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AU2002219292A1 - Substrate for material to be exposed - Google Patents

Substrate for material to be exposed

Info

Publication number
AU2002219292A1
AU2002219292A1 AU2002219292A AU1929202A AU2002219292A1 AU 2002219292 A1 AU2002219292 A1 AU 2002219292A1 AU 2002219292 A AU2002219292 A AU 2002219292A AU 1929202 A AU1929202 A AU 1929202A AU 2002219292 A1 AU2002219292 A1 AU 2002219292A1
Authority
AU
Australia
Prior art keywords
exposed
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002219292A
Inventor
Patrick Chaton
Francois Perraut
Patrick Pouteau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Biomerieux SA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Biomerieux SA
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Biomerieux SA, Commissariat a lEnergie Atomique CEA filed Critical Biomerieux SA
Publication of AU2002219292A1 publication Critical patent/AU2002219292A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00596—Solid-phase processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B01J2219/00612—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports the surface being inorganic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00709—Type of synthesis
    • B01J2219/00711—Light-directed synthesis

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optical Elements Other Than Lenses (AREA)
AU2002219292A 2000-12-14 2001-12-12 Substrate for material to be exposed Abandoned AU2002219292A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0016315 2000-12-14
FR0016315A FR2818263B1 (en) 2000-12-14 2000-12-14 SUBSTRATE FOR INSULATING MATERIAL
PCT/FR2001/003959 WO2002048795A1 (en) 2000-12-14 2001-12-12 Substrate for material to be exposed

Publications (1)

Publication Number Publication Date
AU2002219292A1 true AU2002219292A1 (en) 2002-06-24

Family

ID=8857656

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002219292A Abandoned AU2002219292A1 (en) 2000-12-14 2001-12-12 Substrate for material to be exposed

Country Status (6)

Country Link
US (1) US20040047057A1 (en)
EP (1) EP1346260A1 (en)
JP (1) JP2004523780A (en)
AU (1) AU2002219292A1 (en)
FR (1) FR2818263B1 (en)
WO (1) WO2002048795A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050074781A1 (en) * 2003-10-02 2005-04-07 Herbert von Schroeder Nucleic acid braided J-probes
US8610986B2 (en) * 2009-04-06 2013-12-17 The Board Of Trustees Of The University Of Illinois Mirror arrays for maskless photolithography and image display
US8394502B2 (en) * 2009-09-14 2013-03-12 Ocean Thin Films, Inc. Highly durable first surface silver based optical coatings and method of making the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561946B2 (en) * 1988-08-31 1996-12-11 ホーヤ株式会社 Multilayer back mirror
US5736257A (en) * 1995-04-25 1998-04-07 Us Navy Photoactivatable polymers for producing patterned biomolecular assemblies
JPH09185174A (en) * 1995-12-28 1997-07-15 Oki Electric Ind Co Ltd Method for patterning wafer
DE19608428C2 (en) * 1996-03-05 2000-10-19 Forschungszentrum Juelich Gmbh Chemical sensor
US6042995A (en) * 1997-12-09 2000-03-28 Lucent Technologies Inc. Lithographic process for device fabrication using a multilayer mask which has been previously inspected
US6165896A (en) * 1998-06-25 2000-12-26 Siemens Aktiengesellschaft Self-aligned formation and method for semiconductors
US6274871B1 (en) * 1998-10-22 2001-08-14 Vysis, Inc. Method and system for performing infrared study on a biological sample
US6320206B1 (en) * 1999-02-05 2001-11-20 Lumileds Lighting, U.S., Llc Light emitting devices having wafer bonded aluminum gallium indium nitride structures and mirror stacks
KR100379411B1 (en) * 1999-06-28 2003-04-10 엘지전자 주식회사 biochip and method for patterning and measuring biomaterial of the same
US6494997B1 (en) * 2000-08-18 2002-12-17 General Electric Company Radio frequency magnetron sputtering for lighting applications
US6589717B1 (en) * 2000-11-17 2003-07-08 Advanced Micro Devices, Inc. Photon assisted deposition of hard mask formation for use in manufacture of both devices and masks
FR2849195B1 (en) * 2002-12-20 2005-01-21 Commissariat Energie Atomique BIOSENSOR WITH ANY SUBSTRATE THAT CAN BE CHARACTERIZED IN PHOTOTHERMIC DEFLECTION

Also Published As

Publication number Publication date
FR2818263A1 (en) 2002-06-21
JP2004523780A (en) 2004-08-05
WO2002048795A1 (en) 2002-06-20
US20040047057A1 (en) 2004-03-11
FR2818263B1 (en) 2004-02-20
EP1346260A1 (en) 2003-09-24

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