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AU2001273467A1 - Exposure system for recording media - Google Patents

Exposure system for recording media

Info

Publication number
AU2001273467A1
AU2001273467A1 AU2001273467A AU7346701A AU2001273467A1 AU 2001273467 A1 AU2001273467 A1 AU 2001273467A1 AU 2001273467 A AU2001273467 A AU 2001273467A AU 7346701 A AU7346701 A AU 7346701A AU 2001273467 A1 AU2001273467 A1 AU 2001273467A1
Authority
AU
Australia
Prior art keywords
recording media
exposure system
exposure
recording
media
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001273467A
Inventor
Ayako Kubota
Masanori Kubota
Munetaka Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kubota Research Associates Inc
Original Assignee
KUBOTA RES ASSOCIATES Inc
Kubota Research Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KUBOTA RES ASSOCIATES Inc, Kubota Research Associates Inc filed Critical KUBOTA RES ASSOCIATES Inc
Publication of AU2001273467A1 publication Critical patent/AU2001273467A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/44—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements
    • B41J2/442—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements using lasers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/10—Bifocal lenses; Multifocal lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Laser Beam Printer (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2001273467A 2000-07-25 2001-07-13 Exposure system for recording media Abandoned AU2001273467A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09625335 2000-07-25
US09/625,335 US6369845B1 (en) 2000-03-14 2000-07-25 Exposure system for recording media
PCT/US2001/022219 WO2002007982A1 (en) 2000-07-25 2001-07-13 Exposure system for recording media

Publications (1)

Publication Number Publication Date
AU2001273467A1 true AU2001273467A1 (en) 2002-02-05

Family

ID=24505588

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001273467A Abandoned AU2001273467A1 (en) 2000-07-25 2001-07-13 Exposure system for recording media

Country Status (4)

Country Link
US (2) US6369845B1 (en)
JP (1) JP3869362B2 (en)
AU (1) AU2001273467A1 (en)
WO (1) WO2002007982A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6816182B2 (en) * 2000-03-14 2004-11-09 Masanori Kubota Radiation welding and imaging apparatus and method for using the same
US7506583B1 (en) * 2002-05-02 2009-03-24 Cortron Corporation Flexographic printing reflector
US7432947B2 (en) * 2005-05-25 2008-10-07 Matsushita Electric Industrial Co., Ltd. Apparatus and method of electrophotographic printing employing diffusive light sources and apparatus and method of scanning a document
US20060286362A1 (en) * 2005-06-20 2006-12-21 Masanori Kubota Methods for preparing composite materials
US20060283543A1 (en) * 2005-06-20 2006-12-21 Masanori Kubota Pseudo-transmission method of forming and joining articles
DE102007024700A1 (en) * 2007-05-25 2008-12-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for processing materials with laser radiation and apparatus for carrying out the method
DE102007028860A1 (en) * 2007-06-22 2008-12-24 Josef Lindthaler Device for contact exposure of a printing stencil
TWI490444B (en) * 2009-01-23 2015-07-01 Univ Nat Taipei Technology Slit-scan microscopic system and method using the same
JP2011229625A (en) * 2010-04-26 2011-11-17 Fujifilm Corp Endoscopic system
JP2011229603A (en) * 2010-04-26 2011-11-17 Fujifilm Corp Endoscopic system
DE102015218564B4 (en) * 2015-09-28 2020-07-30 Trumpf Laser Gmbh Laser processing machine and method for laser welding workpieces
KR102217878B1 (en) * 2019-07-03 2021-02-18 세메스 주식회사 Nozzle inspection device and method using light wavelength

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5239338A (en) * 1973-09-24 1993-08-24 Pearson Robert E Storage apparatus comprising a plurality of layers
US4940314A (en) 1985-05-13 1990-07-10 Xerox Corporation Variable wavelength discrete optical image bars having passively enhanced spatial addressing capacity
JP2619473B2 (en) * 1987-06-17 1997-06-11 株式会社日立製作所 Reduction projection exposure method
JPH01212437A (en) * 1988-02-19 1989-08-25 Nippon Telegr & Teleph Corp <Ntt> Pattern exposure and ultraviolet ray aligner
US5580698A (en) 1988-05-05 1996-12-03 Mografo A/S Scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame
JPH0644549B2 (en) * 1989-03-17 1994-06-08 株式会社日立製作所 Projection exposure method and apparatus
JPH061754B2 (en) * 1989-09-01 1994-01-05 株式会社日立製作所 Pattern exposure equipment
JPH03153014A (en) * 1989-11-10 1991-07-01 Mitsubishi Electric Corp Projection aligner
JPH0473926A (en) * 1990-07-16 1992-03-09 Fujitsu Ltd Reduced projection aligner
US5247180A (en) 1991-12-30 1993-09-21 Texas Instruments Incorporated Stereolithographic apparatus and method of use
US5781225A (en) 1992-05-19 1998-07-14 Eastman Kodak Company Method and apparatus for improving electronic recording of depth images
US5296958A (en) 1992-05-29 1994-03-22 Eastman Kodak Company Multiple wavelength laser beam scanning system
AU674518B2 (en) 1992-07-20 1997-01-02 Presstek, Inc. Lithographic printing plates for use with laser-discharge imaging apparatus
JPH0695020A (en) * 1992-09-16 1994-04-08 Canon Inc Optical scanning device
JPH06318542A (en) * 1993-05-07 1994-11-15 Nikon Corp Projection exposure device
US5506614A (en) 1993-07-12 1996-04-09 Xerox Corporation Selective optical elements for multiwavelength electronic print heads
JP3325350B2 (en) * 1993-08-16 2002-09-17 株式会社東芝 Laser exposure apparatus and semiconductor device manufacturing method
IL107508A (en) 1993-11-05 1996-12-05 Orbotech Ltd Method and apparatus for recording on optically-sensitive media
JP3057998B2 (en) 1994-02-16 2000-07-04 キヤノン株式会社 Illumination device and projection exposure apparatus using the same
US5557315A (en) * 1994-08-18 1996-09-17 Eastman Kodak Company Digital printer using a modulated white light exposure source
US5589870A (en) 1994-10-31 1996-12-31 Xerox Corporation Spot profile control using fractional interlace factors in a polygon ROS
US5785651A (en) * 1995-06-07 1998-07-28 Keravision, Inc. Distance measuring confocal microscope
JPH10289475A (en) * 1997-04-16 1998-10-27 Sony Corp Exposure equipment
DE19752713A1 (en) 1997-11-28 1999-06-02 Zeiss Carl Fa UV optical system with reduced aging
JPH11162824A (en) * 1997-12-02 1999-06-18 Sony Corp Exposure equipment

Also Published As

Publication number Publication date
JP2004510177A (en) 2004-04-02
JP3869362B2 (en) 2007-01-17
US6369845B1 (en) 2002-04-09
US20020080228A1 (en) 2002-06-27
WO2002007982A1 (en) 2002-01-31

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