 2022-03-24 2024-11-26 兰州大学 An RF ion source with an octupole permanent magnet antenna
CN118658768A (en) * 2024-05-31 2024-09-17 四川欧瑞特光电科技有限公司 A radio frequency ion source processing control method for optical polishing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5562734A (en) * 1978-11-01 1980-05-12 Toshiba Corp Ion source and ion etching method
US4541890A (en) * 1982-06-01 1985-09-17 International Business Machines Corporation Hall ion generator for working surfaces with a low energy high intensity ion beam
FR2546358B1 (en) * 1983-05-20 1985-07-05 Commissariat Energie Atomique ION SOURCE WITH ELECTRON CYCLOTRON RESONANCE
JPS6161345A (en) * 1984-08-31 1986-03-29 Univ Kyoto Hall accelerator with magnetron auxiliary discharge
US4862032A (en) * 1986-10-20 1989-08-29 Kaufman Harold R End-Hall ion source
EP0463408A3 (en) * 1990-06-22 1992-07-08 Hauzer Techno Coating Europe Bv Plasma accelerator with closed electron drift
EP0525927B1 (en) * 1991-07-23 1995-09-27 Nissin Electric Company, Limited Ion source having a mass separation device
UA27921C2 (en) * 1993-06-21 2000-10-16 Сосьєте Національ Д`Етюд Ет Де Конструкцьон Де Мотер Д`Авіацьон (С.Н.Е.К.М.А.) Plasma engine with decreased length with closed electron drift
US5763989A (en) * 1995-03-16 1998-06-09 Front Range Fakel, Inc. Closed drift ion source with improved magnetic field
ES2296295T3 (en) * 1995-12-09 2008-04-16 Astrium Sas PROVIDER OF HALL EFFECT THAT CAN BE GUIDED.
JPH09302484A (en) * 1996-05-15 1997-11-25 Ulvac Japan Ltd Discharge cleaning device of magnetic neutron beam plasma type
JP2000021871A (en) * 1998-06-30 2000-01-21 Tokyo Electron Ltd Plasma processing method
US6293090B1 (en) * 1998-07-22 2001-09-25 New England Space Works, Inc. More efficient RF plasma electric thruster
JP4672941B2 (en) * 1999-07-13 2011-04-20 東京エレクトロン株式会社 High frequency power supply for generating inductively coupled plasma

Also Published As

Publication number Publication date
US6819053B2 (en) 2004-11-16
US20030184205A1 (en) 2003-10-02
WO2002037521A3 (en) 2003-03-13
WO2002037521A2 (en) 2002-05-10

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