[go: up one dir, main page]

AU2001234668A1 - Apparatus and method for mixing gases - Google Patents

Apparatus and method for mixing gases

Info

Publication number
AU2001234668A1
AU2001234668A1 AU2001234668A AU3466801A AU2001234668A1 AU 2001234668 A1 AU2001234668 A1 AU 2001234668A1 AU 2001234668 A AU2001234668 A AU 2001234668A AU 3466801 A AU3466801 A AU 3466801A AU 2001234668 A1 AU2001234668 A1 AU 2001234668A1
Authority
AU
Australia
Prior art keywords
mixing gases
gases
mixing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001234668A
Inventor
Stephen Chesters
Dean L. Doty
Ben R. Hall
Roger Q. Petton
Thomas P. Ross
Charles A. White
Reginald Wynne
Yan Xu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
DEAN L DOTY
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DEAN L DOTY, Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical DEAN L DOTY
Publication of AU2001234668A1 publication Critical patent/AU2001234668A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/135—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture
    • G05D11/138—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture by sensing the concentration of the mixture, e.g. measuring pH value
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
    • G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0324—With control of flow by a condition or characteristic of a fluid
    • Y10T137/0329—Mixing of plural fluids of diverse characteristics or conditions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0324—With control of flow by a condition or characteristic of a fluid
    • Y10T137/0363—For producing proportionate flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2499—Mixture condition maintaining or sensing
    • Y10T137/2509—By optical or chemical property
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87249—Multiple inlet with multiple outlet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87676—With flow control
    • Y10T137/87684—Valve in each inlet
    • Y10T137/87692—With common valve operator

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Pipeline Systems (AREA)
AU2001234668A 2000-02-04 2001-01-31 Apparatus and method for mixing gases Abandoned AU2001234668A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
USNOTGIVEN 1997-05-02
US18046200P 2000-02-04 2000-02-04
US60180462 2000-02-04
PCT/US2001/003053 WO2001057607A1 (en) 2000-02-04 2001-01-31 Apparatus and method for mixing gases

Publications (1)

Publication Number Publication Date
AU2001234668A1 true AU2001234668A1 (en) 2001-08-14

Family

ID=22660554

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001234668A Abandoned AU2001234668A1 (en) 2000-02-04 2001-01-31 Apparatus and method for mixing gases

Country Status (4)

Country Link
US (1) US6772781B2 (en)
AU (1) AU2001234668A1 (en)
TW (1) TW521000B (en)
WO (1) WO2001057607A1 (en)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2835443B1 (en) * 2002-02-01 2004-03-05 Commissariat Energie Atomique METHOD AND DEVICE FOR MIXING GAS
JP3973605B2 (en) * 2002-07-10 2007-09-12 東京エレクトロン株式会社 Film forming apparatus, raw material supply apparatus used therefor, and film forming method
US7063097B2 (en) * 2003-03-28 2006-06-20 Advanced Technology Materials, Inc. In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration
WO2004088415A2 (en) * 2003-03-28 2004-10-14 Advanced Technology Materials Inc. Photometrically modulated delivery of reagents
JP4512913B2 (en) * 2003-04-07 2010-07-28 旭有機材工業株式会社 Fluid mixing device
US7201179B2 (en) * 2003-09-23 2007-04-10 Air Liquide Industrial U.S. Lp Modular fluid supply system
US20100018592A1 (en) * 2003-10-09 2010-01-28 Parker Frederick A Fluid control system for precisely controlling a flow of fluid
US20060000509A1 (en) * 2004-07-01 2006-01-05 Pozniak Peter M Fluid flow control device and system
US20060080041A1 (en) * 2004-07-08 2006-04-13 Anderson Gary R Chemical mixing apparatus, system and method
US7281840B2 (en) * 2004-07-09 2007-10-16 Tres-Ark, Inc. Chemical mixing apparatus
US7438079B2 (en) * 2005-02-04 2008-10-21 Air Products And Chemicals, Inc. In-line gas purity monitoring and control system
DE06736535T1 (en) * 2005-02-28 2008-06-05 Honeywell International Inc. IMPROVED METHOD FOR MIXING COOLANT
US20060243207A1 (en) * 2005-04-20 2006-11-02 Jursich Gregory M Fluid mixing and delivery system
KR101241922B1 (en) * 2005-06-22 2013-03-11 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 Apparatus and process for integrated gas blending
US20070042487A1 (en) * 2005-08-19 2007-02-22 Imi Norgren, Inc. Bioreactor valve island
EP1933992B1 (en) 2005-08-30 2014-09-24 Advanced Technology Materials, Inc. Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
US20070089796A1 (en) * 2005-10-26 2007-04-26 Tamara Electra Brown Medical air production systems
US20080201053A1 (en) * 2007-02-20 2008-08-21 Esco Technologies (Asia) Pte Ltd System and method for mixed gas chamber with automatic recovery
US7846497B2 (en) * 2007-02-26 2010-12-07 Applied Materials, Inc. Method and apparatus for controlling gas flow to a processing chamber
US7775236B2 (en) * 2007-02-26 2010-08-17 Applied Materials, Inc. Method and apparatus for controlling gas flow to a processing chamber
US8074677B2 (en) * 2007-02-26 2011-12-13 Applied Materials, Inc. Method and apparatus for controlling gas flow to a processing chamber
US7981195B2 (en) 2007-11-09 2011-07-19 Praxair Technology, Inc. System for preventing contaminants from reaching a gas purifier
FR2924222B1 (en) * 2007-11-27 2009-11-13 Air Liquide METHOD FOR DELIVERING GAS MIXTURES FOR AN ANALYZER
CN101910706B (en) * 2007-12-27 2013-11-13 朗姆研究公司 Gas transport delay resolution for short etch recipes
TWI573179B (en) 2008-02-11 2017-03-01 先進科技材料公司 Ion source cleaning in semiconductor processing systems
FR2940624A1 (en) * 2008-12-30 2010-07-02 Akhea DEVICE MIXING AT LEAST TWO GASEOUS CONSTITUENTS
US20110021011A1 (en) 2009-07-23 2011-01-27 Advanced Technology Materials, Inc. Carbon materials for carbon implantation
US20110051546A1 (en) * 2009-08-31 2011-03-03 Steven Finley Fluid blending apparatus and process
US8598022B2 (en) 2009-10-27 2013-12-03 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
GB201002666D0 (en) * 2010-02-17 2010-04-07 Pursuit Dynamics Plc Apparatus and method for entraining fluids
US8931512B2 (en) * 2011-03-07 2015-01-13 Applied Materials, Inc. Gas delivery system and method of use thereof
CN103620734B (en) 2011-06-30 2017-02-15 应用材料公司 Methods and apparatus for rapid gas exchange, rapid gas switching, and programmable gas delivery
TWM423354U (en) * 2011-08-10 2012-02-21 Ableprint Technology Co Ltd Gas concentrations control device of pressure container
JP5793103B2 (en) * 2012-04-13 2015-10-14 岩谷産業株式会社 Method and apparatus for supplying mixed gas
PL2667276T3 (en) * 2012-05-24 2018-04-30 Air Products And Chemicals, Inc. Method of, and apparatus for, providing a gas mixture
EP2667277B1 (en) * 2012-05-24 2017-12-27 Air Products And Chemicals, Inc. Method of, and apparatus for, providing a gas mixture
JP5859586B2 (en) * 2013-12-27 2016-02-10 株式会社日立国際電気 Substrate processing system, semiconductor device manufacturing method, and recording medium
CN105960615A (en) * 2014-02-06 2016-09-21 普莱克斯技术有限公司 Improved dynamics gas blending system and process for producing mixtures with minimal variation within tolerance limits and increased gas utilization
JP2016134569A (en) * 2015-01-21 2016-07-25 株式会社東芝 Semiconductor manufacturing equipment
US10138555B2 (en) * 2015-10-13 2018-11-27 Horiba Stec, Co., Ltd. Gas control system and program for gas control system
DE102016000518A1 (en) * 2016-01-19 2017-07-20 Linde Aktiengesellschaft Gas dilution system
US10591934B2 (en) * 2018-03-09 2020-03-17 Lam Research Corporation Mass flow controller for substrate processing
KR102796445B1 (en) * 2018-04-03 2025-04-15 램 리써치 코포레이션 MEMS Coriolis Gas Flow Controller
JP7281285B2 (en) 2019-01-28 2023-05-25 株式会社堀場エステック DENSITY CONTROLLER, ZERO POINT ADJUSTMENT METHOD, AND PROGRAM FOR DENSITY CONTROLLER
EP4603226A3 (en) 2019-11-27 2025-10-22 Diversified Fluid Solutions, LLC On-demand in-line-blending and supply of chemicals
JP7599775B2 (en) * 2020-09-08 2024-12-16 株式会社ディスコ Equipment that uses high pressure air
KR20220089052A (en) * 2020-12-21 2022-06-28 삼성전자주식회사 Reaction gas supply system, atomic layer deposition apparatus including the same and method of processing a substrate using the same
FR3136831B1 (en) * 2022-06-17 2024-05-24 Air Liquide Dynamic method for quickly filling identical batches of gas mixture bottles with high metrological precision

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2868216A (en) * 1953-03-16 1959-01-13 Texas Co Method and apparatus for determining, and for maintaining constant, the proportions of a flowing fluid mixture
US5368062A (en) * 1992-01-29 1994-11-29 Kabushiki Kaisha Toshiba Gas supplying system and gas supplying apparatus
US5823219A (en) * 1992-08-18 1998-10-20 National Foam, Inc. System and method for producing and maintaining predetermined proportionate mixtures of fluids
JP3174856B2 (en) * 1993-05-07 2001-06-11 日本エア・リキード株式会社 Mixed gas supply device
JP3442604B2 (en) 1996-02-15 2003-09-02 株式会社フジキン Method of supplying mixed gas, mixed gas supply device, and semiconductor manufacturing apparatus provided with these
US5826607A (en) * 1996-11-25 1998-10-27 Sony Corporation Dual exhaust controller
US5887611A (en) * 1996-12-31 1999-03-30 The University Of Florida Gas blender
US5865206A (en) 1997-05-09 1999-02-02 Praxair Technology, Inc. Process and apparatus for backing-up or supplementing a gas supply system

Also Published As

Publication number Publication date
US6772781B2 (en) 2004-08-10
TW521000B (en) 2003-02-21
US20010032668A1 (en) 2001-10-25
WO2001057607A1 (en) 2001-08-09

Similar Documents

Publication Publication Date Title
AU2001234668A1 (en) Apparatus and method for mixing gases
AU2001223590A1 (en) Mixing method and apparatus
AU2001256933A1 (en) Apparatus and method
AU2001263028A1 (en) Stream-cipher method and apparatus
AU4469200A (en) Advanced apparatus and method for abattment of gaseous pollutants
AU2001281373A1 (en) Method and apparatus for blending process materials
AU2001247753A1 (en) Method and apparatus for integrated-battery devices
AU2001294966A1 (en) Gas dissolving apparatus and method
AU2001280489A1 (en) Method and apparatus for providing process-container platforms
AU2002233938A1 (en) Method and apparatus for protein manipulation
AU2001264771A1 (en) Well reference apparatus and method
AU2001297586A1 (en) Gas drying apparatus and method
AU2002350109A1 (en) Methods and apparatus for cryo-therapy
AU2001290051A1 (en) Method and apparatus for analytical problem solving
AU2001273114A1 (en) Method and apparatus for mixing combustion gases
AU2001217357A1 (en) Sequence analysis method and sequence analysis apparatus
AU2002360593A1 (en) Method and apparatus for nano-sensing
AU2002212150A1 (en) Device and method for mixing constituents
AU2002350890A1 (en) Method and apparatus for dosing and mixing
AU2001252437A1 (en) Analytical method and apparatus
AU3414201A (en) Method and apparatus for decoding
AU2002210738A1 (en) Sealing apparatus and method
AU3329200A (en) Mixed gas separating method and separating apparatus
AU2002227345A1 (en) Method and apparatus for evaluating software
AU2648299A (en) Method and device for mixing of gases