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AU2001213610A1 - Method and apparatus for a reticle with purged pellicle-to-reticle gap - Google Patents

Method and apparatus for a reticle with purged pellicle-to-reticle gap

Info

Publication number
AU2001213610A1
AU2001213610A1 AU2001213610A AU1361001A AU2001213610A1 AU 2001213610 A1 AU2001213610 A1 AU 2001213610A1 AU 2001213610 A AU2001213610 A AU 2001213610A AU 1361001 A AU1361001 A AU 1361001A AU 2001213610 A1 AU2001213610 A1 AU 2001213610A1
Authority
AU
Australia
Prior art keywords
reticle
gap
pellicle
purged
purged pellicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001213610A
Inventor
Jorge Ivaldi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2001213610A1 publication Critical patent/AU2001213610A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2001213610A 2000-02-10 2000-11-06 Method and apparatus for a reticle with purged pellicle-to-reticle gap Abandoned AU2001213610A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/501,180 US6507390B1 (en) 2000-02-10 2000-02-10 Method and apparatus for a reticle with purged pellicle-to-reticle gap
US09501180 2000-02-10
PCT/US2000/030432 WO2001059522A1 (en) 2000-02-10 2000-11-06 Method and apparatus for a reticle with purged pellicle-to-reticle gap

Publications (1)

Publication Number Publication Date
AU2001213610A1 true AU2001213610A1 (en) 2001-08-20

Family

ID=23992441

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001213610A Abandoned AU2001213610A1 (en) 2000-02-10 2000-11-06 Method and apparatus for a reticle with purged pellicle-to-reticle gap

Country Status (3)

Country Link
US (1) US6507390B1 (en)
AU (1) AU2001213610A1 (en)
WO (1) WO2001059522A1 (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6847434B2 (en) * 2000-02-10 2005-01-25 Asml Holding N.V. Method and apparatus for a pellicle frame with porous filtering inserts
US6710845B2 (en) * 2000-12-29 2004-03-23 Intel Corporation Purging gas from a photolithography enclosure between a mask protective device and a patterned mask
US6619903B2 (en) * 2001-08-10 2003-09-16 Glenn M. Friedman System and method for reticle protection and transport
JP4027085B2 (en) * 2001-12-04 2007-12-26 キヤノン株式会社 Device manufacturing related apparatus and device manufacturing method
JP3958049B2 (en) * 2002-01-15 2007-08-15 キヤノン株式会社 Reticle with pellicle, device manufacturing related apparatus, exposure apparatus and device manufacturing method
JP4006235B2 (en) * 2002-02-05 2007-11-14 キヤノン株式会社 Inert gas replacement method and apparatus, reticle storage, reticle inspection apparatus, reticle transport box, and device manufacturing method
US7052809B2 (en) * 2002-10-02 2006-05-30 Mykrolis Corporation Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same
US7014961B2 (en) * 2002-10-02 2006-03-21 Yazaki Corporation Photomask assembly incorporating a porous frame
US7094505B2 (en) 2002-10-29 2006-08-22 Toppan Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process
EP1720070A3 (en) * 2002-12-09 2006-11-22 ASML Holding N.V. Pellicle frame with heightened bonding surfaces
US6822731B1 (en) * 2003-06-18 2004-11-23 Asml Holding N.V. Method and apparatus for a pellicle frame with heightened bonding surfaces
US7068347B2 (en) * 2002-12-20 2006-06-27 Intel Corporation Apparatus for reducing pellicle darkening
US6913654B2 (en) * 2003-06-02 2005-07-05 Mykrolis Corporation Method for the removal of airborne molecular contaminants using water gas mixtures
US7551265B2 (en) * 2004-10-01 2009-06-23 Nikon Corporation Contact material and system for ultra-clean applications
US7230673B2 (en) 2004-12-07 2007-06-12 Asml Netherlands B.V. Lithographic apparatus, reticle exchange unit and device manufacturing method
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
WO2007019105A1 (en) * 2005-08-03 2007-02-15 Entegris, Inc. A transfer container
DE102005062430A1 (en) * 2005-12-23 2007-07-05 Carl Zeiss Smt Ag Optical arrangement used in microlithography comprises photomask and adsorbing substance arranged in intermediate chamber to bind contaminating gases containing hydrocarbons by physical adsorption and/or chemical adsorption
JPWO2007094197A1 (en) * 2006-02-16 2009-07-02 株式会社ニコン Protective device, mask and exposure device
DE102012219545A1 (en) * 2012-10-25 2014-04-30 Carl Zeiss Smt Gmbh Projection exposure system for EUV lithography and method of operating the projection exposure system
US10775694B1 (en) * 2019-04-30 2020-09-15 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4719705A (en) 1986-06-24 1988-01-19 The Perkin-Elmer Corporation Reticle transporter
US4986007A (en) 1987-03-25 1991-01-22 Svg Lithography Systems, Inc. Reticle frame assembly
JPH03166545A (en) * 1989-11-27 1991-07-18 Hitachi Electron Eng Co Ltd Pellicle frame for protecting ic reticule
JPH04196117A (en) * 1990-11-26 1992-07-15 Seiko Epson Corp Semiconductor manufacturing device
JPH04269752A (en) * 1991-02-26 1992-09-25 Fujitsu Ltd pellicle
JPH05297572A (en) * 1992-04-22 1993-11-12 Mitsubishi Electric Corp Reticle with pellicle film and method for removing foreign matter thereof
JP3445685B2 (en) * 1994-08-11 2003-09-08 三井化学株式会社 Mask protection device
US5727685A (en) 1995-10-19 1998-03-17 Svg Lithography Systems, Inc. Reticle container with corner holding
JPH09197652A (en) * 1996-01-19 1997-07-31 Nec Corp Pellicle and photomask with pellicle
US5814381A (en) * 1997-04-04 1998-09-29 Inko Industrial Corporation Pellicle assembly having a vented frame
US6216873B1 (en) * 1999-03-19 2001-04-17 Asyst Technologies, Inc. SMIF container including a reticle support structure

Also Published As

Publication number Publication date
US6507390B1 (en) 2003-01-14
WO2001059522A1 (en) 2001-08-16

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