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AU2002226680A1 - Electrode for metal plating and plating device - Google Patents

Electrode for metal plating and plating device

Info

Publication number
AU2002226680A1
AU2002226680A1 AU2002226680A AU2002226680A AU2002226680A1 AU 2002226680 A1 AU2002226680 A1 AU 2002226680A1 AU 2002226680 A AU2002226680 A AU 2002226680A AU 2002226680 A AU2002226680 A AU 2002226680A AU 2002226680 A1 AU2002226680 A1 AU 2002226680A1
Authority
AU
Australia
Prior art keywords
plating
electrode
metal
metal plating
plating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002226680A
Inventor
Kiyoshi Hyodo
Eishirou Kawana
Seiji Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suruga Seiki Co Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of AU2002226680A1 publication Critical patent/AU2002226680A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10Electrodes, e.g. composition, counter electrode
    • C25D17/12Shape or form
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10Electrodes, e.g. composition, counter electrode
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/423Plated through-holes or plated via connections characterised by electroplating method

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
AU2002226680A 2002-01-17 2002-01-17 Electrode for metal plating and plating device Abandoned AU2002226680A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2002/000282 WO2003060200A1 (en) 2002-01-17 2002-01-17 Electrode for metal plating and plating device

Publications (1)

Publication Number Publication Date
AU2002226680A1 true AU2002226680A1 (en) 2003-07-30

Family

ID=11738138

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002226680A Abandoned AU2002226680A1 (en) 2002-01-17 2002-01-17 Electrode for metal plating and plating device

Country Status (6)

Country Link
JP (1) JP4105633B2 (en)
KR (1) KR100706851B1 (en)
CN (1) CN100334259C (en)
AU (1) AU2002226680A1 (en)
TW (1) TW593781B (en)
WO (1) WO2003060200A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201006076D0 (en) 2010-04-12 2010-05-26 Xeros Ltd Novel cleaning apparatus and method
GB201015277D0 (en) 2010-09-14 2010-10-27 Xeros Ltd Novel cleaning method
JP2012219372A (en) * 2011-04-14 2012-11-12 Sumitomo Electric Ind Ltd Method for manufacturing aluminum porous member
JP7746347B2 (en) * 2023-09-22 2025-09-30 株式会社Screenホールディングス Plating apparatus and plating method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4043891A (en) * 1976-01-14 1977-08-23 Bell Telephone Laboratories, Incorporated Electrolytic cell with bipolar electrodes
US4179350A (en) * 1978-09-05 1979-12-18 The Dow Chemical Company Catalytically innate electrode(s)
EP0310401B1 (en) * 1987-10-01 1994-04-20 Furukawa Circuit Foil Co., Ltd. Insoluble electrode device
CN2175238Y (en) * 1993-09-29 1994-08-24 北京科技大学 Positive plate of electroplating bath made of zinc-nickel alloy
JPH0953200A (en) * 1995-08-11 1997-02-25 Nippon Steel Corp Insoluble electrode and its production
CN1064721C (en) * 1998-10-27 2001-04-18 中国科学院广州化学研究所 Plastic filter screen coating film electrode and making method thereof

Also Published As

Publication number Publication date
CN100334259C (en) 2007-08-29
TW593781B (en) 2004-06-21
WO2003060200A1 (en) 2003-07-24
CN1615379A (en) 2005-05-11
JP4105633B2 (en) 2008-06-25
JPWO2003060200A1 (en) 2005-05-19
KR20040072704A (en) 2004-08-18
KR100706851B1 (en) 2007-04-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase