AU2001273260A1 - Dual-scan thin film processing system - Google Patents

Dual-scan thin film processing system

Info

Publication number: AU2001273260A1
Authority: AU; Australia
Prior art keywords: dual; thin film; processing system; film processing; scan thin
Prior art date: 2000-07-10
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2001273260A

Inventor

Chunghsin Lee

Piero Sferlazzo

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

OPNETICS Corp

Original Assignee

OPNETICS CORP

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-07-10

Filing date

2001-07-09

Publication date

2002-01-21

2001-04-23 Priority claimed from US09/840,394 external-priority patent/US6669824B2/en

2001-07-09 Application filed by OPNETICS CORP filed Critical OPNETICS CORP

2002-01-21 Publication of AU2001273260A1 publication Critical patent/AU2001273260A1/en

Status Abandoned legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)

AU2001273260A 2000-07-10 2001-07-09 Dual-scan thin film processing system Abandoned AU2001273260A1 (en)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
US21704900P	2000-07-10	2000-07-10
US60217049		2000-07-10
US09840394		2001-04-23
US09/840,394 US6669824B2 (en)	2000-07-10	2001-04-23	Dual-scan thin film processing system
PCT/US2001/021517 WO2002004695A2 (en)	2000-07-10	2001-07-09	Thin film processing system

Publications (1)

Publication Number	Publication Date
AU2001273260A1 true AU2001273260A1 (en)	2002-01-21

Family

ID=26911563

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2001273260A Abandoned AU2001273260A1 (en)	2000-07-10	2001-07-09	Dual-scan thin film processing system

Country Status (5)

Country	Link
EP (1)	EP1301651A2 (en)
JP (1)	JP2004533538A (en)
CN (1)	CN1257307C (en)
AU (1)	AU2001273260A1 (en)
WO (1)	WO2002004695A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN104378904B (en) *	2014-11-20	2017-01-18	大连理工大学	A plasma chamber with a mechanism for generating negative hydrogen ions
US9988711B2 (en) *	2015-05-14	2018-06-05	Varian Semiconductor Equipment Associates, Inc.	Apparatus and method for multilayer deposition
CN106987817B (en) *	2017-04-17	2019-03-29	同济大学	A method of line style magnetic controlled sputtering target rifle is improved in spill cylinder base coated film quality
JP2020023739A (en) *	2018-08-08	2020-02-13	株式会社アルバック	Ion beam sputtering device and ion beam sputtering method
JP2020026539A (en) *	2018-08-09	2020-02-20	株式会社アルバック	Ion beam sputtering device and ion beam sputtering method
CN114703455B (en) *	2022-02-21	2023-11-28	松山湖材料实验室	Method and device for preparing combined film

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2959023B2 (en) *	1990-02-23	1999-10-06	日本電気株式会社	Ion beam sputtering equipment
JP3074712B2 (en) *	1990-08-31	2000-08-07	日本電気株式会社	Method for producing silver single crystal thin film and metal artificial lattice
US5356673A (en) *	1991-03-18	1994-10-18	Jet Process Corporation	Evaporation system and method for gas jet deposition of thin film materials
JPH05170448A (en) *	1991-12-26	1993-07-09	Matsushita Electric Ind Co Ltd	Method for manufacturing ceramic thin film
JP3452617B2 (en) *	1993-12-10	2003-09-29	真空冶金株式会社	Gas deposition equipment
US5571332A (en) *	1995-02-10	1996-11-05	Jet Process Corporation	Electron jet vapor deposition system
DE19513918C1 (en) *	1995-04-12	1996-11-07	Fraunhofer Ges Forschung	Method of coating submicrometer structures for highly integrated circuits
JPH1026698A (en) *	1996-07-12	1998-01-27	Nikon Corp	Vacuum thin film forming apparatus and method of manufacturing reflector
JP3861329B2 (en) *	1996-07-17	2006-12-20	株式会社ニコン	Vacuum thin film forming apparatus and reflector manufacturing method
US6086727A (en) *	1998-06-05	2000-07-11	International Business Machines Corporation	Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system
JP3081844B2 (en) *	1998-08-26	2000-08-28	日本電信電話株式会社	Optical filter manufacturing method

2001
- 2001-07-09 JP JP2002509548A patent/JP2004533538A/en active Pending
- 2001-07-09 WO PCT/US2001/021517 patent/WO2002004695A2/en not_active Ceased
- 2001-07-09 CN CN 01814155 patent/CN1257307C/en not_active Expired - Fee Related
- 2001-07-09 EP EP01952519A patent/EP1301651A2/en not_active Withdrawn
- 2001-07-09 AU AU2001273260A patent/AU2001273260A1/en not_active Abandoned

Also Published As

Publication number	Publication date
WO2002004695A2 (en)	2002-01-17
WO2002004695A3 (en)	2002-06-20
JP2004533538A (en)	2004-11-04
CN1447865A (en)	2003-10-08
EP1301651A2 (en)	2003-04-16
CN1257307C (en)	2006-05-24

Publication	Publication Date	Title
AU2001236694A1 (en)	2001-12-17	Method and system for self-service film processing
AU2001291175A1 (en)	2002-04-02	Medical image processing systems
AU2001273259A1 (en)	2002-01-21	Differentially-pumped material processing system
EP1215607A3 (en)	2004-03-31	Electronic procurement system
AU2001283991A1 (en)	2002-02-25	Data processing system
AU5892000A (en)	2001-01-22	Thin film thermocouple
AU2733601A (en)	2001-07-16	Digital film processing method
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AU2001253513A1 (en)	2001-11-12	Substrate processing system
AU4262601A (en)	2001-10-15	Image processing
AU6408601A (en)	2001-12-24	A distributed processing system
AU2993200A (en)	2000-08-29	Multiple processing system
AU1218401A (en)	2001-04-30	Fluid processing system
AU6964401A (en)	2001-12-17	Data processing system
AU2001273457A1 (en)	2002-01-30	Foamed-thermoplastic films
AU2001241996A1 (en)	2001-09-17	Rule based proximity and time based tracking system
AU2003242391A1 (en)	2003-12-12	Information processing system
AU3824799A (en)	1999-11-29	Data processing device
AU2001273260A1 (en)	2002-01-21	Dual-scan thin film processing system
AU7433101A (en)	2002-01-08	Processing image data
AU2001295954A1 (en)	2002-04-29	Information processing system
AU4868201A (en)	2001-10-23	Tracking system
AU1407001A (en)	2001-05-30	Image processing system
AU6114500A (en)	2001-02-05	Speech-enabled information processing
AU2186599A (en)	2000-08-25	Data processing system