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AU2002245700A1 - Screening of combinatorial library using x-ray analysis - Google Patents

Screening of combinatorial library using x-ray analysis

Info

Publication number
AU2002245700A1
AU2002245700A1 AU2002245700A AU2002245700A AU2002245700A1 AU 2002245700 A1 AU2002245700 A1 AU 2002245700A1 AU 2002245700 A AU2002245700 A AU 2002245700A AU 2002245700 A AU2002245700 A AU 2002245700A AU 2002245700 A1 AU2002245700 A1 AU 2002245700A1
Authority
AU
Australia
Prior art keywords
screening
ray analysis
combinatorial library
combinatorial
library
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002245700A
Inventor
David M. Gibson
Jeffrey P. Nicolich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
X Ray Optical Systems Inc
Original Assignee
X Ray Optical Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Ray Optical Systems Inc filed Critical X Ray Optical Systems Inc
Publication of AU2002245700A1 publication Critical patent/AU2002245700A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AU2002245700A 2002-03-19 2002-03-19 Screening of combinatorial library using x-ray analysis Abandoned AU2002245700A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2002/008434 WO2003081222A1 (en) 2002-03-19 2002-03-19 Screening of combinatorial library using x-ray analysis

Publications (1)

Publication Number Publication Date
AU2002245700A1 true AU2002245700A1 (en) 2003-10-08

Family

ID=28452135

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002245700A Abandoned AU2002245700A1 (en) 2002-03-19 2002-03-19 Screening of combinatorial library using x-ray analysis

Country Status (2)

Country Link
AU (1) AU2002245700A1 (en)
WO (1) WO2003081222A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1953537A1 (en) * 2007-01-30 2008-08-06 KEMMER, Josef, Dr. Device for detecting or guiding x-radiation using x-ray optics
WO2008112950A1 (en) * 2007-03-15 2008-09-18 X-Ray Optical Systems, Inc. Small spot and high energy resolution xrf system for valence state determination
CN106288796A (en) * 2016-07-26 2017-01-04 中国科学院上海应用物理研究所 A kind of glancing incidence XAFS high-temp in-situ stove
CN109324072B (en) * 2017-07-28 2021-05-14 中国科学院苏州纳米技术与纳米仿生研究所 Detection system and detection method for high-flux combined material chip

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8801019A (en) * 1988-04-20 1989-11-16 Philips Nv ROENTGEN SPECTROMETER WITH DOUBLE-CURVED CRYSTAL.
DE69427152T2 (en) * 1994-07-08 2001-11-22 Muradin Abubekirovic Kumachov METHOD FOR GUIDING NEUTRAL AND CARGO BEAMS AND A DEVICE FOR IMPLEMENTING THE METHOD
CA2267897C (en) * 1996-10-09 2005-12-06 Symyx Technologies Infrared spectroscopy and imaging of libraries
GB9815968D0 (en) * 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
EP1149282A2 (en) * 1998-12-18 2001-10-31 Symyx Technologies, Inc. Apparatus and method for characterizing libraries of different materials using x-ray scattering
US6389101B1 (en) * 1999-05-24 2002-05-14 Jmar Research, Inc. Parallel x-ray nanotomography
JP3373803B2 (en) * 1999-05-28 2003-02-04 科学技術振興事業団 Combinatorial X-ray diffractometer
WO2001007940A1 (en) * 1999-07-21 2001-02-01 Jmar Research, Inc. High collection angle short wavelength radiation collimator and focusing optic

Also Published As

Publication number Publication date
WO2003081222A1 (en) 2003-10-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase