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AU2001293732A1 - Process for producing coatings using siloxane photoinitiators - Google Patents

Process for producing coatings using siloxane photoinitiators

Info

Publication number
AU2001293732A1
AU2001293732A1 AU2001293732A AU9373201A AU2001293732A1 AU 2001293732 A1 AU2001293732 A1 AU 2001293732A1 AU 2001293732 A AU2001293732 A AU 2001293732A AU 9373201 A AU9373201 A AU 9373201A AU 2001293732 A1 AU2001293732 A1 AU 2001293732A1
Authority
AU
Australia
Prior art keywords
formulation
producing coatings
photoinitiators
siloxane
siloxane photoinitiators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001293732A
Inventor
Gisele Baudin
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2001293732A1 publication Critical patent/AU2001293732A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A process for producing stable, scratch-resistant coatings comprising the preparation of a photocurable formulation containing certain siloxane photoinitiators as surface-active initiators, application of the formulation to a substrate and the curing of the formulation by exposure to electromagnetic radiation with wavelengths from 200 nm into the IR region and prior, simultaneous or subsequent exposure to heat.
AU2001293732A 2000-08-14 2001-08-07 Process for producing coatings using siloxane photoinitiators Abandoned AU2001293732A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14
EP00810720 2000-08-14
PCT/EP2001/009123 WO2002014439A2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators

Publications (1)

Publication Number Publication Date
AU2001293732A1 true AU2001293732A1 (en) 2002-02-25

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001293732A Abandoned AU2001293732A1 (en) 2000-08-14 2001-08-07 Process for producing coatings using siloxane photoinitiators

Country Status (13)

Country Link
US (1) US7279200B2 (en)
EP (1) EP1311627B1 (en)
JP (1) JP5068413B2 (en)
KR (1) KR100818643B1 (en)
CN (1) CN1211439C (en)
AT (1) ATE360666T1 (en)
AU (1) AU2001293732A1 (en)
BR (1) BR0113233B1 (en)
CA (1) CA2417112A1 (en)
DE (1) DE60128105T8 (en)
MX (1) MXPA03001383A (en)
TW (1) TWI244495B (en)
WO (1) WO2002014439A2 (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (en) * 2000-05-08 2001-11-22 Georg Gros Coating sheet metal used in the automobile, aviation and naval industries comprises using a chromate-free, water-dilutable anti corrosive binder coating and curing using UV
EP1325089A2 (en) * 2000-09-25 2003-07-09 Chemetall GmbH Method for pretreating and coating metal surfaces, prior to forming, with a paint-like coating and use of substrates so coated
DE60322345D1 (en) 2002-02-04 2008-09-04 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
KR100898877B1 (en) * 2002-02-04 2009-05-25 시바 홀딩 인크 Fluorinated Photoinitiators in Highly Fluorinated Monomers
US7005281B2 (en) 2002-03-06 2006-02-28 Ciba Specialty Chemicals Corp. Enzymatic process for preparing organosilicon group containing photoinitiators
ES2259413T3 (en) * 2002-04-26 2006-10-01 Ciba Specialty Chemicals Holding Inc. INCORPORABLE PHOTOINICIATOR.
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
BRPI0410985B1 (en) * 2003-06-06 2014-07-22 Ciba Sc Holding Ag Polymeric photoinitiators, their preparation process and use, photocurable composition and use, process for producing coatings, method for causing a photoinitiator to accumulate on the surface of coatings, and coated substrate
US20090004496A1 (en) * 2004-07-27 2009-01-01 Orica Australia Pty Ltd System for Providing Powder Coated Reconstituted Cellulosic Substrate
US20080038544A1 (en) * 2004-10-22 2008-02-14 Mitsubishi Rayon Co., Ltd. Matt Acrylic Resin Filmy Product For Thermoforming, Process For Production Thereof, and Laminates Comprising the Product
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
CN105111924A (en) * 2009-04-30 2015-12-02 阿姆斯特郎世界工业公司 UVV curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (en) * 2010-07-12 2012-10-24 重庆大学 Method for modifying nano metal oxide by coupling graft
DE102014107518A1 (en) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reactive micro-applicator with metal-containing additives for use with dental adhesives
CN115195104B (en) 2015-12-22 2023-12-05 卡本有限公司 Dual precursor resin system for additive manufacturing with dual cure resins
JP6531729B2 (en) * 2016-07-19 2019-06-19 株式会社Sumco Method of evaluating carbon concentration of silicon sample, method of evaluating silicon wafer manufacturing process, method of manufacturing silicon wafer, and method of manufacturing silicon single crystal ingot
US11458673B2 (en) 2017-06-21 2022-10-04 Carbon, Inc. Resin dispenser for additive manufacturing
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (en) * 2021-08-11 2022-05-10 武汉工程大学 Optical resin composition and preparation method and application thereof
CN114409902B (en) * 2021-12-27 2023-04-25 北京化工大学 Multifunctional PDMS-based prepolymer, membrane based on the prepolymer and its preparation
EP4491688A4 (en) * 2022-03-07 2025-07-09 Lg Chemical Ltd CONNECTION
JP7722248B2 (en) 2022-04-22 2025-08-13 信越化学工業株式会社 Photoreactive organopolysiloxane, its production method, and photocurable composition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
WO1998033761A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Also Published As

Publication number Publication date
EP1311627A2 (en) 2003-05-21
CN1211439C (en) 2005-07-20
US7279200B2 (en) 2007-10-09
JP5068413B2 (en) 2012-11-07
DE60128105D1 (en) 2007-06-06
WO2002014439A3 (en) 2002-06-13
TWI244495B (en) 2005-12-01
KR100818643B1 (en) 2008-04-04
US20030213931A1 (en) 2003-11-20
KR20030055249A (en) 2003-07-02
WO2002014439A2 (en) 2002-02-21
BR0113233A (en) 2003-06-24
DE60128105T8 (en) 2008-04-30
DE60128105T2 (en) 2007-12-27
EP1311627B1 (en) 2007-04-25
CA2417112A1 (en) 2002-02-21
ATE360666T1 (en) 2007-05-15
CN1447844A (en) 2003-10-08
MXPA03001383A (en) 2003-06-06
BR0113233B1 (en) 2013-10-01
JP2004506776A (en) 2004-03-04

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