[go: up one dir, main page]

AU2002222968A1 - Silica zeolite low-k dielectric thin films - Google Patents

Silica zeolite low-k dielectric thin films

Info

Publication number
AU2002222968A1
AU2002222968A1 AU2002222968A AU2296802A AU2002222968A1 AU 2002222968 A1 AU2002222968 A1 AU 2002222968A1 AU 2002222968 A AU2002222968 A AU 2002222968A AU 2296802 A AU2296802 A AU 2296802A AU 2002222968 A1 AU2002222968 A1 AU 2002222968A1
Authority
AU
Australia
Prior art keywords
thin films
dielectric thin
silica zeolite
zeolite low
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002222968A
Inventor
Zhengbao Wang
Yushan Yan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California
Original Assignee
University of California
University of California Berkeley
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of California, University of California Berkeley filed Critical University of California
Publication of AU2002222968A1 publication Critical patent/AU2002222968A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H10P14/6922
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B37/00Compounds having molecular sieve properties but not having base-exchange properties
    • C01B37/02Crystalline silica-polymorphs, e.g. silicalites dealuminated aluminosilicate zeolites
    • H10P14/6529
    • H10P14/6536
    • H10P14/6544
    • H10P14/6342
    • H10P14/665
    • H10P14/6686
    • H10W20/071
    • H10W20/072
    • H10W20/46

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
AU2002222968A 2000-07-13 2001-07-06 Silica zeolite low-k dielectric thin films Abandoned AU2002222968A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US21810200P 2000-07-13 2000-07-13
US60218102 2000-07-13
US28862601P 2001-05-03 2001-05-03
US60288626 2001-05-03
PCT/US2001/021439 WO2002007191A2 (en) 2000-07-13 2001-07-06 Silica zeolite low-k dielectric thin films

Publications (1)

Publication Number Publication Date
AU2002222968A1 true AU2002222968A1 (en) 2002-01-30

Family

ID=26912568

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002222968A Abandoned AU2002222968A1 (en) 2000-07-13 2001-07-06 Silica zeolite low-k dielectric thin films

Country Status (4)

Country Link
US (2) US6573131B2 (en)
JP (1) JP2004504716A (en)
AU (1) AU2002222968A1 (en)
WO (1) WO2002007191A2 (en)

Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10052075A1 (en) * 2000-10-19 2002-05-02 Thomas Bein Porous layers and a process for their production by means of spin coating
KR100395902B1 (en) * 2000-11-01 2003-08-25 학교법인 서강대학교 Preparation of a patterned mono- or multi-layered composite of zeolite or zeotype molecular sieve on a substrate and composite prepared by the same
US20040124438A1 (en) * 2001-05-01 2004-07-01 Shyama Mukherjee Planarizers for spin etch planarization of electronic components and methods of use thereof
US7083991B2 (en) * 2002-01-24 2006-08-01 Novellus Systems, Inc. Method of in-situ treatment of low-k films with a silylating agent after exposure to oxidizing environments
US7541200B1 (en) 2002-01-24 2009-06-02 Novellus Systems, Inc. Treatment of low k films with a silylating agent for damage repair
US7105459B2 (en) * 2002-03-04 2006-09-12 Rohm Co., Ltd. Method for forming thin film
JP3859540B2 (en) * 2002-05-14 2006-12-20 松下電器産業株式会社 Low dielectric constant insulating film forming material
DE60307306T2 (en) * 2002-10-11 2007-10-11 Koninklijke Philips Electronics N.V. ELECTRICAL EQUIPMENT WITH A PHASE CHANGE MATERIAL
JP4471564B2 (en) * 2002-10-31 2010-06-02 日揮触媒化成株式会社 Coating liquid for forming low dielectric constant amorphous silica film and method for preparing the coating liquid
JP4225765B2 (en) * 2002-10-31 2009-02-18 日揮触媒化成株式会社 Method for forming low dielectric constant amorphous silica coating and low dielectric constant amorphous silica coating obtained by the method
JP4170735B2 (en) * 2002-11-13 2008-10-22 信越化学工業株式会社 Zeolite sol and manufacturing method thereof, composition for forming porous film, porous film and manufacturing method thereof, interlayer insulating film and semiconductor device
US7404990B2 (en) 2002-11-14 2008-07-29 Air Products And Chemicals, Inc. Non-thermal process for forming porous low dielectric constant films
EP1594821A4 (en) * 2003-01-24 2007-10-17 Univ North Texas METHOD AND APPARATUS FOR DESORPTING ELEMENTS OR SPECIES CONTENT (E) S IN CARBON NANOTUBES BY MEANS OF MICROWAVES
US20040180244A1 (en) * 2003-01-24 2004-09-16 Tour James Mitchell Process and apparatus for microwave desorption of elements or species from carbon nanotubes
US7288292B2 (en) * 2003-03-18 2007-10-30 International Business Machines Corporation Ultra low k (ULK) SiCOH film and method
US20050067344A1 (en) * 2003-09-30 2005-03-31 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Zeolite membrane support and zeolite composite membrane
US7303985B2 (en) * 2003-11-17 2007-12-04 Intel Corporation Zeolite-carbon doped oxide composite low k dielectric
US7674390B2 (en) * 2003-11-17 2010-03-09 Intel Corporation Zeolite—sol gel nano-composite low k dielectric
EP1698656B2 (en) * 2003-12-24 2017-04-26 Asahi Kasei Kabushiki Kaisha Microporous membrane made from polyolefin
ES2247921B1 (en) * 2004-04-07 2007-06-16 Universidad Politecnica De Valencia A MICROPOROUS AMORFO MATERIAL, PREPARATION PROCEDURE AND ITS USE IN THE CATALYTIC CONVERSION OF ORGANIC COMPOUNDS.
US7109130B2 (en) * 2004-05-04 2006-09-19 California Institute Of Technology Zeolite films for low k applications
JP4893905B2 (en) 2004-08-31 2012-03-07 独立行政法人産業技術総合研究所 Zeolite raw material liquid, zeolite crystal preparation method, zeolite raw material liquid preparation method, and zeolite thin film
JP4798329B2 (en) * 2004-09-03 2011-10-19 Jsr株式会社 Insulating film forming composition, insulating film, and method for forming the same
JP4798330B2 (en) * 2004-09-03 2011-10-19 Jsr株式会社 Insulating film forming composition, insulating film, and method for forming the same
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
JP2006117763A (en) * 2004-10-20 2006-05-11 Catalysts & Chem Ind Co Ltd Coating liquid for forming low dielectric constant amorphous silica film, method for preparing the same, and low dielectric constant amorphous silica film obtained therefrom
US7179547B2 (en) * 2004-10-29 2007-02-20 The Regents Of The University Of California High aluminum zeolite coatings on corrodible metal surfaces
DE102004053460A1 (en) * 2004-11-05 2006-05-11 Emitec Gesellschaft Für Emissionstechnologie Mbh Protective element for a sensor, as well as appropriate sensor and honeycomb body
KR101067596B1 (en) * 2004-12-01 2011-09-27 삼성코닝정밀소재 주식회사 Manufacturing method of low dielectric porous thin film
US20060142143A1 (en) * 2004-12-15 2006-06-29 Hayim Abrevaya Process for preparing a dielectric interlayer film containing silicon beta zeolite
US8343880B2 (en) * 2004-12-15 2013-01-01 Uop Llc Process for preparing a dielectric interlayer film containing silicon beta zeolite
US7365375B2 (en) * 2005-03-25 2008-04-29 Intel Corporation Organic-framework zeolite interlayer dielectrics
EP1941539A1 (en) * 2005-06-03 2008-07-09 Axcelis Technologies, Inc. Ultraviolet curing process for low k dielectric films
TWI292340B (en) * 2005-07-13 2008-01-11 Ind Tech Res Inst Antireflective transparent zeolite hardcoat film, method for fabricating the same, and solution capable of forming said transparent zeolite film
US7427570B2 (en) * 2005-09-01 2008-09-23 Micron Technology, Inc. Porous organosilicate layers, and vapor deposition systems and methods for preparing same
US7632771B2 (en) * 2006-02-07 2009-12-15 Imec UV light exposure for functionalization and hydrophobization of pure-silica zeolites
US7977121B2 (en) 2006-11-17 2011-07-12 Air Products And Chemicals, Inc. Method and composition for restoring dielectric properties of porous dielectric materials
GB0702327D0 (en) * 2007-02-07 2007-03-21 Leuven K U Res & Dev Zeolite materials and synthesis method thereof
JP2008201833A (en) * 2007-02-16 2008-09-04 Shin Etsu Chem Co Ltd Film forming composition, low dielectric constant insulating film, method for forming low dielectric constant insulating film, and semiconductor device
JP2008205008A (en) * 2007-02-16 2008-09-04 Shin Etsu Chem Co Ltd Composition for forming semiconductor interlayer insulating film and method for producing the same, film forming method and semiconductor device
JP2008201832A (en) * 2007-02-16 2008-09-04 Shin Etsu Chem Co Ltd Siloxane polymer and method for producing the same, coating solution for forming porous film containing the polymer, porous film, and semiconductor device using the porous film
US8530000B2 (en) 2007-09-19 2013-09-10 Micron Technology, Inc. Methods of forming charge-trapping regions
KR101610180B1 (en) * 2007-11-21 2016-04-07 캐논 나노테크놀로지즈 인코퍼레이티드 Porous template and imprinting stack for nano-imprint lithography
US20110129925A1 (en) * 2008-06-13 2011-06-02 Yushan Yan Zeolite and bone mimetic zeolite based coatings for bioimplants
US20100072671A1 (en) * 2008-09-25 2010-03-25 Molecular Imprints, Inc. Nano-imprint lithography template fabrication and treatment
US8470188B2 (en) * 2008-10-02 2013-06-25 Molecular Imprints, Inc. Nano-imprint lithography templates
US20100104852A1 (en) * 2008-10-23 2010-04-29 Molecular Imprints, Inc. Fabrication of High-Throughput Nano-Imprint Lithography Templates
US20100109201A1 (en) * 2008-10-31 2010-05-06 Molecular Imprints, Inc. Nano-Imprint Lithography Template with Ordered Pore Structure
US20100151206A1 (en) 2008-12-11 2010-06-17 Air Products And Chemicals, Inc. Method for Removal of Carbon From An Organosilicate Material
BRPI0918209A2 (en) 2008-12-23 2021-08-31 3M Innovative Properties Company SENSOR
EP2376910A4 (en) 2008-12-23 2015-07-01 3M Innovative Properties Co Organic chemical sensor with microporous organosilicate material
JP5278688B2 (en) * 2009-03-18 2013-09-04 凸版印刷株式会社 Method for manufacturing antireflection laminate
US20100249445A1 (en) * 2009-03-24 2010-09-30 The Regents Of The University Of California Post-spin-on silylation method for hydrophobic and hydrofluoric acid-resistant porous silica films
DE102009028146A1 (en) 2009-07-31 2011-02-03 Evonik Degussa Gmbh Zeolite-containing printing inks, process for their preparation and their use
US8616873B2 (en) * 2010-01-26 2013-12-31 Molecular Imprints, Inc. Micro-conformal templates for nanoimprint lithography
US20110189329A1 (en) * 2010-01-29 2011-08-04 Molecular Imprints, Inc. Ultra-Compliant Nanoimprint Lithography Template
TWI439417B (en) * 2010-12-29 2014-06-01 Univ Ishou Preparation of Nano - zeolite Thin Films with Low Dielectric Constant
EP2842914B1 (en) * 2012-03-26 2023-06-14 Tosoh Corporation Mfi zeolite having uniform mesopores and method for producing same
TWI483776B (en) * 2012-12-14 2015-05-11 Univ Ishou Fabrication of zeolite composite film
CN108033459B (en) * 2017-11-28 2020-04-24 淮阴工学院 Method for synthesizing mesoporous heteroatom molecular sieve by photoinduction self-assembly
CN115212732B (en) * 2021-04-20 2024-02-06 大连理工大学 Preparation method and application of MFI molecular sieve membrane with excellent gas separation performance

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5393409A (en) 1993-03-08 1995-02-28 Uop Hydrocracking process using a controlled porosity catalyst
TW392288B (en) 1997-06-06 2000-06-01 Dow Corning Thermally stable dielectric coatings
WO1999010167A1 (en) * 1997-08-27 1999-03-04 Kabushiki Kaisha Toyota Chuo Kenkyusho Coated object and process for producing the same
US5858457A (en) * 1997-09-25 1999-01-12 Sandia Corporation Process to form mesostructured films
US6159871A (en) 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
US6117411A (en) * 1998-06-29 2000-09-12 California Institute Of Technology Molecular sieve CIT-6
CN1219700C (en) 1998-12-23 2005-09-21 贝特勒纪念学院 Mesoporous silica film from a solution containing a surfactant and methods of making same

Also Published As

Publication number Publication date
WO2002007191A2 (en) 2002-01-24
US20020134995A1 (en) 2002-09-26
US20020060364A1 (en) 2002-05-23
US6630696B2 (en) 2003-10-07
WO2002007191A3 (en) 2002-04-18
JP2004504716A (en) 2004-02-12
US6573131B2 (en) 2003-06-03

Similar Documents

Publication Publication Date Title
AU2002222968A1 (en) Silica zeolite low-k dielectric thin films
AU2002343029A1 (en) Forming low k dielectric layers
AU2001252594A1 (en) Insulating container
SG108850A1 (en) Methods for forming low-k dielectric films
AU2001239982A1 (en) Zeolite ssz-55
AU2002211596A1 (en) Desiccant composition
AU2002322093A1 (en) Multi-position tilt-limiting mechanism
AU2002217771A1 (en) High-performance network switch
AU2002236093A1 (en) Access networks
AU2002222631A1 (en) Etching method for insulating film
AU2001273457A1 (en) Foamed-thermoplastic films
AU6020901A (en) Insulating element
AU2001215196A1 (en) Electrospray device
AU2002318478A1 (en) Zeolite ssz-59
AU2002248706A1 (en) Compact precooler
AU2001278388A1 (en) Screw
AU2002255453A1 (en) Dielectric resonator
AU2002330035A1 (en) Dielectric film
AU2001280255A1 (en) Dielectric composition for manufacturing insulating structures
AU2002219019A1 (en) Insulating element
AU2001279091A1 (en) Rarp server-independent gateway
AU2002319433A1 (en) Low dielectric constant layers
AU2002330069A1 (en) Fireblocking/insulating paper
AU2002340936A1 (en) Insulating foam composition
AU2002312338A1 (en) Thermally insulating interfaces