AU2002225369A1 - Photobase generators, curable compositions prepared by using the same and process of curing - Google Patents

Photobase generators, curable compositions prepared by using the same and process of curing

Info

Publication number: AU2002225369A1
Authority: AU; Australia
Prior art keywords: curing; same; curable compositions; compositions prepared; photobase generators
Prior art date: 2000-12-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2002225369A

Inventor

Shigeki Katogi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Resonac Corp

Original Assignee

Hitachi Chemical Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-12-27

Filing date

2001-12-27

Publication date

2002-07-08

2001-12-27 Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd

2002-07-08 Publication of AU2002225369A1 publication Critical patent/AU2002225369A1/en

Status Abandoned legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C243/00—Compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
- C07C243/40—Hydrazines having nitrogen atoms of hydrazine groups being quaternised

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Epoxy Resins (AREA)
Paints Or Removers (AREA)
Adhesives Or Adhesive Processes (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Polyurethanes Or Polyureas (AREA)
Materials For Photolithography (AREA)
Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)

AU2002225369A 2000-12-27 2001-12-27 Photobase generators, curable compositions prepared by using the same and process of curing Abandoned AU2002225369A1 (en)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
JP2000398467		2000-12-27
JP2000-398467		2000-12-27
JP2001129582		2001-04-26
JP2001-129582		2001-04-26
PCT/JP2001/011528 WO2002051905A1 (en)	2000-12-27	2001-12-27	Photobase generators, curable compositions prepared by using the same and process of curing

Publications (1)

Publication Number	Publication Date
AU2002225369A1 true AU2002225369A1 (en)	2002-07-08

Family

ID=26606884

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2002225369A Abandoned AU2002225369A1 (en)	2000-12-27	2001-12-27	Photobase generators, curable compositions prepared by using the same and process of curing

Country Status (6)

Country	Link
JP (2)	JP3912287B2 (en)
KR (1)	KR100566792B1 (en)
CN (1)	CN1326904C (en)
AU (1)	AU2002225369A1 (en)
TW (1)	TWI245778B (en)
WO (1)	WO2002051905A1 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6835513B2 (en)	2002-03-28	2004-12-28	Samsung Electronic Co., Ltd.	Carbazole based charge transport compounds
KR100641358B1 (en)	2004-09-23	2006-11-01	삼성전자주식회사	Manufacturing method of inkjet print head using photocurable resin composition
WO2007111092A1 (en)	2006-03-24	2007-10-04	Konica Minolta Medical & Graphic, Inc.	Transparent barrier sheet and method for producing transparent barrier sheet
JP5057016B2 (en) *	2006-06-26	2012-10-24	株式会社スリーボンド	Amine imide compound activated by irradiation of active energy ray, composition using the same, and curing method thereof
WO2008072651A1 (en) *	2006-12-14	2008-06-19	Asahi Kasei Chemicals Corporation	Photobase generator and photocurable resin composition
EP2199313A1 (en) *	2007-12-28	2010-06-23	Mitsui Chemicals, Inc.	Latent curing agents, epoxy resin compositions conating the same, sealing materials, and organic el displays
WO2010064631A1 (en) *	2008-12-02	2010-06-10	和光純薬工業株式会社	Photobase generator
US8686059B2 (en)	2009-06-17	2014-04-01	Three Bond Co., Ltd.	Base and radical generator, composition using same and method for curing same
WO2013089100A1 (en)	2011-12-16	2013-06-20	株式会社スリーボンド	Curable resin composition
WO2015008709A1 (en)	2013-07-18	2015-01-22	セメダイン株式会社	Photocurable composition
JP6409784B2 (en)	2013-12-13	2018-10-24	セメダイン株式会社	Photocurable composition having adhesiveness
JP6811949B2 (en) *	2016-03-04	2021-01-13	学校法人東京理科大学	Photocurable composition
TWI758475B (en) *	2017-05-10	2022-03-21	學校法人東京理科大學	Active energy ray-curable composition, method for producing cured film and cured product
JP7287628B2 (en) *	2017-12-12	2023-06-06	学校法人東京理科大学	Active energy ray-curable composition
JP7262460B2 (en) *	2018-06-26	2023-04-21	日東電工株式会社	sealant sheet
JP7440033B2 (en) *	2020-01-10	2024-02-28	株式会社レゾナック	Photocurable resin composition and adhesive
JP6877791B2 (en) *	2020-03-09	2021-05-26	学校法人東京理科大学	Base conversion breeding agent
WO2023127800A1 (en) *	2021-12-28	2023-07-06	旭化成株式会社	Epoxy resin composition, cured product, sealing material, and adhesive

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2830953A1 (en) *	1978-07-14	1980-01-24	Bayer Ag	AMMONIUM SALTS OF ALPHA KETOCARBONIC ACIDS
DE3365773D1 (en) *	1982-02-26	1986-10-09	Ciba Geigy Ag	Coloured photo-hardenable composition
DE3577859D1 (en) *	1985-02-14	1990-06-28	Mitsubishi Electric Corp	EPOXY RESIN COMPOSITION.
EP0555749B1 (en) *	1992-02-14	1999-05-19	Shipley Company Inc.	Radiation sensitive compositions and processes
GB9420107D0 (en) *	1994-10-05	1994-11-16	Kemira Coatings Limted	Polyurethane composition
JPH10139748A (en) *	1996-11-08	1998-05-26	Chugoku Marine Paints Ltd	New amine imide compounds
EP0898202B1 (en) *	1997-08-22	2000-07-19	Ciba SC Holding AG	Photogeneration of amines from alpha-aminoacetophenones

2001
- 2001-12-27 JP JP2002553391A patent/JP3912287B2/en not_active Expired - Fee Related
- 2001-12-27 TW TW090132488A patent/TWI245778B/en not_active IP Right Cessation
- 2001-12-27 WO PCT/JP2001/011528 patent/WO2002051905A1/en not_active Ceased
- 2001-12-27 KR KR1020037007865A patent/KR100566792B1/en not_active Expired - Fee Related
- 2001-12-27 CN CNB018213545A patent/CN1326904C/en not_active Expired - Fee Related
- 2001-12-27 AU AU2002225369A patent/AU2002225369A1/en not_active Abandoned
2006
- 2006-09-15 JP JP2006250163A patent/JP4555995B2/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
KR20030077553A (en)	2003-10-01
JPWO2002051905A1 (en)	2004-04-22
JP2006328427A (en)	2006-12-07
KR100566792B1 (en)	2006-04-03
JP4555995B2 (en)	2010-10-06
WO2002051905A8 (en)	2004-05-13
TWI245778B (en)	2005-12-21
CN1531562A (en)	2004-09-22
WO2002051905A1 (en)	2002-07-04
JP3912287B2 (en)	2007-05-09
CN1326904C (en)	2007-07-18

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Legal Events

Date	Code	Title	Description
2004-02-05	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase